KR20060098432A - 반도체 장치, 식별 라벨, 정보 전달 매체 및 반도체 장치제조 방법 - Google Patents

반도체 장치, 식별 라벨, 정보 전달 매체 및 반도체 장치제조 방법 Download PDF

Info

Publication number
KR20060098432A
KR20060098432A KR1020067005866A KR20067005866A KR20060098432A KR 20060098432 A KR20060098432 A KR 20060098432A KR 1020067005866 A KR1020067005866 A KR 1020067005866A KR 20067005866 A KR20067005866 A KR 20067005866A KR 20060098432 A KR20060098432 A KR 20060098432A
Authority
KR
South Korea
Prior art keywords
layer
semiconductor device
substrate
semiconductor
contact surface
Prior art date
Application number
KR1020067005866A
Other languages
English (en)
Korean (ko)
Inventor
로날드 데커
데오도루스 엠 미치엘센
안툰 엠 에이치 톰바이어
요한-헤인리츠 포크
Original Assignee
코닌클리즈케 필립스 일렉트로닉스 엔.브이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 코닌클리즈케 필립스 일렉트로닉스 엔.브이. filed Critical 코닌클리즈케 필립스 일렉트로닉스 엔.브이.
Publication of KR20060098432A publication Critical patent/KR20060098432A/ko

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68359Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used as a support during manufacture of interconnect decals or build up layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68368Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19041Component type being a capacitor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30105Capacitance
KR1020067005866A 2003-09-24 2004-09-02 반도체 장치, 식별 라벨, 정보 전달 매체 및 반도체 장치제조 방법 KR20060098432A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03103525 2003-09-24
EP03103525.6 2003-09-24

Publications (1)

Publication Number Publication Date
KR20060098432A true KR20060098432A (ko) 2006-09-18

Family

ID=34354579

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067005866A KR20060098432A (ko) 2003-09-24 2004-09-02 반도체 장치, 식별 라벨, 정보 전달 매체 및 반도체 장치제조 방법

Country Status (5)

Country Link
EP (1) EP1668694A1 (fr)
JP (1) JP2007507101A (fr)
KR (1) KR20060098432A (fr)
CN (1) CN1856875A (fr)
WO (1) WO2005029578A1 (fr)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8217381B2 (en) 2004-06-04 2012-07-10 The Board Of Trustees Of The University Of Illinois Controlled buckling structures in semiconductor interconnects and nanomembranes for stretchable electronics
JP2008502151A (ja) 2004-06-04 2008-01-24 ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ 印刷可能半導体素子を製造して組み立てるための方法及びデバイス
US7521292B2 (en) 2004-06-04 2009-04-21 The Board Of Trustees Of The University Of Illinois Stretchable form of single crystal silicon for high performance electronics on rubber substrates
JP4956128B2 (ja) 2006-10-02 2012-06-20 ルネサスエレクトロニクス株式会社 電子装置の製造方法
JP2008091638A (ja) 2006-10-02 2008-04-17 Nec Electronics Corp 電子装置およびその製造方法
JP2008091639A (ja) 2006-10-02 2008-04-17 Nec Electronics Corp 電子装置およびその製造方法
CN105826345B (zh) 2007-01-17 2018-07-31 伊利诺伊大学评议会 通过基于印刷的组装制造的光学系统
US8886334B2 (en) 2008-10-07 2014-11-11 Mc10, Inc. Systems, methods, and devices using stretchable or flexible electronics for medical applications
US8097926B2 (en) 2008-10-07 2012-01-17 Mc10, Inc. Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy
US8372726B2 (en) 2008-10-07 2013-02-12 Mc10, Inc. Methods and applications of non-planar imaging arrays
US8389862B2 (en) 2008-10-07 2013-03-05 Mc10, Inc. Extremely stretchable electronics
JP5646492B2 (ja) 2008-10-07 2014-12-24 エムシー10 インコーポレイテッドMc10,Inc. 伸縮可能な集積回路およびセンサアレイを有する装置
WO2010132552A1 (fr) 2009-05-12 2010-11-18 The Board Of Trustees Of The University Of Illinois Ensembles imprimés de diodes électroluminescentes inorganiques microscopiques ultraminces pour dispositifs d'affichage déformables et semi-transparents
US9723122B2 (en) 2009-10-01 2017-08-01 Mc10, Inc. Protective cases with integrated electronics
WO2011084450A1 (fr) 2009-12-16 2011-07-14 The Board Of Trustees Of The University Of Illinois Électrophysiologie in vivo faisant intervenir des équipements électroniques conformes
US9936574B2 (en) 2009-12-16 2018-04-03 The Board Of Trustees Of The University Of Illinois Waterproof stretchable optoelectronics
US10441185B2 (en) 2009-12-16 2019-10-15 The Board Of Trustees Of The University Of Illinois Flexible and stretchable electronic systems for epidermal electronics
CN102892356B (zh) 2010-03-17 2016-01-13 伊利诺伊大学评议会 基于生物可吸收基质的可植入生物医学装置
WO2012097163A1 (fr) 2011-01-14 2012-07-19 The Board Of Trustees Of The University Of Illinois Réseau de composants optiques ayant une courbure réglable
WO2012158709A1 (fr) 2011-05-16 2012-11-22 The Board Of Trustees Of The University Of Illinois Barrettes de del à gestion thermique assemblées par impression
US9159635B2 (en) 2011-05-27 2015-10-13 Mc10, Inc. Flexible electronic structure
WO2012167096A2 (fr) 2011-06-03 2012-12-06 The Board Of Trustees Of The University Of Illinois Réseau d'électrodes de surface conformables, multiplexées de manière active et à haute densité, pour un interfaçage avec le cerveau
JP6231489B2 (ja) 2011-12-01 2017-11-15 ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ プログラム可能な変化を被るように設計された遷移デバイス
EP2830492B1 (fr) 2012-03-30 2021-05-19 The Board of Trustees of the University of Illinois Dispositifs électroniques montables sur des appendices et conformables à des surfaces et procédé de fabrication correspondant
US9171794B2 (en) 2012-10-09 2015-10-27 Mc10, Inc. Embedding thin chips in polymer
MX2017015587A (es) 2015-06-01 2018-08-23 Univ Illinois Metodo alternativo para sensor uv.
WO2016196675A1 (fr) 2015-06-01 2016-12-08 The Board Of Trustees Of The University Of Illinois Systèmes électroniques miniaturisés ayant des capacités de puissance sans fil et de communication en champ proche
US10925543B2 (en) 2015-11-11 2021-02-23 The Board Of Trustees Of The University Of Illinois Bioresorbable silicon electronics for transient implants

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5256562A (en) * 1990-12-31 1993-10-26 Kopin Corporation Method for manufacturing a semiconductor device using a circuit transfer film
US5689136A (en) * 1993-08-04 1997-11-18 Hitachi, Ltd. Semiconductor device and fabrication method
JP3462166B2 (ja) * 2000-09-08 2003-11-05 富士通カンタムデバイス株式会社 化合物半導体装置

Also Published As

Publication number Publication date
EP1668694A1 (fr) 2006-06-14
JP2007507101A (ja) 2007-03-22
CN1856875A (zh) 2006-11-01
WO2005029578A1 (fr) 2005-03-31

Similar Documents

Publication Publication Date Title
KR20060098432A (ko) 반도체 장치, 식별 라벨, 정보 전달 매체 및 반도체 장치제조 방법
KR100938970B1 (ko) 반도체 장치 및 그 제조 방법
KR100423780B1 (ko) 반도체 기판 및 그의 제조 방법
US8902123B2 (en) Semiconductor device with wireless communication
EP2454752B1 (fr) Semi-conducteur sur isolant à dissipation thermique côté arrière
US7736948B2 (en) Method of manufacturing a plurality of semiconductor devices and carrier substrate
US9034732B2 (en) Semiconductor-on-insulator with back side support layer
US10217822B2 (en) Semiconductor-on-insulator with back side heat dissipation
JPS614269A (ja) 半導体構造体の製造方法
US9496227B2 (en) Semiconductor-on-insulator with back side support layer
JPH1095189A (ja) 半導体装置の製造方法
TW511198B (en) Semiconductor device and method of manufacturing the same
JP2970411B2 (ja) 半導体装置
US7393774B2 (en) Method of fabricating microconnectors
US6365440B1 (en) Method for contacting a circuit chip
US20060278976A1 (en) Semiconductor device, method and manufacturing same, identification label and information carrier
US8927387B2 (en) Robust isolation for thin-box ETSOI MOSFETS
JPH11340419A (ja) 半導体装置の製造方法
US6180495B1 (en) Silicon carbide transistor and method therefor
JP3350405B2 (ja) 半導体装置
US5982025A (en) Wire fixation structure
KR20030006092A (ko) 스마트 ic카드의 패키징 구조 및 그의 패키징 방법
JP2006293873A (ja) 半導体装置
JPH0917857A (ja) 半導体集積回路装置の製造方法
TW364182B (en) Method for fabricating IC polysilicon having reduced contact resistance

Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid