KR20060098432A - 반도체 장치, 식별 라벨, 정보 전달 매체 및 반도체 장치제조 방법 - Google Patents
반도체 장치, 식별 라벨, 정보 전달 매체 및 반도체 장치제조 방법 Download PDFInfo
- Publication number
- KR20060098432A KR20060098432A KR1020067005866A KR20067005866A KR20060098432A KR 20060098432 A KR20060098432 A KR 20060098432A KR 1020067005866 A KR1020067005866 A KR 1020067005866A KR 20067005866 A KR20067005866 A KR 20067005866A KR 20060098432 A KR20060098432 A KR 20060098432A
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- KR
- South Korea
- Prior art keywords
- layer
- semiconductor device
- substrate
- semiconductor
- contact surface
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68359—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used as a support during manufacture of interconnect decals or build up layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68368—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30105—Capacitance
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03103525 | 2003-09-24 | ||
EP03103525.6 | 2003-09-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20060098432A true KR20060098432A (ko) | 2006-09-18 |
Family
ID=34354579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020067005866A KR20060098432A (ko) | 2003-09-24 | 2004-09-02 | 반도체 장치, 식별 라벨, 정보 전달 매체 및 반도체 장치제조 방법 |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1668694A1 (fr) |
JP (1) | JP2007507101A (fr) |
KR (1) | KR20060098432A (fr) |
CN (1) | CN1856875A (fr) |
WO (1) | WO2005029578A1 (fr) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8217381B2 (en) | 2004-06-04 | 2012-07-10 | The Board Of Trustees Of The University Of Illinois | Controlled buckling structures in semiconductor interconnects and nanomembranes for stretchable electronics |
JP2008502151A (ja) | 2004-06-04 | 2008-01-24 | ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ | 印刷可能半導体素子を製造して組み立てるための方法及びデバイス |
US7521292B2 (en) | 2004-06-04 | 2009-04-21 | The Board Of Trustees Of The University Of Illinois | Stretchable form of single crystal silicon for high performance electronics on rubber substrates |
JP4956128B2 (ja) | 2006-10-02 | 2012-06-20 | ルネサスエレクトロニクス株式会社 | 電子装置の製造方法 |
JP2008091638A (ja) | 2006-10-02 | 2008-04-17 | Nec Electronics Corp | 電子装置およびその製造方法 |
JP2008091639A (ja) | 2006-10-02 | 2008-04-17 | Nec Electronics Corp | 電子装置およびその製造方法 |
CN105826345B (zh) | 2007-01-17 | 2018-07-31 | 伊利诺伊大学评议会 | 通过基于印刷的组装制造的光学系统 |
US8886334B2 (en) | 2008-10-07 | 2014-11-11 | Mc10, Inc. | Systems, methods, and devices using stretchable or flexible electronics for medical applications |
US8097926B2 (en) | 2008-10-07 | 2012-01-17 | Mc10, Inc. | Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy |
US8372726B2 (en) | 2008-10-07 | 2013-02-12 | Mc10, Inc. | Methods and applications of non-planar imaging arrays |
US8389862B2 (en) | 2008-10-07 | 2013-03-05 | Mc10, Inc. | Extremely stretchable electronics |
JP5646492B2 (ja) | 2008-10-07 | 2014-12-24 | エムシー10 インコーポレイテッドMc10,Inc. | 伸縮可能な集積回路およびセンサアレイを有する装置 |
WO2010132552A1 (fr) | 2009-05-12 | 2010-11-18 | The Board Of Trustees Of The University Of Illinois | Ensembles imprimés de diodes électroluminescentes inorganiques microscopiques ultraminces pour dispositifs d'affichage déformables et semi-transparents |
US9723122B2 (en) | 2009-10-01 | 2017-08-01 | Mc10, Inc. | Protective cases with integrated electronics |
WO2011084450A1 (fr) | 2009-12-16 | 2011-07-14 | The Board Of Trustees Of The University Of Illinois | Électrophysiologie in vivo faisant intervenir des équipements électroniques conformes |
US9936574B2 (en) | 2009-12-16 | 2018-04-03 | The Board Of Trustees Of The University Of Illinois | Waterproof stretchable optoelectronics |
US10441185B2 (en) | 2009-12-16 | 2019-10-15 | The Board Of Trustees Of The University Of Illinois | Flexible and stretchable electronic systems for epidermal electronics |
CN102892356B (zh) | 2010-03-17 | 2016-01-13 | 伊利诺伊大学评议会 | 基于生物可吸收基质的可植入生物医学装置 |
WO2012097163A1 (fr) | 2011-01-14 | 2012-07-19 | The Board Of Trustees Of The University Of Illinois | Réseau de composants optiques ayant une courbure réglable |
WO2012158709A1 (fr) | 2011-05-16 | 2012-11-22 | The Board Of Trustees Of The University Of Illinois | Barrettes de del à gestion thermique assemblées par impression |
US9159635B2 (en) | 2011-05-27 | 2015-10-13 | Mc10, Inc. | Flexible electronic structure |
WO2012167096A2 (fr) | 2011-06-03 | 2012-12-06 | The Board Of Trustees Of The University Of Illinois | Réseau d'électrodes de surface conformables, multiplexées de manière active et à haute densité, pour un interfaçage avec le cerveau |
JP6231489B2 (ja) | 2011-12-01 | 2017-11-15 | ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ | プログラム可能な変化を被るように設計された遷移デバイス |
EP2830492B1 (fr) | 2012-03-30 | 2021-05-19 | The Board of Trustees of the University of Illinois | Dispositifs électroniques montables sur des appendices et conformables à des surfaces et procédé de fabrication correspondant |
US9171794B2 (en) | 2012-10-09 | 2015-10-27 | Mc10, Inc. | Embedding thin chips in polymer |
MX2017015587A (es) | 2015-06-01 | 2018-08-23 | Univ Illinois | Metodo alternativo para sensor uv. |
WO2016196675A1 (fr) | 2015-06-01 | 2016-12-08 | The Board Of Trustees Of The University Of Illinois | Systèmes électroniques miniaturisés ayant des capacités de puissance sans fil et de communication en champ proche |
US10925543B2 (en) | 2015-11-11 | 2021-02-23 | The Board Of Trustees Of The University Of Illinois | Bioresorbable silicon electronics for transient implants |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5256562A (en) * | 1990-12-31 | 1993-10-26 | Kopin Corporation | Method for manufacturing a semiconductor device using a circuit transfer film |
US5689136A (en) * | 1993-08-04 | 1997-11-18 | Hitachi, Ltd. | Semiconductor device and fabrication method |
JP3462166B2 (ja) * | 2000-09-08 | 2003-11-05 | 富士通カンタムデバイス株式会社 | 化合物半導体装置 |
-
2004
- 2004-09-02 EP EP04769931A patent/EP1668694A1/fr not_active Withdrawn
- 2004-09-02 JP JP2006527520A patent/JP2007507101A/ja not_active Withdrawn
- 2004-09-02 CN CNA2004800275808A patent/CN1856875A/zh active Pending
- 2004-09-02 KR KR1020067005866A patent/KR20060098432A/ko not_active Application Discontinuation
- 2004-09-02 WO PCT/IB2004/051676 patent/WO2005029578A1/fr not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP1668694A1 (fr) | 2006-06-14 |
JP2007507101A (ja) | 2007-03-22 |
CN1856875A (zh) | 2006-11-01 |
WO2005029578A1 (fr) | 2005-03-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |