KR20080090263A - 펠리클의 제조 방법 및 펠리클 - Google Patents

펠리클의 제조 방법 및 펠리클 Download PDF

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Publication number
KR20080090263A
KR20080090263A KR1020080007369A KR20080007369A KR20080090263A KR 20080090263 A KR20080090263 A KR 20080090263A KR 1020080007369 A KR1020080007369 A KR 1020080007369A KR 20080007369 A KR20080007369 A KR 20080007369A KR 20080090263 A KR20080090263 A KR 20080090263A
Authority
KR
South Korea
Prior art keywords
pellicle
film
pellicle film
temperature
manufacturing
Prior art date
Application number
KR1020080007369A
Other languages
English (en)
Korean (ko)
Inventor
토루 시라사키
Original Assignee
신에쓰 가가꾸 고교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 신에쓰 가가꾸 고교 가부시끼가이샤 filed Critical 신에쓰 가가꾸 고교 가부시끼가이샤
Publication of KR20080090263A publication Critical patent/KR20080090263A/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
KR1020080007369A 2007-04-04 2008-01-24 펠리클의 제조 방법 및 펠리클 KR20080090263A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2007-00098614 2007-04-04
JP2007098614 2007-04-04

Publications (1)

Publication Number Publication Date
KR20080090263A true KR20080090263A (ko) 2008-10-08

Family

ID=40013877

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020080007369A KR20080090263A (ko) 2007-04-04 2008-01-24 펠리클의 제조 방법 및 펠리클
KR1020080027178A KR20080090280A (ko) 2007-04-04 2008-03-25 펠리클의 제조 방법 및 펠리클

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020080027178A KR20080090280A (ko) 2007-04-04 2008-03-25 펠리클의 제조 방법 및 펠리클

Country Status (4)

Country Link
JP (1) JP2008276195A (zh)
KR (2) KR20080090263A (zh)
CN (1) CN101281363A (zh)
TW (1) TW200841124A (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2592474B1 (en) * 2010-07-08 2015-04-08 Mitsui Chemicals, Inc. Pellicle film
JP7224712B2 (ja) * 2018-12-03 2023-02-20 信越化学工業株式会社 ペリクルの製造方法、ペリクル、ペリクル付フォトマスク、露光方法、半導体デバイスの製造方法、液晶ディスプレイの製造方法及び有機ｅｌディスプレイの製造方法。

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0445448A (ja) * 1990-06-13 1992-02-14 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JPH0594006A (ja) * 1991-10-01 1993-04-16 Asahi Chem Ind Co Ltd 耐光性ペリクル
JPH07271016A (ja) * 1994-02-10 1995-10-20 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JPH1165092A (ja) * 1997-08-19 1999-03-05 Shin Etsu Chem Co Ltd ペリクルおよびペリクルの製造方法
JP2006178434A (ja) * 2004-11-25 2006-07-06 Asahi Kasei Electronics Co Ltd 大型ペリクル

Also Published As

Publication number Publication date
KR20080090280A (ko) 2008-10-08
CN101281363A (zh) 2008-10-08
JP2008276195A (ja) 2008-11-13
TW200841124A (en) 2008-10-16

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