KR20010037383A - Semiconductor chemical constant pressure spray device - Google Patents
Semiconductor chemical constant pressure spray device Download PDFInfo
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- KR20010037383A KR20010037383A KR1019990044891A KR19990044891A KR20010037383A KR 20010037383 A KR20010037383 A KR 20010037383A KR 1019990044891 A KR1019990044891 A KR 1019990044891A KR 19990044891 A KR19990044891 A KR 19990044891A KR 20010037383 A KR20010037383 A KR 20010037383A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
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Abstract
Description
본 발명은 반도체 약액 정압 분사장치에 관한 것으로서, 더욱 상세하게는 반도체 제조 공정중 포토 및 화학 기상 증착장비의 코터 장치에서 약액을 항상 정압을 유지한 상태에서 웨이퍼에 분사시킬 수 있도록 한 것이다.The present invention relates to a semiconductor chemical liquid constant pressure injection device, and more particularly, to enable chemical liquids to be injected onto a wafer at constant pressure at a coater device of a photo and chemical vapor deposition apparatus during a semiconductor manufacturing process.
일반적으로, 반도체 제조 공정중 포토 및 화학 기상 증착장비의 코터 장치는 약액을 정압으로 웨이퍼에 분사시켜 공정을 진행하는 데, 종래에는 도 1에 도시한 바와 같이, 약액 중앙 공급장치(Chemical Central Supply System: CCSS)에서 복수개 약액 공급박스(1a)의 내부에 설치된 약액 저장탱크(2a)로 약액을 공급하고, 약액 저장탱크(2a)에서 질소를 가압하여 코터 장치(5)로 약액을 공급하며, 코터 장비에서 약액을 사용하기 위해서는 코터 장치(5)의 내부에 설치된 공압 밸브(6)를 오픈시켜 사용하게 된다.In general, the coater device of the photo and chemical vapor deposition equipment during the semiconductor manufacturing process proceeds by injecting the chemical liquid to the wafer at a constant pressure, conventionally, as shown in Figure 1, chemical central supply system (Chemical Central Supply System) : CCSS) supplies the chemical liquid to the chemical liquid storage tank (2a) installed in the plurality of chemical liquid supply box (1a), pressurized nitrogen in the chemical liquid storage tank (2a) to supply the chemical liquid to the coater device (5), coater In order to use the chemical liquid in the equipment, the pneumatic valve 6 installed in the coater device 5 is opened and used.
그러나, 이와 같은 종래의 장치는 복수개의 약액 공급박스(1a)를 설치하여 사용해야 하므로 인해 장비 투자 비용이 상승하게 되며, 관리 포인트가 많아지게 됨에 따른 많은 불편함을 초래하게 되는 등의 문제점이 있었다.However, such a conventional device has a problem such that the equipment investment cost is increased due to the installation and use of a plurality of chemical supply boxes (1a), causing a lot of inconvenience as the management point is increased.
따라서, 본 발명은 상기한 제반 문제점을 해결하기 위한 것으로서, 반도체 제조 공정중 포토 및 화학 기상 증착장비의 코터 장치에서 약액을 항상 정압을 유지한 상태에서 웨이퍼에 분사시킬 수 있도록 공정을 안정화시킬 수 있을 뿐만 아니라, 약액 공급박스의 설치 대수를 줄일 수 있도록 하여 장비 투자 비용을 절감시킬 수 있는 반도체 약액 정압 분사장치를 제공하는 데 그 목적이 있다.Accordingly, the present invention is to solve the above-mentioned problems, it is possible to stabilize the process so that the chemical liquid in the coater device of the photo and chemical vapor deposition equipment during the semiconductor manufacturing process can always be sprayed on the wafer at a constant pressure In addition, the purpose is to provide a semiconductor chemical liquid constant pressure injection device that can reduce the number of installation of the chemical liquid supply box to reduce the equipment investment cost.
도 1은 종래의 장치를 나타낸 구성도1 is a block diagram showing a conventional device
도 2는 본 발명을 나타낸 구성도2 is a block diagram showing the present invention
* 도면의 주요 부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings
1; 약액 공급박스 2; 약액 저장탱크One; Chemical liquid supply box 2; Chemical Storage Tank
3; 디지털 압력 게이지 4; 메스 플로우 콘트롤러3; Digital pressure gauge 4; Mass Flow Controller
상기한 목적을 달성하기 위해 본 발명은 약액 공급박스의 내부에 설치된 약액 저장탱크에 연결되어 약액 공급시 약액 저장탱크의 질소 압력을 감지하기 위한 디지털 압력 게이지와, 상기 디지털 압력 게이지에서 감지된 질소 압력을 전달받아 약액 저장탱크의 질소 정압을 유지하기 위한 메스 플로우 콘트롤러로 구성된 것을 특징으로 하는 반도체 약액 정압 분사장치가 제공된다.In order to achieve the above object, the present invention is connected to a chemical liquid storage tank installed in the chemical liquid supply box is a digital pressure gauge for sensing the nitrogen pressure of the chemical liquid storage tank when the chemical liquid supply, and the nitrogen pressure sensed by the digital pressure gauge Provided is a semiconductor chemical liquid constant pressure injection device, characterized in that consisting of a mass flow controller for maintaining the nitrogen constant pressure of the chemical storage tank received.
이하, 상기한 목적을 달성하기 위한 본 발명의 바람직한 실시예를 첨부된 도면을 참조하여 상세히 설명하면 다음과 같다.Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention for achieving the above object will be described in detail.
도 2는 본 발명을 나타낸 구성도로서, 종래의 기술과 동일한 부분에 대해서는 동일 부호를 부여하여 본 발명을 설명한다.Fig. 2 is a block diagram showing the present invention, in which the same parts as in the prior art are denoted by the same reference numerals to explain the present invention.
본 발명은 약액 공급박스(1)의 내부에 설치된 약액 저장탱크(2)에 약액 공급시 약액 저장탱크(2)의 질소 압력을 감지하기 위한 디지털 압력 게이지(3)가 연결되고, 상기 디지털 압력 게이지(3)에서 감지된 질소 압력을 전달받아 상기 약액 저장탱크(2)의 질소 정압을 유지하기 위한 메스 플로우 콘트롤러(4)가 설치되어 구성된다.The present invention is connected to a digital pressure gauge (3) for sensing the nitrogen pressure of the chemical liquid storage tank (2) when the chemical liquid supply to the chemical liquid storage tank (2) installed inside the chemical liquid supply box (1), the digital pressure gauge A mass flow controller 4 for receiving the nitrogen pressure sensed in (3) and maintaining the nitrogen constant pressure of the chemical storage tank 2 is installed.
상기와 같이 구성된 본 발명은 도 2에 도시한 바와 같이, 약액 중앙 공급장치에서 약액 공급박스(1)의 내부에 설치된 약액 저장탱크(2)로 약액을 공급하고, 이 약액 저장탱크(2)에서 질소를 가압하여 약액을 공급하게 되는 데, 복수개의 코터 장치(5)로 약액을 공급시에는 상기 약액 저장탱크(2)의 질소 압력이 떨어지게 된다.In the present invention configured as described above, as shown in FIG. 2, the chemical liquid is supplied to the chemical liquid storage tank 2 installed in the chemical liquid supply box 1 in the chemical liquid central supply device, and the chemical liquid storage tank 2 is supplied from the chemical liquid storage tank 2. Nitrogen is pressurized to supply the chemical liquid. When the chemical liquid is supplied to the plurality of coater devices 5, the nitrogen pressure of the chemical liquid storage tank 2 drops.
이때, 질소 압력이 떨어진 값을 상기 약액 저장탱크(2)에 연결된 디지털 압력 게이지(3)에서 감지하며, 이 디지털 압력 게이지(3)에서 감지된 압력의 수치가 메스 플로우 콘트롤러(4)로 전달되므로 메스 플로우 콘트롤러(4)는 상기 약액 저장탱크(2)의 질소 정압을 유지하기 위하여 메스 플로우 콘트롤러(4)의 내부에 설치된 밸브(도시는 생략함)를 열어 질소 유량을 증가시킬 수 있게 된다.At this time, the value of the nitrogen pressure drop is sensed by the digital pressure gauge (3) connected to the chemical storage tank (2), since the value of the pressure sensed by the digital pressure gauge (3) is transmitted to the mass flow controller (4) The mass flow controller 4 may open a valve (not shown) installed inside the mass flow controller 4 to increase the nitrogen flow rate in order to maintain the nitrogen constant pressure of the chemical liquid storage tank 2.
이상에서 상술한 바와 같이, 본 발명은 반도체 제조 공정중 포토 및 화학 기상 증착장비의 코터 장치에서 약액을 항상 정압을 유지한 상태에서 웨이퍼에 분사시킬 수 있으므로써 공정을 안정화시킬 수 있으며, 약액 공급박스의 설치 대수를 줄일 수 있음에 따른 장비 투자 비용을 절감시킬 수 있고, 장비의 관리 포인트를 줄일 수 있는 등의 많은 장점이 구비된 매우 유용한 발명이다.As described above, the present invention can stabilize the process by spraying the chemical solution on the wafer at a constant pressure at all times in the coater device of the photo and chemical vapor deposition equipment during the semiconductor manufacturing process, chemical solution supply box It is a very useful invention equipped with many advantages, such as to reduce the equipment investment cost by reducing the number of installation of the, and to reduce the management point of the equipment.
이상에서는 본 발명의 바람직한 실시예를 도시하고 또한 설명하였으나, 본 발명은 상기한 실시예에 의해 한정되지 않고, 이하 청구범위에서 청구하는 본 발명의 요지를 벗어남이 없이 당해 발명이 속하는 기술 분야에서 통상의 지식을 가진 자라면 누구든지 다양한 변경 실시가 가능할 것이다.Although the preferred embodiments of the present invention have been illustrated and described above, the present invention is not limited to the above-described embodiments, and is generally defined in the technical field to which the present invention pertains without departing from the gist of the present invention as claimed in the following claims. Anyone with knowledge of the world will be able to make various changes.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019990044891A KR20010037383A (en) | 1999-10-16 | 1999-10-16 | Semiconductor chemical constant pressure spray device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019990044891A KR20010037383A (en) | 1999-10-16 | 1999-10-16 | Semiconductor chemical constant pressure spray device |
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| Publication Number | Publication Date |
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| KR20010037383A true KR20010037383A (en) | 2001-05-07 |
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| KR1019990044891A KR20010037383A (en) | 1999-10-16 | 1999-10-16 | Semiconductor chemical constant pressure spray device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100914179B1 (en) * | 2007-12-27 | 2009-08-26 | 세메스 주식회사 | Method and apparatus for providing a chemical |
| KR101139530B1 (en) * | 2005-06-30 | 2012-05-02 | 엘지디스플레이 주식회사 | Equipment for manufacturing liquid crystal display |
-
1999
- 1999-10-16 KR KR1019990044891A patent/KR20010037383A/en not_active Application Discontinuation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101139530B1 (en) * | 2005-06-30 | 2012-05-02 | 엘지디스플레이 주식회사 | Equipment for manufacturing liquid crystal display |
| KR100914179B1 (en) * | 2007-12-27 | 2009-08-26 | 세메스 주식회사 | Method and apparatus for providing a chemical |
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