KR19990008146A - 합성 석영 분말의 제조방법 및 석영 유리 성형체의 제조방법 - Google Patents

합성 석영 분말의 제조방법 및 석영 유리 성형체의 제조방법 Download PDF

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Publication number
KR19990008146A
KR19990008146A KR1019970707671A KR19970707671A KR19990008146A KR 19990008146 A KR19990008146 A KR 19990008146A KR 1019970707671 A KR1019970707671 A KR 1019970707671A KR 19970707671 A KR19970707671 A KR 19970707671A KR 19990008146 A KR19990008146 A KR 19990008146A
Authority
KR
South Korea
Prior art keywords
powder
synthetic quartz
silica gel
rotary furnace
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019970707671A
Other languages
English (en)
Korean (ko)
Inventor
가쓰로요시오
시모야마마사루
마에다히로시
오이시쇼오지
Original Assignee
미우라아끼라
미쓰비시가가꾸가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP10588995A external-priority patent/JP3735887B2/ja
Priority claimed from JP10588895A external-priority patent/JP3735886B2/ja
Priority claimed from JP25245895A external-priority patent/JP3806953B2/ja
Priority claimed from JP25245695A external-priority patent/JP3875735B2/ja
Application filed by 미우라아끼라, 미쓰비시가가꾸가부시끼가이샤 filed Critical 미우라아끼라
Publication of KR19990008146A publication Critical patent/KR19990008146A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/11—Powder tap density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Silicon Compounds (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
KR1019970707671A 1995-04-28 1996-04-26 합성 석영 분말의 제조방법 및 석영 유리 성형체의 제조방법 Withdrawn KR19990008146A (ko)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
JP95/105888 1995-04-28
JP10588995A JP3735887B2 (ja) 1995-04-28 1995-04-28 合成石英粉の製造方法及び石英ガラス成形体の製造方法
JP10588895A JP3735886B2 (ja) 1995-04-28 1995-04-28 合成石英粉の製造方法及び石英ガラス成形体の製造方法
JP95/105889 1995-04-28
JP25245895A JP3806953B2 (ja) 1995-09-29 1995-09-29 合成石英粉の製造方法
JP95/252457 1995-09-29
JP25245695A JP3875735B2 (ja) 1995-09-29 1995-09-29 合成石英粉の製造方法
JP25245795 1995-09-29
JP95/252456 1995-09-29
JP95/252458 1995-09-29
PCT/JP1996/001176 WO1996033950A1 (fr) 1995-04-28 1996-04-26 Procedes pour produire de la poudre de quartz synthetique et pour produire du verre de quartz forme

Publications (1)

Publication Number Publication Date
KR19990008146A true KR19990008146A (ko) 1999-01-25

Family

ID=27526249

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970707671A Withdrawn KR19990008146A (ko) 1995-04-28 1996-04-26 합성 석영 분말의 제조방법 및 석영 유리 성형체의 제조방법

Country Status (5)

Country Link
US (1) US6129899A (https=)
EP (1) EP0823403B1 (https=)
KR (1) KR19990008146A (https=)
DE (1) DE69629111T2 (https=)
WO (1) WO1996033950A1 (https=)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1088789A3 (en) * 1999-09-28 2002-03-27 Heraeus Quarzglas GmbH & Co. KG Porous silica granule, its method of production and its use in a method for producing quartz glass
DE60123878T2 (de) * 2000-06-28 2007-05-24 Japan Super Quartz Corp. Synthetisches Quarzpulver, Verfahren zur Herstellung und synthetischer Quarztiegel
US6838068B2 (en) * 2000-06-30 2005-01-04 Mitsubishi Chemical Corporation Silica gel
WO2002026647A1 (en) * 2000-09-28 2002-04-04 Corning Incorporated Optical glass silica soot particles and method of making same
EP1411032B1 (en) * 2001-07-19 2016-12-28 Mitsubishi Chemical Corporation Process for producing a high purity powder
SG115586A1 (en) * 2002-11-12 2005-10-28 Nitto Denko Corp Epoxy resin composition for semiconductor encapsulation, and semiconductor device using the same
US20050014960A1 (en) * 2003-06-30 2005-01-20 Buijink Jan Karel Frederik Catalyst preparation
US7637126B2 (en) * 2003-12-08 2009-12-29 Heraeus Quarzglas Gmbh & Co. Kg Method for the production of laser-active quartz glass and use thereof
JP2008056533A (ja) * 2006-08-31 2008-03-13 Shinetsu Quartz Prod Co Ltd 石英ガラス及びその製造方法
US9249028B2 (en) 2010-02-08 2016-02-02 Momentive Performance Materials Inc. Method for making high purity metal oxide particles and materials made thereof
US8197782B2 (en) * 2010-02-08 2012-06-12 Momentive Performance Materials Method for making high purity metal oxide particles and materials made thereof
PL3218317T3 (pl) 2014-11-13 2019-03-29 Gerresheimer Glas Gmbh Filtr cząstek urządzenia do wytwarzania szkła, jednostka tłoka, głowica dmuchu, wspornik głowicy dmuchu i urządzenie do wytwarzania szkła, przystosowane lub zawierające filtr
JP6981710B2 (ja) 2015-12-18 2021-12-17 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 二酸化ケイ素造粒体からの石英ガラス体の調製
CN108698880B (zh) 2015-12-18 2023-05-02 贺利氏石英玻璃有限两合公司 不透明石英玻璃体的制备
EP3390303B1 (de) 2015-12-18 2024-02-07 Heraeus Quarzglas GmbH & Co. KG Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
CN109153593A (zh) 2015-12-18 2019-01-04 贺利氏石英玻璃有限两合公司 合成石英玻璃粉粒的制备
EP3390304B1 (de) 2015-12-18 2023-09-13 Heraeus Quarzglas GmbH & Co. KG Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
TWI840318B (zh) 2015-12-18 2024-05-01 德商何瑞斯廓格拉斯公司 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途
KR20180095618A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 다중-챔버 가열로에서 실리카 유리체의 제조
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
WO2017103153A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
US11339076B2 (en) 2015-12-18 2022-05-24 Heraeus Quarzglas Gmbh & Co. Kg Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58181735A (ja) * 1982-04-19 1983-10-24 Seiko Epson Corp 石英ガラスの製造法
JPS6335411A (ja) * 1986-07-29 1988-02-16 Tonen Sekiyukagaku Kk 高純度合成石英の製造方法
US5030433A (en) * 1988-07-18 1991-07-09 International Minerals & Chemical Corp. Process for producing pure and dense amorphous synthetic silica particles
DE69109026T2 (de) * 1990-09-07 1995-12-07 Mitsubishi Chem Corp Silica-Glas Pulver und Verfahren seiner Herstellung und daraus hergestellter Silica-Glasgegenstand.
US5211733A (en) * 1990-11-16 1993-05-18 Mitsubishi Kasei Corporation Method for producing a high-purity silica glass powder
KR940702469A (ko) * 1992-07-31 1994-08-20 스께하라 다로우 대형고순도 석영글라스판, 그 제조방법 및 제조장치
JPH06191824A (ja) * 1992-12-24 1994-07-12 Mitsubishi Kasei Corp 石英粉の廻転加熱方法
JPH072513A (ja) * 1993-06-15 1995-01-06 Kimmon Mfg Co Ltd 合成石英ガラス粉の製造方法
WO1996020128A1 (en) * 1994-12-26 1996-07-04 Mitsubishi Chemical Corporation Process for producing synthetic quartz powder
DE19729505A1 (de) * 1997-07-10 1999-01-14 Heraeus Quarzglas Verfahren zur Herstellung von Si0¶2¶-Granulat

Also Published As

Publication number Publication date
EP0823403A4 (https=) 1998-02-25
DE69629111T2 (de) 2004-04-22
EP0823403A1 (en) 1998-02-11
EP0823403B1 (en) 2003-07-16
US6129899A (en) 2000-10-10
WO1996033950A1 (fr) 1996-10-31
DE69629111D1 (de) 2003-08-21

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 19971028

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid