KR20040015299A - 표면 처리 조성물 및 방법 - Google Patents

표면 처리 조성물 및 방법 Download PDF

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Publication number
KR20040015299A
KR20040015299A KR10-2003-7016979A KR20037016979A KR20040015299A KR 20040015299 A KR20040015299 A KR 20040015299A KR 20037016979 A KR20037016979 A KR 20037016979A KR 20040015299 A KR20040015299 A KR 20040015299A
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KR
South Korea
Prior art keywords
formula
compound
composition
group
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR10-2003-7016979A
Other languages
English (en)
Korean (ko)
Inventor
디디에르 주휘
마리-조스 리나
안느-클레르 게이용
진-마르크 코르파
Original Assignee
이 아이 듀폰 디 네모아 앤드 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이 아이 듀폰 디 네모아 앤드 캄파니 filed Critical 이 아이 듀폰 디 네모아 앤드 캄파니
Publication of KR20040015299A publication Critical patent/KR20040015299A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/12Organo silicon halides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polyethers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
KR10-2003-7016979A 2001-06-27 2002-06-21 표면 처리 조성물 및 방법 Withdrawn KR20040015299A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0108460A FR2826654B1 (fr) 2001-06-27 2001-06-27 Composition et procede de traitement de surface et substrats susceptibles d'etre ainsi obtenus
FR0108460 2001-06-27
PCT/FR2002/002167 WO2003002572A1 (fr) 2001-06-27 2002-06-21 Composition et procede de traitement de surface

Publications (1)

Publication Number Publication Date
KR20040015299A true KR20040015299A (ko) 2004-02-18

Family

ID=8864821

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2003-7016979A Withdrawn KR20040015299A (ko) 2001-06-27 2002-06-21 표면 처리 조성물 및 방법

Country Status (8)

Country Link
US (1) US7276618B2 (enExample)
EP (1) EP1436302B1 (enExample)
JP (1) JP4527974B2 (enExample)
KR (1) KR20040015299A (enExample)
CN (1) CN1260232C (enExample)
DE (1) DE60210645T2 (enExample)
FR (1) FR2826654B1 (enExample)
WO (1) WO2003002572A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005056620A1 (de) * 2005-11-25 2007-06-06 Merck Patent Gmbh Amphiphile Silane
CN101541816B (zh) * 2006-12-15 2014-03-12 3M创新有限公司 用于表面处理的具有甲硅烷侧基的含氟氨基甲酸酯化合物
EP2215029A4 (en) * 2007-11-16 2017-11-15 Aqua Diagnostic Pty Ltd Photo electrodes
US8450513B2 (en) * 2010-07-30 2013-05-28 E I Du Pont De Nemours And Company Silane compositions for polyester nanocomposites
US8691915B2 (en) 2012-04-23 2014-04-08 Sabic Innovative Plastics Ip B.V. Copolymers and polymer blends having improved refractive indices
WO2016101185A1 (en) * 2014-12-24 2016-06-30 E. I. Du Pont De Nemours And Company Perfluoropolyether silanes and method of forming the same

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3012006A (en) 1958-04-24 1961-12-05 Dow Corning Fluorinated alkyl silanes and their use
DE1232959B (de) 1964-09-12 1967-01-26 Walter Bloechl Verfahren zur Herstellung eines aus waessriger Loesung anwendbaren Impraegniermittels
US3422131A (en) 1966-02-10 1969-01-14 Us Agriculture Fluoroalkoxyalkyl silanes
US3442664A (en) 1966-04-26 1969-05-06 Minnesota Mining & Mfg Treating composition,method of treating and treated surfaces
JPS5318008B2 (enExample) * 1973-12-28 1978-06-13
US4089882A (en) 1974-03-22 1978-05-16 Shin-Etsu Chemical Co., Ltd. Method of preparing fluoroalkyl-containing organosilanes
JPS521926B2 (enExample) 1974-03-25 1977-01-19
US4525425A (en) 1981-05-11 1985-06-25 El-Chem Corporation Water and oil repellent metal oxide-organic combination coating systems and method of making same
JPS60190727A (ja) * 1984-03-09 1985-09-28 Daikin Ind Ltd 含フツ素有機シラン化合物およびその製法と用途
EP0166363B1 (en) 1984-06-26 1991-08-07 Asahi Glass Company Ltd. Low reflectance transparent material having antisoiling properties
US4549003A (en) 1984-10-26 1985-10-22 Dow Corning Corporation Method for preparing novel fluorinated organosiloxane copolymers
US4689181A (en) 1985-12-27 1987-08-25 Dow Corning Corporation Fluorine-containing organosilanes useful as magnetic media lubricants
US4648904A (en) 1986-02-14 1987-03-10 Scm Corporation Aqueous systems containing silanes for rendering masonry surfaces water repellant
US5011963A (en) 1988-02-09 1991-04-30 Matsushita Electric Ind., Co., Ltd. Terminal perfluoroalkylsilane compounds
US4990377A (en) 1988-05-02 1991-02-05 Pcr Group, Inc. Buffered silane emulsions having low volatile organic compounds when cured
US4877654A (en) 1988-05-02 1989-10-31 Pcr, Inc. Buffered silane emulsions for rendering porous substrates water repellent
JPH02252787A (ja) * 1989-03-28 1990-10-11 Daikin Ind Ltd 防汚性撥水撥油剤組成物
US5059649A (en) 1989-11-08 1991-10-22 Dow Corning Corporation Storage stable one-part fluorosilicone gel compositions exhibiting improved thermal stability
US4983459A (en) 1990-04-03 1991-01-08 Ppg Industries, Inc. Chemically reacted glass surface
US5051129A (en) 1990-06-25 1991-09-24 Dow Corning Corporation Masonry water repellent composition
US5124467A (en) 1990-07-20 1992-06-23 Ciba-Geigy Corporation Perfluoroalkypolyoxyalkylpolysiloxane surfactants
US5274159A (en) 1993-02-18 1993-12-28 Minnesota Mining And Manufacturing Company Destructable fluorinated alkoxysilane surfactants and repellent coatings derived therefrom
JP3383849B2 (ja) * 1993-07-03 2003-03-10 株式会社ソフト99コーポレーション めがねレンズの防曇剤
JPH09241622A (ja) * 1996-03-06 1997-09-16 Shin Etsu Chem Co Ltd 防汚加工剤組成物
JP3503365B2 (ja) * 1996-10-25 2004-03-02 旭硝子株式会社 表面処理された基材
JP3849232B2 (ja) * 1997-06-12 2006-11-22 東レ株式会社 光学薄膜、反射防止性物品および反射防止方法
US5962188A (en) * 1997-06-24 1999-10-05 Kodak Polychrome Graphics Llc Direct write lithographic printing plates
JP4477229B2 (ja) * 1998-03-04 2010-06-09 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 耐層剥離性積層ガラス構造体
JP2000328230A (ja) * 1999-05-20 2000-11-28 Toray Ind Inc 有機膜の成膜法
JP2000327997A (ja) 1999-05-20 2000-11-28 Toray Ind Inc 有機膜の成膜方法

Also Published As

Publication number Publication date
JP4527974B2 (ja) 2010-08-18
US7276618B2 (en) 2007-10-02
CN1520419A (zh) 2004-08-11
DE60210645T2 (de) 2007-01-25
JP2004530776A (ja) 2004-10-07
EP1436302A1 (fr) 2004-07-14
US20040176600A1 (en) 2004-09-09
HK1069829A1 (en) 2005-06-03
EP1436302B1 (fr) 2006-04-12
DE60210645D1 (de) 2006-05-24
WO2003002572A1 (fr) 2003-01-09
FR2826654B1 (fr) 2005-09-16
FR2826654A1 (fr) 2003-01-03
CN1260232C (zh) 2006-06-21

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20031226

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid