KR20060076237A - 전자 장치 및 전자 장치의 형성 방법 - Google Patents

전자 장치 및 전자 장치의 형성 방법 Download PDF

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Publication number
KR20060076237A
KR20060076237A KR1020050131908A KR20050131908A KR20060076237A KR 20060076237 A KR20060076237 A KR 20060076237A KR 1020050131908 A KR1020050131908 A KR 1020050131908A KR 20050131908 A KR20050131908 A KR 20050131908A KR 20060076237 A KR20060076237 A KR 20060076237A
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KR
South Korea
Prior art keywords
organic layer
pixel
electrode
layer
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020050131908A
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English (en)
Korean (ko)
Inventor
강 유
Original Assignee
듀폰 디스플레이즈, 인크.
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Filing date
Publication date
Application filed by 듀폰 디스플레이즈, 인크. filed Critical 듀폰 디스플레이즈, 인크.
Publication of KR20060076237A publication Critical patent/KR20060076237A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
KR1020050131908A 2004-12-29 2005-12-28 전자 장치 및 전자 장치의 형성 방법 Ceased KR20060076237A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/025,522 2004-12-29
US11/025,522 US20060139342A1 (en) 2004-12-29 2004-12-29 Electronic devices and processes for forming electronic devices

Publications (1)

Publication Number Publication Date
KR20060076237A true KR20060076237A (ko) 2006-07-04

Family

ID=36610886

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050131908A Ceased KR20060076237A (ko) 2004-12-29 2005-12-28 전자 장치 및 전자 장치의 형성 방법

Country Status (5)

Country Link
US (2) US20060139342A1 (enExample)
JP (1) JP2006189853A (enExample)
KR (1) KR20060076237A (enExample)
CN (1) CN100587964C (enExample)
TW (1) TW200629618A (enExample)

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TWI267196B (en) * 2005-07-07 2006-11-21 Au Optronics Corp Switching device for a pixel electrode and methods for fabricating the same
US8138075B1 (en) 2006-02-06 2012-03-20 Eberlein Dietmar C Systems and methods for the manufacture of flat panel devices
JP2008294401A (ja) * 2007-04-25 2008-12-04 Mitsubishi Chemicals Corp 有機電界発光素子用組成物、有機電界発光素子および有機電界発光素子の製造方法
KR20100094475A (ko) * 2007-10-26 2010-08-26 이 아이 듀폰 디 네모아 앤드 캄파니 격납된 층을 제조하기 위한 방법 및 재료, 및 이를 사용하여 제조된 소자
JP5441916B2 (ja) * 2007-11-27 2014-03-12 ３ジーソーラー フォトヴォルタイックス リミテッド 大面積色素電池、及びその生産方法
US20090142556A1 (en) * 2007-11-29 2009-06-04 E. I. Du Pont De Nemours And Company Process for forming an organic electronic device including an organic device layer
JP2009135053A (ja) * 2007-11-30 2009-06-18 Sumitomo Chemical Co Ltd 電子デバイス、表示装置および電子デバイスの製造方法
US8040048B2 (en) * 2007-12-12 2011-10-18 Lang Charles D Process for forming an organic electronic device including an organic device layer
US20110092076A1 (en) * 2008-05-19 2011-04-21 E.I. Du Pont De Nemours And Company Apparatus and method of vapor coating in an electronic device
GB2463493B (en) * 2008-09-15 2012-11-14 Cambridge Display Tech Ltd An improved method for ink jet printing organic electronic devices
JP2010093068A (ja) * 2008-10-08 2010-04-22 Hitachi Displays Ltd 有機ｅｌ表示装置およびその製造方法
CN102272970B (zh) * 2009-02-10 2014-12-10 松下电器产业株式会社 发光元件、具备发光元件的发光装置以及发光元件的制造方法
CN103053040B (zh) 2010-08-06 2015-09-02 株式会社日本有机雷特显示器 有机el元件
WO2012017486A1 (ja) 2010-08-06 2012-02-09 パナソニック株式会社 発光素子の製造方法
JP5620495B2 (ja) 2010-08-06 2014-11-05 パナソニック株式会社 発光素子、発光素子を備えた発光装置および発光素子の製造方法
WO2012017491A1 (ja) 2010-08-06 2012-02-09 パナソニック株式会社 発光素子、発光素子を備えた発光装置および発光素子の製造方法
JP5612691B2 (ja) 2010-08-06 2014-10-22 パナソニック株式会社 有機ｅｌ素子およびその製造方法
JP5677432B2 (ja) 2010-08-06 2015-02-25 パナソニック株式会社 有機ｅｌ素子、表示装置および発光装置
GB2483269A (en) * 2010-09-02 2012-03-07 Cambridge Display Tech Ltd Organic Electroluminescent Device containing Fluorinated Compounds
CN111712981B (zh) 2017-12-22 2021-11-26 米沃奇电动工具公司 用于绝缘操作杆的刀附件
KR102605376B1 (ko) 2018-12-31 2023-11-23 삼성디스플레이 주식회사 표시 장치
US12510821B2 (en) * 2020-05-21 2025-12-30 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist composition and method of forming photoresist pattern

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JP3036436B2 (ja) * 1996-06-19 2000-04-24 セイコーエプソン株式会社 アクティブマトリックス型有機ｅｌ表示体の製造方法
JP3520396B2 (ja) * 1997-07-02 2004-04-19 セイコーエプソン株式会社 アクティブマトリクス基板と表示装置
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JP4434411B2 (ja) * 2000-02-16 2010-03-17 出光興産株式会社 アクティブ駆動型有機ｅｌ発光装置およびその製造方法
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KR100461467B1 (ko) * 2002-03-13 2004-12-13 엘지.필립스 엘시디 주식회사 능동행렬 유기전기발광소자
JP2003332041A (ja) * 2002-05-15 2003-11-21 Seiko Epson Corp 電気光学装置及び電子機器
KR100437533B1 (ko) * 2002-05-29 2004-06-30 엘지.필립스 엘시디 주식회사 액티브 매트릭스형 유기전계발광 소자 및 그의 제조방법
JP2004047215A (ja) * 2002-07-10 2004-02-12 Toshiba Corp 有機ｅｌ素子および有機ｅｌ表示装置
CN1681869B (zh) * 2002-09-24 2010-05-26 E.I.内穆尔杜邦公司 用于电子器件用聚合物酸胶体制成的可水分散的聚苯胺
US7431866B2 (en) * 2002-09-24 2008-10-07 E. I. Du Pont De Nemours And Company Water dispersible polythiophenes made with polymeric acid colloids
JP4000515B2 (ja) * 2002-10-07 2007-10-31 セイコーエプソン株式会社 電気光学装置、マトリクス基板、及び電子機器
US6940651B2 (en) * 2002-12-30 2005-09-06 Eitan Zeira Durable nano-structured optical surface
JP4455517B2 (ja) * 2005-03-04 2010-04-21 三星モバイルディスプレイ株式會社 薄膜トランジスタの製造方法

Also Published As

Publication number Publication date
CN1825615A (zh) 2006-08-30
CN100587964C (zh) 2010-02-03
US20060139342A1 (en) 2006-06-29
JP2006189853A (ja) 2006-07-20
US20070075626A1 (en) 2007-04-05
TW200629618A (en) 2006-08-16

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