KR970060403A - Semiconductor wafer cleaning system using pure water - Google Patents

Semiconductor wafer cleaning system using pure water Download PDF

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Publication number
KR970060403A
KR970060403A KR1019960000826A KR19960000826A KR970060403A KR 970060403 A KR970060403 A KR 970060403A KR 1019960000826 A KR1019960000826 A KR 1019960000826A KR 19960000826 A KR19960000826 A KR 19960000826A KR 970060403 A KR970060403 A KR 970060403A
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KR
South Korea
Prior art keywords
pure water
wafer
semiconductor wafer
cleaning system
cleaning
Prior art date
Application number
KR1019960000826A
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Korean (ko)
Other versions
KR100211642B1 (en
Inventor
김성일
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019960000826A priority Critical patent/KR100211642B1/en
Publication of KR970060403A publication Critical patent/KR970060403A/en
Application granted granted Critical
Publication of KR100211642B1 publication Critical patent/KR100211642B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

현장설비에서 현상 후 웨이퍼를 린스(Rinse)하기 위하여 분사노즐에서 분사되는 순수의 압력을 제어하여 웨이퍼 린스시 발생하는 웨이퍼의 세정분량을 방지하는 순수를 이용한 반도체 웨이퍼 세정 시스템이 개시되어 있다. 본 발명은 반도체 웨이퍼를 세정하기 위한 순수가 공급라인 중에 설치된 제1 레귤레이터에 의해 조절되면서 분사노즐을 통하여 분사되는 순수를 이용한 반도체 웨이퍼 세정 시스템에 있어서, 상기 분사노즐에 일정한 분사압력이 유지되도록 상기 분사노즐에 공기를 공급해주는 공기 공급라인이 더 설치되어 있는 것을 특징으로 한다. 따라서 웨이퍼 세정을 위해서 분사노즐을 통해서 공급되는 순수의 압력을 효과적으로 제어하여 웨이퍼 세정불량을 방지할 수 있다는 효과가 있다.There is disclosed a semiconductor wafer cleaning system using pure water that controls the pressure of pure water injected from an injection nozzle to rinse a wafer after development in a field facility to prevent the amount of cleaning of the wafer that occurs during wafer rinse. The present invention relates to a semiconductor wafer cleaning system using pure water sprayed through a spray nozzle while pure water for cleaning semiconductor wafers is regulated by a first regulator installed in a supply line, And an air supply line for supplying air to the nozzle is further provided. Therefore, the pressure of the pure water supplied through the injection nozzle for cleaning the wafer can be effectively controlled to prevent wafer cleaning defects.

Description

순수를 이용한 반도체 웨이퍼 세정 시스템Semiconductor wafer cleaning system using pure water

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제2도는 본 발명에 따른 순수를 이용한 반도체 웨이퍼 세정 시스템의 일 실시예를 나타내는 블럭도이다.FIG. 2 is a block diagram showing an embodiment of a semiconductor wafer cleaning system using pure water according to the present invention.

Claims (4)

반도체 웨이퍼를 세정하기 위한 순수가 공급라인 중에 설치된 제1 레귤레이터에 의해 조절되면서 분사노즐을 통하여 분사되는 순수를 이용한 반도체 웨이퍼 세정 시스템에 있어서, 상기 분사노즐에 일정한 분사압력이 유지되도록 상기 분사노즐에 공기를 공급해주는 공기 공급라인이 더 설치되어 있는 것을 특징으로 하는 순수를 이용한 반도체 웨이퍼 세정 시스템.1. A semiconductor wafer cleaning system using pure water sprayed through an injection nozzle while pure water for cleaning a semiconductor wafer is adjusted by a first regulator installed in a supply line, the system comprising: And an air supply line for supplying air to the semiconductor wafer cleaning system. 제1항에 있어서, 상기 공기 공급라인 중에는 제2 레귤레이터가 설치되어 공기의 공급량을 조절하는 것을 특징으로 하는 상기 순수를 이용한 반도체 웨이퍼 세정 시스템.The system according to claim 1, wherein a second regulator is installed in the air supply line to regulate a supply amount of air. 제2항에 있어서, 상기 제1 레귤레이터와 분사노즐 사이 및 상기 제2 레귤레이터와 분사노즐 사이에 각기 밸브가 설치되어 분사압력을 조절할 수 있는 것을 특징으로 하는 순수를 이용한 반도체 웨이퍼 세정 시스템.3. The semiconductor wafer cleaning system of claim 2, wherein a valve is provided between the first regulator and the spray nozzle and between the second regulator and the spray nozzle to adjust the spray pressure. 제1항에 있어서, 상기 제1 레귤레이터와 분사노즐 사이에 필터와 유량계가 설치되어 있는 것을 특징으로 하는 상기 순수를 이용한 반도체 웨이퍼 세정 시스템.The system of claim 1, wherein a filter and a flow meter are provided between the first regulator and the spray nozzle. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960000826A 1996-01-17 1996-01-17 Apparatus for cleaning semiconductor wafer with pure water KR100211642B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960000826A KR100211642B1 (en) 1996-01-17 1996-01-17 Apparatus for cleaning semiconductor wafer with pure water

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960000826A KR100211642B1 (en) 1996-01-17 1996-01-17 Apparatus for cleaning semiconductor wafer with pure water

Publications (2)

Publication Number Publication Date
KR970060403A true KR970060403A (en) 1997-08-12
KR100211642B1 KR100211642B1 (en) 1999-08-02

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960000826A KR100211642B1 (en) 1996-01-17 1996-01-17 Apparatus for cleaning semiconductor wafer with pure water

Country Status (1)

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KR (1) KR100211642B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100416590B1 (en) * 2001-01-13 2004-02-05 삼성전자주식회사 Apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100416590B1 (en) * 2001-01-13 2004-02-05 삼성전자주식회사 Apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same

Also Published As

Publication number Publication date
KR100211642B1 (en) 1999-08-02

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