KR20000039842A - Circuit for sensing misalignment of focus in stepper - Google Patents

Circuit for sensing misalignment of focus in stepper Download PDF

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Publication number
KR20000039842A
KR20000039842A KR1019980055304A KR19980055304A KR20000039842A KR 20000039842 A KR20000039842 A KR 20000039842A KR 1019980055304 A KR1019980055304 A KR 1019980055304A KR 19980055304 A KR19980055304 A KR 19980055304A KR 20000039842 A KR20000039842 A KR 20000039842A
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South Korea
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wafer
pulse signal
signal
shutter
stage
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KR1019980055304A
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Korean (ko)
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권오현
김성일
이상훈
김보현
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윤종용
삼성전자 주식회사
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Priority to KR1019980055304A priority Critical patent/KR20000039842A/en
Publication of KR20000039842A publication Critical patent/KR20000039842A/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605Workpiece metrology
    • G03F7/70616Monitoring the printed patterns
    • G03F7/70641Focus
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: A circuit is provided to sense a misalignment of focus in a stepper and thereby to prevent inferiority of a semiconductor device. CONSTITUTION: A stepper which is a kind of an exposure equipment is for transcribing an image of a reticle into circuit pattern of a wafer placed on a wafer stage. In a sensing circuit(10), a first input terminal(11) receives a shutter driving pulse signal, and a second input terminal(12) receives a stage driving pulse signal. When the wafer is subjected to an exposure process, the shutter driving pulse signal is high and the stage driving pulse signal is low. Further, when the wafer stage is moved to align the wafer, the shutter signal is low and the stage signal is high. Accordingly, such normal pulse signals become a low signal via an AND gate(15). However, if the wafer stage is vibrated while the shutter is opened, a certain high signal is generated in the low stage driving pulse signal. Therefore, two pulse signals are all in high level, and an output signal of the AND gate(15) is also in high level, so that a display part(16) indicates a poor operation.

Description

정렬 노광 장치의 초점 흔들림 감지 회로(Defocus sensing circuit for stepper)Defocus sensing circuit for stepper of alignment exposure device

본 발명은 정렬 노광 장치의 초점 흔들림 감지 회로에 관한 것으로서, 보다 구체적으로는 정렬 노광 장치에서 웨이퍼 위에 레티클의 이미지를 노광할 때 웨이퍼가 놓인 웨이퍼 스테이지가 진동하는 것을 감지하여 빛의 초점이 맞지 않는 것을 방지하기 위한 초점 흔들림 감지 회로에 관한 것이다.The present invention relates to a defocus detection circuit of an alignment exposure apparatus, and more particularly, to detect a vibration of a wafer stage on which a wafer is placed when an image of a reticle is exposed on a wafer in an alignment exposure apparatus, thereby preventing the light from focusing. A focus shake detection circuit for preventing.

정렬 노광 장치(Stepper)는 반도체 제조 공정에서 웨이퍼 상의 반도체 소자에 회로 패턴을 형성하기 위해서 일정한 파장을 갖는 광원을 이용하여 레티클(Reticle)의 이미지를 웨이퍼 위에 전사하는 장치이다. 정렬 노광 장치는 광학계에 의해서 예를 들면 5:1 정도로 축소된 레티클의 이미지를 반복 이동하여 웨이퍼 위에 바둑판 모양의 이미지를 만들어 낸다. 웨이퍼는 웨이퍼 스테이지(Wafer Stage) 위에 놓인 상태에서 노광되는데, 웨이퍼가 놓인 웨이퍼 스테이지는 축소된 레티클 이미지만큼 x-y 좌표 상에서 순차적으로 반복 이동하여 웨이퍼가 노광될 수 있도록 이동시키는 역할을 한다.An alignment exposure apparatus (stepper) is an apparatus for transferring an image of a reticle onto a wafer using a light source having a constant wavelength in order to form a circuit pattern on a semiconductor device on a wafer in a semiconductor manufacturing process. The alignment exposure apparatus repeatedly moves the image of the reticle reduced by, for example, about 5: 1 by the optical system to produce a checkered image on the wafer. The wafer is exposed while being placed on a wafer stage. The wafer stage on which the wafer is placed serves to sequentially expose the wafer by repeatedly moving on the x-y coordinates by the reduced reticle image.

셔터(Shutter)가 열리면 광원에서 발생된 빛은 레티클의 이미지를 웨이퍼 위에 노광한다. 이때, 웨이퍼 스테이지는 레티클과 웨이퍼를 정렬시킨 상태에서 정지해 있어야 하는데, 웨이퍼가 순차적으로 노광되도록 웨이퍼 스테이지가 움직일 때 발생하는 진동에 의해서 노광되는 동안 웨이퍼가 흔들릴 수 있다. 노광될 때 웨이퍼가 흔들리게 되면 빛의 초점이 맞지 않아서 웨이퍼에 형성된 회로 패턴의 해상도가 떨어지고, 반도체 소자에 불량이 발생하게 된다.When the shutter is opened, the light generated by the light source exposes an image of the reticle onto the wafer. At this time, the wafer stage should be stopped while the reticle and the wafer are aligned, and the wafer may be shaken during exposure by vibration generated when the wafer stage moves so that the wafer is sequentially exposed. If the wafer is shaken during exposure, light is out of focus and the resolution of the circuit pattern formed on the wafer is reduced, resulting in defects in the semiconductor device.

따라서, 본 발명의 목적은 셔터가 열리는 순간에 웨이퍼 스테이지가 진동하는지 여부를 감지하여 반도체 소자의 불량을 방지하는데 있다.Accordingly, an object of the present invention is to detect whether the wafer stage vibrates at the moment the shutter is opened to prevent defects in the semiconductor device.

도 1은 본 발명의 실시예에 따른 초점 흔들림 감지 회로를 나타내는 회로도,1 is a circuit diagram illustrating a focus shake detection circuit according to an exemplary embodiment of the present invention;

도 2는 셔터와 웨이퍼 스테이지의 구동에 대한 펄스 신호가 정상적으로 발생하는 경우를 나타내는 파형도,2 is a waveform diagram showing a case where a pulse signal for driving the shutter and the wafer stage normally occurs;

도 3은 셔터와 웨이퍼 스테이지의 구동에 대한 펄스 신호가 비정상적으로 발생하는 경우를 나타내는 파형도이다.3 is a waveform diagram illustrating a case where an abnormally generated pulse signal for driving a shutter and a wafer stage is generated.

도면의 주요 부분에 대한 설명Description of the main parts of the drawing

10; 초점 흔들림 감지 회로 11, 12; 입력 단자10; Focus shake detection circuits 11 and 12; Input terminal

13, 14; 트랜지스트 15; 논리곱 게이트13, 14; Transistor 15; Logical gate

16; 표시부16; Display

이러한 목적을 달성하기 위하여 본 발명은 셔터가 열린 상태와 닫힌 상태를 서로 다른 신호로 구분하여 셔터 구동 펄스 신호가 입력되는 제1입력부와, 웨이퍼 스테이지가 이동하는 상태와 정지한 상태를 서로 다른 신호로 구분하여 스테이지 구동 펄스 신호가 입력되는 제2입력부와, 셔터가 열린 상태를 나타내는 셔터 구동 펄스 신호와 웨이퍼 스테이지가 이동하는 상태를 나타내는 웨이퍼 스테이지 구동 신호가 동시에 입력되는 경우에만 소정의 신호를 출력하는 출력부를 포함하는 것을 특징으로 하는 초점 흔들림 감지 회로를 제공한다.In order to achieve the above object, the present invention divides an open state and a closed state into different signals so that a first input unit to which a shutter driving pulse signal is input, and a moving state and a stopped state of the wafer stage are different signals. An output for outputting a predetermined signal only when a second input unit for inputting a stage driving pulse signal separately and a shutter driving pulse signal indicating a shutter open state and a wafer stage driving signal indicating a state in which the wafer stage moves are simultaneously input; It provides a focus shake detection circuit comprising a portion.

이하, 도면을 참조하여 본 발명의 실시예를 상세히 설명하고자 한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

도 1은 본 발명의 실시예에 따른 초점 흔들림 감지 회로를 나타내는 회로도이고, 도 2는 셔터와 웨이퍼 스테이지의 구동에 대한 펄스 신호가 정상적으로 발생하는 경우를 나타내는 파형도이고, 도 3은 셔터와 웨이퍼 스테이지의 구동에 대한 펄스 신호가 비정상적으로 발생하는 경우를 나타내는 파형도이다.1 is a circuit diagram illustrating a focus shake detection circuit according to an exemplary embodiment of the present invention. FIG. 2 is a waveform diagram illustrating a case in which a pulse signal for driving a shutter and a wafer stage is normally generated. FIG. 3 is a shutter and a wafer stage. This is a waveform diagram showing a case where an abnormally generated pulse signal for driving of.

도 1 내지 도 3을 참조하면, 초점 흔들림 감지 회로(10)는 셔터 구동 펄스 신호가 입력되는 제1입력 단자(11)와 제1트랜지스터(13)로 이루어지는 제1입력부, 스테이지 구동 펄스 신호가 입력되는 제2입력 단자(12)와 제2트랜지스터(14)로 이루어지는 제2입력부, 논리곱 게이트(AND Gate)(15), 표시부(16)로 구성된다. 제1트랜지스터(13)와 제2트랜지스터(14)는 전원 Vcc, 입력 단자(11, 12), 논리곱 게이트(15)에 연결된다.Referring to FIGS. 1 to 3, the focus shake detection circuit 10 may include a first input unit 11 including a shutter driving pulse signal and a first transistor 13 and a stage driving pulse signal. And a second input unit including a second input terminal 12 and a second transistor 14, an AND gate 15, and a display unit 16. The first transistor 13 and the second transistor 14 are connected to the power supply Vcc, the input terminals 11 and 12, and the AND gate 15.

정렬 노광 장치의 셔터(도시되지 않음)의 동작 상태를 나타내는 셔터 구동 펄스 신호는 제1입력 단자(11)에 입력된다. 셔터 구동 펄스 신호는 셔터가 열릴 때에는 high, 셔터가 닫힐 때에는 low 상태로 입력된다. 웨이퍼 스테이지(도시되지 않음)의 동작 상태를 나타내는 스테이지 구동 펄스 신호는 제2입력 단자(12)에 입력된다. 스테이지 구동 펄스 신호는 웨이퍼 스테이지가 정지할 때에는 low, 이동할 때에는 high 상태로 입력된다.A shutter drive pulse signal indicating an operating state of a shutter (not shown) of the alignment exposure apparatus is input to the first input terminal 11. The shutter drive pulse signal is input high when the shutter is opened and low when the shutter is closed. A stage driving pulse signal indicating an operating state of a wafer stage (not shown) is input to the second input terminal 12. The stage driving pulse signal is input low when the wafer stage is stopped and high when moving.

따라서, 웨이퍼가 노광될 때에 셔터 구동 펄스 신호는 high, 스테이지 구동 펄스 신호는 low 상태이고, 레티클과 웨이퍼를 정렬하기 위해서 웨이퍼 스테이지가 이동할 때에 셔터 구동 펄스 신호는 low, 스테이지 구동 펄스 신호는 high 상태로 제1입력 단자(11)와 제2입력 단자(12)에 입력된다. 이와 같이, 정상적인 펄스 신호가 제1입력 단자(11)와 제2입력 단자(12)에 입력될 때에는 논리곱 게이트(15)에 의해서 low 상태의 신호가 출력되어 노광 공정을 계속 진행한다.Therefore, the shutter drive pulse signal is high when the wafer is exposed, the stage drive pulse signal is low, and the shutter drive pulse signal is low and the stage drive pulse signal is high when the wafer stage moves to align the reticle with the wafer. It is input to the 1st input terminal 11 and the 2nd input terminal 12. FIG. In this way, when the normal pulse signal is input to the first input terminal 11 and the second input terminal 12, the low-state signal is outputted by the AND gate 15 to continue the exposure process.

그러나, 셔터가 열려 있을 때에 웨이퍼 스테이지가 진동을 하게 되면 low 상태의 스테이지 구동 펄스 신호 중에 high 상태의 신호(A)가 나타나게 된다. 이와 같이, 셔터 구동 펄스 신호가 high 상태일 때에 스테이지 구동 펄스 신호가 high 상태로 되면, 논리곱 게이트(15)에 의해서 high 상태의 신호가 출력되어 노광 불량이 발생하는 것을 감지할 수 있다.However, if the wafer stage vibrates while the shutter is open, the signal A in the high state appears in the stage driving pulse signal in the low state. As described above, when the stage driving pulse signal becomes high when the shutter driving pulse signal is high, the high gate signal is output by the AND gate 15 to detect that an exposure failure occurs.

노광 불량이 발생하는 경우에는 이를 표시부(16)에 표시하여 작업자가 이를 인식하게 하거나, 제어 장치(도시되지 않음)에 의해서 웨이퍼 스테이지의 동작을 정지시킬 수 있다. 액정 표시판(Liquid Crystal Display) 등의 표시부(16)는 논리곱 게이트(15)에서 출력되는 high와 low의 2진수 신호를 10진수화하고, 이를 숫자로 표시하여 불량이 발생하는 경우에 불량이 발생한 위치를 확인할 수 있다.When an exposure failure occurs, the display unit 16 may display it so that an operator may recognize it, or the operation of the wafer stage may be stopped by a control device (not shown). The display unit 16, such as a liquid crystal display, decodes the high and low binary signals output from the AND gate 15, displays them numerically, and generates a failure in the case of a failure. You can check the location.

이상 설명한 바와 같이 본 발명에 의하면, 초점 흔들림으로 인한 불량이 발생하는 경우에 이를 발견하고 발생한 위치를 확인함으로써 불량 발생을 줄일 수 있다.As described above, according to the present invention, when a defect due to the focus shake occurs, the occurrence of the defect can be reduced by finding the detected position and confirming the generated position.

Claims (3)

셔터가 열린 상태와 닫힌 상태를 서로 다른 신호로 구분하여 셔터 구동 펄스 신호가 입력되는 제1입력부와,A first input unit configured to input a shutter driving pulse signal by dividing an open state and a closed state into different signals; 웨이퍼 스테이지가 이동하는 상태와 정지한 상태를 서로 다른 신호로 구분하여 스테이지 구동 펄스 신호가 입력되는 제2입력부와,A second input unit configured to divide the moving state and the stopped state of the wafer stage into different signals and input a stage driving pulse signal; 상기 셔터가 열린 상태를 나타내는 상기 셔터 구동 펄스 신호와 상기 웨이퍼 스테이지가 이동하는 상태를 나타내는 상기 웨이퍼 스테이지 구동 신호가 동시에 입력되는 경우에만 소정의 신호를 출력하는 출력부를 포함하는 것을 특징으로 하는 초점 흔들림 감지 회로.And an output unit for outputting a predetermined signal only when the shutter driving pulse signal representing the open state of the shutter and the wafer stage driving signal representing the state of moving the wafer stage are simultaneously input. Circuit. 제 1항에 있어서, 상기 출력부는 논리곱 게이트인 것을 특징으로 하는 초점 흔들림 감지 회로.The focus shake detection circuit of claim 1, wherein the output unit is an AND gate. 제 1항에 있어서, 상기 초점 흔들림 감지 회로는 상기 출력부에서 출력되는 상기 신호를 표시하는 표시부를 더 포함하는 것을 특징으로 하는 초점 흔들림 감지 회로.The focus shake detection circuit of claim 1, wherein the focus shake detection circuit further comprises a display unit for displaying the signal output from the output unit.
KR1019980055304A 1998-12-16 1998-12-16 Circuit for sensing misalignment of focus in stepper KR20000039842A (en)

Priority Applications (1)

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KR1019980055304A KR20000039842A (en) 1998-12-16 1998-12-16 Circuit for sensing misalignment of focus in stepper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019980055304A KR20000039842A (en) 1998-12-16 1998-12-16 Circuit for sensing misalignment of focus in stepper

Publications (1)

Publication Number Publication Date
KR20000039842A true KR20000039842A (en) 2000-07-05

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Family Applications (1)

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KR1019980055304A KR20000039842A (en) 1998-12-16 1998-12-16 Circuit for sensing misalignment of focus in stepper

Country Status (1)

Country Link
KR (1) KR20000039842A (en)

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