KR20080039724A - 다층 나노선 및 이의 형성방법 - Google Patents
다층 나노선 및 이의 형성방법 Download PDFInfo
- Publication number
- KR20080039724A KR20080039724A KR1020060107410A KR20060107410A KR20080039724A KR 20080039724 A KR20080039724 A KR 20080039724A KR 1020060107410 A KR1020060107410 A KR 1020060107410A KR 20060107410 A KR20060107410 A KR 20060107410A KR 20080039724 A KR20080039724 A KR 20080039724A
- Authority
- KR
- South Korea
- Prior art keywords
- iron
- gold
- current
- nanowires
- nanowire
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y5/00—Nanobiotechnology or nanomedicine, e.g. protein engineering or drug delivery
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/006—Nanostructures, e.g. using aluminium anodic oxidation templates [AAO]
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/0009—Antiferromagnetic materials, i.e. materials exhibiting a Néel transition temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/0036—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity
- H01F1/0072—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity one dimensional, i.e. linear or dendritic nanostructures
- H01F1/0081—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity one dimensional, i.e. linear or dendritic nanostructures in a non-magnetic matrix, e.g. Fe-nanowires in a nanoporous membrane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12465—All metal or with adjacent metals having magnetic properties, or preformed fiber orientation coordinate with shape
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12583—Component contains compound of adjacent metal
- Y10T428/1259—Oxide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12632—Four or more distinct components with alternate recurrence of each type component
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Biotechnology (AREA)
- Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Medicinal Chemistry (AREA)
- Medical Informatics (AREA)
- General Health & Medical Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Pharmacology & Pharmacy (AREA)
- Biophysics (AREA)
- Bioinformatics & Cheminformatics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Electroplating Methods And Accessories (AREA)
- Soft Magnetic Materials (AREA)
- Powder Metallurgy (AREA)
Abstract
Description
Claims (20)
- 바코드 형 철(Fe)-금(Au) 다층 나노선 형성 방법에 있어서,양극산화 나노틀을 이용하여 제1전류를 사용하여 철을, 상기 제 1 전류보다 낮은 제 2 전류를 사용하여 금을 상기 나노틀의 세공(Pore)으로 서로 번갈아 충진시켜 철-금 다층 나노선을 형성하는 전기도금 공정,상기 양극산화 나노틀을 에칭하는 공정을 포함하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제1항에 있어서,상기 양극산화 나노틀은 양극산화 알루미늄 나노틀 임을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제1항에 있어서,상기 전기도금 공정 전에 전자빔 증착법으로 상기 양극산화 알루미늄 나노틀의 밑면에 전도성 물질층을 형성하는 공정을 더 포함하는 것을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제1항에 있어서,상기 전기도금 공정에 사용하는 전해액은 Iron (II) Sulfate Heptahydrate(FeSO4 7H2O)와 Potassium Dicyanoaurate(Ⅰ)(KAu(CN)2l)인 것을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제4항에 있어서,상기 Iron (II) Sulfate Heptahydrate(FeSO4 7H2O)와 Potassium Dicyanoaurate(Ⅰ)(KAu(CN)2l)의 비율은 40:1에서 4:1 범위인 것을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제1항에 있어서,상기 양극 산화 나노틀을 에칭하는 공정은 NaOH를 사용하는 것을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제1항에 있어서,상기 제 1 전류는 30 mA/Cm2 이고, 상기 제 2 전류는 1.5 mA/Cm2 임을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 바코드형 철(Fe)-금(Au) 다층 나노선 형성 방법에 있어서,한 개의 도금조 속에 Iron (II) Sulfate Heptahydrate(FeSO4 7H2O)와 Potassium Dicyanoaurate(Ⅰ)(KAu(CN)2l)을 40:1에서 4:1 범위의 비율의 용액을 제조하는 단계;하부에 전도성 물질층을 가지는 양극산화 알루미늄 나노틀을 음극에 위치시키고, 펄스를 사용하여 제 1 전류와 제 2 전류를 교대로 인가하여 철-금 다층 나노선을 형성하는 단계; 와상기 양극 산화 나노틀을 에칭하는 공정을 포함하는 바코드형 철-금 다층 나노선 형성 방법.
- 제8항에 있어서,상기 나노틀은 양극산화 알루미늄 나노틀 임을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제8항에 있어서,상기 전도성 물질층을 전자빔 증착법으로 250 nm 두께로 형성된 것을 특징으로 하는 철-금 다층 나노선 형성 방법.
- 제8항에 있어서,상기 Iron (II) Sulfate Heptahydrate(FeSO4 7H2O)와 Potassium Dicyanoaurate(Ⅰ)(KAu(CN)2l)의 비율은 16:1 인 것을 특징으로 하는 바코드형 철- 금 다층 나노선 형성 방법.
- 제8항에 있어서,상기 양극산화 알루미늄 나노틀을 에칭하는 공정은 NaOH를 사용하는 것을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제8항에 있어서,상기 제 1 전류는 30 mA/Cm2 이고, 상기 제 2 전류는 1.5 mA/Cm2 임을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 바코드형 철(Fe)-금(Au) 다층 나노선 형성 방법에 있어서,한 개의 도금조 속에 철 2가 이온을 나타내는 전구체와 금 1가 이온을 나타내는 전구체 용액을 제조하는 단계;하부에 증착한 전도성 물질층을 갖는 양극산화 알루미늄 나노틀을 음극에 위치시키고, 펄스를 사용하여 제1 전류와 제2 전류을 교대로 인가하여 철-금 다층 나노선을 형성하는 단계; 와상기 양극산화 알루미늄 나노틀을 에칭하는 공정을 포함하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제14항에 있어서,상기 나노틀은 양극산화 알루미늄 나노틀 임을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제14항에 있어서,상기 전도성 물질층은 전자빔 증착법으로 250 nm 두께로 형성된 것을 특징으로 하는 철-금 다층 나노선 형성 방법.
- 제14항에 있어서,상기 철 2가 이온을 나타내는 전구체와 금 1가 이온을 나타내는 전구체 용액은 Iron (II) Sulfate Heptahydrate(FeSO4 7H2O)와 Potassium Dicyanoaurate(Ⅰ)(KAu(CN)2l)의 40:1에서 4:1 범위의 비율 용액인 것을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제14항에 있어서,상기 양극 산화 나노틀을 에칭하는 공정은 NaOH를 사용하는 것을 특징으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 제14항에 있어서,상기 제 1 전류는 30 mA/Cm2 이고, 상기 제 2 전류는 1.5 mA/Cm2 임을 특징 으로 하는 바코드 형 철-금 다층 나노선 형성 방법.
- 원판형 철 또는 금 나노입자 형성 방법에 있어서,한 개의 도금조 속에 철 2가 이온을 나타내는 전구체와 금 1가 이온을 나타내는 전구체 용액을 제조하는 단계;하부에 증착한 전도성 물질층을 갖는 양극산화 알루미늄 나노틀을 음극에 위치시키고, 펄스를 사용하여 제1 전류와 제2 전류을 교대로 인가하여 철-금 다층 나노선을 형성하는 단계;상기 양극산화 알루미늄 나노틀을 에칭하는 단계; 및상기 두 개의 금속 박막중 하나의 금속 박막을 화학 에칭하는 공정을 포함하는 원판형 철 또는 금 나노입자 형성 방법.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060107410A KR100848689B1 (ko) | 2006-11-01 | 2006-11-01 | 다층 나노선 및 이의 형성방법 |
EP07119717A EP1925696B1 (en) | 2006-11-01 | 2007-10-31 | A method of manufacturing an iron-gold barcode nanowire |
JP2007283260A JP4847429B2 (ja) | 2006-11-01 | 2007-10-31 | 鉄−金のバーコードナノワイヤー及びその製造方法 |
US11/931,703 US9175412B2 (en) | 2006-11-01 | 2007-10-31 | Iron-gold barcode nanowire and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060107410A KR100848689B1 (ko) | 2006-11-01 | 2006-11-01 | 다층 나노선 및 이의 형성방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080039724A true KR20080039724A (ko) | 2008-05-07 |
KR100848689B1 KR100848689B1 (ko) | 2008-07-28 |
Family
ID=38984219
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060107410A KR100848689B1 (ko) | 2006-11-01 | 2006-11-01 | 다층 나노선 및 이의 형성방법 |
Country Status (4)
Country | Link |
---|---|
US (1) | US9175412B2 (ko) |
EP (1) | EP1925696B1 (ko) |
JP (1) | JP4847429B2 (ko) |
KR (1) | KR100848689B1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101336829B1 (ko) * | 2011-03-28 | 2013-12-04 | 고려대학교 산학협력단 | 나노 규모의 금속이 코팅된 다층 유기 기반 발광 바코드 나노 구조체, 그 제조 방법 및 이용 방법 |
US10385467B2 (en) | 2016-05-02 | 2019-08-20 | Korea Institute Of Science And Technology | Metal nanolaminates and manufacturing method thereof |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1919703B1 (en) | 2005-08-12 | 2013-04-24 | Modumetal, LLC | Compositionally modulated composite materials and methods for making the same |
US9758891B2 (en) | 2008-07-07 | 2017-09-12 | Modumetal, Inc. | Low stress property modulated materials and methods of their preparation |
KR101093364B1 (ko) | 2008-12-31 | 2011-12-14 | 고려대학교 산학협력단 | 다원계 나노선 제조방법 |
US8383237B2 (en) * | 2009-06-01 | 2013-02-26 | University Of Maryland, College Park | Preparation of silica stabilized biological templates for the production of metal and layered nanoparticles |
EP3009532A1 (en) | 2009-06-08 | 2016-04-20 | Modumetal, Inc. | Electrodeposited nanolaminate coatings and claddings for corrosion protection |
US10100419B2 (en) * | 2009-11-25 | 2018-10-16 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Production of nano-organized electrodes on porous substrate |
KR101161060B1 (ko) * | 2009-11-30 | 2012-06-29 | 서강대학교산학협력단 | 나노입자를 기둥형태로 조직화시키기 위한 배열장치 및 그 배열방법 |
JP5424406B2 (ja) * | 2010-02-09 | 2014-02-26 | 国立大学法人 長崎大学 | 化合物半導体極細線の製造方法、及び化合物半導体極細線集合体 |
JP5414066B2 (ja) * | 2010-06-25 | 2014-02-12 | 独立行政法人産業技術総合研究所 | 光制御素子 |
EP2596150B1 (en) | 2010-07-22 | 2020-06-17 | Modumetal, Inc. | Material and process for electrochemical deposition of nanolaminated brass alloys |
US20130309280A1 (en) | 2011-02-01 | 2013-11-21 | Korea University Research And Business Foundation | Spinning nanowires and method for inducing cell eradication using same |
WO2012149082A2 (en) * | 2011-04-26 | 2012-11-01 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Three-dimensional coherent plasmonic nanowire arrays for enhancement of optical processes |
US10718636B1 (en) | 2012-04-11 | 2020-07-21 | Louisiana Tech Research Corporation | Magneto-resistive sensors |
US9784802B1 (en) * | 2012-04-11 | 2017-10-10 | Louisiana Tech Research Corporation | GMR nanowire sensors |
CN102774807A (zh) * | 2012-07-05 | 2012-11-14 | 上海大学 | 核壳式纳米线阵列拉曼散射增强基底制备方法 |
EA201500949A1 (ru) | 2013-03-15 | 2016-02-29 | Модьюметл, Инк. | Способ формирования многослойного покрытия, покрытие, сформированное вышеуказанным способом, и многослойное покрытие |
WO2014146114A1 (en) | 2013-03-15 | 2014-09-18 | Modumetal, Inc. | Nanolaminate coatings |
EP2971266A4 (en) | 2013-03-15 | 2017-03-01 | Modumetal, Inc. | A method and apparatus for continuously applying nanolaminate metal coatings |
EP2971261A4 (en) | 2013-03-15 | 2017-05-31 | Modumetal, Inc. | Electrodeposited compositions and nanolaminated alloys for articles prepared by additive manufacturing processes |
DE102014005685A1 (de) * | 2014-04-11 | 2015-10-29 | Bundesrepublik Deutschland, Vertreten Durch Den Bundesminister Für Wirtschaft Und Energie, Dieser Vertreten Durch Den Präsidenten Der Bundesanstalt Für Materialforschung Und -Prüfung (Bam) | Strichcodeträgerpartikel, Herstellung und Verwendung |
WO2016044712A1 (en) | 2014-09-18 | 2016-03-24 | Modumetal, Inc. | Methods of preparing articles by electrodeposition and additive manufacturing processes |
CA2961508C (en) | 2014-09-18 | 2024-04-09 | Modumetal, Inc. | A method and apparatus for continuously applying nanolaminate metal coatings |
CN105967142A (zh) * | 2016-04-27 | 2016-09-28 | 中国计量大学 | 一种用于sers基底的多明治周期性纳米线阵列及其制备方法 |
WO2018049062A1 (en) | 2016-09-08 | 2018-03-15 | Modumetal, Inc. | Processes for providing laminated coatings on workpieces, and articles made therefrom |
CA3057836A1 (en) | 2017-03-24 | 2018-09-27 | Modumetal, Inc. | Lift plungers with electrodeposited coatings, and systems and methods for producing the same |
WO2018195516A1 (en) | 2017-04-21 | 2018-10-25 | Modumetal, Inc. | Tubular articles with electrodeposited coatings, and systems and methods for producing the same |
CN110892491A (zh) * | 2017-07-10 | 2020-03-17 | 思力柯集团 | 包括含铝层的涂层的磁体 |
EP3784823A1 (en) | 2018-04-27 | 2021-03-03 | Modumetal, Inc. | Apparatuses, systems, and methods for producing a plurality of articles with nanolaminated coatings using rotation |
CN109795975A (zh) * | 2018-12-28 | 2019-05-24 | 南京大学 | 一种金属微/纳米线阵列及其制备方法 |
US20220193642A1 (en) * | 2019-02-25 | 2022-06-23 | Habib Technologies LLC | Catalytic plasmonic nanomaterial |
EP3799084B1 (en) * | 2019-09-30 | 2023-05-03 | Murata Manufacturing Co., Ltd. | Nanomagnetic inductor cores, inductors and devices incorporating such cores, and associated manufacturing methods |
KR102370918B1 (ko) * | 2020-05-22 | 2022-03-08 | 고려대학교 산학협력단 | 나노바코드를 이용한 대식세포의 부착 및 분극화 조절 방법 |
JPWO2023038158A1 (ko) * | 2021-09-13 | 2023-03-16 |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5713637B2 (ko) | 1973-09-04 | 1982-03-18 | ||
US3902977A (en) * | 1973-12-13 | 1975-09-02 | Engelhard Min & Chem | Gold plating solutions and method |
US4198484A (en) * | 1978-07-26 | 1980-04-15 | Abbott Laboratories | Cuvette ampule for use with automatic analyzer apparatus |
JPH0727663B2 (ja) * | 1985-04-03 | 1995-03-29 | ヤマハ株式会社 | 光磁気記録媒体およびその製法 |
IL76592A (en) | 1985-10-06 | 1989-03-31 | Technion Res & Dev Foundation | Method for electrodeposition of at least two metals from a single solution |
US4869971A (en) * | 1986-05-22 | 1989-09-26 | Nee Chin Cheng | Multilayer pulsed-current electrodeposition process |
US4808279A (en) * | 1986-10-02 | 1989-02-28 | The University Of Toronto Innovations Foundation | Process for preparing magnetic recording material |
US5278933A (en) * | 1992-06-30 | 1994-01-11 | Hunsinger Terrance D | Fiber optic splice organizer and associated method |
GB9405535D0 (en) * | 1994-03-21 | 1994-05-04 | Raychem Sa Nv | Splice organizing apparatus |
TW286371B (ko) * | 1995-03-31 | 1996-09-21 | Minnesota Mining & Mfg | |
MY125832A (en) * | 1995-11-06 | 2006-08-30 | Japan Recom Ltd | Closure for cable connection |
US5708751A (en) * | 1996-04-24 | 1998-01-13 | Tii Industries, Inc. | Optical fiber enclosure system |
US6521116B2 (en) * | 1999-07-30 | 2003-02-18 | Moltech Invent S.A. | Cells for the electrowinning of aluminium having dimensionally stable metal-based anodes |
SE9903531D0 (sv) * | 1999-09-30 | 1999-09-30 | Res Inst Acreo Ab | Förfarande för elektroavsättning av metalliska flerskikt |
AU1495101A (en) * | 1999-10-01 | 2001-05-10 | Surromed, Inc. | Method of manufacture of colloidal rod particles as nanobar codes |
US7045049B1 (en) * | 1999-10-01 | 2006-05-16 | Nanoplex Technologies, Inc. | Method of manufacture of colloidal rod particles as nanobar codes |
EP1146147A4 (en) * | 1999-10-07 | 2006-08-16 | Tanaka Precious Metal Ind | GOLD PLATING LIQUID AND METHOD FOR PLATING USING LIQUID |
JP2004502554A (ja) | 2000-03-22 | 2004-01-29 | ユニバーシティー オブ マサチューセッツ | ナノシリンダー・アレイ |
US6547944B2 (en) * | 2000-12-08 | 2003-04-15 | Delphi Technologies, Inc. | Commercial plating of nanolaminates |
JP3598373B2 (ja) * | 2001-09-03 | 2004-12-08 | 独立行政法人物質・材料研究機構 | 基体上に接合して規則化配列したナノ構造体およびその製造方法 |
WO2003046265A2 (en) * | 2001-11-26 | 2003-06-05 | Massachusetts Institute Of Technology | Thick porous anodic alumina films and nanowire arrays grown on a solid substrate |
KR20030075227A (ko) * | 2002-03-16 | 2003-09-26 | 김영식 | 금속 나노 막대 제조용 다공성 알루미나 및 그의 제조방법 |
US6902827B2 (en) * | 2002-08-15 | 2005-06-07 | Sandia National Laboratories | Process for the electrodeposition of low stress nickel-manganese alloys |
JP4315424B2 (ja) * | 2003-08-29 | 2009-08-19 | キヤノン株式会社 | ナノ構造体の製造方法 |
US7610074B2 (en) | 2004-01-08 | 2009-10-27 | The Board Of Trustees Of The University Of Illinois | Multi-functional plasmon-resonant contrast agents for optical coherence tomography |
US7292762B2 (en) * | 2004-04-14 | 2007-11-06 | Fujikura Ltd. | Hole-assisted holey fiber and low bending loss multimode holey fiber |
US7274850B2 (en) * | 2005-02-25 | 2007-09-25 | Charles Industries, Ltd. | Fiber optic splice enclosure |
US7308183B2 (en) * | 2006-01-04 | 2007-12-11 | Adc Telecommunications, Inc. | Fiber access terminal including moisture barrier plate |
US7418183B2 (en) * | 2006-02-08 | 2008-08-26 | Charles Industries, Ltd. | Fiber optic splice enclosure |
US20070221917A1 (en) * | 2006-03-24 | 2007-09-27 | Chin Wee S | Method of preparing nanowire(s) and product(s) obtained therefrom |
-
2006
- 2006-11-01 KR KR1020060107410A patent/KR100848689B1/ko active IP Right Grant
-
2007
- 2007-10-31 JP JP2007283260A patent/JP4847429B2/ja active Active
- 2007-10-31 US US11/931,703 patent/US9175412B2/en active Active
- 2007-10-31 EP EP07119717A patent/EP1925696B1/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101336829B1 (ko) * | 2011-03-28 | 2013-12-04 | 고려대학교 산학협력단 | 나노 규모의 금속이 코팅된 다층 유기 기반 발광 바코드 나노 구조체, 그 제조 방법 및 이용 방법 |
US10385467B2 (en) | 2016-05-02 | 2019-08-20 | Korea Institute Of Science And Technology | Metal nanolaminates and manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
EP1925696A3 (en) | 2010-02-24 |
KR100848689B1 (ko) | 2008-07-28 |
EP1925696A2 (en) | 2008-05-28 |
US9175412B2 (en) | 2015-11-03 |
JP2008115469A (ja) | 2008-05-22 |
EP1925696B1 (en) | 2012-12-19 |
JP4847429B2 (ja) | 2011-12-28 |
US20090155617A1 (en) | 2009-06-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100848689B1 (ko) | 다층 나노선 및 이의 형성방법 | |
US8070930B2 (en) | Methods for fabricating metal nanowires | |
McGary et al. | Magnetic nanowires for acoustic sensors | |
Kline et al. | Template-grown metal nanowires | |
Hurst et al. | Multisegmented one‐dimensional nanorods prepared by hard‐template synthetic methods | |
Bera et al. | Synthesis of nanostructured materials using template-assisted electrodeposition | |
Proenca et al. | Distinguishing nanowire and nanotube formation by the deposition current transients | |
Su et al. | Microstructure and magnetic properties of bamboo-like CoPt/Pt multilayered nanowire arrays | |
Cesiulis et al. | Electrodeposition of iron-group alloys into nanostructured oxide membranes: Synthetic challenges and properties | |
Ohgai et al. | Magneto-sensitive nickel nanowires fabricated by electrodeposition into multi-and single-ion track templates | |
Ohgai et al. | Electrodeposition of cobalt based ferro-magnetic metal nanowires in polycarbonate films with cylindrical nanochannels fabricated by heavy-ion-track etching | |
KR20090126825A (ko) | 코어쉘 나노선 및 그 제조 방법 | |
Jani et al. | Soft and hard surface manipulation of nanoporous anodic aluminum oxide (AAO) | |
Sequeira | Electrochemical synthesis of iron oxide nanoparticles for biomedical application | |
US20130337034A1 (en) | Biofunctionalized magnetic nanowires | |
EP1230443A1 (en) | Method for electrodeposition of metallic multilayers | |
Podlaha et al. | 16 Electrochemical Deposition of Nanostructured Metals | |
KR100733794B1 (ko) | 원판형 금속 나노입자 형성방법 | |
Neetzel et al. | Uniaxial magnetization performance of Co-Al 2 O 3 nano-composite films electrochemically synthesized from acidic aqueous solution | |
Gupta et al. | Scaffold assisted synthesized metallic and semiconductor nanowires for electrochemical biosensing applications | |
CN112962122B (zh) | 一种高矫顽力B掺杂FePt薄膜的制备方法 | |
Kisner | Ultrathin gold nanowires: chemistry, electrical characterization and application to sense cellular biology | |
Rožman | Functionalization of magnetic nanowires for biomedical applications | |
Min et al. | Magnetic nanodiscs fabricated from multilayered nanowires | |
Briggle et al. | Multilayer film fabrication using flow injection coupled with electrochemical deposition |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
AMND | Amendment | ||
E601 | Decision to refuse application | ||
J201 | Request for trial against refusal decision | ||
AMND | Amendment | ||
B701 | Decision to grant | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130621 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20140630 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20151123 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20160615 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20170707 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20180702 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20190715 Year of fee payment: 12 |