KR20050062540A - 포토레지스트로서 유용한 플루오르화 중합체 및 마이크로리소그래피법 - Google Patents
포토레지스트로서 유용한 플루오르화 중합체 및 마이크로리소그래피법 Download PDFInfo
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- KR20050062540A KR20050062540A KR1020057002754A KR20057002754A KR20050062540A KR 20050062540 A KR20050062540 A KR 20050062540A KR 1020057002754 A KR1020057002754 A KR 1020057002754A KR 20057002754 A KR20057002754 A KR 20057002754A KR 20050062540 A KR20050062540 A KR 20050062540A
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- South Korea
- Prior art keywords
- fluorine
- containing copolymer
- group
- ethylenically unsaturated
- photoresist composition
- Prior art date
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- 238000000034 method Methods 0.000 title claims description 17
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- 229920001577 copolymer Polymers 0.000 claims abstract description 33
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- 239000011737 fluorine Substances 0.000 claims abstract description 30
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- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 4
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
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- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 8
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 7
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- 239000012953 triphenylsulfonium Substances 0.000 description 5
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- HSINOMROUCMIEA-FGVHQWLLSA-N (2s,4r)-4-[(3r,5s,6r,7r,8s,9s,10s,13r,14s,17r)-6-ethyl-3,7-dihydroxy-10,13-dimethyl-2,3,4,5,6,7,8,9,11,12,14,15,16,17-tetradecahydro-1h-cyclopenta[a]phenanthren-17-yl]-2-methylpentanoic acid Chemical class C([C@@]12C)C[C@@H](O)C[C@H]1[C@@H](CC)[C@@H](O)[C@@H]1[C@@H]2CC[C@]2(C)[C@@H]([C@H](C)C[C@H](C)C(O)=O)CC[C@H]21 HSINOMROUCMIEA-FGVHQWLLSA-N 0.000 description 2
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- SMEROWZSTRWXGI-HVATVPOCSA-N lithocholic acid Chemical compound C([C@H]1CC2)[C@H](O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H]([C@@H](CCC(O)=O)C)[C@@]2(C)CC1 SMEROWZSTRWXGI-HVATVPOCSA-N 0.000 description 1
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- 230000003287 optical effect Effects 0.000 description 1
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- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- JGTNAGYHADQMCM-UHFFFAOYSA-N perfluorobutanesulfonic acid Chemical class OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F14/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F14/18—Monomers containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F214/18—Monomers containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F214/18—Monomers containing fluorine
- C08F214/26—Tetrafluoroethene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
- C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/12—Hydrolysis
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
- C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US40437402P | 2002-08-19 | 2002-08-19 | |
| US60/404,374 | 2002-08-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20050062540A true KR20050062540A (ko) | 2005-06-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| KR1020057002754A Withdrawn KR20050062540A (ko) | 2002-08-19 | 2003-08-19 | 포토레지스트로서 유용한 플루오르화 중합체 및 마이크로리소그래피법 |
Country Status (10)
| Country | Link |
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| US (1) | US7312287B2 (https=) |
| EP (1) | EP1551886B1 (https=) |
| JP (1) | JP4578971B2 (https=) |
| KR (1) | KR20050062540A (https=) |
| CN (1) | CN1675262A (https=) |
| AT (1) | ATE408173T1 (https=) |
| AU (1) | AU2003259951A1 (https=) |
| DE (1) | DE60323521D1 (https=) |
| TW (1) | TW200403257A (https=) |
| WO (1) | WO2004016664A1 (https=) |
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| AU2003259951A1 (en) * | 2002-08-19 | 2004-03-03 | E.I. Du Pont De Nemours And Company | Fluorinated polymers useful as photoresists, and processes for microlithography |
| JP5560854B2 (ja) * | 2010-03-31 | 2014-07-30 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物およびそれに用いる重合体 |
| CN104945795B (zh) * | 2010-11-24 | 2019-05-21 | Ａｇｃ株式会社 | 机动车用密封圈或者工业气体压缩机用密封圈或滑动构件 |
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| US5229473A (en) * | 1989-07-07 | 1993-07-20 | Daikin Industries Ltd. | Fluorine-containing copolymer and method of preparing the same |
| JP4034896B2 (ja) * | 1997-11-19 | 2008-01-16 | 松下電器産業株式会社 | レジスト組成物及びこれを用いたパターン形成方法 |
| JPH11265067A (ja) * | 1998-01-16 | 1999-09-28 | Jsr Corp | 感放射線性樹脂組成物 |
| IL141803A0 (en) * | 1998-09-23 | 2002-03-10 | Du Pont | Photoresists, polymers and processes for microlithography |
| HK1047797B (zh) * | 1999-05-04 | 2006-07-28 | 纳幕尔杜邦公司 | 氟化聚合物，光刻胶和用於显微光刻的方法 |
| KR100535149B1 (ko) * | 1999-08-17 | 2005-12-07 | 주식회사 하이닉스반도체 | 신규의 포토레지스트용 공중합체 및 이를 이용한 포토레지스트조성물 |
| JP4240786B2 (ja) * | 1999-09-17 | 2009-03-18 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| DE60116484T2 (de) * | 2000-05-05 | 2006-08-24 | E.I. Dupont De Nemours And Co., Wilmington | Copolymere für photoresistzusammensetzungen und verfahren zur herstellung |
| EP1246013A3 (en) * | 2001-03-30 | 2003-11-19 | E.I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| US6737215B2 (en) * | 2001-05-11 | 2004-05-18 | Clariant Finance (Bvi) Ltd | Photoresist composition for deep ultraviolet lithography |
| AU2003259951A1 (en) * | 2002-08-19 | 2004-03-03 | E.I. Du Pont De Nemours And Company | Fluorinated polymers useful as photoresists, and processes for microlithography |
-
2003
- 2003-08-19 AU AU2003259951A patent/AU2003259951A1/en not_active Abandoned
- 2003-08-19 US US10/523,490 patent/US7312287B2/en not_active Expired - Fee Related
- 2003-08-19 EP EP03788676A patent/EP1551886B1/en not_active Expired - Lifetime
- 2003-08-19 WO PCT/US2003/026088 patent/WO2004016664A1/en not_active Ceased
- 2003-08-19 DE DE60323521T patent/DE60323521D1/de not_active Expired - Lifetime
- 2003-08-19 AT AT03788676T patent/ATE408173T1/de not_active IP Right Cessation
- 2003-08-19 TW TW092122760A patent/TW200403257A/zh unknown
- 2003-08-19 JP JP2004529165A patent/JP4578971B2/ja not_active Expired - Fee Related
- 2003-08-19 KR KR1020057002754A patent/KR20050062540A/ko not_active Withdrawn
- 2003-08-19 CN CNA038189178A patent/CN1675262A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP4578971B2 (ja) | 2010-11-10 |
| DE60323521D1 (de) | 2008-10-23 |
| ATE408173T1 (de) | 2008-09-15 |
| US7312287B2 (en) | 2007-12-25 |
| EP1551886B1 (en) | 2008-09-10 |
| TW200403257A (en) | 2004-03-01 |
| CN1675262A (zh) | 2005-09-28 |
| JP2005536589A (ja) | 2005-12-02 |
| EP1551886A1 (en) | 2005-07-13 |
| WO2004016664A1 (en) | 2004-02-26 |
| AU2003259951A1 (en) | 2004-03-03 |
| EP1551886A4 (en) | 2007-11-14 |
| US20060166129A1 (en) | 2006-07-27 |
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Legal Events
| Date | Code | Title | Description |
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| PA0105 | International application |
Patent event date: 20050218 Patent event code: PA01051R01D Comment text: International Patent Application |
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| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |