KR20050056256A - 다중표면 측정용 2파장 공초점 간섭계 - Google Patents

다중표면 측정용 2파장 공초점 간섭계 Download PDF

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Publication number
KR20050056256A
KR20050056256A KR1020057006888A KR20057006888A KR20050056256A KR 20050056256 A KR20050056256 A KR 20050056256A KR 1020057006888 A KR1020057006888 A KR 1020057006888A KR 20057006888 A KR20057006888 A KR 20057006888A KR 20050056256 A KR20050056256 A KR 20050056256A
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KR
South Korea
Prior art keywords
test
subtest
beams
interferometer
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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KR1020057006888A
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English (en)
Korean (ko)
Inventor
토마스 제이. 던
앤드류 더블유. 쿨라위엑
마크 제이. 트로놀로니
Original Assignee
코닝 트로펠 코포레이션
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Publication of KR20050056256A publication Critical patent/KR20050056256A/ko
Withdrawn legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02015Interferometers characterised by the beam path configuration
    • G01B9/02017Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02019Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different points on same face of object
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02001Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007Two or more frequencies or sources used for interferometric measurement
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02015Interferometers characterised by the beam path configuration
    • G01B9/02027Two or more interferometric channels or interferometers
    • G01B9/02028Two or more reference or object arms in one interferometer
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02041Interferometers characterised by particular imaging or detection techniques
    • G01B9/02042Confocal imaging
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02078Caused by ambiguity
    • G01B9/02079Quadrature detection, i.e. detecting relatively phase-shifted signals
    • G01B9/02081Quadrature detection, i.e. detecting relatively phase-shifted signals simultaneous quadrature detection, e.g. by spatial phase shifting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020057006888A 2002-10-22 2003-10-21 다중표면 측정용 2파장 공초점 간섭계 Withdrawn KR20050056256A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/277,798 US6781699B2 (en) 2002-10-22 2002-10-22 Two-wavelength confocal interferometer for measuring multiple surfaces
US10/277,798 2002-10-22

Publications (1)

Publication Number Publication Date
KR20050056256A true KR20050056256A (ko) 2005-06-14

Family

ID=32093359

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020057006888A Withdrawn KR20050056256A (ko) 2002-10-22 2003-10-21 다중표면 측정용 2파장 공초점 간섭계

Country Status (6)

Country Link
US (1) US6781699B2 (enExample)
EP (1) EP1556666A2 (enExample)
JP (1) JP2006504095A (enExample)
KR (1) KR20050056256A (enExample)
AU (1) AU2003301582A1 (enExample)
WO (1) WO2004038322A2 (enExample)

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US7075660B2 (en) * 2003-11-18 2006-07-11 Corning Incorporated Multi-beam probe with adjustable beam angle
JP4522137B2 (ja) * 2004-05-07 2010-08-11 キヤノン株式会社 光学系の調整方法
DE102004045808A1 (de) * 2004-09-22 2006-04-06 Robert Bosch Gmbh Optische Messvorrichtung zur Vermessung von mehreren Flächen eines Messobjektes
WO2007060873A1 (ja) * 2005-11-24 2007-05-31 Kirin Techno-System Corporation 表面検査装置
DE102005059550A1 (de) * 2005-12-13 2007-06-14 Siemens Ag Optische Messvorrichtung zum Vermessen eines Hohlraums
EP1969306A2 (en) * 2006-01-06 2008-09-17 Phonak AG Method and system for reconstructing the three-dimensional shape of the surface of at least a portion of an ear canal and/or of a concha
CA2597891A1 (en) * 2007-08-20 2009-02-20 Marc Miousset Multi-beam optical probe and system for dimensional measurement
US7808617B2 (en) * 2007-09-17 2010-10-05 Quality Vision International, Inc. Dual resolution, dual range sensor system and method
US7791731B2 (en) * 2007-12-18 2010-09-07 Quality Vision International, Inc. Partial coherence interferometer with measurement ambiguity resolution
DE102008012461B4 (de) * 2008-03-04 2013-08-01 Minebea Co., Ltd. Vorrichtung zur optischen Abtastung der Innenfläche einer Bohrung
DE102008033942B3 (de) * 2008-07-18 2010-04-08 Luphos Gmbh Faseroptisches Mehrwellenlängeninterferometer (MWLI) zur absoluten Vermessung von Abständen und Topologien von Oberflächen in großem Arbeitsabstand
DE102008050259A1 (de) 2008-10-07 2010-04-08 Fionec Gmbh Optische Sonde (II)
DE102008050258A1 (de) 2008-10-07 2010-04-08 Fionec Gmbh Optische Sonde (I)
WO2011032572A1 (en) * 2009-09-18 2011-03-24 Carl Zeiss Smt Gmbh Method of measuring a shape of an optical surface and interferometric measuring device
JP2011117795A (ja) * 2009-12-02 2011-06-16 Arc Harima Kk 表面性状測定方法および表面性状測定装置
US8593644B2 (en) * 2010-12-13 2013-11-26 Southwest Research Institute White light optical profilometer for measuring complex surfaces
US10234400B2 (en) 2012-10-15 2019-03-19 Seagate Technology Llc Feature detection with light transmitting medium
KR102048793B1 (ko) * 2013-02-12 2019-11-26 지고 코포레이션 표면 컬러를 이용한 표면 토포그래피 간섭측정계
CN105509639B (zh) * 2014-09-24 2019-01-01 通用电气公司 用来测量几何特征的测量系统和测量方法
US9929103B2 (en) * 2015-01-29 2018-03-27 Toshiba Memory Corporation Misalignment checking device and manufacturing method of semiconductor device
CN104990499B (zh) * 2015-07-02 2017-07-04 哈尔滨工业大学 基于共轭焦点跟踪探测技术的探针传感装置
JP6570938B2 (ja) * 2015-09-17 2019-09-04 ゼネラル・エレクトリック・カンパニイ 物体の幾何学的特徴を測定するシステム及び方法
CN105806255A (zh) * 2016-04-19 2016-07-27 哈尔滨工业大学 一种用于共焦显微系统的α-β扫描方法
DE102017114023A1 (de) * 2017-06-23 2018-12-27 SmarAct Holding GmbH Verfahren und Detektor zur mit Interferometrie korrelierten Bildaufnahme
CN108132026B (zh) * 2018-01-24 2024-02-27 赵智亮 半导体中红外可见光双波长透射式干涉测试装置
DE102018211913B4 (de) * 2018-07-17 2022-10-13 Carl Zeiss Industrielle Messtechnik Gmbh Vorrichtung und Verfahren zum Erfassen einer Objektoberfläche mittels elektromagnetischer Strahlung
WO2020167301A1 (en) * 2019-02-13 2020-08-20 Halliburton Energy Services, Inc. Acoustic telemetry system
US11347039B2 (en) * 2019-05-22 2022-05-31 The Boeing Company Optical imaging and scanning of holes
EP4162254A4 (en) * 2020-06-03 2024-06-05 Kinetic River Corp. CONFIGURABLE PARTICLE ANALYZER DEVICES AND METHODS
JP7629176B2 (ja) * 2021-03-31 2025-02-13 Orbray株式会社 光学式内面測定装置

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* Cited by examiner, † Cited by third party
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DE4416493A1 (de) 1994-05-10 1995-11-16 Bosch Gmbh Robert Oberflächenprüfvorrichtung
DE19536143A1 (de) 1995-09-28 1997-04-03 Bosch Gmbh Robert Vorrichtung zum optischen Messen physikalischer Größen mittels eines Heterodyn-Interferometers
US5777736A (en) * 1996-07-19 1998-07-07 Science Applications International Corporation High etendue imaging fourier transform spectrometer
DE19650703A1 (de) * 1996-12-06 1998-06-10 Bosch Gmbh Robert Verfahren zum interferometrischen Messen von Positionen, Positionsänderungen und daraus abgeleiteter physikalischer Größen
US5777738A (en) 1997-03-17 1998-07-07 Tropel Corporation Interferometric measurement of absolute dimensions of cylindrical surfaces at grazing incidence
DE19714202A1 (de) * 1997-04-07 1998-10-15 Bosch Gmbh Robert Vorrichtung zum optischen Prüfen von Oberflächen
EP1224434B1 (de) 1999-10-09 2004-07-14 Robert Bosch Gmbh Interferometrische messvorrichtung zur formvermessung

Also Published As

Publication number Publication date
US6781699B2 (en) 2004-08-24
AU2003301582A8 (en) 2004-05-13
WO2004038322A3 (en) 2004-09-30
AU2003301582A1 (en) 2004-05-13
WO2004038322A2 (en) 2004-05-06
US20040075842A1 (en) 2004-04-22
JP2006504095A (ja) 2006-02-02
EP1556666A2 (en) 2005-07-27

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PA0105 International application

Patent event date: 20050421

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid