KR20010088340A - 정전기 방전으로부터 레티클을 격리시키는 방법 - Google Patents

정전기 방전으로부터 레티클을 격리시키는 방법 Download PDF

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Publication number
KR20010088340A
KR20010088340A KR1020010007949A KR20010007949A KR20010088340A KR 20010088340 A KR20010088340 A KR 20010088340A KR 1020010007949 A KR1020010007949 A KR 1020010007949A KR 20010007949 A KR20010007949 A KR 20010007949A KR 20010088340 A KR20010088340 A KR 20010088340A
Authority
KR
South Korea
Prior art keywords
substrate
light blocking
blocking material
integrated circuit
discontinuity
Prior art date
Application number
KR1020010007949A
Other languages
English (en)
Korean (ko)
Inventor
플랜더즈스티븐디.
오그래디데이빗에스.
스몰링스키재섹지.
Original Assignee
포만 제프리 엘
인터내셔널 비지네스 머신즈 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 포만 제프리 엘, 인터내셔널 비지네스 머신즈 코포레이션 filed Critical 포만 제프리 엘
Publication of KR20010088340A publication Critical patent/KR20010088340A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020010007949A 2000-03-10 2001-02-17 정전기 방전으로부터 레티클을 격리시키는 방법 KR20010088340A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US52367900A 2000-03-10 2000-03-10
US09/523,679 2000-03-10

Publications (1)

Publication Number Publication Date
KR20010088340A true KR20010088340A (ko) 2001-09-26

Family

ID=24085981

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020010007949A KR20010088340A (ko) 2000-03-10 2001-02-17 정전기 방전으로부터 레티클을 격리시키는 방법

Country Status (3)

Country Link
JP (1) JP2001272768A (zh)
KR (1) KR20010088340A (zh)
CN (1) CN1319783A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100422907B1 (ko) * 2002-05-02 2004-03-12 아남반도체 주식회사 정전기 방지 모듈을 갖는 마스크

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009086385A (ja) * 2007-09-29 2009-04-23 Hoya Corp フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法
KR101652803B1 (ko) * 2014-08-27 2016-09-01 (주)마이크로이미지 정전기 배출 구조를 가지는 크롬 마스크
CN109031883A (zh) * 2018-08-23 2018-12-18 苏州瑞而美光电科技有限公司 一种报废光刻掩膜版的回收处理方法
KR20200088543A (ko) 2019-01-14 2020-07-23 삼성전자주식회사 포토 마스크, 이의 제조방법, 및 이를 이용한 반도체 소자의 제조방법
WO2020147059A1 (en) * 2019-01-17 2020-07-23 Yangtze Memory Technologies Co., Ltd. Photomask with electrostatic discharge protection

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62293244A (ja) * 1986-06-13 1987-12-19 Hitachi Ltd 帯電防止フオトマスク基板
KR19980043419A (ko) * 1996-12-03 1998-09-05 문정환 마스크 구조
US5989754A (en) * 1997-09-05 1999-11-23 Taiwan Semiconductor Manufacturing Company, Ltd. Photomask arrangement protecting reticle patterns from electrostatic discharge damage (ESD)
KR20000000240U (ko) * 1998-06-05 2000-01-15 김영환 이에스디(esd) 방지기능을 갖는 포토 마스크

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62293244A (ja) * 1986-06-13 1987-12-19 Hitachi Ltd 帯電防止フオトマスク基板
KR19980043419A (ko) * 1996-12-03 1998-09-05 문정환 마스크 구조
US5989754A (en) * 1997-09-05 1999-11-23 Taiwan Semiconductor Manufacturing Company, Ltd. Photomask arrangement protecting reticle patterns from electrostatic discharge damage (ESD)
KR20000000240U (ko) * 1998-06-05 2000-01-15 김영환 이에스디(esd) 방지기능을 갖는 포토 마스크

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100422907B1 (ko) * 2002-05-02 2004-03-12 아남반도체 주식회사 정전기 방지 모듈을 갖는 마스크

Also Published As

Publication number Publication date
CN1319783A (zh) 2001-10-31
JP2001272768A (ja) 2001-10-05

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