KR20020045532A - 기판을 지지하기 위한 장치를 갖춘 다이 본더 및/또는와이어 본더 - Google Patents
기판을 지지하기 위한 장치를 갖춘 다이 본더 및/또는와이어 본더 Download PDFInfo
- Publication number
- KR20020045532A KR20020045532A KR1020010075865A KR20010075865A KR20020045532A KR 20020045532 A KR20020045532 A KR 20020045532A KR 1020010075865 A KR1020010075865 A KR 1020010075865A KR 20010075865 A KR20010075865 A KR 20010075865A KR 20020045532 A KR20020045532 A KR 20020045532A
- Authority
- KR
- South Korea
- Prior art keywords
- drawer
- vacuum
- substrate
- bonder
- cavities
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 39
- 239000011888 foil Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 6
- 239000011159 matrix material Substances 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 4
- 238000003780 insertion Methods 0.000 description 3
- 230000037431 insertion Effects 0.000 description 3
- 239000000314 lubricant Substances 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000009420 retrofitting Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K37/00—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups
- B23K37/04—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work
- B23K37/0426—Fixtures for other work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Die Bonding (AREA)
Abstract
Description
Claims (4)
- 기판을 지지하는 장치를 가지고, 이것에 의해 상기 기판을 지지하는 상기 장치는 진공이 적용되는 드릴 구멍(1)을 가진 테이블(2)을 포함하는 다이 본더 및/또는 와이어 본더에 있어서,상기 테이블(2)의 하부 표면은 진공이 적용될 수 있는 상이한 길이의 적어도 2개의 공동(20.1 내지 20.6)을 가지고,이동가능한 드로어(8)가 존재하며, 상기 테이블(2)의 하부 표면에 면한 드로어의 표면(21)은 공동(22.1 내지 22.6)을 가지며, 이것에 의해 드로어(8)내의 공동(22.1 내지 22.6)은 테이블(2)의 공동(20.1 내지 20.6)에 면한 측면 아암 및 드릴 구멍(1)에 면한 적어도 하나의 측면 아암을 포함하고,상기 드로어(8)는 테이블(2)내의 상이한 지점에서 끼워질 수 있으며 이것에 의해 드로어(8)의 상이한 지점에서 드로어(8)의 공동(22.1 내지 22.6) 및 테이블(2)의 공동(20.1 내지 20.6)의 상이한 개수가 겹쳐지는 것을 특징으로 하는 다이 본더 및/또는 와이어 본더.
- 제 1 항에 있어서,상기 테이블(2)의 하부 표면내의 적어도 2개의 공동(20.1 내지 20.6)은 그루브(19)로써 연결되는 것을 특징으로 하는 다이 본더 및/또는 와이어 본더.
- 제 1 항에 있어서,상기 드로어(8)의 다른 측면은 호일(11)에 의해 덮여질 수 있으며, 진공이 적용될 수 있는 그루브(9)를 구비하고, 및상기 드로어(8)는 호일(11)이 테이블(2)의 하부 표면에 위치하는 반전된 위치에서 테이블(2)내로 삽입될 수 있는 것을 특징으로 하는 다이 본더 및/또는 와이어 본더.
- 제 2 항에 있어서,상기 드로어(8)의 다른 측면은 호일(11)에 의해 덮여질 수 있으며, 진공이 적용될 수 있는 그루브(9)를 가지고, 및상기 드로어(8)는 호일(11)이 테이블(2)의 하부 표면에 위치하는 반전된 위치에서 테이블(2)내로 삽입될 수 있는 것을 특징으로 하는 다이 본더 및/또는 와이어 본더.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH23962000 | 2000-12-06 | ||
CH20002396/00 | 2000-12-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020045532A true KR20020045532A (ko) | 2002-06-19 |
KR100844222B1 KR100844222B1 (ko) | 2008-07-04 |
Family
ID=4568985
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020010075865A KR100844222B1 (ko) | 2000-12-06 | 2001-12-03 | 기판 지지 장치를 구비한 다이 본더 및/또는 와이어 본더 |
Country Status (6)
Country | Link |
---|---|
US (1) | US6585145B2 (ko) |
KR (1) | KR100844222B1 (ko) |
CN (1) | CN1248300C (ko) |
HK (1) | HK1047189A1 (ko) |
MY (1) | MY122841A (ko) |
TW (1) | TW527674B (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080149687A1 (en) * | 2006-12-22 | 2008-06-26 | Garnett Mark D | Weld Inspection Optimizer |
CN103903993B (zh) * | 2012-12-28 | 2017-05-03 | 贵州雅光电子科技股份有限公司 | 一种二极管引线焊接装配方法及装置 |
CN103831568B (zh) * | 2014-03-11 | 2016-01-20 | 西安永电电气有限责任公司 | 一种igbt模块的热敏电阻焊接工装及焊接方法 |
CN110977166B (zh) * | 2019-12-26 | 2021-07-23 | 浙江量子医疗器械有限公司 | 一种脚踏式快压极头组件焊接装置 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE142406C (ko) | ||||
DE1953900A1 (de) | 1969-10-25 | 1971-05-27 | Licentia Gmbh | Vorrichtung zur zwischenzeitlichen Halterung von zu bearbeitenden Gegenstaenden unterschiedlicher Groesse |
US3907268A (en) | 1974-03-29 | 1975-09-23 | Thomas F Hale | Valve means for vacuum holding device |
JPS5859740A (ja) | 1981-09-21 | 1983-04-08 | ガ−バ−・サイエンテイフイツク・プロダクツ・インコ−ポレ−テツド | 真空ワ−クピ−スホ−ルダ− |
JPS58121640A (ja) | 1982-01-13 | 1983-07-20 | Hitachi Ltd | 真空吸着台 |
GB8815553D0 (en) | 1988-06-30 | 1988-08-03 | Mpl Precision Ltd | Vacuum chuck |
US5281794A (en) | 1990-05-25 | 1994-01-25 | Kabushiki Kaisha Shinkawa | Heater block for use in a bonder utilizing vacuum suction attachment means |
JPH07110455B2 (ja) * | 1992-10-27 | 1995-11-29 | 住友電気工業株式会社 | ウェハ固定装置 |
IL103906A (en) * | 1992-11-27 | 1996-05-14 | Orbotech Ltd | Vacuum holder particularly useful as a vacuum table |
JPH06306247A (ja) | 1993-04-26 | 1994-11-01 | Hitachi Chem Co Ltd | 水溶性樹脂組成物及びこれを用いた親水化処理方法 |
JPH0758191A (ja) * | 1993-08-13 | 1995-03-03 | Toshiba Corp | ウェハステージ装置 |
GB2320282A (en) | 1994-08-02 | 1998-06-17 | Tobias Michael Cardew | Vacuum securing arrangements |
US5923408A (en) * | 1996-01-31 | 1999-07-13 | Canon Kabushiki Kaisha | Substrate holding system and exposure apparatus using the same |
JP2000357711A (ja) * | 1999-06-15 | 2000-12-26 | Sony Corp | 半導体装置製造用治具および半導体装置の製造方法 |
CH695405A5 (de) * | 1999-12-14 | 2006-04-28 | Esec Trading Sa | Die Bonder und Wire Bonder mit einer Ansaugvorrichtung zum Flachziehen und Niederhalten eines gewölbten Substrats. |
-
2001
- 2001-11-30 TW TW090129645A patent/TW527674B/zh not_active IP Right Cessation
- 2001-12-03 KR KR1020010075865A patent/KR100844222B1/ko active IP Right Grant
- 2001-12-04 US US10/006,201 patent/US6585145B2/en not_active Expired - Fee Related
- 2001-12-05 MY MYPI20015559A patent/MY122841A/en unknown
- 2001-12-06 CN CNB011429747A patent/CN1248300C/zh not_active Expired - Fee Related
-
2002
- 2002-11-29 HK HK02108667.3A patent/HK1047189A1/zh unknown
Also Published As
Publication number | Publication date |
---|---|
US6585145B2 (en) | 2003-07-01 |
TW527674B (en) | 2003-04-11 |
HK1047189A1 (zh) | 2003-02-07 |
US20020066765A1 (en) | 2002-06-06 |
MY122841A (en) | 2006-05-31 |
CN1248300C (zh) | 2006-03-29 |
KR100844222B1 (ko) | 2008-07-04 |
CN1357912A (zh) | 2002-07-10 |
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