KR20040046861A - 광화학 반응 처리 장치 및 광화학 반응 처리 방법 - Google Patents
광화학 반응 처리 장치 및 광화학 반응 처리 방법 Download PDFInfo
- Publication number
- KR20040046861A KR20040046861A KR1020020074899A KR20020074899A KR20040046861A KR 20040046861 A KR20040046861 A KR 20040046861A KR 1020020074899 A KR1020020074899 A KR 1020020074899A KR 20020074899 A KR20020074899 A KR 20020074899A KR 20040046861 A KR20040046861 A KR 20040046861A
- Authority
- KR
- South Korea
- Prior art keywords
- light source
- light
- photochemical reaction
- light sources
- turned
- Prior art date
Links
- 238000006552 photochemical reaction Methods 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title claims abstract description 13
- 230000001678 irradiating effect Effects 0.000 claims abstract description 3
- 238000012545 processing Methods 0.000 claims description 35
- 230000006866 deterioration Effects 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 7
- 230000008859 change Effects 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- 230000005855 radiation Effects 0.000 description 24
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- 239000011521 glass Substances 0.000 description 13
- 238000000354 decomposition reaction Methods 0.000 description 12
- 239000007788 liquid Substances 0.000 description 11
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000000498 cooling water Substances 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910021642 ultra pure water Inorganic materials 0.000 description 4
- 239000012498 ultrapure water Substances 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 239000003456 ion exchange resin Substances 0.000 description 3
- 229920003303 ion-exchange polymer Polymers 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 235000013361 beverage Nutrition 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3227—Units with two or more lamps
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/326—Lamp control systems
Landscapes
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physical Water Treatments (AREA)
Abstract
Description
Claims (8)
- 다수의 광원을 구비하고, 상기 광원으로부터의 광 조사에 의해 피조사체의 광화학 반응 처리를 행하는 광화학 반응 처리 장치에 있어서, 점등하는 광원을 사용시간 경과에 따라서 제어함으로써, 상기 피조사체에 대한 광 조사량을 소정 수준으로 제어하는 것을 특징으로 하는 광화학 반응 처리 장치.
- 제1항에 있어서, 상기 다수의 광원 중 일부의 광원을 점등 혹은 조광 점등하고, 점등 혹은 조광 점등하는 광원의 조합을 순차로 전환함으로써, 광 조사량을 소정 수준으로 제어하는 것을 특징으로 하는 광화학 반응 처리 장치.
- 제1항에 있어서, 광원의 경시적 조도 저하 특성을 기초로, 사용시간 경과에 따라, 점등 혹은 조광 점등하는 광원수와 소등하는 광원수의 비율을 변경시키는 것을 특징으로 하는 광화학 반응 처리 장치.
- 제2항 또는 제3항에 있어서, 상기 점등 혹은 조광 점등하는 광원의 조합 및 전환 시기 및 상기 사용시간 경과에 따른 점등 혹은 조광 점등 광원수와 소등 광원수의 상기 비율의 변경 형태를 장치의 운전 개시 전에 미리 설정하고, 이 설정에 따라서 점등 혹은 조광 점등하는 광원을 시간 경과에 따라 제어하는 것을 특징으로 하는 광화학 반응 처리 장치.
- 제4항에 있어서, 상기 설정 내용은 운전 개시 후에 수정 가능한 것을 특징으로 하는 광화학 반응 처리 장치.
- 제1항 내지 제3항 중 어느 한 항에 있어서, 상기 광원은 자외선을 방사하는 광원인 것을 특징으로 하는 광화학 반응 처리 장치.
- 제1항 내지 제3항 중 어느 한 항 기재의 장치를 이용하여, 광원으로부터 빛을 조사하여, 피조사체에 대하여 광화학 반응 처리를 행하는 것을 특징으로 하는 광화학 반응 처리 방법.
- 점등 혹은 조광 점등시키는 광원과 소등시키는 광원의 비율의 변경이나, 점등 혹은 조광 점등시키는 광원의 로테이션에 의해, 광원의 일제 교환기간을 연장시키는 것을 특징으로 하는 광화학 반응 처리 방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020074899A KR100764332B1 (ko) | 2002-11-28 | 2002-11-28 | 광화학 반응 처리 장치 및 광화학 반응 처리 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020074899A KR100764332B1 (ko) | 2002-11-28 | 2002-11-28 | 광화학 반응 처리 장치 및 광화학 반응 처리 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040046861A true KR20040046861A (ko) | 2004-06-05 |
KR100764332B1 KR100764332B1 (ko) | 2007-10-05 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020020074899A KR100764332B1 (ko) | 2002-11-28 | 2002-11-28 | 광화학 반응 처리 장치 및 광화학 반응 처리 방법 |
Country Status (1)
Country | Link |
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KR (1) | KR100764332B1 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2022542296A (ja) | 2019-07-31 | 2022-09-30 | アクセス ビジネス グループ インターナショナル リミテッド ライアビリティ カンパニー | 水処理システム |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10263536A (ja) * | 1997-03-24 | 1998-10-06 | Shinko Pantec Co Ltd | 有機物含有水の処理方法とその装置 |
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2002
- 2002-11-28 KR KR1020020074899A patent/KR100764332B1/ko active IP Right Grant
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Publication number | Publication date |
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KR100764332B1 (ko) | 2007-10-05 |
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