KR20020063576A - 탁도계 어레이 시스템 - Google Patents

탁도계 어레이 시스템 Download PDF

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Publication number
KR20020063576A
KR20020063576A KR1020027006296A KR20027006296A KR20020063576A KR 20020063576 A KR20020063576 A KR 20020063576A KR 1020027006296 A KR1020027006296 A KR 1020027006296A KR 20027006296 A KR20027006296 A KR 20027006296A KR 20020063576 A KR20020063576 A KR 20020063576A
Authority
KR
South Korea
Prior art keywords
light
light source
array system
sample
optical fiber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020027006296A
Other languages
English (en)
Korean (ko)
Inventor
배네지아심케이.
Original Assignee
하크 컴퍼니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 하크 컴퍼니 filed Critical 하크 컴퍼니
Publication of KR20020063576A publication Critical patent/KR20020063576A/ko
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/251Colorimeters; Construction thereof
    • G01N21/253Colorimeters; Construction thereof for batch operation, i.e. multisample apparatus
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/063Illuminating optical parts
    • G01N2201/0636Reflectors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Optical Measuring Cells (AREA)
KR1020027006296A 1999-11-19 2000-11-13 탁도계 어레이 시스템 Ceased KR20020063576A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/444,061 1999-11-19
US09/444,061 US6307630B1 (en) 1999-11-19 1999-11-19 Turbidimeter array system
PCT/US2000/031153 WO2001036940A2 (en) 1999-11-19 2000-11-13 Turbidimeter array system

Publications (1)

Publication Number Publication Date
KR20020063576A true KR20020063576A (ko) 2002-08-03

Family

ID=23763327

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020027006296A Ceased KR20020063576A (ko) 1999-11-19 2000-11-13 탁도계 어레이 시스템

Country Status (7)

Country Link
US (2) US6307630B1 (enExample)
EP (1) EP1230534A2 (enExample)
JP (1) JP2003515124A (enExample)
KR (1) KR20020063576A (enExample)
AU (1) AU772363B2 (enExample)
CA (1) CA2391979C (enExample)
WO (1) WO2001036940A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100903133B1 (ko) * 2007-12-17 2009-06-16 한국전자통신연구원 광공동을 이용한 고감도 혼탁도 센서 및 센싱 방법

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US7530877B1 (en) 1999-06-03 2009-05-12 Micron Technology, Inc. Semiconductor processor systems, a system configured to provide a semiconductor workpiece process fluid
US7180591B1 (en) * 1999-06-03 2007-02-20 Micron Technology, Inc Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods
US6290576B1 (en) 1999-06-03 2001-09-18 Micron Technology, Inc. Semiconductor processors, sensors, and semiconductor processing systems
US6894778B2 (en) * 2002-04-23 2005-05-17 Hach Company Low detection limit turbidimeter
DE10225842A1 (de) * 2002-06-04 2003-12-24 Zeiss Carl Smt Ag Verfahren und Vorrichtung zur Bestimmung der Strahlungsbeständigkeit eines optischen Materials
CA2391641A1 (fr) * 2002-06-28 2003-12-28 Robert Longin Plateforme robotisee de cultures cellulaires en batteries de reacteurs miniaturises, equipee d'un systeme de mesure en temps reel de la turbidite cellulaire ou toutes autres proprietes optiques
AU2003264805A1 (en) * 2002-10-18 2004-05-04 Brian David Bissett Automated kinetci solubility assay apparatus and method
US20040083798A1 (en) * 2002-11-05 2004-05-06 Sadar Michael J. Detection of filter breakthrough
US7099012B1 (en) * 2003-03-13 2006-08-29 Turner Designs, Inc. In-line spectrometer
US20060055927A1 (en) * 2004-09-16 2006-03-16 Rosemount Analytical Inc. Turbidity sensor
US20060061765A1 (en) * 2004-09-16 2006-03-23 Behzad Rezvani Turbidity sensor with improved noise rejection
US7470917B1 (en) 2004-12-15 2008-12-30 Turner Designs, Inc. Submersible apparatus for measuring active fluorescence
US7301158B1 (en) 2004-12-15 2007-11-27 Turner Designs, Inc. Method and apparatus for measuring active fluorescence
US8703492B2 (en) 2007-04-06 2014-04-22 Qiagen Gaithersburg, Inc. Open platform hybrid manual-automated sample processing system
US8355132B2 (en) * 2007-04-06 2013-01-15 Qiagen Gaithersburg, Inc. Sample adequacy measurement system having a plurality of sample tubes and using turbidity light scattering techniques
US8877507B2 (en) 2007-04-06 2014-11-04 Qiagen Gaithersburg, Inc. Ensuring sample adequacy using turbidity light scattering techniques
CN101809430A (zh) 2007-09-12 2010-08-18 哈赫公司 标准介质悬浮体、光学颗粒测量仪器、以及用于光学颗粒测量仪器的检定方法
JP5152803B2 (ja) * 2008-09-24 2013-02-27 倉敷紡績株式会社 液体濃度計
US7659980B1 (en) 2008-11-24 2010-02-09 Herbert Leckie Mitchell Nephelometric turbidity sensor device
US20100220315A1 (en) * 2009-02-27 2010-09-02 Beckman Coulter, Inc. Stabilized Optical System for Flow Cytometry
AU2010237532B2 (en) * 2009-04-15 2014-11-20 Biocartis Nv Optical detection system for monitoring rtPCR reaction
RU2442973C2 (ru) * 2009-10-02 2012-02-20 Закрытое акционерное общество "ИММУНОСКРИН" (ЗАО "ИММУНОСКРИН") Иммунотурбидиметрический планшетный анализатор
JP4948624B2 (ja) * 2010-05-06 2012-06-06 シャープ株式会社 濁度検知器
KR101832074B1 (ko) * 2013-09-30 2018-02-23 하흐 랑에 게엠베하 네펠로메트릭 탁도계 및 네펠로메트릭 탁도계의 시료 큐벳의 오염을 탐지하기 위한 방법
US20160370287A1 (en) * 2015-06-17 2016-12-22 Flodesign Sonics, Inc. Turbidity sensor with improved flow path

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FR2323991A1 (fr) * 1975-09-11 1977-04-08 Inst Nat Sante Rech Med Perfectionnements aux appareils de mesure d'absorption du rayonnement notamment les photometres
JPS5389484A (en) * 1977-01-18 1978-08-07 Toshiba Electric Equip Photo detector
JPS5960323A (ja) * 1982-09-30 1984-04-06 Toshiba Corp 測光装置
JPS5970946A (ja) * 1982-10-15 1984-04-21 Toshiba Corp 吸光度測定装置
US4509856A (en) * 1982-11-16 1985-04-09 The United States Of America As Represented By The United States Department Of Energy Rotor for centrifugal fast analyzers
JPS59178337A (ja) * 1983-03-29 1984-10-09 Toshiba Corp 自動化学分析装置
FR2558610B1 (fr) * 1984-01-23 1986-05-09 Labo Electronique Physique Procede et appareillage pour determiner l'instant d'arret d'un processus de renouvellement de liquide
US4762413A (en) * 1984-09-07 1988-08-09 Olympus Optical Co., Ltd. Method and apparatus for measuring immunological reaction with the aid of fluctuation in intensity of scattered light
US4888484A (en) * 1986-02-20 1989-12-19 Automatik Machinery Corporation Apparatus and method for spectrophotometric analysis of a material in a moving process stream
JPH02259451A (ja) * 1989-03-30 1990-10-22 Shimadzu Corp 濁度計
JPH063266A (ja) * 1992-06-24 1994-01-11 Seki Electron Kk オゾン濃度測定方法および2光路セルを用いた光吸収式オゾン濃度計
US5506679A (en) * 1994-09-08 1996-04-09 Hach Company Nephelometer instrument
JPH0915144A (ja) * 1995-07-03 1997-01-17 Toa Denpa Kogyo Kk 吸光光度計およびこの吸光光度計の温度補償方法
JPH10325797A (ja) * 1997-05-26 1998-12-08 Dainippon Screen Mfg Co Ltd 流体濃度測定装置
JPH11118715A (ja) * 1997-10-20 1999-04-30 Suido Kiko Kaisha Ltd 水質計および水質測定方法
US6111636A (en) * 1998-04-17 2000-08-29 Labsystems Oy Device for measuring optical density
ATE271422T1 (de) * 1998-05-01 2004-08-15 Hoffmann La Roche Vorrichtung zur gleichzeitigen überwachung von reaktionen, die in einer vielzahl von reaktionsgefässen stattfinden
US5912737A (en) * 1998-06-01 1999-06-15 Hach Company System for verifying the calibration of a turbidimeter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100903133B1 (ko) * 2007-12-17 2009-06-16 한국전자통신연구원 광공동을 이용한 고감도 혼탁도 센서 및 센싱 방법

Also Published As

Publication number Publication date
JP2003515124A (ja) 2003-04-22
EP1230534A2 (en) 2002-08-14
CA2391979A1 (en) 2001-05-25
AU772363B2 (en) 2004-04-22
US20010046051A1 (en) 2001-11-29
AU1603901A (en) 2001-05-30
WO2001036940A3 (en) 2002-01-10
US6307630B1 (en) 2001-10-23
WO2001036940A2 (en) 2001-05-25
CA2391979C (en) 2006-12-19

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