CN1505693A - 利用氟化酮作为蒸汽反应器的湿清洗剂 - Google Patents
利用氟化酮作为蒸汽反应器的湿清洗剂 Download PDFInfo
- Publication number
- CN1505693A CN1505693A CNA028087798A CN02808779A CN1505693A CN 1505693 A CN1505693 A CN 1505693A CN A028087798 A CNA028087798 A CN A028087798A CN 02808779 A CN02808779 A CN 02808779A CN 1505693 A CN1505693 A CN 1505693A
- Authority
- CN
- China
- Prior art keywords
- ketone
- fluorinated ketone
- hydrogen
- clean
- fluorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000002576 ketones Chemical class 0.000 title claims abstract description 58
- 239000012459 cleaning agent Substances 0.000 title abstract 2
- 238000000034 method Methods 0.000 claims abstract description 38
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 25
- 239000007788 liquid Substances 0.000 claims abstract description 19
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 25
- 239000011737 fluorine Substances 0.000 claims description 24
- 229910052739 hydrogen Inorganic materials 0.000 claims description 23
- 239000001257 hydrogen Substances 0.000 claims description 22
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 21
- -1 Chlorofluorocarbons Chemical compound 0.000 claims description 19
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 13
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 13
- 229910052799 carbon Inorganic materials 0.000 claims description 12
- 238000009835 boiling Methods 0.000 claims description 10
- 239000000460 chlorine Substances 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- PRPAGESBURMWTI-UHFFFAOYSA-N [C].[F] Chemical compound [C].[F] PRPAGESBURMWTI-UHFFFAOYSA-N 0.000 claims description 6
- JGZVUTYDEVUNMK-UHFFFAOYSA-N 5-carboxy-2',7'-dichlorofluorescein Chemical group C12=CC(Cl)=C(O)C=C2OC2=CC(O)=C(Cl)C=C2C21OC(=O)C1=CC(C(=O)O)=CC=C21 JGZVUTYDEVUNMK-UHFFFAOYSA-N 0.000 claims description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052794 bromium Inorganic materials 0.000 claims description 5
- 125000005842 heteroatom Chemical group 0.000 claims description 5
- GRVMOMUDALILLH-UHFFFAOYSA-N 1,1,1,2,4,5,5,5-octafluoro-2,4-bis(trifluoromethyl)pentan-3-one Chemical compound FC(F)(F)C(F)(C(F)(F)F)C(=O)C(F)(C(F)(F)F)C(F)(F)F GRVMOMUDALILLH-UHFFFAOYSA-N 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- ABEYIXWZRMBGCM-UHFFFAOYSA-N [C].[F].[Br] Chemical compound [C].[F].[Br] ABEYIXWZRMBGCM-UHFFFAOYSA-N 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- ABQIAHFCJGVSDJ-UHFFFAOYSA-N 1,1,1,3,4,4,4-heptafluoro-3-(trifluoromethyl)butan-2-one Chemical compound FC(F)(F)C(=O)C(F)(C(F)(F)F)C(F)(F)F ABQIAHFCJGVSDJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 2
- ATFJOPNBIKXOBU-UHFFFAOYSA-N [Br].[C] Chemical compound [Br].[C] ATFJOPNBIKXOBU-UHFFFAOYSA-N 0.000 claims description 2
- HXELGNKCCDGMMN-UHFFFAOYSA-N [F].[Cl] Chemical compound [F].[Cl] HXELGNKCCDGMMN-UHFFFAOYSA-N 0.000 claims description 2
- QBGQXQMDNWJPAU-UHFFFAOYSA-N [I].[C].[F] Chemical compound [I].[C].[F] QBGQXQMDNWJPAU-UHFFFAOYSA-N 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 1
- 239000005864 Sulphur Substances 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 229910052740 iodine Inorganic materials 0.000 claims 1
- 239000011630 iodine Substances 0.000 claims 1
- 238000004140 cleaning Methods 0.000 abstract description 11
- 238000010792 warming Methods 0.000 abstract description 7
- 150000001875 compounds Chemical class 0.000 description 17
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 16
- 239000000126 substance Substances 0.000 description 15
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- 239000007789 gas Substances 0.000 description 11
- 229920002313 fluoropolymer Polymers 0.000 description 10
- 239000004811 fluoropolymer Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- 238000005194 fractionation Methods 0.000 description 8
- 235000003270 potassium fluoride Nutrition 0.000 description 8
- 239000011698 potassium fluoride Substances 0.000 description 8
- 239000004215 Carbon black (E152) Substances 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical class FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 7
- 229930195733 hydrocarbon Natural products 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 150000001721 carbon Chemical group 0.000 description 6
- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 150000002430 hydrocarbons Chemical class 0.000 description 6
- 239000000376 reactant Substances 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 239000013638 trimer Substances 0.000 description 5
- RXGUIWHIADMCFC-UHFFFAOYSA-N 2-Methylpropyl 2-methylpropionate Chemical compound CC(C)COC(=O)C(C)C RXGUIWHIADMCFC-UHFFFAOYSA-N 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 230000018199 S phase Effects 0.000 description 4
- 235000011089 carbon dioxide Nutrition 0.000 description 4
- 238000004821 distillation Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 238000001819 mass spectrum Methods 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 230000001988 toxicity Effects 0.000 description 3
- 231100000419 toxicity Toxicity 0.000 description 3
- GXDHCNNESPLIKD-UHFFFAOYSA-N 2-methylhexane Chemical compound CCCCC(C)C GXDHCNNESPLIKD-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- ABDBNWQRPYOPDF-UHFFFAOYSA-N carbonofluoridic acid Chemical compound OC(F)=O ABDBNWQRPYOPDF-UHFFFAOYSA-N 0.000 description 2
- IYRWEQXVUNLMAY-UHFFFAOYSA-N carbonyl fluoride Chemical compound FC(F)=O IYRWEQXVUNLMAY-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- MEMJZBFXKCSMSF-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4-nonafluoro-4-methoxybutane Chemical compound COC(F)(F)C(F)(F)C(F)(F)C(F)(F)F.COC(F)(F)C(F)(F)C(F)(F)C(F)(F)F MEMJZBFXKCSMSF-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 208000033962 Fontaine progeroid syndrome Diseases 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-methylmorpholine Substances CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- ZCZSIDMEHXZRLG-UHFFFAOYSA-N acetic acid heptyl ester Natural products CCCCCCCOC(C)=O ZCZSIDMEHXZRLG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000007059 acute toxicity Effects 0.000 description 1
- 231100000403 acute toxicity Toxicity 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004177 carbon cycle Methods 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 238000005202 decontamination Methods 0.000 description 1
- 230000003588 decontaminative effect Effects 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 239000005431 greenhouse gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- JPXGPRBLTIYFQG-UHFFFAOYSA-N heptan-4-yl acetate Chemical compound CCCC(CCC)OC(C)=O JPXGPRBLTIYFQG-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000003380 propellant Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D11/00—Special methods for preparing compositions containing mixtures of detergents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/04—Saturated compounds containing keto groups bound to acyclic carbon atoms
- C07C49/175—Saturated compounds containing keto groups bound to acyclic carbon atoms containing ether groups, groups, groups, or groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/78—Separation; Purification; Stabilisation; Use of additives
- C07C45/85—Separation; Purification; Stabilisation; Use of additives by treatment giving rise to a chemical modification
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/04—Saturated compounds containing keto groups bound to acyclic carbon atoms
- C07C49/16—Saturated compounds containing keto groups bound to acyclic carbon atoms containing halogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/04—Saturated compounds containing keto groups bound to acyclic carbon atoms
- C07C49/16—Saturated compounds containing keto groups bound to acyclic carbon atoms containing halogen
- C07C49/167—Saturated compounds containing keto groups bound to acyclic carbon atoms containing halogen containing only fluorine as halogen
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Detergent Compositions (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/841,340 US6394107B1 (en) | 2001-04-24 | 2001-04-24 | Use of fluorinated ketones as wet cleaning agents for vapor reactors and vapor reactor components |
| US09/841,340 | 2001-04-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1505693A true CN1505693A (zh) | 2004-06-16 |
Family
ID=25284615
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA028087798A Pending CN1505693A (zh) | 2001-04-24 | 2002-02-12 | 利用氟化酮作为蒸汽反应器的湿清洗剂 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6394107B1 (enExample) |
| EP (1) | EP1381709A1 (enExample) |
| JP (1) | JP4160403B2 (enExample) |
| KR (1) | KR20030090784A (enExample) |
| CN (1) | CN1505693A (enExample) |
| WO (1) | WO2002086191A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103084353A (zh) * | 2011-10-31 | 2013-05-08 | 朗姆研究公司 | 铝质等离子体室部件的清洁方法 |
| CN103597565A (zh) * | 2011-05-24 | 2014-02-19 | 施耐德电器工业公司 | 十氟-2-甲基丁-3-酮和载气的混合物作为中电压中的电绝缘和/或灭弧介质 |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6540930B2 (en) * | 2001-04-24 | 2003-04-01 | 3M Innovative Properties Company | Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
| US6423673B1 (en) * | 2001-09-07 | 2002-07-23 | 3M Innovation Properties Company | Azeotrope-like compositions and their use |
| JP3958080B2 (ja) * | 2002-03-18 | 2007-08-15 | 東京エレクトロン株式会社 | プラズマ処理装置内の被洗浄部材の洗浄方法 |
| US6923278B2 (en) * | 2002-05-06 | 2005-08-02 | Pride Mobility Products Corporation | Adjustable anti-tip wheels for power wheelchair |
| US7250114B2 (en) * | 2003-05-30 | 2007-07-31 | Lam Research Corporation | Methods of finishing quartz glass surfaces and components made by the methods |
| US20050011859A1 (en) * | 2003-07-15 | 2005-01-20 | Bing Ji | Unsaturated oxygenated fluorocarbons for selective aniostropic etch applications |
| US20050161061A1 (en) * | 2003-09-17 | 2005-07-28 | Hong Shih | Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system |
| US7252780B2 (en) * | 2004-05-26 | 2007-08-07 | E.I. Du Pont De Nemours And Company | 1,1,1,2,2,4,5,5,5-nonafluoro-4-(trifluoromethyl)-3-pentanone refrigerant and heat transfer compositions comprising a fluoroether |
| US20100108094A1 (en) | 2005-07-29 | 2010-05-06 | Junichi Ishikawa | Solvent Composition for Removing Radioactive Substance and Removing Material, and Method for Removing Radioactive Substance |
| US7385089B2 (en) * | 2005-12-23 | 2008-06-10 | 3M Innovative Properties Company | Fluorochemical ketone compounds and processes for their use |
| KR20080114757A (ko) * | 2006-02-28 | 2008-12-31 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 세정 분야를 위한 플루오르화 화합물을 포함하는 공비 조성물 |
| US8791254B2 (en) * | 2006-05-19 | 2014-07-29 | 3M Innovative Properties Company | Cyclic hydrofluoroether compounds and processes for their preparation and use |
| JP4884180B2 (ja) * | 2006-11-21 | 2012-02-29 | 東京エレクトロン株式会社 | 基板処理装置および基板処理方法 |
| US8193397B2 (en) * | 2006-12-06 | 2012-06-05 | 3M Innovative Properties Company | Hydrofluoroether compounds and processes for their preparation and use |
| UA105668C2 (uk) * | 2009-06-12 | 2014-06-10 | Абб Текнолоджи Аг | Діелектричне ізоляційне середовище |
| DE202009018213U1 (de) | 2009-06-12 | 2011-06-09 | Abb Technology Ag | Dielektrisches Isolationsmedium |
| DE202009018239U1 (de) | 2009-06-12 | 2011-06-01 | Abb Technology Ag | Schalteinrichtung mit dielektrischem Isolationsmedium |
| DE202009009305U1 (de) | 2009-06-17 | 2009-11-05 | Ormazabal Gmbh | Schalteinrichtung für Mittel-, Hoch- oder Höchstspannung mit einem Füllmedium |
| WO2011029488A1 (en) | 2009-09-11 | 2011-03-17 | Abb Research Ltd | Transformer comprising a heat pipe |
| BR112012008890A2 (pt) | 2009-10-19 | 2018-05-08 | Abb Technology Ag | transformador |
| AR084275A1 (es) | 2010-12-14 | 2013-05-02 | Abb Technology Ag | Medio aislante dielectrico |
| BR112013014849A2 (pt) | 2010-12-14 | 2016-10-18 | Abb Research Ltd | "meio de isolamento dielétrico, uso de um monoéter fluorídrico, uso do meio de isolamento dielétrico e aparelho para a geração, distribuição e uso de energia elétrica". |
| CA2821158A1 (en) * | 2010-12-16 | 2012-06-21 | Abb Technology Ag | Dielectric insulation medium |
| RU2472767C1 (ru) * | 2011-11-25 | 2013-01-20 | Федеральное государственное унитарное предприятие "Российский научный центр "Прикладная химия" | Способ получения перфторэтилизопропилкетона |
| CN103988382B (zh) | 2011-12-13 | 2018-02-16 | Abb 技术有限公司 | 转换器建筑物及运行或提供转换器建筑物的方法 |
| RU2607897C1 (ru) * | 2015-09-10 | 2017-01-11 | Федеральное государственное унитарное предприятие "Российский научный центр "Прикладная химия" | Способ получения перфторэтилизопропилкетона |
| US20170282220A1 (en) * | 2016-04-01 | 2017-10-05 | Tyco Fire & Security Gmbh | Method and System for Liquid Cleaning of Smoke Sensor Heads |
| EP3689980A1 (en) * | 2019-01-31 | 2020-08-05 | 3M Innovative Properties Company | Fluoropolymer compositions |
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| US3185734A (en) * | 1960-10-25 | 1965-05-25 | Du Pont | Novel polyfluoro-substituted ketones and their preparation from polyfluoro acid fluorides |
| NL7711424A (nl) * | 1976-10-23 | 1978-04-25 | Hoechst Ag | Werkwijze voor de bereiding van fluor bevattende ketonen. |
| EP0609200A1 (en) * | 1988-12-02 | 1994-08-10 | Minnesota Mining And Manufacturing Company | Direct fluorination process for making perfluorinated organic substances |
| JP2763083B2 (ja) * | 1993-06-01 | 1998-06-11 | 工業技術院長 | フッ素系洗浄溶剤組成物 |
| US5466877A (en) * | 1994-03-15 | 1995-11-14 | Minnesota Mining And Manufacturing Company | Process for converting perfluorinated esters to perfluorinated acyl fluorides and/or ketones |
| JP2869432B2 (ja) * | 1996-10-04 | 1999-03-10 | 工業技術院長 | 溶剤及びそれを用いる物品表面の清浄化方法 |
| JP2952414B2 (ja) * | 1997-09-22 | 1999-09-27 | 工業技術院長 | 溶剤及びそれを用いる物品表面の清浄化方法 |
| US5998671A (en) * | 1998-05-15 | 1999-12-07 | Alliedsignal Inc. | Fluorinated ketones and method for making same |
| EP1083219B1 (en) * | 1998-05-26 | 2006-08-30 | Tokyo Electron Limited | Cleaning fluid and cleaning method for component of semiconductor-treating apparatus |
| JP3141325B2 (ja) * | 1999-01-14 | 2001-03-05 | 工業技術院長 | 溶剤およびそれを用いる物品表面の清浄化方法 |
| JP4322346B2 (ja) * | 1999-02-26 | 2009-08-26 | 東京エレクトロン株式会社 | 成膜装置のクリーニング方法 |
-
2001
- 2001-04-24 US US09/841,340 patent/US6394107B1/en not_active Expired - Fee Related
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2002
- 2002-02-12 EP EP02764134A patent/EP1381709A1/en not_active Withdrawn
- 2002-02-12 KR KR10-2003-7013839A patent/KR20030090784A/ko not_active Withdrawn
- 2002-02-12 JP JP2002583701A patent/JP4160403B2/ja not_active Expired - Fee Related
- 2002-02-12 WO PCT/US2002/004087 patent/WO2002086191A1/en not_active Ceased
- 2002-02-12 CN CNA028087798A patent/CN1505693A/zh active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103597565A (zh) * | 2011-05-24 | 2014-02-19 | 施耐德电器工业公司 | 十氟-2-甲基丁-3-酮和载气的混合物作为中电压中的电绝缘和/或灭弧介质 |
| CN103597565B (zh) * | 2011-05-24 | 2017-01-18 | 施耐德电器工业公司 | 十氟‑2‑甲基丁‑3‑酮和载气的混合物作为中电压中的电绝缘和/或灭弧介质 |
| CN103084353A (zh) * | 2011-10-31 | 2013-05-08 | 朗姆研究公司 | 铝质等离子体室部件的清洁方法 |
| CN103084353B (zh) * | 2011-10-31 | 2016-06-08 | 朗姆研究公司 | 铝质等离子体室部件的清洁方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20030090784A (ko) | 2003-11-28 |
| JP2005507954A (ja) | 2005-03-24 |
| EP1381709A1 (en) | 2004-01-21 |
| US6394107B1 (en) | 2002-05-28 |
| WO2002086191A1 (en) | 2002-10-31 |
| JP4160403B2 (ja) | 2008-10-01 |
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