KR20030090784A - 플루오르화 케톤의 증기 반응기용 습식 세정제로서의 용도 - Google Patents

플루오르화 케톤의 증기 반응기용 습식 세정제로서의 용도 Download PDF

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Publication number
KR20030090784A
KR20030090784A KR10-2003-7013839A KR20037013839A KR20030090784A KR 20030090784 A KR20030090784 A KR 20030090784A KR 20037013839 A KR20037013839 A KR 20037013839A KR 20030090784 A KR20030090784 A KR 20030090784A
Authority
KR
South Korea
Prior art keywords
fluorinated ketone
fluorinated
reactor
ketone
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR10-2003-7013839A
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English (en)
Korean (ko)
Inventor
서스럿 케사리
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 컴파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쓰리엠 이노베이티브 프로퍼티즈 컴파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 컴파니
Publication of KR20030090784A publication Critical patent/KR20030090784A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D11/00—Special methods for preparing compositions containing mixtures of detergents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/04—Saturated compounds containing keto groups bound to acyclic carbon atoms
    • C07C49/175—Saturated compounds containing keto groups bound to acyclic carbon atoms containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/78—Separation; Purification; Stabilisation; Use of additives
    • C07C45/85—Separation; Purification; Stabilisation; Use of additives by treatment giving rise to a chemical modification
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/04—Saturated compounds containing keto groups bound to acyclic carbon atoms
    • C07C49/16—Saturated compounds containing keto groups bound to acyclic carbon atoms containing halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/04—Saturated compounds containing keto groups bound to acyclic carbon atoms
    • C07C49/16—Saturated compounds containing keto groups bound to acyclic carbon atoms containing halogen
    • C07C49/167—Saturated compounds containing keto groups bound to acyclic carbon atoms containing halogen containing only fluorine as halogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Detergent Compositions (AREA)
  • Chemical Vapour Deposition (AREA)
KR10-2003-7013839A 2001-04-24 2002-02-12 플루오르화 케톤의 증기 반응기용 습식 세정제로서의 용도 Withdrawn KR20030090784A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/841,340 US6394107B1 (en) 2001-04-24 2001-04-24 Use of fluorinated ketones as wet cleaning agents for vapor reactors and vapor reactor components
US09/841,340 2001-04-24
PCT/US2002/004087 WO2002086191A1 (en) 2001-04-24 2002-02-12 Use of fluorinated ketones as wet cleaning agents for vapor reactors

Publications (1)

Publication Number Publication Date
KR20030090784A true KR20030090784A (ko) 2003-11-28

Family

ID=25284615

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2003-7013839A Withdrawn KR20030090784A (ko) 2001-04-24 2002-02-12 플루오르화 케톤의 증기 반응기용 습식 세정제로서의 용도

Country Status (6)

Country Link
US (1) US6394107B1 (enExample)
EP (1) EP1381709A1 (enExample)
JP (1) JP4160403B2 (enExample)
KR (1) KR20030090784A (enExample)
CN (1) CN1505693A (enExample)
WO (1) WO2002086191A1 (enExample)

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US6540930B2 (en) * 2001-04-24 2003-04-01 3M Innovative Properties Company Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases
US6423673B1 (en) * 2001-09-07 2002-07-23 3M Innovation Properties Company Azeotrope-like compositions and their use
JP3958080B2 (ja) * 2002-03-18 2007-08-15 東京エレクトロン株式会社 プラズマ処理装置内の被洗浄部材の洗浄方法
US6923278B2 (en) * 2002-05-06 2005-08-02 Pride Mobility Products Corporation Adjustable anti-tip wheels for power wheelchair
US7250114B2 (en) * 2003-05-30 2007-07-31 Lam Research Corporation Methods of finishing quartz glass surfaces and components made by the methods
US20050011859A1 (en) * 2003-07-15 2005-01-20 Bing Ji Unsaturated oxygenated fluorocarbons for selective aniostropic etch applications
US20050161061A1 (en) * 2003-09-17 2005-07-28 Hong Shih Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system
US7252780B2 (en) * 2004-05-26 2007-08-07 E.I. Du Pont De Nemours And Company 1,1,1,2,2,4,5,5,5-nonafluoro-4-(trifluoromethyl)-3-pentanone refrigerant and heat transfer compositions comprising a fluoroether
US20100108094A1 (en) 2005-07-29 2010-05-06 Junichi Ishikawa Solvent Composition for Removing Radioactive Substance and Removing Material, and Method for Removing Radioactive Substance
US7385089B2 (en) * 2005-12-23 2008-06-10 3M Innovative Properties Company Fluorochemical ketone compounds and processes for their use
KR20080114757A (ko) * 2006-02-28 2008-12-31 이 아이 듀폰 디 네모아 앤드 캄파니 세정 분야를 위한 플루오르화 화합물을 포함하는 공비 조성물
US8791254B2 (en) * 2006-05-19 2014-07-29 3M Innovative Properties Company Cyclic hydrofluoroether compounds and processes for their preparation and use
JP4884180B2 (ja) * 2006-11-21 2012-02-29 東京エレクトロン株式会社 基板処理装置および基板処理方法
US8193397B2 (en) * 2006-12-06 2012-06-05 3M Innovative Properties Company Hydrofluoroether compounds and processes for their preparation and use
UA105668C2 (uk) * 2009-06-12 2014-06-10 Абб Текнолоджи Аг Діелектричне ізоляційне середовище
DE202009018213U1 (de) 2009-06-12 2011-06-09 Abb Technology Ag Dielektrisches Isolationsmedium
DE202009018239U1 (de) 2009-06-12 2011-06-01 Abb Technology Ag Schalteinrichtung mit dielektrischem Isolationsmedium
DE202009009305U1 (de) 2009-06-17 2009-11-05 Ormazabal Gmbh Schalteinrichtung für Mittel-, Hoch- oder Höchstspannung mit einem Füllmedium
WO2011029488A1 (en) 2009-09-11 2011-03-17 Abb Research Ltd Transformer comprising a heat pipe
BR112012008890A2 (pt) 2009-10-19 2018-05-08 Abb Technology Ag transformador
AR084275A1 (es) 2010-12-14 2013-05-02 Abb Technology Ag Medio aislante dielectrico
BR112013014849A2 (pt) 2010-12-14 2016-10-18 Abb Research Ltd "meio de isolamento dielétrico, uso de um monoéter fluorídrico, uso do meio de isolamento dielétrico e aparelho para a geração, distribuição e uso de energia elétrica".
CA2821158A1 (en) * 2010-12-16 2012-06-21 Abb Technology Ag Dielectric insulation medium
FR2975820B1 (fr) * 2011-05-24 2013-07-05 Schneider Electric Ind Sas Melange de decafluoro-2-methylbutan-3-one et d'un gaz vecteur comme milieu d'isolation electrique et/ou d'extinction des arcs electriques en moyenne tension
US8545639B2 (en) * 2011-10-31 2013-10-01 Lam Research Corporation Method of cleaning aluminum plasma chamber parts
RU2472767C1 (ru) * 2011-11-25 2013-01-20 Федеральное государственное унитарное предприятие "Российский научный центр "Прикладная химия" Способ получения перфторэтилизопропилкетона
CN103988382B (zh) 2011-12-13 2018-02-16 Abb 技术有限公司 转换器建筑物及运行或提供转换器建筑物的方法
RU2607897C1 (ru) * 2015-09-10 2017-01-11 Федеральное государственное унитарное предприятие "Российский научный центр "Прикладная химия" Способ получения перфторэтилизопропилкетона
US20170282220A1 (en) * 2016-04-01 2017-10-05 Tyco Fire & Security Gmbh Method and System for Liquid Cleaning of Smoke Sensor Heads
EP3689980A1 (en) * 2019-01-31 2020-08-05 3M Innovative Properties Company Fluoropolymer compositions

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3185734A (en) * 1960-10-25 1965-05-25 Du Pont Novel polyfluoro-substituted ketones and their preparation from polyfluoro acid fluorides
NL7711424A (nl) * 1976-10-23 1978-04-25 Hoechst Ag Werkwijze voor de bereiding van fluor bevattende ketonen.
EP0609200A1 (en) * 1988-12-02 1994-08-10 Minnesota Mining And Manufacturing Company Direct fluorination process for making perfluorinated organic substances
JP2763083B2 (ja) * 1993-06-01 1998-06-11 工業技術院長 フッ素系洗浄溶剤組成物
US5466877A (en) * 1994-03-15 1995-11-14 Minnesota Mining And Manufacturing Company Process for converting perfluorinated esters to perfluorinated acyl fluorides and/or ketones
JP2869432B2 (ja) * 1996-10-04 1999-03-10 工業技術院長 溶剤及びそれを用いる物品表面の清浄化方法
JP2952414B2 (ja) * 1997-09-22 1999-09-27 工業技術院長 溶剤及びそれを用いる物品表面の清浄化方法
US5998671A (en) * 1998-05-15 1999-12-07 Alliedsignal Inc. Fluorinated ketones and method for making same
EP1083219B1 (en) * 1998-05-26 2006-08-30 Tokyo Electron Limited Cleaning fluid and cleaning method for component of semiconductor-treating apparatus
JP3141325B2 (ja) * 1999-01-14 2001-03-05 工業技術院長 溶剤およびそれを用いる物品表面の清浄化方法
JP4322346B2 (ja) * 1999-02-26 2009-08-26 東京エレクトロン株式会社 成膜装置のクリーニング方法

Also Published As

Publication number Publication date
CN1505693A (zh) 2004-06-16
JP2005507954A (ja) 2005-03-24
EP1381709A1 (en) 2004-01-21
US6394107B1 (en) 2002-05-28
WO2002086191A1 (en) 2002-10-31
JP4160403B2 (ja) 2008-10-01

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20031023

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid