KR20030058235A - 액정표시소자의 제조방법 - Google Patents
액정표시소자의 제조방법 Download PDFInfo
- Publication number
- KR20030058235A KR20030058235A KR1020010088631A KR20010088631A KR20030058235A KR 20030058235 A KR20030058235 A KR 20030058235A KR 1020010088631 A KR1020010088631 A KR 1020010088631A KR 20010088631 A KR20010088631 A KR 20010088631A KR 20030058235 A KR20030058235 A KR 20030058235A
- Authority
- KR
- South Korea
- Prior art keywords
- mask
- substrate
- liquid crystal
- photoresist
- pattern
- Prior art date
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/13625—Patterning using multi-mask exposure
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims (6)
- 어레이부와 어레이 외곽부로 구분되어 상기 어레이부에 수직 교차하는 게이트 배선 및 데이터 배선과, 상기 두 배선 사이에 박막트랜지스터가 구비된 액정표시소자의 제조방법에 있어서,기판 상에 필름 및 포토레지스트를 차례로 형성하는 단계;마스크의 얼라인 키와 기판 내부의 패턴과 비교하여 마스크를 정렬하는 단계;상기 마스크를 통해 하부의 포토레지스트를 노광하는 단계;상기 포토레지스트를 패터닝하는 단계;상기 패터닝된 포토레지스트를 마스크로 하여 상기 필름을 식각하는 단계를 포함하여 이루어지는 것을 특징으로 하는 액정표시소자의 제조방법.
- 제 1 항에 있어서, 상기 기판 내부의 패턴은 상기 게이트 배선 끝단부 또는 데이터 배선 끝단부에 형성된 더미 패턴인 것을 특징으로 하는 액정표시소자의 제조방법.
- 제 2 항에 있어서, 상기 더미 패턴은 상기 게이트 배선 또는 데이터 배선과 동시에 형성하는 것을 특징으로 하는 액정표시소자의 제조방법.
- 제 2 항에 있어서, 상기 더미 패턴 사이에 얼라인 키를 더 형성하는 것을 특징으로 하는 액정표시소자의 제조방법.
- 제 4 항에 있어서, 상기 얼라인 키는 상기 게이트 배선과 동시에 형성하는 것을 특징으로 하는 액정표시소자의 제조방법.
- 제 1 항에 있어서, 상기 기판 내부의 패턴은 수직 교차하는 게이트 배선 및 데이터 배선인 것을 특징으로 하는 액정표시소자의 제조방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020010088631A KR100815907B1 (ko) | 2001-12-29 | 2001-12-29 | 액정표시소자의 제조방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020010088631A KR100815907B1 (ko) | 2001-12-29 | 2001-12-29 | 액정표시소자의 제조방법 |
Publications (2)
Publication Number | Publication Date |
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KR20030058235A true KR20030058235A (ko) | 2003-07-07 |
KR100815907B1 KR100815907B1 (ko) | 2008-03-21 |
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KR1020010088631A KR100815907B1 (ko) | 2001-12-29 | 2001-12-29 | 액정표시소자의 제조방법 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101055198B1 (ko) * | 2004-06-30 | 2011-08-08 | 엘지디스플레이 주식회사 | 게이트 마스크 및 이를 이용한 조개 얼룩 감지 방법 |
KR101107677B1 (ko) * | 2004-12-02 | 2012-01-25 | 엘지디스플레이 주식회사 | 액정표시소자의 제조방법 |
KR101308751B1 (ko) * | 2006-12-29 | 2013-09-12 | 엘지디스플레이 주식회사 | 액정표시소자의 오버레이키 및 이를 형성하는 방법 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3284432B2 (ja) * | 1994-11-16 | 2002-05-20 | セイコーエプソン株式会社 | 液晶装置及びその製造方法 |
JPH09197434A (ja) * | 1996-01-16 | 1997-07-31 | Toshiba Corp | 表示装置の製造方法 |
JP2988393B2 (ja) * | 1996-08-29 | 1999-12-13 | 日本電気株式会社 | 露光方法 |
JP3090113B2 (ja) * | 1998-02-13 | 2000-09-18 | 日本電気株式会社 | 半導体装置の製造方法 |
JP2000356858A (ja) * | 1999-06-15 | 2000-12-26 | Display Technologies Inc | 表示装置用アレイ基板及びその製造方法 |
-
2001
- 2001-12-29 KR KR1020010088631A patent/KR100815907B1/ko active IP Right Grant
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101055198B1 (ko) * | 2004-06-30 | 2011-08-08 | 엘지디스플레이 주식회사 | 게이트 마스크 및 이를 이용한 조개 얼룩 감지 방법 |
KR101107677B1 (ko) * | 2004-12-02 | 2012-01-25 | 엘지디스플레이 주식회사 | 액정표시소자의 제조방법 |
KR101308751B1 (ko) * | 2006-12-29 | 2013-09-12 | 엘지디스플레이 주식회사 | 액정표시소자의 오버레이키 및 이를 형성하는 방법 |
Also Published As
Publication number | Publication date |
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KR100815907B1 (ko) | 2008-03-21 |
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