KR20070119057A - 워크스테이션들 간의 전달 챔버 - Google Patents

워크스테이션들 간의 전달 챔버 Download PDF

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Publication number
KR20070119057A
KR20070119057A KR1020077024974A KR20077024974A KR20070119057A KR 20070119057 A KR20070119057 A KR 20070119057A KR 1020077024974 A KR1020077024974 A KR 1020077024974A KR 20077024974 A KR20077024974 A KR 20077024974A KR 20070119057 A KR20070119057 A KR 20070119057A
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KR
South Korea
Prior art keywords
chamber
transfer
workstation
workstation system
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020077024974A
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English (en)
Korean (ko)
Inventor
클린턴 엠. 해리스
Original Assignee
브룩스 오토메이션 인코퍼레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 브룩스 오토메이션 인코퍼레이티드 filed Critical 브룩스 오토메이션 인코퍼레이티드
Publication of KR20070119057A publication Critical patent/KR20070119057A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67184—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the presence of more than one transfer chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67715—Changing the direction of the conveying path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Automation & Control Theory (AREA)
KR1020077024974A 2005-03-30 2006-03-29 워크스테이션들 간의 전달 챔버 Ceased KR20070119057A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/093,480 2005-03-30
US11/093,480 US9099506B2 (en) 2005-03-30 2005-03-30 Transfer chamber between workstations

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020147033479A Division KR101567917B1 (ko) 2005-03-30 2006-03-29 워크스테이션들 간의 전달 챔버

Publications (1)

Publication Number Publication Date
KR20070119057A true KR20070119057A (ko) 2007-12-18

Family

ID=37054076

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020077024974A Ceased KR20070119057A (ko) 2005-03-30 2006-03-29 워크스테이션들 간의 전달 챔버
KR1020147033479A Active KR101567917B1 (ko) 2005-03-30 2006-03-29 워크스테이션들 간의 전달 챔버

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020147033479A Active KR101567917B1 (ko) 2005-03-30 2006-03-29 워크스테이션들 간의 전달 챔버

Country Status (6)

Country Link
US (1) US9099506B2 (enExample)
JP (2) JP5751690B2 (enExample)
KR (2) KR20070119057A (enExample)
CN (1) CN101189713B (enExample)
TW (1) TWI395255B (enExample)
WO (1) WO2006105195A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8531678B2 (en) * 1999-07-09 2013-09-10 Nova Measuring Instruments, Ltd. Method and system for measuring patterned structures
US7891936B2 (en) 2005-03-30 2011-02-22 Brooks Automation, Inc. High speed substrate aligner apparatus
US8545165B2 (en) 2005-03-30 2013-10-01 Brooks Automation, Inc. High speed substrate aligner apparatus
US20080019806A1 (en) * 2006-07-24 2008-01-24 Nyi Oo Myo Small footprint modular processing system
DE102008062080A1 (de) * 2008-12-12 2010-06-17 Karlsruher Institut für Technologie Vorrichtung zum Transport atmosphärenempfindlicher Proben und Verwendung derselben
TW201123340A (en) * 2009-11-12 2011-07-01 Hitachi High Tech Corp Vacuum processing system and vacuum processing method of semiconductor processing substrate
JP2013033965A (ja) * 2011-07-29 2013-02-14 Semes Co Ltd 基板処理装置、基板処理設備、及び基板処理方法
JP5923288B2 (ja) * 2011-12-01 2016-05-24 株式会社日立ハイテクノロジーズ 真空処理装置及び真空処理装置の運転方法
WO2019182913A1 (en) * 2018-03-20 2019-09-26 Tokyo Electron Limited Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using same
JP7321182B2 (ja) * 2018-03-23 2023-08-04 アゼンタ・インコーポレーテッド 自動化極低温貯蔵及び回収システム
US10886155B2 (en) * 2019-01-16 2021-01-05 Applied Materials, Inc. Optical stack deposition and on-board metrology

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5310410A (en) * 1990-04-06 1994-05-10 Sputtered Films, Inc. Method for processing semi-conductor wafers in a multiple vacuum and non-vacuum chamber apparatus
JPH04298059A (ja) 1991-03-27 1992-10-21 Hitachi Ltd 真空処理装置
JPH06151552A (ja) * 1992-11-10 1994-05-31 Hitachi Ltd 半導体製造装置およびそれを用いた半導体製造方法
KR970011065B1 (ko) * 1992-12-21 1997-07-05 다이닛뽕 스크린 세이조오 가부시키가이샤 기판처리장치와 기판처리장치에 있어서 기판교환장치 및 기판교환방법
TW295677B (enExample) * 1994-08-19 1997-01-11 Tokyo Electron Co Ltd
JP3453223B2 (ja) 1994-08-19 2003-10-06 東京エレクトロン株式会社 処理装置
JPH08151552A (ja) 1994-11-29 1996-06-11 Japan Synthetic Rubber Co Ltd ハードコートフィルム
JP2981844B2 (ja) 1996-05-16 1999-11-22 住友重機械工業株式会社 薄膜製造装置
US6280134B1 (en) * 1997-06-17 2001-08-28 Applied Materials, Inc. Apparatus and method for automated cassette handling
US6235634B1 (en) * 1997-10-08 2001-05-22 Applied Komatsu Technology, Inc. Modular substrate processing system
US6038490A (en) * 1998-01-29 2000-03-14 International Business Machines Corporation Automated data storage library dual picker interference avoidance
KR100265287B1 (ko) * 1998-04-21 2000-10-02 윤종용 반도체소자 제조용 식각설비의 멀티챔버 시스템
TW442891B (en) * 1998-11-17 2001-06-23 Tokyo Electron Ltd Vacuum processing system
JP2000150618A (ja) 1998-11-17 2000-05-30 Tokyo Electron Ltd 真空処理システム
JP4256551B2 (ja) 1998-12-25 2009-04-22 東京エレクトロン株式会社 真空処理システム
US6662076B1 (en) * 1999-02-10 2003-12-09 Advanced Micro Devices, Inc. Management of move requests from a factory system to an automated material handling system
JP2000312463A (ja) 1999-04-27 2000-11-07 Shinko Electric Co Ltd リニアモータのレール接続構造
TW504941B (en) * 1999-07-23 2002-10-01 Semiconductor Energy Lab Method of fabricating an EL display device, and apparatus for forming a thin film
JP2001315960A (ja) 2000-05-09 2001-11-13 Meidensha Corp 基板搬送装置
JP4021125B2 (ja) * 2000-06-02 2007-12-12 東京エレクトロン株式会社 ウェハ移載装置の装置ユニット接続時に用いられるレールの真直性保持装置
US6852194B2 (en) * 2001-05-21 2005-02-08 Tokyo Electron Limited Processing apparatus, transferring apparatus and transferring method
US6779962B2 (en) * 2002-03-22 2004-08-24 Brooks Automation, Inc. Device for handling flat panels in a vacuum
JP4712379B2 (ja) 2002-07-22 2011-06-29 ブルックス オートメーション インコーポレイテッド 基板処理装置
US6968257B2 (en) * 2003-11-21 2005-11-22 International Business Machines Corporation Continued execution of accessor commands on a restricted multiple accessor path of an automated data storage library
US8085676B2 (en) * 2006-06-29 2011-12-27 Nortel Networks Limited Method and system for looping back traffic in QIQ ethernet rings and 1:1 protected PBT trunks

Also Published As

Publication number Publication date
JP2008535262A (ja) 2008-08-28
CN101189713A (zh) 2008-05-28
US9099506B2 (en) 2015-08-04
TW200644050A (en) 2006-12-16
US20060245847A1 (en) 2006-11-02
JP5751690B2 (ja) 2015-07-22
KR20150002888A (ko) 2015-01-07
CN101189713B (zh) 2012-03-28
KR101567917B1 (ko) 2015-11-10
WO2006105195A3 (en) 2007-11-01
JP2014060412A (ja) 2014-04-03
WO2006105195A2 (en) 2006-10-05
TWI395255B (zh) 2013-05-01

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