KR20040110975A - Processing system - Google Patents

Abstract

PURPOSE: A processing system is provided to enable a person to pass between two sides of the processing system in a short time. CONSTITUTION: A processing system includes a first transferring line(A), a second transferring line(B), a first multistage unit, a first transferring member(88A), a second multistage unit, a second transferring member(88B), a transceiver, and a path(168A). The first transferring line transfers a wafer to be processed in a substantially parallel direction in an order of a process flow. The second transferring line transfers the wafer in a substantially series direction. The first multistage unit includes at least one input unit and at least one process unit. The second multistage unit includes at least one output unit and at least one process unit laminated thereon. The second transferring member transfers the wafer between the units in the second multistage unit. The transceiver transceives the wafer between the first and second transferring members. The path is provided below the transceiver for a person to pass therethrough.

Description

Processing System {PROCESSING SYSTEM}

The present invention relates to a processing system having a conveying line for conveying a substrate to be processed in one or a series of processing steps in a substantially horizontal direction in serial in the order of a process flow.

Recently, in the resist coating and developing system for LCD (liquid crystal display display) manufacturing, in order to cope with the increase in size of the LCD substrate, the LCD substrate is horizontally conveyed on a conveying path formed by placing a carrier such as a conveying roller in the horizontal direction. In addition, a so-called flat flow type cleaning process or developing process part equipped with a cleaning process or developing process is provided, and the whole system is placed in a roughly horizontal line in the order of the process flow in accordance with such flat flow type processing part. As a result, system configurations or layouts arranged in serial have become popular (see Patent Document 1, for example).

As described in Patent Literature 1, this kind of layout arranges processing stations of horizontal length in the center of the system, and arranges cassette stations and interface stations in both longitudinal ends thereof. In the cassette station, the carry-in / out of the cassette which accommodates a plurality of unprocessed or processed substrates is performed between the stage in the station and the outside of the system, and the carry-in / out of the substrate is carried out between the cassette on the stage and the processing station. . In the interface station, a substrate is exchanged between an adjacent exposure apparatus and a processing station.

The processing station has two rows of conveying lines, with the cassette station as the starting point and the end point, and the progress road and the return path having the interface station as the return point. In general, the advancing path is mainly composed of the conveying line of the flat flow type cleaning treatment part and the conveying line of the coating treatment part, and the returning path is mainly composed of the conveying line of the flat flow type developing treatment part. At the start end and / or the end of each conveying line, a pair of oven towers formed by collectively arranging a single-sheet oven unit having a hot plate in multiple stages is provided. Between both oven towers, a lifting and swinging transport robot for transporting a substrate between the units in the tower is provided.

<Patent Document 1>

Japanese Patent Application Laid-Open No. 2002-334918

A processing system having a conveying line for conveying a substrate to be processed in a substantially horizontal direction in a serial sequence in the order of a process flow based on the layout of the above-mentioned flat flow type processing unit has a footprint, as the size of the LCD substrate increases. In particular, the size of the longitudinal direction also increases, and it is not uncommon to exceed 50m in total length.

In this type of processing system, in order to travel from one side of the system to the other side, one end of the system has to be bypassed either the cassette station side or the exposure apparatus side. For this reason, it required considerable walking effort and time for people to move from one side of the system to the other side in the event of maintenance or fire. This problem is aggravated as the overall length of the system increases as the distance increases by twice the rate.

In addition, in this type of processing system, it is difficult to smoothly and efficiently adjust the conveying tact between different conveying lines, for example, if the conveying tact changes when the product lot or the like changes, for example, or the process flow in some parts of the system. If congestion occurs, there is a problem that the processing contents in the front and rear (especially upstream) processing sections are affected.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems of the prior art, and in a system layout having a conveying line for conveying a substrate to be processed in a substantially horizontal direction in a serial sequence, a human bypass is provided between both sides of the system. Instead, it aims to provide a treatment system that can be used simply and in a short time.

Another object of the present invention is to provide a processing system for improving the reliability of the process flow or the conveying flow in the system layout as described above.

1 is a plan view showing the structure of a resist coating and developing processing system according to an embodiment of the present invention.

2 is a plan view showing the configuration of an application process unit in the treatment system.

3 is a side view illustrating the configuration of an oven tower and a transport mechanism in the processing system.

4 is a side view illustrating the configuration of an oven tower and a conveyance mechanism in the treatment system.

Fig. 5 is a side view showing the structure of an oven tower and a conveyance mechanism in the processing system.

6 is a front view showing the configuration of a passage around the processing system.

7 is a perspective view showing an example of the configuration of an extension unit EXT in the processing system.

8 is a cross-sectional view showing a configuration example of a cooling unit COL in the processing system.

9 is a perspective view showing a passage for exiting the processing system and its surroundings.

Fig. 10 is a perspective view showing the internal access passage in the processing system and the configuration thereof.

Fig. 11 is a flowchart showing the procedure of overall processing in the processing system.

It is a top view which shows an example of the layout at the time of providing two or more said processing systems in a clean room.

Fig. 13 is a plan view showing the structure of a resist coating and developing processing system according to a second embodiment of the present invention.

<Description of main parts of drawing>

10: resist coating development processing system

14 (C / S): cassette station

16 (P / S): process station

18 (I / F): interface station

24: cleaning process part

76, 78, 80, 82, 84, 86 (TB): Oven Tower

88, 90, 92 (S / A): Transfer mechanism

88A, 88B, 90A, 90B (S / A): Carrying Mechanism

168, 168A, 168B: passage

170, 170A, 170B (EXT): Extension Unit

174 support

176 (COL): Cooling Unit

178 (BUF): Buffer

206: passage marker

[A], [B], [C], [D]: Return Line

In order to achieve the above object, the first processing system of the present invention comprises a first conveying line for conveying a substrate to be processed in a serial or substantially horizontal direction in the order of a process flow in one or a series of processing steps; A second conveying line installed on an extension of the first conveying line, for conveying the substrate to be processed in one or a series of processing steps in a substantially horizontal direction in a serial order in a process flow; and an end of the first conveying line A first unit provided in the multi-stage at least one carrying unit for carrying out a substrate to be processed from the first conveying line and at least one treating unit for carrying out a predetermined treatment on the substrate to be processed. A first conveying means for conveying a substrate to be processed between the multi-stage unit portion, each unit in the first multi-stage unit portion, and the second conveying line. At least one carrying unit for carrying in the substrate to be processed into the second conveying line and at least one processing unit for carrying out a predetermined treatment on the substrate to be processed at a plurality of stages; A second conveying means for conveying the substrate to be processed between the two-stage unit portion, each unit in the second multi-stage unit portion, and between the first conveying means and the second conveying means; It has a sending and receiving portion disposed between both conveying means for sending and receiving, and a passage provided below the sending and receiving portion so that a person can cross the system.

In the first processing system, the transfer of the substrate is carried out between the first and the second conveying means on both sides through a sending and receiving unit disposed at the center of the region where the first conveying line and the second conveying line are connected. Is done. The first conveying means is also accessible to each unit in the first multi-stage unit part provided at the end of the first conveying line, and the second conveying means is each part in the second multi-stage unit part provided at the start end of the second conveying line. The unit can also be accessed. The person concerned can move from one side of the system to the other side for a short time or a short time through a passage for exiting the system provided under the receiving section in the region where the carrier system and the unit are three-dimensionally concentrated in this way.

The second processing system of the present invention comprises a first conveying line of a traveling path for conveying a substrate to be processed in one or a series of processing steps in a substantially horizontal direction in serial in the order of a process flow, and of the first conveying line. A multi-stage arrangement comprising at least one carrying unit for carrying out the substrate to be processed from the first conveying line and at least one processing unit for carrying out a predetermined treatment on the substrate 2nd conveyance of the process path which is provided on the 1st multistage unit part and the extension of the said 1st conveyance line, and conveys a to-be-processed board | substrate in a serially substantially horizontal direction in order of a process flow in one or a series of process processes. At least one carrying unit and a target to be carried in a line and at a start end of the second transfer line to carry the substrate to be processed into the second transfer line. A second multi-stage unit portion formed by stacking at least one processing unit for performing a predetermined treatment on a plate in multiple stages, and substantially parallel to the second conveying line, to be treated in one or a series of processing steps A third conveying line in a return path for conveying the substrate in a substantially horizontal direction in the serial order of the process flow, and an end portion of the third conveying line for carrying out the substrate to be processed from the third conveying line A third multi-stage unit unit formed by stacking at least one carrying unit for carrying out a predetermined process on a substrate to be processed and at least one carrying unit for carrying out a predetermined process; and the first carrying line on an extension of the third carrying line Almost parallel to the chamber, the substrate being processed in one or a series of processing steps almost horizontally in series in the order of the process flow A fourth conveying line to the return path to be conveyed at a return path and a start end portion of the fourth conveying line, the predetermined conveying unit being provided to at least one conveying unit and the unprocessed substrate for carrying in the unprocessed substrate to the fourth conveying line; A substrate to be processed between the fourth multi-stage unit portion formed by stacking at least one processing unit for multiple processing in multiple stages, and each unit in the first multi-stage unit portion and each unit in the fourth multi-stage unit portion. First conveying means for conveying the substrate, second conveying means for conveying the substrate to be processed between each unit in the second multistage unit portion and each unit in the third multistage unit portion, and the first conveying means A cross section between the transfer unit and the transfer unit disposed between the transfer unit to exchange the substrate to be processed between the transfer unit and the second transfer unit. Giving the reception to go out has a passage provided in the bottom portion.

In the said 2nd processing system, the area | region to which the 1st conveyance line and the 2nd conveyance line are connected, and the area | region to which the 3rd conveyance line and the 4th conveyance line are connected are arrange | positioned at one place, and it is located in the substantially center of a connection area | region. The substrate is exchanged between the first and second conveying means on both sides through the arranged exchange portion. The first conveying means can also access each unit in the first multistage unit portion provided in the end portion of the first conveying line and each unit in the fourth multistage unit portion provided in the start portion of the fourth conveying line. The second conveying means can also access each unit in the second multistage unit portion provided in the start end of the second conveying line and each unit in the third multistage unit part provided in the end portion of the third conveying line. The person in charge can simply move from one side of the system to the other side through a passage for exiting the system provided under the receiving part in the area where the carrier system or the unit is three-dimensionally concentrated.

In the second processing system, the first receiving unit for passing the substrate to be processed from the first conveying means to the second conveying means and the second conveying means for passing the substrate to be processed from the second conveying means to the first conveying means. It is preferable that the second stack unit is arranged in multiple stages. According to such a structure, bidirectional substrate feeding and receiving between 1st and 2nd conveying means can be made independently or in parallel, and conveyance efficiency can be raised. In addition, in order to arrange the first and second transfer units in multiple stages, the footprint is not increased.

The third processing system of the present invention comprises a first conveying line of a traveling path for conveying a substrate to be processed in one or a series of processing steps in a substantially horizontal direction in serial in the order of a process flow, and the first conveying line of the first conveying line. A multi-stage arrangement comprising at least one carrying unit for carrying out the substrate to be processed from the first conveying line and at least one processing unit for carrying out a predetermined treatment on the substrate 1st stage unit part, the 1st conveyance means for conveying a to-be-processed board | substrate between each unit in the said 1st multistage unit part, and the extension of the said 1st conveyance line, One or a series of process processes At the beginning of the second conveying line and the second conveying line of the traveling path for conveying the substrate to be processed in a substantially horizontal direction in the serial in the order of the process flow Er, a second multi-stage unit formed by stacking at least one carrying unit for carrying in a substrate to be processed into the second conveying line and at least one treating unit for carrying out a predetermined treatment on the substrate to be processed in multiple stages. A second conveying means for conveying the substrate to be processed between the unit and each unit in the second multi-stage unit portion, and the substrate to be processed is exchanged between the first conveying means and the second conveying means. In order to achieve this, the first sending and receiving portions disposed between the two conveying means and the second conveying line are disposed substantially parallel to each other, and the substrate to be processed is substantially horizontally arranged in the order of the process flow in one or a series of processing steps. It is provided in the 3rd conveyance line of the return path conveying to a phosphorus direction, and the terminal part of the said 3rd conveying line, and carrying out a to-be-processed substrate from the said 3rd conveying line A third multi-stage unit unit formed by stacking at least one carrying unit for carrying out a predetermined process on a substrate to be processed, and a third multi-stage unit unit arranged in multiple stages, and between each unit in the third multi-stage unit unit. A third conveying means for conveying the processing substrate, and substantially parallel to the first conveying line on an extension of the third conveying line, to serially process the substrate to be processed in one or a series of processing steps in the order of the process flow; A fourth conveying line of the return path conveying in a substantially horizontal direction of the furnace, and at least one carrying unit which is provided at the beginning end of the fourth conveying line to carry the substrate to be processed into the fourth conveying line; A fourth multi-stage unit portion formed by laminating at least one processing unit on a multi-stage to perform a predetermined process on the substrate to be processed; and the fourth multi-stage Between the fourth conveying means for conveying the substrate to be processed between each unit in the knit portion and between the conveying means for transferring the substrate to be processed between the third conveying means and the fourth conveying means; And a second pass / receive portion disposed at and a first passage and a second passage respectively set below the first and second pass / receive portions so that a person can cross the system.

In the third processing system, between the first and second conveying means on both sides through the first sending and receiving portion disposed at the center of the area where the first conveying line and the second conveying line are connected at the traveling path side. Between the third and fourth conveying means on both sides of the substrate through the second conveying portion which is arranged at the center of the area where the third conveying line and the fourth conveying line are connected, at the same time as the exchange of the substrate is performed. The exchange of substrates is performed at. The first conveying means can also access each unit in the first multi-stage unit provided at the end of the first conveying line. The second conveying means can also access each unit in the second multi-stage unit provided at the start end of the second conveying line. The third conveying means can also access each unit in the third multi-stage unit part provided at the end of the third conveying line. The fourth conveying means can also access each unit in the fourth multi-stage unit provided at the start end of the fourth conveying line. In this manner, the concerned party may move from one side to the other side of the system through the first and second passages for exiting the system, which are respectively installed under the first and the second receiver in the area where the carrier system or the unit is three-dimensionally concentrated. You can simply move around.

In the third processing system, it is preferable that the first passage and the second passage are arranged almost in a straight line in the direction crossing the system, from the ease of exit, the safety surface, and the like.

A preferred embodiment of the processing system of the present invention is provided at the end of the second conveying line, and is provided to at least one unloading unit and the substrate to be unloaded from the second conveying line. A fifth multi-stage unit unit formed by stacking at least one processing unit for carrying out the process in multiple stages and at a start end of the third conveying line, at least for carrying in the substrate to be processed into the third conveying line; In the sixth multi-stage unit portion formed by stacking one carrying out unit and at least one processing unit for performing a predetermined | prescribed process to a to-be-processed board | substrate in multistage, each unit in a 5th multistage unit part, and in a 6th multistage unit part. It is a structure which has 5th conveyance means for conveying a to-be-processed board | substrate between each unit. In such a configuration, the end of the second conveying line of the traveling path and the start end of the third conveying line of the returning path are connected via the fifth and sixth multi-stage unit parts and the fifth conveying means, and the traveling path is returned to the return path. Also in the return, a series of processes in the processing unit for the substrate are efficiently performed. In this case, preferably, a sixth for bringing the substrate to be processed into another processing system adjacent to the end of the second conveying line and the beginning of the third conveying line, or for carrying out the substrate to be processed from the other processing system. In order to exchange the substrate to be processed between the conveying means and the fifth conveying means and the sixth conveying means, it may have a third transmit and receive portion arranged between both conveying means. In this configuration, inline processing in cooperation with another processing system adjacent to each other can be performed via the sixth conveying means and the third receiving part.

Another preferred embodiment of the processing system includes a cassette stage on which one or a plurality of cassettes are placed for storing a substrate to be processed in multiple stages, a first end of a first conveying line, and an end of a fourth conveying line; The unprocessed substrate is picked up from any of the cassettes on the cassette stage and brought into the first conveying line, and the treated substrate is taken out from the fourth conveying line, and the cassette of any of the cassette stages It is a structure which has a 7th conveyance means for accommodating in. In such a configuration, the unprocessed substrate accommodated in the cassette on the cassette stage is loaded into the first conveying line of the traveling path by the seventh conveying means, and finally, via the first conveying line and the subsequent conveying line or the multi-stage unit part. The substrate is taken over by the seventh conveying means as a substrate processed from the fourth conveying line to the return path and returned to the cassette on the stage.

In the processing system of the present invention, one embodiment in which the conveying means is preferred includes a lifting carrier that can lift in a vertical direction, a swing carrier that can pivot around a vertical axis on the lifting carrier, and a substrate to be processed on the swing carrier. It includes a carrier arm that can be stretched in the front and rear direction in the horizontal plane while supporting the. In such a configuration, the conveying means can move in and out of the substrate by lifting and swinging to access any unit in two adjacent multi-stage unit portions.

In the processing system of the present invention, preferably, at least one conveying line is provided with a conveying path formed by placing a conveying body for carrying the substrate to be processed almost horizontally along the conveying line, and on the conveying path. In order to convey a process board | substrate, it has a conveyance drive means which drives a conveyance body. This type of conveying line is suitable for the so-called flat flow treatment, in particular for liquid treatment. In this case, liquid processing means for providing a desired liquid treatment to the substrate to be processed on the conveying path is provided.

Further, in the treatment system of the present invention, a typical example of the treatment unit included in the multi-stage unit part is a heat treatment unit for performing a desired thermal treatment on the substrate to be processed in relation to the treatment on the conveying line. The preferred form of the sending and receiving portion is a structure having a support plate for placing the substrate to be processed in units of one sheet, and a plurality of support pins which are discretely provided on the support plate to support the substrate almost horizontally at the front end of the pin.

In the processing system of the present invention, in order to efficiently use the space on the passage, preferably, at least one processing unit for performing a predetermined process is applied to the substrate to be processed and stacked on or below the receiving portion. The processing unit may be accessible by at least one conveying means accessible to the transmitting and receiving unit. Further, preferably, the processing unit placed on the receiving portion may be a unit having a substrate temperature adjusting means for constantly adjusting the temperature of the substrate to be processed.

In addition, in the processing system of the present invention, the buffer unit is provided by placing at least one buffer unit for temporarily storing the substrate to be stored and being stacked on or under the receiving unit, and accessible by at least one conveying unit accessible to the receiving unit. May be made accessible. In such a configuration, it is possible to temporarily store the substrate via the sending and receiving part in an adjacent buffer unit as necessary, and to compensate or adjust the conveying timing when the conveying contact differs between two conveying lines. In this case, when the substrate is withdrawn from the transfer line during an emergency such as a failure or failure in the system, the reliability of the process flow and the transfer flow can be improved.

In the processing system of the present invention, a configuration in which display means for notifying the presence of the passage and the situation in the system at the same time near the entrance of the passage is preferable, or the passage is always in an open state.

[Embodiment of the Invention]

EMBODIMENT OF THE INVENTION Hereinafter, preferred embodiment of this invention is described with reference to an accompanying drawing.

Fig. 1 shows a resist coating and developing process system applicable to the present invention. The resist coating and developing processing system 10 is installed in a clean room, for example, using an LCD substrate as a substrate to be treated, and in the LCD manufacturing process, such as cleaning, resist coating, prebaking, developing and post-baking in a photography process. Each process is done. The exposure treatment is performed by an external exposure apparatus 12 provided adjacent to the system.

In this resist coating and developing processing system 10, a horizontal process station (P / S) 16 is disposed at a central portion, and a cassette station (C / S) 14 is formed at both ends of the longitudinal direction (X direction). ) And an interface station (I / F) 18 are arranged.

The cassette station (C / S) 14 is a cassette import / export port of the system 10, and the substrate G is stacked in multiple stages so that a plurality of cassettes C can be accommodated in a horizontal direction, for example, in the Y direction. The cassette stage 20 which can mount all four, and the conveyance mechanism 22 which let the board | substrate G enter and exit with respect to the cassette C on this stage 20 are provided. The conveyance mechanism 22 has a means which can hold | maintain the board | substrate G, for example, the conveyance arm 22a, is operable in four axes of X, Y, Z, and (theta), and is adjacent to the process station P / S It is possible to exchange the (16) side with the substrate G.

The process station (P / S) 16 has conveying lines [A], [B] of the traveling paths extending in the system longitudinal direction (X direction) and conveying lines [C], [D] of the return paths. More specifically, in the path from the cassette station (C / S) 14 to the interface station (I / F) 18, the conveying line [A] is attached to the cleaning process section 24, and the conveying line [B] is attached to the application process section 26.

The cleaning process unit 24 includes a scrubber cleaning unit (SCR) 28 and a conveying line at a place adjacent to the cassette station (C / S) 14 of the scrubber cleaning unit (SCR) 28. An excimer UV irradiation unit (e-UV) 30 is disposed on [A]. In the scrubber cleaning unit (SCR) 28, the conveying line [A] is constituted by a conveying path of a flat flow method, for example, a roller conveying path, and the LCD substrate G is conveyed in a horizontal position on the conveying line [A]. Brushing cleaning and flow cleaning are performed to the board | substrate G, moving to conveyance.

The coating process section 26 includes an import unit (IN) 32, a resist coating unit (CT) 34, a vacuum drying unit (VD) 36, an edge remover unit (ER) 38, and an export unit ( OUT) 40 is arranged in a line along the conveyance line [B]. As shown in FIG. 2, these application unit groups (IN) 32, (CT) 34, (VD) 36, (ER) 38, and (OUT) 40 are supported by a support ( 42) are arranged in a horizontal line in the order of the processing steps. The substrate G is directly applied between the units by a pair or a plurality of carrier arms 46 and 46 moving along a pair of guide rails 44 and 44 laid parallel to both sides of the support 42. I can receive it.

The roller conveying path 50 of the flat flow type | mold which installs the conveyance roller or the roller rotor 48 which can put the board | substrate G on substantially horizontally in the loading unit (IN) 32 at regular intervals in the X direction. Is installed. In the roller transport 50 that may have been drawn from the carry path unit (PASS _in) (102) for being included in the oven tower (TB) (78) adjacent, which will be described later and, for example, having a drive motor and the transmission mechanism It is driven by the conveyance drive part 52. In the bottom of the roller transport 50, the pass unit (PASS _in) by lifting the whole substrate (G) is transferred from the 102 to the horizontal position the carrier arm (46, 46) of the plurality of lines of the lifting available for passing to the lift The pin 52 is provided.

The resist coating unit (CT) 34 includes a cup-shaped processing container 54 having an upper surface opened therein, and a liftable stage 56 for horizontally placing and holding the substrate G in the processing container 54. ), A lift driver (not shown) provided below the processing container 54 for raising and lowering the stage 56, and a resist liquid supply unit for supplying a resist liquid to the substrate G on the stage 56 ( Not shown). As the coating method, either a spin coat method or a spinless method may be used. In the case of the spin coating method, while rotating the stage 56 on which the substrate G is placed by a rotation driving unit (not shown), the resist liquid is added dropwise from the nozzle of the resist liquid supply unit to form a substrate on the substrate by the rotational force and the centrifugal force. It expands to one surface and forms the coating film of the resist liquid which has a fixed film thickness. In the case of the spinless method, by continuously discharging or scanning the nozzle of the resist liquid supply unit with respect to the substrate G on the stage 56 in the horizontal direction, the resist liquid is continuously discharged in a linear form having a thin diameter on the upper surface of the substrate, A coating film of a resist liquid having a constant film thickness is formed.

The pressure reduction drying unit (VD) 36 has a lower chamber 58 of a tray or a shallow bottom container type having an upper surface opened, and a lid shape configured to be in close airtight contact or fit to the upper surface of the lower chamber 58. Has an upper chamber (not shown). The lower chamber 58 has a substantially rectangular shape, and a stage 60 for arranging and supporting the substrate G horizontally is disposed at the center thereof, and an exhaust port 62 is provided at four corners of the bottom surface. Each exhaust port 62 is through a vacuum pump (not shown) through an exhaust pipe (not shown). In the state where the upper chamber is covered by the lower chamber 58, the processing spaces in both chambers can be decompressed to a predetermined degree of vacuum by the vacuum pump.

The edge remover unit ER 38 includes: a stage 64 on which the substrate G is placed horizontally and supported, and alignment means for positioning the substrate G in a pair of corner portions facing each other ( 66 and four remover heads 68 and the like for removing excess resist from four peripheral edges (edges) of the substrate G are provided. In the state where the alignment means 66 has positioned the board | substrate G on the stage 64, each remover head 68 moves to each edge of the board | substrate G, and is attached to the periphery of each board | substrate side. The excess resist is dissolved by thinner and removed.

The unloading unit (OUT) 40 has a roller conveying path and a lift pin (not shown) as in the unloading unit (IN) 32 described above. The transfer arms 46 and 46 carry the substrate G, which has been subjected to resist removal in the edge remover unit ER 38, to the transfer unit OUT 40, and the lift pins transfer arms 46 and 46. ), The board | substrate G is taken in, and it mounts on a roller conveyance path. After doing so, the board | substrate G is conveyed by roller conveyance to the pass unit PASS _out 144 (FIG. 5) for carrying _out the board | substrate contained in the adjacent oven tower (TB) 80 mentioned later.

Thus, in the coating process part 26, the roller conveyance in the conveyance arms 46 and 46 which are movable along the guide rails 44 and 44, the carry-in unit (IN) 32, and the carry-out unit (OUT) 40 is carried out. The furnace conveyance line [B] is comprised.

In the return path from the interface station (I / F) 18 to the cassette station (C / S) 14, the conveying line C is placed in the developing process unit 70, and the conveying line D is It is attached to the inspection part 72.

The developing process unit 70 includes a flat flow developing unit (DEV) 74 and an i-ray UV irradiation unit (i-UV) 75. The developing unit (DEV) 74 constitutes a conveying line [C] as a roller conveying path (not shown), for example, like a scrubber cleaning unit (SCR) 28, and the substrate along the conveying line [C]. The substrate G is subjected to a series of developing treatment steps (liquid window, developing reaction, rinsing, drying, etc.) while moving (G) by roller conveyance. The i-ray UV irradiation unit (i-UV) 75 is for decolorizing the development, and draws the roller conveyance path from the development unit (DEV) 74.

The inspection unit 72 also constitutes a conveying line D as a conveying path of a flat flow method, for example, a roller conveying path (not shown), and moves the substrate G by roller conveying along the conveying line D. Line width inspection, macroscopic pattern inspection and film quality / film thickness inspection of the resist pattern on G) are performed.

In this resist coating and developing processing system 10, the end of the conveying line [A], the start and end of the conveying line [B], the start and end of the conveying line [C], and the conveying line [D] Oven towers (TB) 76, 78, 80, 82, 84, 86 are respectively provided as a multi-stage unit part at the start end. And vertical conveyance between both oven towers (TB) 76 and 86, between both oven towers (TB) 78 and 84, and between both oven towers (TB) 80 and 82. Mechanisms (S / A) 88, 90, 92 are provided respectively.

As shown in FIG. 3, the oven tower (TB) 76 located in the terminal part of conveyance line [A], for example, passes the board | substrate (PASS _out ) 94 for board | substrate carrying out in order from the bottom, for example. A dehydration bake unit (DHP) 96, 98, which is a heating unit for dehydration bake, and a postbaking unit (POBAKE) 100, which is a heating unit for postbaking, are stacked in multiple stages. Here, the pass unit (PASS _out ) 94 is a transport mechanism (S / A) 88 is a substrate (G) that has been subjected to the pre-process (cleaning process) in the scrubber cleaning unit (SCR) 28 on the upstream side. By providing a space for carrying out from the conveying line [A], the roller conveying path (not shown) drawn from the scrubber cleaning unit (SCR) 28, and the board | substrate G are lifted up and conveyed upwards. A lift pin (not shown) that can be passed to the mechanism (S / A) 88 is provided.

In the oven tower (TB) 86 located at the start end of the conveying line [D], for example, a cooling unit for adjusting the substrate temperature _in the pass unit 102 for carrying the substrate in order from the bottom. (COL) 104 and postbaking units 106 and 108 are stacked in multiple stages. Here, the pass unit (PASS _in ) 102, the conveyance mechanism (S / A) 88 is a conveying line [D] to the substrate (G) for receiving the subsequent process (inspection process) in the downstream inspection unit 26 By providing a space for carrying into the container, the substrate G is received from the roller conveying path (not shown) and the conveying mechanism (S / A) 88 drawn in from the inspection unit 72 and placed on the conveying path. It has a lift pin (not shown) that can be mounted on it.

In FIG. 3, the conveyance mechanism (S / A) 88 is the lifting carrier 114 which can move up and down according to the guide rail 112 extended in a perpendicular direction, and on this lifting carrier 114 in (theta) direction. The pivoting carrier 116 which can be rotated or swiveled, and the carrier arm or tweezers 118 which can move forward and backward or stretch in the front-rear direction while supporting the board | substrate G on this pivoting carrier 116 is provided. A drive unit 120 for lifting and lowering the lifting carrier 114 is provided at the base end side of the vertical guide rail 112, so that the driving unit 122 for pivoting the turning carrier 116 is a lifting carrier ( 114, a drive unit 124 for advancing and driving the carrier arm 118 is attached to the swing carrier 116. As shown in FIG. Each drive part 120, 122, 124 may be comprised, for example with an electric motor.

The conveyance mechanism (S / A) 88 having such a structure is moved up and down at high speed under the control of a controller (not shown) to access arbitrary units in the two adjacent oven towers (TB) 76, 86 and the substrate ( Import and export of G) is possible.

As shown in FIG. 4, in the oven tower (TB) 78 located at the start end of the conveyance line [B], for example, the pass unit (PASS _in ) 126 for board | substrate loading in order from the following, The cooling units (COL) 128 and 130 for adjusting the substrate temperature and the advice unit (AD) 132 for the hydrophobization treatment are stacked in multiple stages. Here, the pass unit (PASS _in ) 126 is a conveyance mechanism (S / A) 90 is a conveying line to the substrate (G) for receiving a subsequent process (resist coating process) in the downstream coating process portion 26 By providing a space for carrying into [B], the roller conveyance path 50 (FIG. 2) and the conveyance mechanism (S / A) which are attracted to the carrying-in unit (IN) 32 of the coating process part 26. It has a lifting pin 134 (FIG. 2) which can take the board | substrate G from the 90), and mounts it on the said conveyance path 50. As shown in FIG.

In the oven tower (TB) 84 located at the end of the transfer line [C], for example, a pass unit (PASS _out ) 136 and a post-baking unit (POBAKE) for carrying _out the substrate in order from the bottom. (138, 140) and Advance Unit (AD) 142 are stacked in multiple stages. Here, the pass unit (PASS _out ) 136 is carried _out by the conveyance mechanism (S / A) 90, the conveyance mechanism (C) to the substrate (G) received the development process in the upstream development process unit 70 The roller conveying path (not shown) drawn from the i-ray UV irradiation unit (i-UV) 75 and the substrate G are lifted above the conveying path by providing a space for the conveying mechanism (S / A). It has a lift pin (not shown) which can be passed to the 90).

In FIG. 4, the conveyance mechanism (S / A) 90 has the same structure as the above-mentioned conveyance mechanism (S / A) 88 (FIG. 3), and it raises and lowers at high speed under the control of the controller which is not shown in figure. It is possible to carry out the carry-out of the board | substrate G by turning to the rotational movement, and to access arbitrary units in both adjacent oven towers (TB) 78 and 84.

As shown in FIG. 5, the oven tower (TB) 80 located in the terminal part of conveyance line [B], for example, passes the board | substrate (PASS _out ) 144 for carrying out a board | substrate in order from the following, A cooling unit (COL) 146 for adjusting the substrate temperature and prebaking units (148, 150), which are heating units for prebaking, are stacked in multiple stages. Here, the pass unit (PASS _out ) 144, the conveyance mechanism (S / A) 92 is a conveying line for the substrate (G) received the pre-process (resist coating process) in the upstream application process portion 26 By providing a space for carrying out from [B], the roller conveyance path (not shown) and the board | substrate G which are pulled in from the export part OUT 40 of the application | coating process part 26, and the board | substrate G are conveyed upwards. It has a lift pin (not shown) which can be lifted up and handed to the conveyance mechanism (S / A) 92.

In the oven tower (TB) 82 located at the start end of the conveying line [C], for example, a pass unit (PASS _in ) 152 for loading the substrate and a cooling unit for adjusting the temperature of the substrate ( COL) 154 and prebaking units 156 and 158 are stacked in multiple stages. Here, the pass unit (PASS _in ) 152, the conveyance mechanism (S / A) 92 to the conveying line (C) the substrate (G) for receiving the development process in the downstream developing process unit 70 By providing the space for carrying in, the board | substrate G is received from the roller conveyance path (not shown) and the conveyance mechanism (S / A) 92 which are attracted to the developing unit (DEV) 74, and responds. It has a liftable lift pin (not shown) for mounting on the conveying path.

In FIG. 5, the conveyance mechanism (S / A) 92 has the same structure as the above-mentioned conveyance mechanism (S / A) 88 (FIG. 3), and it raises and lowers at high speed under the control of the controller which is not shown in figure. It is designed to carry out the carrying out of the board | substrate G by turning to the rotational movement, and to access arbitrary units in both adjacent oven towers (TB) 80 and 82.

In FIG. 1, the interface station (I / F) 18 has a conveying apparatus 160 for exchanging the adjacent exposure apparatus 12 and the board | substrate G, and the buffer stage (BUF) around it. ) 162, an extension cooling stage (EXT COL) 164, and a peripheral device (TITLER / EE) 166 are disposed. In the buffer stage (BUF) 162, a stationary buffer cassette (not shown) is placed. The extension cooling stage (EXT COL) 164 is a stage for exchanging and receiving a substrate having a cooling function, and is used when exchanging a substrate G with a process station (P / S) 16 side. The peripheral device 166 may have a configuration in which, for example, a titler TITLER and a peripheral exposure device EE are stacked on top of each other. The conveying apparatus 160 has a means which can hold | maintain the board | substrate G, for example, the conveying arm 160a, and the adjacent exposure apparatus 12, each unit (BUF) 162, (EXT-COL) 164 ), (TITLER / EE) 166 and the substrate (G) can be exchanged.

In FIG. 1, between the conveyance mechanism 88 and the conveyance mechanism 90, the passage 168 which allows a person to escape through this resist application and development processing system in the clean room, and both conveyance mechanisms, Extension units (EXT) 170 for exchanging the substrate G between the 88 and 90 are provided above and below.

6 shows a structure or layout around the passage 168 as seen from the front side. A cross-section c-shaped support part 174 is provided on the floor surface 172 between both conveying mechanisms (S / A) 88 and 90 so that an ordinary adult M is not bent inside the support part 174. The passage 168 of the height (for example, about 190 cm from the floor surface) which can fully escape | extract is formed. Both side wall portions or the leg portions 174a of the support portion 174 may be configured to be stationary, or may be configured to be movable with a caster. The horizontal plate part 174b of the upper part of the support part 174 forms the ceiling of the passage 168, and comprises the support for mounting the extension unit 170 or other units in multiple stages.

In the example of illustration, the cooling unit (COL) 176, the extension unit (EXT) 170A, 170B, and the buffer unit (BUF) 178 for substrate temperature adjustment are carried out on the support base 174b in order from the bottom. Stacked in multiple stages. The cooling unit 176 is made accessible from one side by, for example, a conveyance mechanism (S / A) 88. Although the extension units (EXT) 170A and 170B are accessible from both sides of the conveyance mechanisms (S / A) 88 and 90 from both sides, preferably, the substrates of the one-way carry-out type are opposite to each other. It may be used as a send / receive unit. That is, one extension unit (EXT) 170A puts the board | substrate G in a unit only by the conveyance mechanism 88 side, and picks up the board | substrate G from a unit by the conveyance mechanism (S / A) 90 side. The inside is in a carry-in / out form, and the other extension unit (EXT) 170B only feeds the substrate G into the unit from the transport mechanism (S / A) 90 side, and transport mechanism (S / A) 88 The board | substrate G may be taken in and out from the unit at the side. The buffer unit (BUF) 178 may be configured to be accessible from both of the transport mechanisms (S / A) 88 and 90, or may be configured to be accessible from only one side.

7 shows an example of the configuration of the extension unit (EXT) 170. A horizontal support plate 182 having substantially the same shape as the substrate G is accommodated in the unit box 180 so that a plurality of support pins 184 are separated at regular intervals at the same height on the horizontal support plate 182. It is installed. The board | substrate G is supported by the pin front end of the support pin 184, and is mounted horizontally on the horizontal support plate 182, and is united by the conveyance arm 118 of conveyance mechanisms (S / A) 88,90. Brought in or out of the unit.

8, the structural example of the cooling unit (COL) 176 is shown. The cooling unit (COL) 176 of this structural example has fixedly arrange | positioned the cooling plate 186 in the unit box 184 substantially horizontally at a fixed height position. The cooling plate 186 is made of a metal having high thermal conductivity, for example, aluminum, and is provided with a passage through which the cooling water temperature-controlled at a set value (for example, 23 ° C.) flows inside. In the previous step, for example, the substrate G, which has been subjected to a heat treatment of 100 ° C. or more, and is disposed on the cooling plate 186, is cooled to a set temperature by heat dissipation due to heat conduction to the cooling plate 186. The cooling plate 186 has a plurality of through-holes 186a penetrating up and down in discrete arrangement patterns, and the substrate G is lifted up and down at each of the through-holes 186a when the substrate G is loaded in and out. As a supporting member for supporting the lifter, the lift pin 188 is provided to be movable in the vertical direction. These lift pins 188 are coupled to the lifting mechanism 192 through the horizontal base member 190. Lifting and lowering of the lifting mechanism 192 moves the lift pins 188 up and down between the lowest position for evacuation (position shown in FIG. 8) and the uppermost position for substrate feeding.

The buffer unit (BUF) 178 is a unit for temporarily storing the substrate G via the extension unit EXT 170 as needed, for example, the transfer line [A], [B]. ], [C], or [D] withdrawal of the substrate G from the conveying line when compensation or adjustment of the conveying timing is made when the conveying tactile is different or when an emergency such as an obstacle or failure in the system occurs. It is used to make it. The structure of the buffer unit (BUF) 178 may be a method of stacking a plurality of sheet-type units (buffs) for accommodating the substrate G in a single unit in a plurality of stages, or in one assembly unit. A plurality of buffs may be provided in multiple stages so that one board G may be stored on and off of each buff. It is also possible to provide an opening / closing door or shutter in front of the buffer unit (BUF) 178, and to form an atmosphere of inert gas, for example nitrogen gas, in the unit. In view of variability in substrate storage capacity (height size) and low access frequency, the buffer unit (BUF) 178 is preferably disposed at the top of the multi-stage unit structure on the passage 168.

9 shows a layout around the passage 168 as seen from the inclined top. The outside of the inlet or the outlet of the passage 168 is an open space S, and the space S is used to work on the units COL, EXT, and BUF on the passage 168. One can access and manage desired maintenance. In addition, each unit in adjacent oven towers (TB) 76, 78, 84, 86 can also be accessed in this space S for maintenance.

In this embodiment, maintenance of each conveyance mechanism (S / A) 88, 90, 92 is carried out between conveyance lines [A, B] of the progress road and conveyance lines [C, D] of the return path. This is done as the worker enters and exits the space K. In order for a worker to enter and exit the space K, it is preferable to provide a suitable passage under at least one of the conveying lines [A] or [D] or at least one of the conveying lines [B] or [C]. . For example, as shown in FIG. 10, the passage 198 for entering and exiting the space K can be provided at the lower portion of the substrate loading unit IN 32 in the coating process unit 26. However, since the passage 198 is usually installed at a height of 1 m or less from the floor surface under the conveyance line B, the worker is to exit the passage 198 in a bent or lying down position. An opening and closing door 200 may be provided at the entrance of the passage 198.

Moreover, it is also possible to use the said space K between the conveyance lines A and B of a progress path, and the conveyance lines C and D of a return path as an auxiliary conveyance space. That is, as shown in FIG. 1, the shuttle 202 which horizontally mounted the board | substrate G by one unit is arrange | positioned in the space K, and the shuttle 202 is line-oriented by the drive mechanism which is not shown in figure ( X direction) may be moved in both directions. Through this shuttle 202, the substrate G can be exchanged between the transfer mechanisms 88 and 22 or between the transfer mechanisms 90 and 92.

11 shows the procedure of processing in this resist coating and developing processing system. First, in the cassette station (C / S) 14, the conveyance mechanism 22 picks up one board | substrate G in the predetermined | prescribed cassette C on the stage 20, and a process station (P / S) ) it is brought to an excimer UV irradiation unit (UV-e) (30) of the cleaning process unit 24 of the 16 (step S _1).

In the excimer UV irradiation unit (e-UV) 30, the substrate G is subjected to dry cleaning by ultraviolet irradiation (step S ₂ ). Ultraviolet cleaning mainly removes organic matter from the substrate surface. After the completion of the ultraviolet cleaning, the substrate G is transferred to the scrubber cleaning unit (SCR) 28 of the cleaning process part 24 by the conveyance mechanism 22 of the cassette station (C / S) 14.

In the scrubber cleaning unit (SCR) 28, as described above, the substrate G is brushed and flow-cleaned on the surface of the substrate G while the substrate G is conveyed in a flat flow on the conveyance line [A] by roller conveyance. Particulate contamination is removed from the surface (step S ₂ ). After the cleaning, the substrate G is rinsed while flowing and conveyed, and finally, the substrate G is dried using an air knife or the like.

The substrate G, which has been cleaned in the scrubber cleaning unit (SCR) 28, is transferred from the pass unit 94 for carrying _{out in} the oven tower TB of the end of the conveying line [A]. It carries out from conveyance line [A] by (S / A) 88.

The board | substrate G carried out from the conveyance line [A] is conveyed by the conveyance mechanism (S / A) 88, and the unit in oven tower (TB) 76, 86, for example, a dehydration bake unit (DHP) 96,98. ), And dehydrated therein (step S ₄ ). After the dehydration treatment, the substrate G is passed to the conveyance mechanism S / A 90 by the conveyance mechanism (S / A) 88 via the extension unit (EXT) 170A. By the conveyance mechanism (S / A) 90, the substrate G is transferred to one of the units in the oven tower (TB) 78, 84, for example, the cooling unit (COL) 128, 130, There it is cooled to a constant substrate temperature (step S ₅ ). Subsequently, the substrate G is transferred to one of the advice units AD 132 and 142 and subjected to a hydrophobic treatment therein (step S ₆ ). After the completion of this hydrophobization treatment, the substrate G is cooled to a constant substrate temperature in one of the cooling units (COLs) 128 and 130 (step S ₇ ). Thereafter, the substrate G is transferred to a pass unit PASS _in 126 of the oven tower TB 78, and is carried there on the conveying line B.

On the conveyance line B, the substrate G is carried into the coating process section 26 and transferred to the resist coating unit CT 34 through the loading unit (IN) 32. In the resist coating unit (CT) 34, the resist liquid is applied to the substrate surface (processed surface) by the spin coating method or the spinless method. Subsequently, the substrate G is subjected to a drying process by depressurization in a reduced pressure drying unit (VD) 36 adjacent to the downstream side, and then to the edge portion of the substrate by the edge remover unit (ER) 38 adjacent to the downstream side. Excess (unnecessary) resist is removed (step S ₈ ).

The substrate G subjected to the resist coating treatment as described above is a pass unit (PASS) for carrying out belonging to the oven tower (TB) 80 through the take-out unit 40 from the edge remover unit ER 38. _out ), and are carried out from the conveyance line [B] by the conveyance mechanism (S / A) 92 there.

The board | substrate G is rotated by the conveyance mechanism S / A 90 to the unit in oven tower TB 80 and 82 in a predetermined sequence, and receives a predetermined process. For example, the substrate G is first moved to one of the prebaking units PREBAKE 148, 150, 156, and 158, where it is subjected to baking after the resist coating (step S ₉ ). Subsequently, the substrate G is transferred to one of the cooling units (COL) 146 and 154, where it is cooled to a constant substrate temperature (step S ₁₀ ). Subsequently, the substrate G is exchanged with the extension cooling stage (EXT COL) 164 on the interface station (I / F) 18 side.

In the interface station (I / F) 18, the substrate G is carried from the extension cooling stage (EXT COL) 164 to the peripheral exposure apparatus EE of the peripheral device 166, whereby the substrate ( After receiving the exposure for removing the resist attached to the periphery of G) at the time of development, it is sent to the adjacent exposure apparatus 12 (step S ₁₁ ).

In the exposure apparatus 12, a predetermined circuit pattern is exposed to the resist on the substrate G. Subsequently, when the substrate G, which has been subjected to pattern exposure, is returned from the exposure apparatus 12 to the interface station (I / F) 18 (step S ₁₁ ), first, the substrate G is carried into the titler TITLER of the peripheral apparatus 166. is, there is the predetermined information recorded in a predetermined area on the substrate (step S _12). After that, the substrate G is returned to the extension cooling stage (EXT COL) 164. The conveyance of the board | substrate G in the interface station I / F 18, and the exchange of the board | substrate G with the exposure apparatus 12 are performed by the conveyance apparatus 160. FIG.

In the process station (P / S) 16, the conveyance mechanism 92 receives the exposed substrate G from the extension cooling stage (EXT COL) 164, and then, in the oven tower (TB) 82, Transfer to a pass unit (PASS _in ) 152. The substrate G is carried on the conveying line C _{in a} pass unit PASS 152 and flows to the developing unit DEV 74.

In the developing unit (DEV) 74, a series of developing processes such as developing, rinsing and drying are performed while the substrate G is flown by the roller conveyance on the conveying line C (step S ₁₃ ).

The substrate G subjected to the developing process in the developing process part 70 is carried in the bleaching process part (i-UV) 75 adjacent to the downstream side by roller conveyance as it is, and is subjected to the decolorizing process by i-ray irradiation therein ( Step S ₁₄ ). The discoloration-processed board | substrate G is carried _out from the conveyance line [C] by the conveyance mechanism (S / A) 90 by the pass- _out unit PASS _out 136 in oven tower TB86. .

The substrate G taken out from the conveying line C is first subjected to a post-baking heat treatment in any one of the post-baking units POBAKE (step S ₁₅ ), and then predetermined in one of the cooling units COL. It is cooled to a substrate temperature (step S _16). There are two types of transfer sequences in this case.

The first conveying sequence is a post-baking unit (POBAKE) in the jurisdiction where the conveying mechanism (S / A) 90 having taken out the substrate G from the conveying line [C], for example, an oven tower (TB) ( 84 is a case where it is brought into one of the post-baking units POBAKEs 138 and 140. In this case, the conveyance mechanism (S / A) 90 cools the cooling unit COL in the jurisdiction of the substrate G, for example, the cooling unit in the oven tower TB 78 after the end of the postbaking process. COL) 128 and 130 and transfers the substrate G to the extension unit EXT 170B after the substrate temperature adjustment is completed. Then, the conveyance mechanism (S / A) 88 on the opposite side picks up the substrate G from the extension unit EXT 170B, and then passes the pass unit PASS in the oven tower TB 86. _in ) 102.

The 2nd conveyance sequence is a case where the conveyance mechanism (S / A) 90 passes the board | substrate G carried out from the conveyance line [C] directly to extension unit (EXT) 170B. In this case, when the conveyance mechanism (S / A) 88 picks up the board | substrate G from the extension unit (EXT) 170B from the opposite side, the post-baking unit (POBAKE) in a jurisdiction, for example oven It is carried in one of the post-baking units POBAKE 100, 106, and 108 in the tower TB (76, 86). After completion of the post-baking process, the cooling unit COL in the jurisdiction of the substrate G, for example, the cooling unit COL 104 or the cooling unit on the passage 168 in the oven tower TB 86. After carrying out the substrate temperature adjustment, the substrate G is transferred to a pass unit 102 _{in the} oven tower TB 86.

The board | substrate G carried to the pass unit PASS _in 102 is carried _{in in the} conveyance line D there, and is flown to the inspection part AP 72. FIG. In the inspection unit AP 72, line width inspection, film quality, film thickness inspection, and the like are performed on the resist pattern on the substrate G while moving the substrate G by roller conveyance on the conveyance line D (step ₁₇ ). . The board | substrate carrying out part (not shown) corresponding to the above-mentioned carrying out pass unit (PASS _out ) is provided in the terminal part of conveyance line [D]. The board | substrate G which finished the inspection process is entrusted to the conveyance mechanism 22 by the cassette station (C / S) 14 side through the said board | substrate carrying part. In the cassette station (C / S) 14, the conveyance mechanism 22 accommodates the board | substrate G taken from the conveyance line [D] in any one cassette C on the stage 20 (step S). ₁ ).

As described above, in this embodiment, the conveyance lines [A], [B] and return paths of the traveling paths extending in the system longitudinal direction (X direction) to the horizontal process station (P / S) 16 are conveyed. In the resist coating and developing process system in which the lines [C] and [D] are provided in two rows, the points connecting the conveying lines [A] and [B] of the traveling path and the conveying lines [C] and [D] of the return path The cross points 168 for exiting the system are provided under the extension / extension unit (EXT) 170 of the substrate relay station located at the center point of the connection point. Furthermore, at the end of each conveying line [A], [B], [C], [D] located near the connection point, heat treatment relating to the liquid treatment on the conveying line or the liquid treatment on the conveying line before and after is performed. Oven towers (TB) 76, 78, 84, 86, which are formed by laminating and arranging oven units in multiple stages, and oven towers facing each other in a direction parallel to the passage 168 (Y direction) ( Lifting / turning type transfer mechanisms (S / A) 88, 90 accessible to each unit in the oven tower between the TBs 76 and 86 and between the oven towers TB and 78 and 84, respectively. I install it. These conveyance mechanisms (S / A) 88 and 90 exchange board | substrate G with each other via the extension unit (EXT) 170. As shown in FIG.

Thus, in this embodiment, the transverse passage 168 for exiting the system is realized in the area where the carrier system and the unit are concentrated. For this reason, there exists an advantage that it does not need to follow the substantial increase of a footprint in the establishment of the channel | path 168.

In this embodiment, the passage 168 provides a way out when a person comes and goes between both sides of the system. At the time of maintenance, circulation, or other disasters such as a fire, a person concerned (usually an operator or a worker) passes through this passage 168, so that the cassette end (C / S) 14 or the exposure apparatus at the end of the system is passed. You can easily move from one side of the system to the other without difficulty bypassing (12). As the overall length of the system increases, and as the number of installations of the system increases, the benefits of the passage 168 increase.

12 shows an example of layout in the case where a plurality (for example, two) of resist coating and developing processing systems in this embodiment are provided in a clean room. Usually, as shown in the drawing, a plurality of systems 10A and 10B are arranged in parallel in the clean room 202 at appropriate intervals. Therefore, the passages 168 of the respective systems 10A and 10B are aligned in a straight line in the system width direction (Y direction). For example, a fire suddenly occurs in the clean room 202, and as shown at the time, the person concerned M is connected to the shade of the system 10A and the shade of the system 10B in the interior from the doorway 204, respectively. _a , M _b ) In this case, the inside concerned M _b exits the passage 168 of the system 10B as indicated by the dotted line, and continues straight afterwards to exit the passage 168 of the system 10A, as shown by the dotted line. The doorway 204 can be reached at a distance to the shortest time. In addition, as shown by the dashed line, the front participant M _a can also reach the doorway 204 in the shortest to the shortest time by exiting the passage 168 of the system 10A.

In the vicinity of the front entrance of the passage 168, it is preferable to provide a passage marker of lighting or light emitting display type so that the presence of the passage 168 can be visually confirmed from any orientation. In this embodiment, as shown in FIG. 12, the passage marker 206 may be provided in the form which protrudes forward, for example, inclined from any one of oven tower TB (76, 78). According to such an installation form, the installation place of the passage marker 206 can be visually recognized from all orientations at a viewing angle of 180 degrees. In addition, as shown in FIG. 12, when several system 10A, 10B is provided in parallel, the path | route marker 206 of the front system 10A is seen through the channel | path 168 of the back system 10B. It is preferable to provide the passage marker 206 at a position sufficiently lower than the ceiling of the passage 168 (FIG. 9).

The passage marker 206 may be dedicated, but may be a display means for visually displaying and notifying the overall system status, for example, a signal tower. For example, in an emergency, the signal tower may emit light in a particular color so as to function as a passage marker 206 for evacuation. By installing the signal tower in such a position, it is possible to check at a glance through the signal tower the operating status of a plurality of high-level systems arranged in parallel in the clean room without moving to the end of the system.

In this embodiment, not only the extension unit (EXT) 170 but also the buffer unit (BUF) 178 and the cooling unit (COL) 176 for adjusting the substrate temperature are stacked in multiple stages on the passage 168. I am placing it.

As described above, the buffer unit (BUF) 178 is a unit for temporarily storing the substrate G via the extension unit EXT 170 temporarily as necessary. For example, it is assumed that the transfer contact was changed from 80 seconds to 60 seconds with the changed eye of the product lot without interrupting the transfer flow of the substrate G in the system. In this case, during the constant transient period, the substrate G is taken _{out at} the end of the transfer line [A], that is, from the pass unit 94 in the oven tower (TB) 76 at the interval of 60 seconds after the change. In other words, the substrate G is carried out from the end of the transfer line C, namely, from the pass unit PASS _out 136 in the oven tower TB 84 at intervals of 80 seconds before the change. For this reason, the necessity of adjusting the timing of a conveyance sequence in both conveyance mechanisms (S / A) 88 and 90 so that the conveyance tag (60 second) system after a change and the conveyance tag (80 second) system before a change does not interfere. . Here, each of the transfer mechanisms (S / A) 88, 90 can leave any substrate G in the buffer unit (BUF) 178 only for an arbitrary time, thereby adjusting the timing between the different transfer tac- ties. You can set the recipe on the optimal transport sequence for this.

In addition, even when the process flow is stopped or congested somewhere in the system, the buffer unit (BUF) 178 can be effectively used. For example, when a failure occurs in the coating process section 26 and the substrate is not able to be loaded into the process section 26, the scrubber cleaning unit (SCR) 28 performs the flat-flow cleaning treatment at that time. In the middle of the received substrate G, the cleaning treatment may be completed as it is. Therefore, from the scrubber cleaning unit (SCR) 28, the cleaned board | substrate G is carried out from the conveyance line [A] one by one at the same cycle or timing as normal. Thus, each board | substrate G carried out from the conveyance line [A] is thermally processed in the sequence as usual in oven tower (TB) 76, 78, 84, 86, and is carried in the coating process part 26. It may be stored in the buffer unit (BUF) 178 instead.

Thus, by providing the buffer unit (BUF) 178 adjacent to the extension unit (EXT) 170 (preferably overlapping up and down), the reliability of the conveying flow and the process flow can be improved.

The cooling unit (COL) 176 on the passage 168 can function as a substitute or complement of the cooling units (COL) in the adjacent oven towers (TB) 76, 78, 84, 86 as described above. The cooling unit (COL) in the oven tower (TB) is stacked on top of the heating units (DHP), (AD), (PREBAKE) and (POBAKE), whereas the cooling unit (COL) 176 on the passage 168 is stacked. Since the stacks are stacked and stacked with non-heating units such as the extension unit (EXT) 170 and the buffer unit (BUF) 178, there is an advantage that a special heat insulating structure is not required.

13 shows a layout of the resist coating and developing processing system according to the second embodiment. In the drawings, the same or similar reference numerals are assigned to portions having the same structure or function as those of the above-described first embodiment (FIGS. 1 to 11).

In this second embodiment, the extension lines (A), [B] and return lines [C] and [D] of the return paths are connected directly, respectively, and the extension unit (EXT) in the above embodiment. Each of the 170 and the conveyance mechanisms (S / A) 88, 90 is divided into two parts, a traveling path side and a return path side.

More specifically, on the traveling path side, between the oven tower (TB) 76 located at the end of the transfer line [A] and the oven tower (TB) 78 located at the start end of the transfer line [B]. On the conveyance mechanism (S / A) 88A for conveying the board | substrate G between each unit in oven tower (TB) 76, and the board | substrate G from the upstream to downstream of a process flow on a traveling path. A conveyance mechanism (S / A) 90A for conveying the substrate G between the units in the extension unit (EXT) 170A for exchanging and each unit in the oven tower (TB) 78. I arrange it in a line. Here, both conveyance mechanisms (S / A) 88A and 90A are accessible also to extension unit (EXT) 170A, and the conveyance mechanisms (S / A) 88A of the downstream side are downstream from the upstream conveyance mechanism (S / A) 88A. The exchange of the substrate G to the S / A) 90A is performed via the extension unit (EXT) 170A.

In addition, on the return path side, the oven tower is placed between the oven tower (TB) 84 located at the end of the conveying line C and the oven tower (TB) 86 located at the beginning of the conveying line width. A transfer mechanism (S / A) 90B for conveying the substrate G between each unit in the (TB) 84, and the substrate G being supplied downstream from the upstream side of the process flow on the return path. An extension unit (EXT) 170B for receiving and a transfer mechanism (S / A) 88B for conveying the substrate G between each unit in the oven tower (TB) 86 are arranged in a row. have. Both conveying mechanisms (S / A) 90B and 88B are accessible to the extension unit (EXT) 170B, and the conveying mechanism (S / on the downstream side from the upstream conveying mechanism (S / A) 90B. A) The transfer of the substrate G to the 88B is performed via the extension unit (EXT) 170B.

In this 2nd Embodiment, the channel | path 168A, 168B for exiting out under each extension unit (EXT) 170A, 170B can be provided with the structure or mechanism similar to the above-mentioned 1st Embodiment. The person in charge can simply move from one side of the system to the other side without bypassing one end of the system by vertically exiting both passages 168A, 168B in the direction of traversing the system (Y direction). In the example of illustration, since both the passages 168A and 168B are arranged in a straight line in the system transverse direction (Y direction), the person concerned can smoothly and safely escape the passages 168A and 168B even in an emergency. have. However, it is also possible to arrange the two passages 168A and 168B at positions offset in the system longitudinal direction.

In the second embodiment, in order to arrange the extension unit (EXT) 170 and the conveyance mechanisms (S / A) 88 and 90 in each of the traveling path and the return path, the footprint is particularly preferable than in the first embodiment. The overall length of the system is slightly larger. On the other hand, each conveyance mechanism (S / A) 88 and 90 has an advantage that maintenance can be performed directly from the outside of the system. Moreover, also in this embodiment, the cooling unit (COL) 176, buffer unit (BUF) 178, etc. for board | substrate temperature adjustment can be arrange | positioned on the upper and lower sides of each extension unit (EXT) 170A, 170B. .

As mentioned above, although preferred embodiment of this invention was described, various deformation | transformation and a change are possible within the technical idea of this invention. For example, a flat conveyance path is not limited to a roller conveyance path, For example, the belt-shaped conveyance path etc. which attach a pair of belts to a horizontal direction at regular intervals are also possible. In addition, the oven tower may include a processing unit other than the heat treatment system, or a multi-stage unit portion such as an oven tower may be configured only by the processing units other than the heat treatment system.

The processing system of the present invention is preferably applied to the resist coating and developing processing system as described above, but is not limited thereto, and various modifications can be made in the system configuration and system elements, for example, a film forming apparatus or an etching apparatus. It can also be applied to inline systems including the same. In the present invention, the substrate to be processed is not limited to an LCD substrate, but various substrates for flat panel display, semiconductor wafers, CD substrates, photomasks, printed substrates, and the like. This includes.

As described above, according to the processing system of the present invention, in a system layout having a conveying line for conveying a substrate to be processed in a substantially horizontal direction in serial in the order of a process flow, no human bypasses between both sides of the system. Simply and in a short time can be made. Furthermore, the reliability of a process flow or conveyance flow can also be improved.

Claims (18)

A first conveying line for conveying the substrate to be processed in one or a series of processing steps in a substantially horizontal direction in serial in the order of the process flow; A second conveying line installed on an extension of said first conveying line, for conveying a substrate to be processed in a sequence of processing flows in a substantially horizontal direction in the order of a process flow in one or a series of processing steps; It is provided at the end of the first conveying line, and at least one carrying unit for carrying out the substrate to be processed from the first conveying line and at least one processing unit for carrying out a predetermined process to the substrate to be processed are multistage. A first multi-stage unit part formed by laminating on First conveying means for conveying the substrate to be processed between each unit in the first multi-stage unit portion; It is provided at the start end of the second conveying line, at least one carrying unit for carrying in the substrate to be processed into the second conveying line and at least one processing unit for carrying out a predetermined process to the substrate to be processed. A second multi-stage unit portion formed by stacking in multiple stages, Second conveying means for conveying the substrate to be processed between each unit in the second multi-stage unit portion; A sending and receiving portion disposed between both conveying means to exchange the substrate to be processed between the first conveying means and the second conveying means; A processing system having a passageway installed beneath the give-and-receive portion for humans to exit the system. A first conveying line of a traveling path for conveying the substrate to be processed in one or a series of processing steps in a substantially horizontal direction in serial in the order of the process flow; It is provided at the end of the first conveying line, and at least one carrying unit for carrying out the substrate to be processed from the first conveying line and at least one processing unit for carrying out a predetermined process to the substrate to be processed are multistage. A first multi-stage unit part formed by laminating on A second conveying line provided on an extension of the first conveying line, for conveying a substrate to be processed in one or a series of processing steps in a substantially horizontal direction in a serial order in a process flow; It is provided at the start end of the second conveying line, at least one carrying unit for carrying in the substrate to be processed into the second conveying line and at least one processing unit for carrying out a predetermined process to the substrate to be processed. A second multi-stage unit portion formed by stacking in multiple stages, A third conveying line provided in substantially parallel to the second conveying line, for conveying the substrate to be processed in one or a series of processing steps in a substantially horizontal direction in a serial order in a process flow; It is provided at the end of the third conveying line, and at least one carrying unit for carrying out the substrate to be processed from the third conveying line and at least one processing unit for carrying out a predetermined process to the substrate to be processed are multistage. A third multi-stage unit part formed by laminating on On the extension of the third conveying line is provided in substantially parallel to the first conveying line, the return path for conveying the substrate to be processed in a serial or substantially horizontal direction in the order of the process flow in one or a series of processing steps 4 return line, It is provided at the beginning end of the fourth conveying line, at least one carrying unit for carrying in the substrate to be processed into the fourth conveying line and at least one processing unit for carrying out a predetermined process to the substrate to be processed. A fourth multi-stage unit unit formed by stacking in multiple stages, First conveying means for conveying the substrate to be processed between each unit in the first multi-stage unit portion and each unit in the fourth multi-stage unit portion; Second conveying means for conveying the substrate to be processed between each unit in the second multi-stage unit portion and each unit in the third multi-stage unit portion; A sending and receiving portion disposed between both conveying means to exchange the substrate to be processed between the first conveying means and the second conveying means; A processing system having a passageway installed beneath the give-and-receive portion for humans to exit the system. 3. The processing unit according to claim 2, wherein the exchange unit receives a first transfer unit for exchanging a substrate to be processed from the first transfer unit to the second transfer unit, and from the second transfer unit to the first transfer unit. A processing system formed by stacking and arranging a second exchange unit for exchanging a substrate in multiple stages. A first conveying line of a traveling path for conveying the substrate to be processed in one or a series of processing steps in a substantially horizontal direction in serial in the order of the process flow; It is provided at the end of the first conveying line, and at least one carrying unit for carrying out the substrate to be processed from the first conveying line and at least one processing unit for carrying out a predetermined process to the substrate to be processed are multistage. A first multi-stage unit part formed by laminating on First conveying means for conveying the substrate to be processed between each unit in the first multi-stage unit portion; A second conveying line provided on an extension of the first conveying line, for conveying a substrate to be processed in one or a series of processing steps in a substantially horizontal direction in a serial order in a process flow; It is provided at the start end of the second conveying line, at least one carrying unit for carrying in the substrate to be processed into the second conveying line and at least one processing unit for carrying out a predetermined process to the substrate to be processed. A second multi-stage unit portion formed by stacking in multiple stages, Second conveying means for conveying the substrate to be processed between each unit in the second multi-stage unit portion; A first give-and-receive unit disposed between both conveying means to exchange the substrate to be processed between the first conveying means and the second conveying means; A third conveying line provided in substantially parallel to the second conveying line, for conveying the substrate to be processed in one or a series of processing steps in a substantially horizontal direction in a serial order in a process flow; It is provided at the end of the third conveying line, and at least one carrying unit for carrying out the substrate to be processed from the third conveying line and at least one processing unit for carrying out a predetermined process to the substrate to be processed are multistage. A third multi-stage unit part formed by laminating on Third conveying means for conveying the substrate to be processed between each unit in the third multi-stage unit portion; On the extension of the third conveying line is provided in substantially parallel to the first conveying line, the return path for conveying the substrate to be processed in a serial or substantially horizontal direction in the order of the process flow in one or a series of processing steps 4 return line, It is provided at the beginning end of the fourth conveying line, at least one carrying unit for carrying in the substrate to be processed into the fourth conveying line and at least one processing unit for carrying out a predetermined process to the substrate to be processed. A fourth multi-stage unit unit formed by stacking in multiple stages, Fourth conveying means for conveying the substrate to be processed between the units in the fourth multi-stage unit portion; A second give-and-receive unit disposed between both conveying means to exchange the substrate to be processed between the third conveying means and the fourth conveying means; And a first and a second passage respectively installed under the first and second receivers to allow a person to cross the system. 5. The processing system of claim 4, wherein said first passageway and said second passageway are disposed substantially straight in a direction crossing the system. The substrate according to any one of claims 2 to 5, which is provided at an end portion of the second conveying line and is provided to at least one unloading unit and the substrate to be carried out from the second conveying line. A fifth multi-stage unit portion formed by stacking at least one processing unit for performing a predetermined process in multiple stages; It is provided at the start end of the third conveying line, at least one carrying unit for carrying in the substrate to be processed into the third conveying line and at least one processing unit for carrying out a predetermined process to the substrate to be processed. A sixth multi-stage unit unit formed by stacking in multiple stages, And a fifth conveying means for conveying the substrate to be processed between each unit in the fifth multi-stage unit portion and each unit in the sixth multi-stage unit portion. 7. The method of claim 6, further comprising: a material for bringing the substrate to or from the other processing system into another processing system adjacent to an end of the second conveying line and an end of the third conveying line; 6 conveying means, And a third send / receive unit disposed between both conveying means to exchange the substrate to be processed between the fifth conveying means and the sixth conveying means. 8. The cassette stage according to any one of claims 2 to 5 and 7, wherein one or a plurality of cassettes for storing a substrate to be processed in multiple stages, a first end of the first conveying line, and the first stage 4 is provided between the end of the conveying line, the unprocessed substrate to be picked up from any one of the cassettes on the cassette stage and brought into the first conveying line, and the treated substrate is conveyed to the fourth conveyance. And a seventh conveying means for carrying out from the line for accommodating any one of said cassettes on said cassette stage. 8. The lifting carrier according to any one of claims 1 to 5 and 7, wherein the conveying means is capable of lifting up and down in a vertical direction, a pivoting carrier that is pivotable around a vertical axis on the lifting carrier, and the pivoting. And a conveyance arm which is extensible in the horizontal direction in the horizontal plane while supporting the substrate to be processed on the conveying body. The conveying path according to any one of claims 1 to 5, wherein at least one conveying line is provided with a conveying body for carrying the substrate to be processed substantially horizontally along the conveying line; And a conveying drive means for driving the conveying body to convey the substrate to be processed on the conveying path. The processing system according to claim 10, further comprising liquid processing means for performing a desired liquid treatment on the substrate to be processed on the conveying path. The treatment according to any one of claims 1 to 5, 7, and 11, wherein the treatment unit is a heat treatment unit for performing a desired thermal treatment on the substrate to be processed in relation to the treatment on the conveying line. system. 12. The support plate according to any one of claims 1 to 5, 7, and 11, wherein the exchange part supports a substrate on which the substrate to be processed is placed in units of one sheet, and the substrate is almost horizontally supported at the front end of the pin. And a plurality of support pins discretely installed on the support plate for the purpose of. The method according to any one of claims 1 to 5 and 11, wherein at least one processing unit for carrying out a predetermined process is placed on the substrate to be stacked above or below the receiving portion. The processing system which makes the said processing unit accessible by the said at least 1 conveyance means accessible to a part. 15. The processing system according to claim 14, wherein said processing unit, which is provided to be stacked on said sending and receiving part, has a substrate temperature adjusting means for constantly adjusting the temperature of the substrate to be processed. The buffer unit according to any one of claims 1 to 5 and 11, wherein a buffer unit for temporarily storing the substrate to be processed is stored on the upper and lower portions of the exchange portion to access the transfer portion. And a processing system which makes the buffer unit accessible by at least one conveying means as much as possible. The processing system according to any one of claims 1 to 5 and 11, wherein display means for simultaneously notifying the presence of the passage and the situation in the system is provided near the entrance of the passage. The processing system according to any one of claims 1 to 5 and 11, wherein the passage is always open.