KR20070057983A - 임피던스를 측정하여 플라즈마 처리 시스템에서의프로세스를 모니터링하는 방법 및 장치 - Google Patents
임피던스를 측정하여 플라즈마 처리 시스템에서의프로세스를 모니터링하는 방법 및 장치 Download PDFInfo
- Publication number
- KR20070057983A KR20070057983A KR1020077009423A KR20077009423A KR20070057983A KR 20070057983 A KR20070057983 A KR 20070057983A KR 1020077009423 A KR1020077009423 A KR 1020077009423A KR 20077009423 A KR20077009423 A KR 20077009423A KR 20070057983 A KR20070057983 A KR 20070057983A
- Authority
- KR
- South Korea
- Prior art keywords
- plasma processing
- impedance
- substrate
- value
- processing system
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/951,548 | 2004-09-27 | ||
US10/951,548 US20060065631A1 (en) | 2004-09-27 | 2004-09-27 | Methods and apparatus for monitoring a process in a plasma processing system by measuring impedance |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20070057983A true KR20070057983A (ko) | 2007-06-07 |
Family
ID=36097837
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020077009423A KR20070057983A (ko) | 2004-09-27 | 2005-09-23 | 임피던스를 측정하여 플라즈마 처리 시스템에서의프로세스를 모니터링하는 방법 및 장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20060065631A1 (zh) |
JP (1) | JP2008515197A (zh) |
KR (1) | KR20070057983A (zh) |
CN (1) | CN101088148A (zh) |
TW (1) | TW200624599A (zh) |
WO (1) | WO2006036820A2 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018190486A1 (ko) * | 2017-04-14 | 2018-10-18 | 광운대학교 산학협력단 | 플라즈마 진단 시스템 및 방법 |
Families Citing this family (35)
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---|---|---|---|---|
JP4416569B2 (ja) * | 2004-05-24 | 2010-02-17 | キヤノン株式会社 | 堆積膜形成方法および堆積膜形成装置 |
US7323116B2 (en) * | 2004-09-27 | 2008-01-29 | Lam Research Corporation | Methods and apparatus for monitoring a process in a plasma processing system by measuring self-bias voltage |
JP2007081302A (ja) * | 2005-09-16 | 2007-03-29 | Toshiba Corp | 管理システム、管理方法及び電子装置の製造方法 |
US20080084650A1 (en) | 2006-10-04 | 2008-04-10 | Applied Materials, Inc. | Apparatus and method for substrate clamping in a plasma chamber |
JP4623111B2 (ja) | 2008-03-13 | 2011-02-02 | ソニー株式会社 | 画像処理装置、画像処理方法及びプログラム |
US8501631B2 (en) | 2009-11-19 | 2013-08-06 | Lam Research Corporation | Plasma processing system control based on RF voltage |
US20110297088A1 (en) * | 2010-06-04 | 2011-12-08 | Texas Instruments Incorporated | Thin edge carrier ring |
US10157729B2 (en) | 2012-02-22 | 2018-12-18 | Lam Research Corporation | Soft pulsing |
US9842725B2 (en) | 2013-01-31 | 2017-12-12 | Lam Research Corporation | Using modeling to determine ion energy associated with a plasma system |
US9368329B2 (en) | 2012-02-22 | 2016-06-14 | Lam Research Corporation | Methods and apparatus for synchronizing RF pulses in a plasma processing system |
US9390893B2 (en) | 2012-02-22 | 2016-07-12 | Lam Research Corporation | Sub-pulsing during a state |
US9462672B2 (en) | 2012-02-22 | 2016-10-04 | Lam Research Corporation | Adjustment of power and frequency based on three or more states |
US9197196B2 (en) | 2012-02-22 | 2015-11-24 | Lam Research Corporation | State-based adjustment of power and frequency |
US9530620B2 (en) * | 2013-03-15 | 2016-12-27 | Lam Research Corporation | Dual control modes |
US9320126B2 (en) | 2012-12-17 | 2016-04-19 | Lam Research Corporation | Determining a value of a variable on an RF transmission model |
US10128090B2 (en) | 2012-02-22 | 2018-11-13 | Lam Research Corporation | RF impedance model based fault detection |
US9171699B2 (en) | 2012-02-22 | 2015-10-27 | Lam Research Corporation | Impedance-based adjustment of power and frequency |
US9502216B2 (en) | 2013-01-31 | 2016-11-22 | Lam Research Corporation | Using modeling to determine wafer bias associated with a plasma system |
US9295148B2 (en) | 2012-12-14 | 2016-03-22 | Lam Research Corporation | Computation of statistics for statistical data decimation |
US10325759B2 (en) | 2012-02-22 | 2019-06-18 | Lam Research Corporation | Multiple control modes |
US9114666B2 (en) | 2012-02-22 | 2015-08-25 | Lam Research Corporation | Methods and apparatus for controlling plasma in a plasma processing system |
US9408288B2 (en) | 2012-09-14 | 2016-08-02 | Lam Research Corporation | Edge ramping |
US9043525B2 (en) | 2012-12-14 | 2015-05-26 | Lam Research Corporation | Optimizing a rate of transfer of data between an RF generator and a host system within a plasma tool |
US9155182B2 (en) | 2013-01-11 | 2015-10-06 | Lam Research Corporation | Tuning a parameter associated with plasma impedance |
US9620337B2 (en) | 2013-01-31 | 2017-04-11 | Lam Research Corporation | Determining a malfunctioning device in a plasma system |
US9779196B2 (en) | 2013-01-31 | 2017-10-03 | Lam Research Corporation | Segmenting a model within a plasma system |
US9107284B2 (en) | 2013-03-13 | 2015-08-11 | Lam Research Corporation | Chamber matching using voltage control mode |
US9119283B2 (en) | 2013-03-14 | 2015-08-25 | Lam Research Corporation | Chamber matching for power control mode |
US9502221B2 (en) | 2013-07-26 | 2016-11-22 | Lam Research Corporation | Etch rate modeling and use thereof with multiple parameters for in-chamber and chamber-to-chamber matching |
US9594105B2 (en) | 2014-01-10 | 2017-03-14 | Lam Research Corporation | Cable power loss determination for virtual metrology |
US10950421B2 (en) * | 2014-04-21 | 2021-03-16 | Lam Research Corporation | Using modeling for identifying a location of a fault in an RF transmission system for a plasma system |
US9536749B2 (en) | 2014-12-15 | 2017-01-03 | Lam Research Corporation | Ion energy control by RF pulse shape |
US10920320B2 (en) * | 2017-06-16 | 2021-02-16 | Applied Materials, Inc. | Plasma health determination in semiconductor substrate processing reactors |
US20190242838A1 (en) * | 2018-02-07 | 2019-08-08 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Non-Invasive Method for Probing Plasma Impedance |
CN115696709B (zh) * | 2022-12-28 | 2023-03-21 | 江苏奥文仪器科技有限公司 | 监测射频辉光放电光谱仪放电室内等离子体稳定性的装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5414324A (en) * | 1993-05-28 | 1995-05-09 | The University Of Tennessee Research Corporation | One atmosphere, uniform glow discharge plasma |
US5863376A (en) * | 1996-06-05 | 1999-01-26 | Lam Research Corporation | Temperature controlling method and apparatus for a plasma processing chamber |
US6197116B1 (en) * | 1996-08-29 | 2001-03-06 | Fujitsu Limited | Plasma processing system |
US6063234A (en) * | 1997-09-10 | 2000-05-16 | Lam Research Corporation | Temperature sensing system for use in a radio frequency environment |
US6123775A (en) * | 1999-06-30 | 2000-09-26 | Lam Research Corporation | Reaction chamber component having improved temperature uniformity |
US6302966B1 (en) * | 1999-11-15 | 2001-10-16 | Lam Research Corporation | Temperature control system for plasma processing apparatus |
TW483037B (en) * | 2000-03-24 | 2002-04-11 | Hitachi Ltd | Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe |
JP3977114B2 (ja) * | 2002-03-25 | 2007-09-19 | 株式会社ルネサステクノロジ | プラズマ処理装置 |
US20040027209A1 (en) * | 2002-08-09 | 2004-02-12 | Applied Materials, Inc. | Fixed matching network with increased match range capabilities |
-
2004
- 2004-09-27 US US10/951,548 patent/US20060065631A1/en not_active Abandoned
-
2005
- 2005-09-23 TW TW094133153A patent/TW200624599A/zh unknown
- 2005-09-23 JP JP2007533668A patent/JP2008515197A/ja not_active Withdrawn
- 2005-09-23 KR KR1020077009423A patent/KR20070057983A/ko not_active Application Discontinuation
- 2005-09-23 WO PCT/US2005/034226 patent/WO2006036820A2/en active Application Filing
- 2005-09-23 CN CNA2005800397617A patent/CN101088148A/zh active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018190486A1 (ko) * | 2017-04-14 | 2018-10-18 | 광운대학교 산학협력단 | 플라즈마 진단 시스템 및 방법 |
US10964515B2 (en) | 2017-04-14 | 2021-03-30 | Kwangwoon University Industry-Academic Collaboration Foundation | Plasma diagnostic system and method |
Also Published As
Publication number | Publication date |
---|---|
US20060065631A1 (en) | 2006-03-30 |
JP2008515197A (ja) | 2008-05-08 |
TW200624599A (en) | 2006-07-16 |
WO2006036820A2 (en) | 2006-04-06 |
CN101088148A (zh) | 2007-12-12 |
WO2006036820A3 (en) | 2007-07-05 |
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WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |