KR20060108219A - 광학 장치, 광조사 장치 및 광조사 방법 - Google Patents
광학 장치, 광조사 장치 및 광조사 방법 Download PDFInfo
- Publication number
- KR20060108219A KR20060108219A KR1020060031922A KR20060031922A KR20060108219A KR 20060108219 A KR20060108219 A KR 20060108219A KR 1020060031922 A KR1020060031922 A KR 1020060031922A KR 20060031922 A KR20060031922 A KR 20060031922A KR 20060108219 A KR20060108219 A KR 20060108219A
- Authority
- KR
- South Korea
- Prior art keywords
- optical
- light
- light source
- light irradiation
- optical member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 229
- 238000000034 method Methods 0.000 title claims abstract description 49
- 239000000463 material Substances 0.000 claims abstract description 19
- 238000012545 processing Methods 0.000 claims description 23
- 230000010355 oscillation Effects 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 13
- 238000005286 illumination Methods 0.000 abstract description 5
- 230000008859 change Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 238000012935 Averaging Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 230000033001 locomotion Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000001965 increasing effect Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000013024 troubleshooting Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0933—Systems for active beam shaping by rapid movement of an element
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Laser Beam Processing (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005114858A JP4475159B2 (ja) | 2005-04-12 | 2005-04-12 | 光照射装置 |
| JPJP-P-2005-00114858 | 2005-04-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20060108219A true KR20060108219A (ko) | 2006-10-17 |
Family
ID=37077540
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020060031922A Withdrawn KR20060108219A (ko) | 2005-04-12 | 2006-04-07 | 광학 장치, 광조사 장치 및 광조사 방법 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7952819B2 (enExample) |
| JP (1) | JP4475159B2 (enExample) |
| KR (1) | KR20060108219A (enExample) |
| CN (1) | CN100443951C (enExample) |
| TW (1) | TW200643468A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110094778A1 (en) * | 2009-10-27 | 2011-04-28 | Cheng-Po Yu | Circuit board and fabrication method thereof |
| JP5853331B2 (ja) * | 2011-03-11 | 2016-02-09 | 株式会社ブイ・テクノロジー | レーザ照射装置及びそれを使用した液晶表示パネルの輝点修正方法 |
| JP2013193110A (ja) * | 2012-03-21 | 2013-09-30 | Sumitomo Heavy Ind Ltd | レーザ加工装置及びレーザ加工方法 |
| CN120786811A (zh) * | 2024-04-09 | 2025-10-14 | 泓瀚科技股份有限公司 | 电路板上调整助焊剂分布位置的方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4767293A (en) | 1986-08-22 | 1988-08-30 | Copeland Corporation | Scroll-type machine with axially compliant mounting |
| CN1030865C (zh) * | 1992-05-15 | 1996-01-31 | 中国科学院上海光学精密机械研究所 | 全方位光束检验仪 |
| JPH0669928A (ja) | 1992-08-17 | 1994-03-11 | Fuji Xerox Co Ltd | ルーティング方式 |
| JP3091075B2 (ja) * | 1994-03-30 | 2000-09-25 | ローム株式会社 | 重力感応型映像装置 |
| US5525810A (en) * | 1994-05-09 | 1996-06-11 | Vixel Corporation | Self calibrating solid state scanner |
| JPH08338962A (ja) | 1995-06-13 | 1996-12-24 | Toshiba Corp | ビームホモジナイザ及びレーザ加工装置 |
| JP3894509B2 (ja) * | 1995-08-07 | 2007-03-22 | キヤノン株式会社 | 光学装置、露光装置およびデバイス製造方法 |
| JPH11156579A (ja) | 1996-11-15 | 1999-06-15 | Amada Co Ltd | レーザー切断方法、レーザーピアス方法、レーザー溶接方法、およびレーザー加飾方法並びに前記各方法に使用するレーザー加工ヘッド |
| AU752405B2 (en) * | 1998-03-27 | 2002-09-19 | Hideyoshi Horimai | Three-dimensional image display |
| JP3437088B2 (ja) | 1998-06-04 | 2003-08-18 | 住友重機械工業株式会社 | ビーム回転機能付ホモジナイザ装置及びこれを用いたレーザ加工装置 |
| JP2000167682A (ja) | 1998-12-03 | 2000-06-20 | Amada Eng Center Co Ltd | レーザ加工ヘッド |
| JP2001350117A (ja) | 2000-06-09 | 2001-12-21 | Hamamatsu Kagaku Gijutsu Kenkyu Shinkokai | レーザ光強度分布平坦化マスクおよびそれを用いたレーザメッキ装置ならびにレーザメッキ方法 |
| DE10049557B4 (de) * | 2000-10-06 | 2004-09-02 | Microlas Lasersystem Gmbh | Vorrichtung zum Umwandeln der Intensitätsverteilung eines Laserstrahls |
| CN2454077Y (zh) * | 2000-12-12 | 2001-10-17 | 魏学惠 | 激光加工机光学装置 |
| CN1205490C (zh) * | 2001-12-31 | 2005-06-08 | 深圳朗光科技有限公司 | 可调谐光纤衰减器 |
-
2005
- 2005-04-12 JP JP2005114858A patent/JP4475159B2/ja not_active Expired - Fee Related
-
2006
- 2006-04-07 KR KR1020060031922A patent/KR20060108219A/ko not_active Withdrawn
- 2006-04-11 US US11/279,362 patent/US7952819B2/en not_active Expired - Fee Related
- 2006-04-12 CN CNB2006100820720A patent/CN100443951C/zh not_active Expired - Fee Related
- 2006-04-12 TW TW095113019A patent/TW200643468A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006293092A (ja) | 2006-10-26 |
| JP4475159B2 (ja) | 2010-06-09 |
| TW200643468A (en) | 2006-12-16 |
| US20060226381A1 (en) | 2006-10-12 |
| TWI325066B (enExample) | 2010-05-21 |
| CN1847921A (zh) | 2006-10-18 |
| US7952819B2 (en) | 2011-05-31 |
| CN100443951C (zh) | 2008-12-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20060407 |
|
| PG1501 | Laying open of application | ||
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |