KR20020059040A - Apparatus to prevent bending of large size substrate board - Google Patents

Abstract

PURPOSE: A droop prevention apparatus for large substrate is provided to achieve an improved quality of product and yield by forming each pattern in an accurate manner through the uniform exposure of the substrate. CONSTITUTION: A droop prevention apparatus comprises a substrate mounting chamber(100) having an upper base surface where a substrate(1) is mounted, a sealed section(101) formed within the substrate mounting chamber, and a vacuum adsorption path(110) formed at the top of a side wall of the chamber so as to adsorb the substrate; a pressure supply unit(120) for supplying pressure to the sealed section of the substrate mounting chamber; and a droop volume measuring unit(200) for measuring the volume of droop of the substrate. The droop prevention apparatus supports the substrate in a flat state where the substrate is prevented from being bent.

Description

Deflection prevention device for large substrates {APPARATUS TO PREVENT BENDING OF LARGE SIZE SUBSTRATE BOARD}

The present invention relates to an apparatus for preventing sagging of a large substrate for flatly supporting the substrate in various manufacturing and processing processes for a large substrate, for example, an exposure process. The present invention relates to a large-sized substrate deflection prevention device capable of accurately forming each pattern by exposing the substrate uniformly over the entire surface by supporting and exposing it in a form in which warping is prevented.

In general, when exposing large substrates such as large LCDs, PDPs, and PCBs, the process of exposing a portion of a substrate on a substrate having a plurality of identical patterns, moving to the next substrate, and exposing again, a so-called step / repeat method (step) and repeat type) work, and it is preferable that such substrates be subjected to exposure work in a non-contact manner. However, when only the peripheral free space 1a of the substrate 1 as shown in FIG. 9 is supported for non-contact exposure, the thickness of the substrate 1 is generally 0.5 to 1.2 mm (30 inches) for LCDs. ), And the PDP should not be thicker than 5mm (up to 60 to 80 inches in commercialization or development), resulting in warpage at the center of the substrate 1, and if exposed in this state, Accurate pattern formation becomes difficult.

In order to solve this problem, each time exposure is performed by contact or exposure of a part, exposure is performed by correcting the amount of deflection calculated or measured by using a support device at the bottom. All of the exposure by contact has a high probability of product defects in the contact portion, and such product defects have become a factor such as generation of defective pixels in the LCD.

As shown in FIG. 7, when there is a free space 1b between the pattern of the substrate 1 and the pattern, deflection may be corrected by partial contact using the space, but in this case, the size of one pattern is large. The deflection of the central part becomes a problem, and the position of the substrate 1 needs to be changed every time the size of the substrate 1 changes, so that the equipment becomes complicated and takes a lot of work time and is expensive.

The present invention has been made in order to solve such a problem and defects in the prior art, in the form of preventing bending by spreading the substrate horizontally flat on the substrate fixing chamber while supporting the large substrate in the manufacturing and processing process for the large substrate. It is to provide a large-sized substrate deflection prevention device that can form the respective patterns accurately by, for example, exposing the entire surface uniformly in the exposure step by supporting and performing the process.

In order to achieve the above object, an embodiment of the present invention comprises a substrate fixing chamber having a support base on which a substrate is provided, and a substrate for vacuum adsorption on a base surface on which the substrate on the substrate fixing chamber is placed. Adsorption holes and adsorption paths are formed, and inside the hermetic chamber, a pressure supply means capable of maintaining and varying the pressure in the hermetic chamber is provided to compensate for the deflection of the substrate.

In addition, when the substrate is placed on the base surface of the upper part of the substrate fixing chamber by a conveying means such as a vacuum pad, the amount of deflection is obtained by measuring the amount of deflection of the substrate, and the pressure variable device is used to adjust the pressure in the hermetic chamber. By adjusting the adsorption force of the formed upper vacuum adsorption furnace, the substrate is fixed to the base surface of the substrate fixing chamber by the vacuum adsorption force and then exposed.

In another embodiment of the present invention, when the substrate is thin and large in size, the inside of the hermetic chamber is provided with a substrate pulling means for holding the substrate and applying a force in the horizontal direction to the outer side of the base surface on which the substrate is placed within a range that does not damage the substrate. The substrate pulling means is configured to hold the substrate and to apply the horizontal force in the horizontal direction with an appropriate force to hold the substrate flat and to expose the substrate while controlling the pressure of the substrate.

1 to 3 show an embodiment of a sag prevention device of a large substrate according to the present invention,

1 is a schematic plan view.

2 is a schematic longitudinal sectional view;

3 is a plan view showing the deflection amount measuring device together.

4 to 8 show another embodiment of the sag prevention device of a large substrate according to the present invention,

4 is a schematic plan view.

5 is a schematic longitudinal sectional view.

Fig. 6 is a partially cutaway side view showing the substrate pulling means.

7 is a perspective view of the substrate pulling means;

8 is an explanatory view of the action of the substrate pulling means;

9 is a plan view showing the configuration of a substrate.

<Description of the reference numerals for the main parts of the drawings>

1: substrate 100: substrate fixing chamber

101: hermetic chamber 110: vacuum adsorption furnace

120: pressure supply means 121: supply pipe

130: distance detection sensor 200: deflection measuring device

300: substrate pulling means 310: support block

311 adsorption furnace 312 adsorption holes

313: suction pad 320: support block operating means

321 cylinder 322 plunger

323: connecting rod 324: hinge portion

325: connecting member 326: hinge portion

331: guide groove 332: cam

333: Campin

In order to achieve the above object, the large-sized substrate deflection prevention device according to the present invention has a substrate mounted on an upper base surface and an airtight chamber is formed therein, and a vacuum suction path for adsorbing the substrate is formed at the upper end of the main wall. And a chamber, a pressure supply means for supplying pressure to the hermetic chamber of the substrate fixing chamber, and a deflection amount measuring device for measuring the amount of deflection of the substrate, so as to support the substrate in a flat form that prevents warpage.

In addition, the pressure supply means is coupled to the supply pipe to one side of the main wall of the substrate fixing chamber, the supply pipe is configured to connect to the pressing means provided to maintain and vary the pressure in the hermetic chamber.

And, the upper side of the substrate fixing chamber may be provided with a substrate pulling means for supporting the upper side of the substrate fixing chamber while absorbing and expanding the four sides of the substrate.

The substrate pulling means is formed so that a plurality of vacuum adsorption holes and adsorption passages communicate with each other to adsorb the four sides of the substrate. A support block that is installed to be mounted on the edge, and a support block that moves the support block from the initial position to the forward position, puts it on the four sides of the substrate, and supports the support block to absorb the four sides of the substrate and pull it to the reverse position. Means.

Hereinafter, the case in which the present invention is applied to an exposure process will be described in detail with reference to the accompanying drawings.

1 to 3 show a deflection preventing device of a large substrate according to an embodiment of the present invention, a schematic plan view is shown in FIG. 1, a schematic longitudinal cross-sectional view is shown in FIG. 2, and FIG. The top view shown is shown.

In the figure, 1 is a substrate for exposure, 2 is a substrate on the substrate 1 and the photo mask (3) shows an attachment frame on the lower surface, the upper side of the substrate fixing chamber 100, the airtight chamber 101 is formed The lifting amount is fixed and the deflection amount measuring device 200 for measuring the deflection amount of the substrate 1 is provided.

The substrate fixing chamber 100 has a seating groove 102 formed stepwise so that the substrate 1 is stably placed at the upper end of the main wall, and a vacuum adsorption path 110 is formed at the upper end of the main wall so that the vacuum adsorption path 110 is formed. The substrate 1 mounted on the upper end of the circumferential wall by the exhaust of the air in the airtight chamber 101 through the () is configured to be stably fixed by the vacuum pressure, the pressure supply means 120 to the substrate fixing chamber 100 It is provided so that the said board | substrate 1 may be fixed in the form unfolded flat by the pressure of the airtight chamber 101 by supplying pressure to the airtight chamber 101.

And, the pressure supply means 120 is coupled to the supply pipe 121 to one side of the circumferential wall of the substrate fixing chamber 100 to maintain the pressure in the airtight chamber 101 and to change the pressure means (not shown) The pressurized pressure gas is supplied.

One type of the deflection measuring device 200 is configured to combine a plurality of distance detection sensor 130 for measuring the deflection amount by detecting a distance to the substrate 1 inside the substrate fixing chamber 100. .

According to another embodiment of the deflection measuring device 200, the measurement system 210 is moved in the width direction (Y direction) by driving the width direction driving guide 221 by the rotation of the first driving motor 220. The longitudinal driving guide 231 is driven by the rotation of the driving motor 230 so that the widthwise driving guide 221 and the measuring system 210 are configured to move in the longitudinal direction (X direction), thereby measuring the measuring system 210. Is free to move in the X and Y directions within a constant measurement area.

For example, the measurement system 210 uses a known Michelson Stellar Interferometry, and a light source, a half mirror, a reflector, a camera, etc. necessary for the construction of the interferometer are built in to measure sag. According to the size of the substrate 1 or the number of patterns in the substrate 1, the position at which the deflection should be measured is determined and moved to the X and Y sides by driving the first and second driving motors 220 and 230. Will be measured.

A conventional ball screw or the like is used for the widthwise driving guide 221 and the longitudinal driving guide 231.

Referring to the operation of the deflection prevention device of a large substrate according to the present invention as described above are as follows.

When the substrate 1 is moved to the upper part of the substrate fixing chamber 100 by the usual transfer means for the exposure process and placed on the seating groove 102 formed in the upper end of the main wall of the substrate fixing chamber 100, The periphery of the substrate 1 is adsorbed by the vacuum formed in the vacuum adsorption path 110 formed above the circumferential wall of the chamber 100 to fix the substrate 1. Then, when the pressure gas is injected into the hermetic chamber 101 of the substrate fixing chamber 100 by the supply pipe 121 of the pressure supply means 120, the bending of the substrate 1 is prevented by the expansion pressure of the pressure gas. It is supported in a very flat form, and the above operation is performed by measuring the deflection amount of the substrate 1 by the distance detection sensor 130 or the measurement system 210 of the deflection measurement device 200 and by this measurement amount in the airtight chamber 101. In addition to adjusting the pressure while adjusting the adsorption force of the vacuum adsorption path (110).

In this way, after the substrate 1 is fixed in a flat shape that prevents warpage, exposure is performed so that the respective patterns can be accurately formed by exposing the substrate 1 evenly over the entire surface.

4 to 8 show another embodiment of the apparatus for preventing sag of a large substrate according to the present invention. FIG. 4 is a schematic plan view, FIG. 5 is a schematic longitudinal cross-sectional view, respectively, and FIG. 6 shows a substrate pulling means. 7 is a perspective view of the substrate pulling means, respectively, and FIG. 8 is an explanatory view of the operation of the substrate pulling means.

In another embodiment of the large-sized substrate deflection prevention device shown in Figures 4 to 8, the substrate fixing chamber 100 while absorbing and expanding the four sides of the substrate 1 on the upper side of the substrate fixing chamber 100. The substrate pulling means 300 for supporting the upper portion of the main wall is provided.

The substrate pulling means 300 is formed in communication with a plurality of vacuum adsorption holes 312 and the adsorption passage 311 so as to adsorb the four sides of the substrate 1, the lower surface of each of the adsorption holes 312 Adsorption pad 313 is coupled to each other, and the support block 310 is installed to be mounted on the four sides of the upper base of the substrate fixing chamber 100 and the support block 310 to move from the initial position to the forward position The support block 310 is composed of support block operation means 320 which is operated so that the support block 310 is attracted to the four sides of the substrate 1 and is pulled out to the backward position after absorbing the four sides of the substrate 1.

The support block operating means 320 is a cylinder 321 is fixed to the upper base surface of the substrate fixing chamber 100, one end of the connecting rod 323 to the plunger 322 of the cylinder 321 hinge 324 ) Is rotatably coupled, and the other end of the connecting rod 323 is rotatably coupled to the hinge 326 to the connecting member 325 fixed to the support block 310.

In addition, a cam 332 is inserted into the guide groove 331 formed in the upper portion of the substrate fixing chamber 100, and a cam pin 333 in contact with the cam 332 is moved at both ends of the support block 310. It is fixed.

Referring to the operation of the deflection prevention device of a large substrate according to another embodiment of the present invention as described above are as follows.

When the substrate 1 is moved to the upper portion of the substrate fixing chamber 100 by the usual transfer means for the exposure process is inserted into the mounting groove 102 formed in the upper end of the main wall of the substrate fixing chamber 100 for fixing the substrate The periphery of the substrate 1 is adsorbed by the vacuum formed in the vacuum adsorption path 110 formed above the circumferential wall of the chamber 100 to temporarily fix the substrate 1.

Subsequently, when the cylinder 321 of the substrate pulling means 300 installed to be located on all sides of the substrate 1 is operated to push the support block 310 at an initial position as shown in FIG. Cam pins 333 fixed to both ends of the) is moved by the cam 332, so that the support block 310 is advanced without being interfered with the upper end of the substrate fixing chamber 100, Figure 8 (b) Contact with the substrate (1).

Subsequently, the suction chamber 311 of the support block 310 and the vacuum suction hole 312 are sucked on the four sides of the substrate 1 by the vacuum formed by the vacuum suction path of the substrate fixing chamber 100 ( When the exhaust of the 110 is stopped, the four sides of the substrate 1 are fixed only by the respective supporting blocks 310 of the substrate pulling means 300, and thus the four sides of the substrate 1 are fixed by the four supporting blocks 310. After the four sides are adsorbed and fixed, the cylinders 321 are operated in reverse, so that the support blocks 310 are slightly retracted as shown in FIG. 8 (c). The four sides of the substrate 1 are supported by the support blocks 310. The substrate 1 is flattened because it is pulled by.

The substrate 1 is flattened by the support blocks 310 as described above, and then vacuum is again formed in the upper vacuum suction path 110 of the substrate fixing chamber 100 to absorb and fix the periphery of the substrate 1. When the pressure gas is injected into the hermetic chamber 101 of the substrate fixing chamber 100 by the supply pipe 121 of the pressure supply means 120, the bending of the substrate 1 is prevented by the expansion pressure of the pressure gas. It is supported in a very flat form. The above operation is performed by measuring the amount of deflection of the substrate 1 by the amount of deflection measuring device 200 and the distance detection sensor 130, and adjusting the pressure in the hermetic chamber 101 by the amount of measurement. This is performed while adjusting the adsorption force of).

As described above, the present invention exposes a large substrate such as a large LCD, a PDP, a PCB, and spreads the substrate flat on the substrate fixing chamber horizontally to support it in a form that prevents warpage, thereby exposing the substrate to the entire surface. There is an advantage that it is possible to form each pattern accurately by exposing uniformly, thereby preventing product defects such as defective pixels, thereby improving product quality and improving production yield.

In addition, the apparatus for preventing sag of a large substrate according to the present invention has been described mainly by applying an example to an exposure process, but the present invention is not limited thereto and may be used in the entire process of manufacturing and processing a large substrate. It is to be understood that various embodiments that may be modified and changed within the true spirit and scope of the principles described and claimed are within the scope of protection of the present invention.

Claims (7)

A substrate fixing chamber 100 having a substrate 1 mounted on an upper base surface and an airtight chamber 101 formed therein, and a vacuum suction path 110 for adsorbing the substrate 1 formed at an upper end of a main wall; The substrate includes a pressure supply means 120 for supplying pressure to the hermetic chamber 101 of the substrate fixing chamber 100, and a deflection amount measuring device 200 for measuring the amount of deflection of the substrate 1. Deflection prevention device for a large substrate, characterized in that configured to be fixed to (1) in a flat form prevented bending. A substrate fixing chamber 100 having a substrate 1 mounted on an upper base surface and an airtight chamber 101 formed therein, and a vacuum suction path 110 for adsorbing the substrate 1 formed at an upper end of a main wall; And a pressure supply means 120 for supplying pressure to the hermetic chamber 101 of the substrate fixing chamber 100, a deflection amount measuring device 200 for measuring the amount of deflection of the substrate 1, and the substrate fixing. The substrate 1 includes a substrate pulling means 300 for supporting the upper base surface of the substrate fixing chamber 100 while adsorbing and expanding the four sides of the substrate 1 on the upper side of the chamber 100. ) Large-sized substrate deflection prevention device, characterized in that configured to be fixed in a flat form prevented bending. According to claim 1 or 2, wherein the pressure supply means 120 is coupled to the supply pipe 121 to one side of the main wall of the chamber for fixing the substrate 100, the supply pipe 121 is the airtight chamber 101 Deflection prevention device for a large substrate, characterized in that connected to the pressing means provided to maintain and vary the pressure in the chamber. According to claim 1 or claim 2, The deflection amount measuring apparatus 200 is a plurality of distance detection sensors for measuring the deflection amount by detecting the distance to the substrate 1 in the interior of the substrate fixing chamber (100) Deflection prevention device for a large substrate, characterized in that the 130 is configured to be coupled. The apparatus of claim 1 or 2, wherein the deflection measuring apparatus 200 includes a width direction driving guide 221 for moving the measurement system 210 in the width direction (Y direction), and the width direction driving guide 221. The first drive motor 220 for operating the drive, the longitudinal drive guide 231 for moving the width direction drive guide 221 in the longitudinal direction (X direction), and the longitudinal drive guide 231 And a second driving motor (230) for actuation, wherein the measuring system (210) is configured to freely move in the X and Y directions within a predetermined measurement area. The method of claim 2, wherein the substrate pulling means 300 is formed in communication with a plurality of vacuum adsorption holes 312 and the adsorption passage 311 in order to adsorb the four sides of the substrate (1) Adsorption pad 313 is coupled to be positioned at the lower end of the 312, the support block 310 is installed to be mounted on the four sides of the upper base of the substrate fixing chamber 100 and the support block 310 Support block operating means 320 which is moved from the initial position to the forward position and placed on the four sides of the substrate 1, the support block 310 to absorb the four sides of the substrate 1 and pulled out to the reverse position to expand the 320 Deflection prevention device for a large substrate, characterized in that consisting of). According to claim 2, wherein the support block operating means 320 is a cylinder 321 is fixed to the upper base surface of the chamber for fixing the substrate 100, the plunger 322 of the cylinder 321 of the connecting rod 323 One end is rotatably coupled to the hinge portion 324, the other end of the connecting rod 323 is rotatably coupled to the hinge portion 326 to the connecting member 325 fixed to the support block 310, The cam 332 is inserted into the guide groove 331 formed at the upper portion of the substrate fixing chamber 100, and the cam pins 333 are in contact with the cam 332 at both ends of the support block 310. Deflection prevention device for a large substrate, characterized in that the fixed configuration.