KR100191234B1 - Dissolved oxygen measuring system for pure water - Google Patents
Dissolved oxygen measuring system for pure water Download PDFInfo
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- KR100191234B1 KR100191234B1 KR1019960035153A KR19960035153A KR100191234B1 KR 100191234 B1 KR100191234 B1 KR 100191234B1 KR 1019960035153 A KR1019960035153 A KR 1019960035153A KR 19960035153 A KR19960035153 A KR 19960035153A KR 100191234 B1 KR100191234 B1 KR 100191234B1
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- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
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Abstract
반도체 제조공정에 사용되는 초순수의 용존산소를 측정하여 규정된 초순수가 항상 각 제조설비에 공급될 수 있도록 하는 반도체 제조용 초순수의 용존산소 측정장치에 관한 것이다.The present invention relates to an apparatus for measuring dissolved oxygen in ultrapure water for semiconductor manufacturing by measuring dissolved oxygen in ultrapure water used in a semiconductor manufacturing process so that prescribed ultrapure water can always be supplied to each manufacturing facility.
본 발명의 구성은 초순수배관(11)으로 흐르는 초순수의 일부가 연결배관(13)을 통해 용존산소측정기(12)로 공급되도록 하여 초순수의 용존산소를 측정하도록 된 반도체 제조용 초순수의 용존산소 측정장치에 있어서, 초순수배관(11)에 초순수저장탱크(15)를 유입배관(16)으로 연결하여 일정량의 초순수를 저장하고, 초순수배관(11)으로부터 용존산소측정기(12)로 초순수의 공급이 중단될 때 초순수저장탱크(15)에 저장된 초순수를 용존산소측정기(12)로 공급하도록 된 것이다.In the configuration of the present invention, a portion of the ultrapure water flowing into the ultrapure water pipe 11 is supplied to the dissolved oxygen measuring device 12 through the connection pipe 13 to measure the dissolved oxygen of the ultrapure water for semiconductor manufacturing to measure the dissolved oxygen of the ultrapure water. In this case, the ultrapure water storage tank 15 is connected to the ultrapure water pipe 11 by the inlet pipe 16 to store a certain amount of ultrapure water, and when the supply of ultrapure water from the ultrapure water pipe 11 to the dissolved oxygen measuring device 12 is stopped. The ultrapure water stored in the ultrapure water storage tank 15 is supplied to the dissolved oxygen measuring device 12.
따라서 설비의 가동이 중단된 상태에서도 초순수의 용존산소를 지속적으로 측정하는 것이 가능하므로 다시 설비를 가동시키는 경우에도 용존산소측정기의 안정화시간이 필요없어 설비의 가동율 및 제품의 생산성이 향상되는 효과가 있다.Therefore, it is possible to continuously measure the dissolved oxygen of ultrapure water even when the operation of the equipment is stopped. Therefore, even when the equipment is operated again, there is no need for stabilization time of the dissolved oxygen measuring instrument, thereby improving the operation rate and productivity of the product. .
Description
본 발명은 반도체 제조용 초순수의 용존산소(Dissolved Oxygen) 측정장치에 관한 것으로서, 더욱 상세하게는 반도체 제조공정에 사용되는 초순수의 용존산소를 측정하여 규정된 초순수가 항상 각 제조설비에 공급될 수 있도록 하는 반도체 제조용 초순수의 용존산소 측정장치에 관한 것이다.The present invention relates to a device for measuring dissolved oxygen of ultrapure water for semiconductor manufacturing, and more particularly, to measure the dissolved oxygen of ultrapure water used in a semiconductor manufacturing process so that the specified ultrapure water can always be supplied to each manufacturing facility. An apparatus for measuring dissolved oxygen in ultrapure water for semiconductor manufacturing.
일반적으로 반도체장치는 많은 제조공정을 거쳐 제조되고, 제조과정중 웨이퍼의 오염은 수율 및 성능에 치명적인 영향을 주므로 웨이퍼의 세정등과 같은 용수로서 불순물이 제거된 초순수를 사용하게 된다.In general, semiconductor devices are manufactured through many manufacturing processes, and since contamination of the wafer during the manufacturing process has a fatal effect on yield and performance, ultrapure water from which impurities are removed as water, such as cleaning the wafer, is used.
이러한 초순수에는 용존산소량이 규정되어 있고, 이 용존산소량이 규정치로 유지되어 공급되는지를 항상 측정하여 모니터링하고 있다.The amount of dissolved oxygen is defined in such ultrapure water, and it is always measured and monitored whether the dissolved oxygen is maintained at the specified value.
따라서 종래에는 도1에 도시된 바와 같이 각종 제조설비로 초순수를 공급하기 위한 초순수배관(1)에 용존산소측정기(2)를 설치하였던 것으로, 즉 용존산소 측정장치는 초순수배관(1)에 별도의 연결배관(3)으로 연결된 용존산소측정기(2)와, 상기 연결배관(3)에 설치된 밸브(4)로 이루어진 것이다.Therefore, conventionally, as shown in FIG. 1, the dissolved oxygen measuring device 2 is installed in the ultrapure water pipe 1 for supplying ultrapure water to various manufacturing facilities, that is, the dissolved oxygen measuring device is separately provided in the ultrapure water pipe 1. Dissolved oxygen measuring device 2 connected to the connecting pipe (3), and the valve (4) provided in the connecting pipe (3).
이러한 초순수 용존산소 측정장치는 밸브(4)를 개방하여 초순수배관(1)으로 흐르는 초순수의 일부가 연결배관(3)을 통해 용존산소측정기(2)로 공급됨으로써 초순수의 용존산소를 측정하게 된다.The ultra-pure dissolved oxygen measuring device measures the dissolved oxygen of the ultra pure water by opening a valve (4) to supply a portion of the ultra pure water flowing into the ultra pure water pipe (1) to the dissolved oxygen measuring device (2) through the connecting pipe (3).
통상 대부분의 반도체 생산라인은 설비의 중단없이 24시간 가동되고, 특별한 일이 발생하여 생산라인이 중단되는 경우 최대한 빠른 시간내에 생산을 재개할 수 있도록 노력하고 있다. 용존산소측정장치의 경우에도 24시간 가동되어지는 것으로, 핵심요소인 갈바니 전지의 특성상 초순수의 공급중단이 발생하여 추후 용존산소 측정을 재개할 경우 약 4시간의 안정화 시간이 필요하다.Normally, most semiconductor production lines operate 24 hours without interruption of equipment, and try to resume production as soon as possible in the event that the production line is interrupted due to special events. The dissolved oxygen measuring device is also operated for 24 hours. The supply of ultrapure water occurs due to the characteristics of the galvanic battery, which is a key factor.
이러한 안정화 시간동안에는 용존산소의 측정치가 규정치보다 높게 나타나기 때문에 용존산소를 정확하게 측정할 수 없고, 정확하게 측정하기 위해서는 반드시 약 24시간을 기다려야 한다. 따라서 설비의 가동을 중단시킨후 가동개시 까지 많은 시간이 소요되어 설비의 가동율 및 생산성이 저하되는 문제점이 있었다.During this stabilization time, the dissolved oxygen measurement value is higher than the specified value, so the dissolved oxygen cannot be accurately measured, and about 24 hours must be waited for accurate measurement. Therefore, it takes a lot of time to start the operation after stopping the operation of the equipment, there was a problem that the operation rate and productivity of the equipment is reduced.
본 발명은 상기와 같은 종래의 문제점을 해결하기 위한 것으로, 그 목적은 설비가동의 중단으로 초순수의 공급이 중단된 후 다시 가동을 재개하는 경우 안정화시간이 필요없이 즉시 초순수의 용존산소를 정확하게 측정하여 설비의 가동율 및 제품의 생산성을 향상시킬 수 있는 반도체 제조용 초순수의 용존산소 측정장치를 제공하는 데 있다.The present invention is to solve the conventional problems as described above, the purpose is to accurately measure the dissolved oxygen of the ultra-pure water immediately without the need for stabilization time when the operation is restarted after the supply of ultra-pure water is stopped due to the interruption of equipment operation An object of the present invention is to provide a device for measuring dissolved oxygen in ultrapure water for semiconductor manufacturing that can improve the operation rate of equipment and productivity of a product.
도1은 종래의 초순수 용존산소 측정장치를 개략적으로 나타낸 구성도이다.1 is a schematic view showing a conventional ultrapure dissolved oxygen measuring apparatus.
도2는 본 발명에 따른 초순수 용존산소 측정장치를 개략적으로 나타낸 구성도이다.Figure 2 is a schematic diagram showing an ultrapure dissolved oxygen measuring apparatus according to the present invention.
*도면의 주요부분에 대한 부호의 설명** Description of the symbols for the main parts of the drawings *
1, 11 : 초순수배관2, 12 : 용존산소측정기1, 11: ultrapure water pipe 2, 12: dissolved oxygen measuring instrument
3, 13 : 연결배관4, 14, 22, 23, 24 : 밸브3, 13: connection piping 4, 14, 22, 23, 24: valve
15 : 초순수저장탱크16 : 유입배관15: ultrapure water storage tank 16: inlet piping
17 : 배출배관18 : 가스탱크17 exhaust pipe 18 gas tank
19 : 가스공급라인20 : 안전밸브19: gas supply line 20: safety valve
21 : 솔레노이드밸브21: solenoid valve
상기의 목적은 초순수배관으로 흐르는 초순수의 일부가 연결배관을 통해 용존산소측정기로 공급되도록 하여 초순수의 용존산소를 측정하도록 된 반도체 제조용 초순수의 용존산소 측정장치에 있어서, 초순수배관에 초순수저장탱크를 유입배관으로 연결하여 일정량의 초순수를 저장하고, 초순수배관으로부터 용존산소측정기로 초순수의 공급이 중단될 때 초순수저장탱크에 저장된 초순수를 용존산소측정기로 공급하도록 구성됨을 특징으로 하는 반도체 제조용 초순수의 용존산소 측정장치를 제공하는 데 있다.The purpose of the above is to inject the ultrapure water storage tank into the ultrapure water pipe in the ultrapure water dissolved oxygen measuring device for semiconductor manufacturing in which a part of the ultrapure water flowing to the ultrapure water pipe is supplied to the dissolved oxygen measuring device through the connection pipe to measure the dissolved oxygen of the ultrapure water. Measurement of dissolved oxygen in ultrapure water for semiconductor manufacturing, characterized in that it is configured to store a certain amount of ultrapure water by connecting to the pipe, and to supply the ultrapure water stored in the ultrapure water storage tank to the dissolved oxygen measuring instrument when the supply of ultrapure water is stopped from the ultrapure water pipe to the dissolved oxygen measuring instrument. To provide a device.
이때 상기 초순수저장탱크내에 불활성가스를 공급하여 초순수저장탱크내에 외부로부터 산소가 유입되는 것을 방지하고, 초순수저장탱크의 상부에는 내부압을 일정하게 유지하는 안전밸브를 설치하는 것이 바람직하다.At this time, by supplying an inert gas into the ultrapure water storage tank to prevent oxygen from flowing into the ultrapure water storage tank, it is preferable to install a safety valve on the upper portion of the ultrapure water storage tank to maintain a constant internal pressure.
이하, 본 발명의 구체적인 실시예를 첨부한 도면을 참조하여 상세히 설명한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
도2는 본 발명에 따른 반도체 제조용 초순수의 용존산소 측정장치를 나타낸 것으로, 초순수배관(11)에 용존산소측정기(12)가 연결배관(13)으로 연결되어 초순수의 일부가 용존산소측정기(12)로 공급되도록 되어 있고, 연결배관(13)에는 초순수의 흐름을 제어하는 제 1 밸브(14)가 구비되어 있다.Figure 2 shows a device for measuring the dissolved oxygen of ultrapure water for semiconductor manufacturing according to the present invention, the dissolved oxygen measuring device 12 is connected to the ultrapure water pipe 11 by a connecting pipe 13, a part of the ultrapure water dissolved oxygen measuring device 12 The supply pipe 13 is provided with a first valve 14 for controlling the flow of ultrapure water.
그리고 상기 초순수배관(11)에 초순수저장탱크(15)가 유입배관(16)으로 연결되어 초순수저장탱크(15)내에 초순수가 일정량 저장되도록 되어 있고, 초순수저장탱크(15)내의 초순수는 설비의 가동중단으로 초순수배관(11)으로부터 용존산소측정기(12)로 초순수의 공급이 중단될 때 용존산소측정기(12)로 공급되어지는 것으로, 초순수저장탱크(15)에 구비된 배출배관(17)이 용존산소측정기(12)와 제 1 밸브(14) 사이의 연결배관(13)에 연결되어 있다.The ultrapure water storage tank 15 is connected to the inlet pipe 16 to the ultrapure water pipe 11 so that a certain amount of ultrapure water is stored in the ultrapure water storage tank 15, and the ultrapure water in the ultrapure water storage tank 15 is operated. When the supply of ultrapure water from the ultrapure water pipe (11) to the dissolved oxygen measuring device (12) is interrupted, the supply is supplied to the dissolved oxygen measuring device (12), and the discharge pipe (17) provided in the ultrapure water storage tank (15) is dissolved. It is connected to the connecting pipe 13 between the oxygen meter 12 and the first valve 14.
상기 초순수저장탱크(15)에는 내부로 불활성가스를 주입시키기 위한 가스탱크(18)가 가스공급라인(19)으로 연결되어 외부로부터 산소가 유입되는 것을 방지하도록 되어 있고, 초순수저장탱크(15) 내부의 불활성가스 압력을 일정수준 이하로 유지하도록 일측에 안전밸브(20)가 설치되며, 가스공급라인(19)에는 일정 이상의 가스압력이 걸리도록 하는 솔레노이드밸브(21)가 설치된다.The ultrapure water storage tank 15 has a gas tank 18 for injecting inert gas therein to be connected to the gas supply line 19 to prevent oxygen from flowing from the outside, and inside the ultrapure water storage tank 15. A safety valve 20 is installed at one side to maintain the inert gas pressure below a predetermined level, and a solenoid valve 21 is installed at the gas supply line 19 to apply a predetermined or higher gas pressure.
또한 초순수저장탱크(15)의 유입 및 배출배관(16)(17)에 초순수의 흐름을 제어하는 제 2 및 제 3 밸브(22)(23)가 설치되고, 가스공급라인(19)에는 가스의 흐름을 제어하는 제 4 밸브(24)가 설치된 구성이다.In addition, second and third valves 22 and 23 for controlling the flow of ultrapure water are installed in the inlet and outlet pipes 16 and 17 of the ultrapure water storage tank 15, and the gas supply line 19 The 4th valve 24 which controls a flow is provided.
이러한 구성의 본 발명은 설비의 가동으로 각 설비로 공급되어지는 초순수배관(11)에 초순수가 흐르게 되면, 제 1 밸브(14) 및 제 2 밸브(22)를 개방시킴으로써 초순수의 일부가 연결배관(13) 및 유입배관(16)을 통해 용존산소측정기(12) 및 초순수저장탱크(15)로 공급되어진다.According to the present invention having such a configuration, when ultrapure water flows into the ultrapure water pipes 11 supplied to each facility by the operation of the facility, a part of the ultrapure water is connected to the connecting pipes by opening the first valve 14 and the second valve 22. 13) and the inlet pipe 16 is supplied to the dissolved oxygen measuring device 12 and the ultrapure water storage tank 15.
따라서 용존산소측정기(12)는 초순수의 용존산소를 측정할 수 있는 것이고, 초순수저장탱크(15)에는 초순수가 일정량 저장되어진다. 이때 배출배관(17)의 제 3 밸브(23)는 폐쇄하여 용존산소측정기(12)로 초순수저장탱크(15)의 초순수가 공급되지 않도록 하고, 초순수저장탱크(15)내에 초순수가 일정량 저장되면 제 2 밸브(22)를 폐쇄시킨다.Therefore, the dissolved oxygen measuring device 12 can measure the dissolved oxygen of ultrapure water, and the ultrapure water storage tank 15 stores a certain amount of ultrapure water. At this time, the third valve 23 of the discharge pipe 17 is closed so that the ultrapure water of the ultrapure water storage tank 15 is not supplied to the dissolved oxygen measuring device 12, and when a predetermined amount of ultrapure water is stored in the ultrapure water storage tank 15, 2 Close the valve (22).
이러한 상태에서 특별한 일이 발생하여 설비의 가동을 중단시키는 경우 초순수배관(11)으로 초순수가 흐르지 않게 된다. 이때 연결배관(13)의 제 1 밸브(14)를 폐쇄시키고 배출배관(17)의 제 3 밸브(23)를 개방시키게 되면, 초순수저장탱크(15)내에 저장되어 있던 초순수가 배출배관(17)을 통해 용존산소측정기(12)로 공급될 수 있는 것이고, 이로써 용존산소측정기(12)는 초순수의 용존산소를 지속적으로 측정할 수 있게 된다.In this state, when special work occurs and the operation of the facility is stopped, the ultrapure water does not flow into the ultrapure water pipe (11). At this time, when the first valve 14 of the connecting pipe 13 is closed and the third valve 23 of the discharge pipe 17 is opened, the ultrapure water stored in the ultrapure water storage tank 15 is discharged pipe 17. It can be supplied to the dissolved oxygen measuring device 12 through, so that the dissolved oxygen measuring device 12 can continuously measure the dissolved oxygen of the ultrapure water.
한편, 초순수저장탱크(15)내의 초순수가 배출배관(17)을 통해 공급되는 과정에서 초순수의 양이 줄어들게 되면, 외부로부터 산소가 유입될 염려가 있는 것이므로 제 4 밸브(24)를 열어 초순수의 배출과 동시에 가스탱크(18)로부터 불활성가스가 초순수저장탱크(15)내로 주입되도록 함으로써 불활성가스가 초순수가 빠져나간 공간을 채우게 되는 것이고, 이로서 외부로부터 산소유입을 방지할 수 있는 것이다.On the other hand, if the amount of ultrapure water is reduced in the process of supplying ultrapure water in the ultrapure water storage tank 15 through the discharge pipe 17, since there is a possibility that oxygen may flow from the outside, the fourth valve 24 is opened to discharge ultrapure water. At the same time, the inert gas is injected into the ultrapure water storage tank 15 from the gas tank 18, thereby filling the space in which the inert gas escapes the ultrapure water, thereby preventing the inflow of oxygen from the outside.
또한 본 발명은 안전장치로서 안전밸브(20)가 설치되어 초순수저장탱크(15)의 내부압이 일정치 이상을 넘지않도록 되어 있고, 솔레노이드밸브(21)에 의해 불활성가스가 항상 일정한 압으로 주입되어진다.In addition, in the present invention, the safety valve 20 is installed as a safety device so that the internal pressure of the ultrapure water storage tank 15 does not exceed a predetermined value, and the inert gas is always injected at a constant pressure by the solenoid valve 21. Lose.
다시 설비의 가동이 재개되어 초순수배관(11)으로 초순수가 흐르게 되면, 처음상태와 마찬가지로 연결배관(13)의 제 1 밸브(14)와 유입밸브(16)의 제 2 밸브(22)를 개방하여 초순수배관(11)으로부터 초순수의 일부가 공급될 수 있도록 하고, 배출배관(17)의 제 3 밸브(23)를 폐쇄시키게 되면 용존산소측정기(12)는 초순수배관(11)으로부터 공급되는 초순수의 용존산소를 지속적으로 측정할 수 있는 것이고, 초순수저장탱크(15)에는 다시 초순수가 저장되어진다.When operation of the equipment is restarted again and ultrapure water flows into the ultrapure water pipe 11, the first valve 14 of the connecting pipe 13 and the second valve 22 of the inlet valve 16 are opened as in the initial state. When a part of the ultrapure water can be supplied from the ultrapure water pipe 11 and the third valve 23 of the discharge pipe 17 is closed, the dissolved oxygen measuring device 12 is dissolved in the ultrapure water supplied from the ultrapure water pipe 11. Oxygen can be continuously measured, ultrapure water is stored in the ultrapure water storage tank 15 again.
이때 초순수저장탱크(15)내에 주입되어 있던 불활성가스는 초순수의 공급량만큼 안전밸브(20)를 통해 빠져나가게 되어 일정압을 계속 유지하게 된다.At this time, the inert gas injected into the ultrapure water storage tank 15 is discharged through the safety valve 20 as much as the supply amount of ultrapure water to maintain a constant pressure.
이상에서와 같이 본 발명에 따른 반도체 제조용 초순수의 용존산소 측정장치에 의하면, 설비의 가동이 중단된 상태에서도 초순수의 용존산소를 지속적으로 측정하는 것이 가능하므로 다시 설비를 가동시키는 경우에도 용존산소측정기의 안정화시간이 필요없어 설비의 가동율 및 제품의 생산성이 향상되는 효과가 있다.As described above, according to the apparatus for measuring dissolved oxygen of ultrapure water for semiconductor manufacturing according to the present invention, it is possible to continuously measure the dissolved oxygen of ultrapure water even when the operation of the equipment is stopped. There is no need for stabilization time, which increases the operating rate and productivity of the product.
이상에서 본 발명은 기재된 구체예에 대해서만 상세히 설명되었지만 본 발명의 기술사상 범위 내에서 다양한 변형 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 특허청구범위에 속함은 당연한 것이다.Although the present invention has been described in detail only with respect to the described embodiments, it will be apparent to those skilled in the art that various modifications and variations are possible within the technical scope of the present invention, and such modifications and modifications are within the scope of the appended claims.
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960035153A KR100191234B1 (en) | 1996-08-23 | 1996-08-23 | Dissolved oxygen measuring system for pure water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960035153A KR100191234B1 (en) | 1996-08-23 | 1996-08-23 | Dissolved oxygen measuring system for pure water |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR19980015717A KR19980015717A (en) | 1998-05-25 |
| KR100191234B1 true KR100191234B1 (en) | 1999-06-15 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960035153A KR100191234B1 (en) | 1996-08-23 | 1996-08-23 | Dissolved oxygen measuring system for pure water |
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| KR (1) | KR100191234B1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150128350A (en) | 2014-05-09 | 2015-11-18 | 주식회사 미래에스티 | Apparatus for producing ultra-pure water production |
| KR20160103826A (en) | 2015-02-25 | 2016-09-02 | 주식회사 미래에스티 | Filter of ultra-pure water production system and ultra-pure water production system using the same |
-
1996
- 1996-08-23 KR KR1019960035153A patent/KR100191234B1/en not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150128350A (en) | 2014-05-09 | 2015-11-18 | 주식회사 미래에스티 | Apparatus for producing ultra-pure water production |
| KR20160103826A (en) | 2015-02-25 | 2016-09-02 | 주식회사 미래에스티 | Filter of ultra-pure water production system and ultra-pure water production system using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| KR19980015717A (en) | 1998-05-25 |
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