JP5133158B2 - 多重ビームレーザー装置 - Google Patents
多重ビームレーザー装置 Download PDFInfo
- Publication number
- JP5133158B2 JP5133158B2 JP2008180345A JP2008180345A JP5133158B2 JP 5133158 B2 JP5133158 B2 JP 5133158B2 JP 2008180345 A JP2008180345 A JP 2008180345A JP 2008180345 A JP2008180345 A JP 2008180345A JP 5133158 B2 JP5133158 B2 JP 5133158B2
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- JP
- Japan
- Prior art keywords
- beams
- incident
- laser
- relay lens
- laser device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0905—Dividing and/or superposing multiple light beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0972—Prisms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0977—Reflective elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Laser Beam Processing (AREA)
- Recrystallisation Techniques (AREA)
Description
22 ビーム分割部
23 プリズム
31a 第1反射ミラー
31b 第2反射ミラー
32 ビームスプリッター
41 反射ミラー
42 ビームスプリッター
51 入射側レンズ
52 ビーム分割部
54 第1リレーレンズ
55 第2リレーレンズ
56 基板
Claims (8)
- ビームを出射するレーザー光源と、
前記ビームの経路上に配置された入射側レンズと、
前記入射側レンズを経たビームを複数のビームに分割するビーム分割部と、
前記複数の分割されたビームの経路上に配置され前記複数の分割されたビーム夫々の経路を変更するビーム経路調整部と、
を含み、
前記ビーム分割部は、夫々の反射面が相互対向するように平行に配置された第1反射ミラー及び第2反射ミラー、及び、前記第1反射ミラー及び前記第2反射ミラーの間に配置され入射されたビームを透過ビームと反射ビームに分割する一つのビームスプリッターをさらに含み、
前記レーザー光源から出射されたビームは、前記第1反射ミラー及び前記第2反射ミラーにより、前記一つのビームスプリッターを少なくとも2回経由するように入射され、複数の分割されたビームで出力されることを特徴とする多重ビームレーザー装置。 - 前記ビーム経路調整部は、プリズムであることを特徴とする請求項1に記載の多重ビームレーザー装置。
- 前記複数の分割されたビームの強度は、均一であることを特徴とする請求項1に記載の多重ビームレーザー装置。
- 前記ビーム経路調整部を経た前記複数のビームの夫々の前記レーザー光源からの進行距離は、相互同一であることを特徴とする請求項1に記載の多重ビームレーザー装置。
- 前記ビーム経路調整部を経た複数のビームの大きさとビームの間隔を調節するリレーレンズをさらに含むことを特徴とする請求項1に記載の多重ビームレーザー装置。
- 前記リレーレンズは相互隣接して配置された第1リレーレンズと第2リレーレンズを含むことを特徴とする請求項5に記載の多重ビームレーザー装置。
- 前記入射側レンズから前記第1リレーレンズまで前記ビームが進行した距離は、前記第1リレーレンズの焦点距離と前記入射側レンズの焦点距離の和と同一であることを特徴とする請求項6に記載の多重ビームレーザー装置。
- 前記レーザー光源から出射するビームは、フェムト秒レーザービームであることを特徴とする請求項1に記載の多重ビームレーザー装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2007-0068964 | 2007-07-10 | ||
KR1020070068964A KR100862481B1 (ko) | 2007-07-10 | 2007-07-10 | 다중 빔 레이저 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009021597A JP2009021597A (ja) | 2009-01-29 |
JP5133158B2 true JP5133158B2 (ja) | 2013-01-30 |
Family
ID=40149292
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008180345A Expired - Fee Related JP5133158B2 (ja) | 2007-07-10 | 2008-07-10 | 多重ビームレーザー装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7991037B2 (ja) |
JP (1) | JP5133158B2 (ja) |
KR (1) | KR100862481B1 (ja) |
DE (1) | DE102008031937A1 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5446631B2 (ja) * | 2009-09-10 | 2014-03-19 | アイシン精機株式会社 | レーザ加工方法及びレーザ加工装置 |
JP2011203430A (ja) * | 2010-03-25 | 2011-10-13 | Casio Computer Co Ltd | レーザ光源装置、光源ユニット及びプロジェクタ |
CN101829846A (zh) * | 2010-05-11 | 2010-09-15 | 苏州市博海激光科技有限公司 | 高功率激光辊类表面集成聚焦毛化加工方法及装置 |
KR102208818B1 (ko) * | 2012-11-20 | 2021-01-28 | 삼성디스플레이 주식회사 | 레이저 가공 장치 |
US10725287B2 (en) * | 2013-06-11 | 2020-07-28 | Nlight, Inc. | Image rotation compensation for multiple beam material processing |
CN103558667B (zh) * | 2013-11-19 | 2016-04-13 | 武汉光迅科技股份有限公司 | 一种基于自由空间传输的多播交换光开关 |
DE102014003773B4 (de) | 2014-03-15 | 2024-05-08 | Carl Zeiss Microscopy Gmbh | Mikroskop und Baugruppe zur Mehrstrahlabtastung |
US10406630B1 (en) | 2014-11-20 | 2019-09-10 | Nlight, Inc. | Multi-beam laser processing with dispersion compensation |
US9958686B2 (en) * | 2015-10-16 | 2018-05-01 | Everready Precision Ind. Corp. | Optical apparatus |
KR101787718B1 (ko) * | 2016-06-21 | 2017-11-16 | 한국기계연구원 | 3차원 레이저 프린팅 장치 및 방법 |
KR101912450B1 (ko) * | 2016-12-16 | 2018-10-26 | 주식회사 이오테크닉스 | 멀티빔을 이용한 레이저 가공 장치 및 이에 사용되는 광학계 |
KR102551147B1 (ko) * | 2018-04-18 | 2023-07-05 | 삼성디스플레이 주식회사 | 레이저 장치 |
KR20210026975A (ko) | 2019-08-28 | 2021-03-10 | 부산대학교 산학협력단 | 프리즘 |
Family Cites Families (24)
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FR2585480B1 (fr) * | 1985-07-24 | 1994-01-07 | Ateq Corp | Generateur de modeles a laser |
JPS6327814A (ja) | 1986-07-22 | 1988-02-05 | Asahi Glass Co Ltd | マルチビ−ム光変調素子 |
JP2528371B2 (ja) * | 1989-12-29 | 1996-08-28 | ホーヤ株式会社 | 多波長ビ―ムスプリッタ装置 |
US5534950A (en) * | 1993-10-04 | 1996-07-09 | Laser Power Corporation | High resolution image projection system and method employing lasers |
JP2597464B2 (ja) * | 1994-03-29 | 1997-04-09 | 株式会社ジーティシー | レーザアニール装置 |
US5786560A (en) * | 1995-03-31 | 1998-07-28 | Panasonic Technologies, Inc. | 3-dimensional micromachining with femtosecond laser pulses |
US6028706A (en) * | 1995-07-26 | 2000-02-22 | Fujitsu Limited | Virtually imaged phased array (VIPA) having a varying reflectivity surface to improve beam profile |
DE19535525A1 (de) | 1995-09-25 | 1997-03-27 | Lo Laseroptik Gmbh | Strahlvervielfacher |
KR100300959B1 (ko) | 1997-07-05 | 2001-10-26 | 윤종용 | 플랫플레이트를이용한광분리장치와광분리방법및광분리장치의제조방법 |
DE10215162B4 (de) * | 2002-04-05 | 2006-01-05 | Lavision Biotec Gmbh | Strahlteilervorrichtung und Laserrastermikroskop |
JP2004045684A (ja) * | 2002-07-11 | 2004-02-12 | Sony Corp | 画像表示装置における照明光学装置及び画像表示装置 |
JP2004158568A (ja) * | 2002-11-05 | 2004-06-03 | Sony Corp | 光照射装置 |
JP2003207732A (ja) | 2002-11-25 | 2003-07-25 | Fujitsu Ltd | レーザモジュールおよびこれを備えた光走査装置 |
JP2004200497A (ja) * | 2002-12-19 | 2004-07-15 | Sony Corp | 光照射装置及びレーザアニール装置 |
JP2004311818A (ja) * | 2003-04-09 | 2004-11-04 | Koshin Kogaku Kogyo Kk | 光路長可変装置およびレーザー装置 |
US6909735B2 (en) * | 2003-04-10 | 2005-06-21 | Hitachi Via Mechanics, Ltd. | System and method for generating and controlling multiple independently steerable laser beam for material processing |
JP2005250173A (ja) * | 2004-03-04 | 2005-09-15 | Cluster Technology Co Ltd | レーザー照射方法及びレーザー照射装置 |
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KR20070035514A (ko) | 2004-06-29 | 2007-03-30 | 애버리 데니슨 코포레이션 | 탄성 중합체와 부직포 웹 사이의 결합이 개선된부직포-탄성 중합체 라미네이트 |
CN101346800B (zh) * | 2005-12-20 | 2011-09-14 | 株式会社半导体能源研究所 | 用于制造半导体装置的激光辐射设备和方法 |
KR20070068964A (ko) | 2005-12-27 | 2007-07-02 | 엘지전자 주식회사 | 액정 표시 장치 |
KR100849820B1 (ko) | 2007-04-11 | 2008-07-31 | 삼성전기주식회사 | 다중 빔 레이저 장치 및 빔 스플리터 |
KR100862448B1 (ko) | 2007-04-11 | 2008-10-08 | 삼성전기주식회사 | 다중 빔 레이저 장치 |
-
2007
- 2007-07-10 KR KR1020070068964A patent/KR100862481B1/ko not_active IP Right Cessation
-
2008
- 2008-07-07 DE DE102008031937A patent/DE102008031937A1/de not_active Withdrawn
- 2008-07-09 US US12/169,924 patent/US7991037B2/en not_active Expired - Fee Related
- 2008-07-10 JP JP2008180345A patent/JP5133158B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2009021597A (ja) | 2009-01-29 |
US20090016400A1 (en) | 2009-01-15 |
KR100862481B1 (ko) | 2008-10-08 |
DE102008031937A1 (de) | 2009-01-22 |
US7991037B2 (en) | 2011-08-02 |
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