KR20020021629A - 전기전도성 중합체로 코팅된 공작물의 전기도금 공정 - Google Patents

전기전도성 중합체로 코팅된 공작물의 전기도금 공정 Download PDF

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Publication number
KR20020021629A
KR20020021629A KR1020017013256A KR20017013256A KR20020021629A KR 20020021629 A KR20020021629 A KR 20020021629A KR 1020017013256 A KR1020017013256 A KR 1020017013256A KR 20017013256 A KR20017013256 A KR 20017013256A KR 20020021629 A KR20020021629 A KR 20020021629A
Authority
KR
South Korea
Prior art keywords
contact element
workpiece
contact
electroplated
process according
Prior art date
Application number
KR1020017013256A
Other languages
English (en)
Korean (ko)
Inventor
크로넨베르크발터
후퍼위르겐
Original Assignee
리차드 피. 뮐러
엔쏜 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 리차드 피. 뮐러, 엔쏜 인코포레이티드 filed Critical 리차드 피. 뮐러
Publication of KR20020021629A publication Critical patent/KR20020021629A/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54—Electroplating of non-metallic surfaces
    • C25D5/56—Electroplating of non-metallic surfaces of plastics
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroplating Methods And Accessories (AREA)
KR1020017013256A 2000-02-18 2001-02-20 전기전도성 중합체로 코팅된 공작물의 전기도금 공정 KR20020021629A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10007435.9 2000-02-18
DE10007435A DE10007435A1 (de) 2000-02-18 2000-02-18 Verfahren zum Galvanisieren eines mit einem elektrisch leitenden Polymer beschichteten Werkstücks
PCT/US2001/001235 WO2001061079A1 (en) 2000-02-18 2001-02-20 Process for electroplating a work piece coated with an electrically conducting polymer

Publications (1)

Publication Number Publication Date
KR20020021629A true KR20020021629A (ko) 2002-03-21

Family

ID=7631430

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020017013256A KR20020021629A (ko) 2000-02-18 2001-02-20 전기전도성 중합체로 코팅된 공작물의 전기도금 공정

Country Status (11)

Country Link
US (1) US20020157959A1 (de)
EP (1) EP1198624A4 (de)
KR (1) KR20020021629A (de)
CN (1) CN1366563A (de)
AU (1) AU2001237942A1 (de)
BR (1) BR0104544A (de)
CA (1) CA2369687A1 (de)
DE (1) DE10007435A1 (de)
IL (1) IL145890A0 (de)
MX (1) MXPA01010570A (de)
WO (1) WO2001061079A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL355475A1 (en) * 2000-02-21 2004-05-04 Trek 2000 International Ltd. A portable data storage device
WO2003038158A2 (de) * 2001-10-25 2003-05-08 Infineon Technologies Ag Galvanisiereinrichtung und galvanisiersystem zum beschichten von bereits leitfähig ausgebildeten strukturen
WO2013074702A1 (en) 2011-11-15 2013-05-23 Ashwin-Ushas Corporation, Inc. Complimentary polymer electrochromic device
CN103046031B (zh) * 2012-12-11 2014-08-13 胜宏科技（惠州）股份有限公司 一种线路板电镀金方法
US9207515B2 (en) 2013-03-15 2015-12-08 Ashwin-Ushas Corporation, Inc. Variable-emittance electrochromic devices and methods of preparing the same
US9632059B2 (en) 2015-09-03 2017-04-25 Ashwin-Ushas Corporation, Inc. Potentiostat/galvanostat with digital interface
US9482880B1 (en) 2015-09-15 2016-11-01 Ashwin-Ushas Corporation, Inc. Electrochromic eyewear
US9945045B2 (en) 2015-12-02 2018-04-17 Ashwin-Ushas Corporation, Inc. Electrochemical deposition apparatus and methods of using the same
CN110499527B (zh) * 2019-08-12 2021-07-13 嘉兴市上村电子有限公司 Bt树脂基材电镀的安装方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3619382A (en) * 1970-01-27 1971-11-09 Gen Electric Process of reducing metal compounds to metal in a matrix
DE2101049A1 (de) * 1971-01-11 1972-08-03 Siemens Ag Verfahren zur vorzugsweise beidseitigen Beschichtung von Kunststoffolien mit .Metall
DE3810992A1 (de) * 1988-03-31 1989-10-12 Hoechst Ceram Tec Ag Verfahren und vorrichtung zum plattieren von pin-grid-arrays
US5114558A (en) * 1989-02-15 1992-05-19 Kadija Igor V Method and apparatus for manufacturing interconnects with fine lines and spacing
US5516416A (en) * 1994-12-14 1996-05-14 International Business Machines Corporation Apparatus and method for electroplating pin grid array packaging modules
DE19612555C2 (de) * 1996-03-29 1998-03-19 Atotech Deutschland Gmbh Verfahren zur selektiven elektrochemischen Behandlung von Leiterplatten und Vorrichtung zur Durchführung des Verfahrens
US5871629A (en) * 1996-09-18 1999-02-16 International Business Machines Corporation Method and apparatus for fixturing substrate assemblies for electrolytic plating
US5869139A (en) * 1997-02-28 1999-02-09 International Business Machines Corporation Apparatus and method for plating pin grid array packaging modules
EP0889680A3 (de) * 1997-07-01 2000-07-05 Deutsche Thomson-Brandt Gmbh Verfahren zur Entfernung und/oder Aufbringung von leitendem Material
DE19822075C2 (de) * 1998-05-16 2002-03-21 Enthone Gmbh Verfahren zur metallischen Beschichtung von Substraten
US6214180B1 (en) * 1999-02-25 2001-04-10 International Business Machines Corporation Method for shorting pin grid array pins for plating
US6197171B1 (en) * 1999-03-31 2001-03-06 International Business Machines Corporation Pin contact mechanism for plating pin grid arrays

Also Published As

Publication number Publication date
EP1198624A4 (de) 2003-05-21
EP1198624A1 (de) 2002-04-24
CA2369687A1 (en) 2001-08-23
DE10007435A1 (de) 2001-08-23
BR0104544A (pt) 2002-01-08
MXPA01010570A (es) 2003-09-04
AU2001237942A1 (en) 2001-08-27
WO2001061079A1 (en) 2001-08-23
CN1366563A (zh) 2002-08-28
IL145890A0 (en) 2002-07-25
US20020157959A1 (en) 2002-10-31

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