KR102937744B1 - 반도체 구조를 클리빙하기 위한 스프링 부재를 갖는 클리브 시스템 및 이러한 구조를 클리빙하기 위한 방법 - Google Patents
반도체 구조를 클리빙하기 위한 스프링 부재를 갖는 클리브 시스템 및 이러한 구조를 클리빙하기 위한 방법Info
- Publication number
- KR102937744B1 KR102937744B1 KR1020237031711A KR20237031711A KR102937744B1 KR 102937744 B1 KR102937744 B1 KR 102937744B1 KR 1020237031711 A KR1020237031711 A KR 1020237031711A KR 20237031711 A KR20237031711 A KR 20237031711A KR 102937744 B1 KR102937744 B1 KR 102937744B1
- Authority
- KR
- South Korea
- Prior art keywords
- cleave
- semiconductor structure
- suction
- cleaving
- arm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/18—Handling of layers or the laminate
- B32B38/1858—Handling of layers or the laminate using vacuum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B43/00—Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
- B32B43/006—Delaminating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P54/00—Cutting or separating of wafers, substrates or parts of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/14—Semiconductor wafers
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Dicing (AREA)
- Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962906860P | 2019-09-27 | 2019-09-27 | |
| US62/906,860 | 2019-09-27 | ||
| PCT/US2020/051180 WO2021061480A1 (en) | 2019-09-27 | 2020-09-17 | Cleave systems having spring members for cleaving a semiconductor structure and methods for cleaving such structures |
| KR1020227013720A KR102710431B1 (ko) | 2019-09-27 | 2020-09-17 | 반도체 구조를 클리빙하기 위한 스프링 부재를 갖는 클리브 시스템 및 이러한 구조를 클리빙하기 위한 방법 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020227013720A Division KR102710431B1 (ko) | 2019-09-27 | 2020-09-17 | 반도체 구조를 클리빙하기 위한 스프링 부재를 갖는 클리브 시스템 및 이러한 구조를 클리빙하기 위한 방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20230137484A KR20230137484A (ko) | 2023-10-04 |
| KR102937744B1 true KR102937744B1 (ko) | 2026-03-12 |
Family
ID=72709863
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020237031711A Active KR102937744B1 (ko) | 2019-09-27 | 2020-09-17 | 반도체 구조를 클리빙하기 위한 스프링 부재를 갖는 클리브 시스템 및 이러한 구조를 클리빙하기 위한 방법 |
| KR1020227013720A Active KR102710431B1 (ko) | 2019-09-27 | 2020-09-17 | 반도체 구조를 클리빙하기 위한 스프링 부재를 갖는 클리브 시스템 및 이러한 구조를 클리빙하기 위한 방법 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020227013720A Active KR102710431B1 (ko) | 2019-09-27 | 2020-09-17 | 반도체 구조를 클리빙하기 위한 스프링 부재를 갖는 클리브 시스템 및 이러한 구조를 클리빙하기 위한 방법 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US11538698B2 (https=) |
| EP (1) | EP4035202B1 (https=) |
| JP (2) | JP7418559B2 (https=) |
| KR (2) | KR102937744B1 (https=) |
| CN (1) | CN114556540A (https=) |
| TW (2) | TWI833039B (https=) |
| WO (1) | WO2021061480A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7309191B2 (ja) * | 2019-11-06 | 2023-07-18 | 中村留精密工業株式会社 | ウェハー分割装置 |
| US12019031B2 (en) * | 2020-09-16 | 2024-06-25 | Globalwafers Co., Ltd. | Cleaved semiconductor wafer imaging system |
| US20260026320A1 (en) * | 2024-07-19 | 2026-01-22 | Globalwafers Co., Ltd. | Cleaving systems and methods for cleaving semiconductor structures by combined thermal and mechanical stress induction |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004335930A (ja) | 2003-05-12 | 2004-11-25 | Juki Corp | ウェハの劈開方法及び劈開装置 |
| US20130062020A1 (en) | 2011-03-15 | 2013-03-14 | Memc Electronic Materials, Inc. | Systems and Methods for Cleaving A Bonded Wafer Pair |
| US20150101758A1 (en) | 2013-10-11 | 2015-04-16 | Tokyo Electron Limited | Peel-off apparatus, peel-off system, peel-off method and computer storage medium |
| US20180071771A1 (en) | 2016-09-13 | 2018-03-15 | SCREEN Holdings Co., Ltd. | Detaching apparatus and detaching method |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB763831A (en) * | 1953-06-01 | 1956-12-19 | Headley Townsend Backhouse | Improvements in sheet separating and forwarding devices |
| CH635769A5 (fr) * | 1980-03-10 | 1983-04-29 | Far Fab Assortiments Reunies | Installation pour le sciage de plaques et dispositif de manutention pour une telle installation. |
| JP2726002B2 (ja) * | 1994-06-06 | 1998-03-11 | 株式会社アマダ | 一枚取り装置 |
| US5676364A (en) | 1994-08-19 | 1997-10-14 | Amada Company, Limited | Plate material separating apparatus |
| JPH08229887A (ja) * | 1994-12-27 | 1996-09-10 | Seiko Epson Corp | 積層シートのカット方法およびその装置 |
| JPH115064A (ja) * | 1997-06-16 | 1999-01-12 | Canon Inc | 試料の分離装置及びその方法並びに基板の製造方法 |
| JP2000150456A (ja) | 1998-11-06 | 2000-05-30 | Canon Inc | 試料の分離装置及び分離方法 |
| US6263941B1 (en) | 1999-08-10 | 2001-07-24 | Silicon Genesis Corporation | Nozzle for cleaving substrates |
| JP4517315B2 (ja) | 1999-10-08 | 2010-08-04 | 株式会社ニコン | 基板落下防止機構およびこれを備えた基板検査装置 |
| EP1624484B1 (en) | 2003-05-13 | 2012-03-28 | Mimasu Semiconductor Industry Co., Ltd. | Wafer demounting method, wafer demounting device, and wafer demounting and transferring machine |
| US20050150597A1 (en) * | 2004-01-09 | 2005-07-14 | Silicon Genesis Corporation | Apparatus and method for controlled cleaving |
| US7427554B2 (en) | 2005-08-12 | 2008-09-23 | Silicon Genesis Corporation | Manufacturing strained silicon substrates using a backing material |
| US8993410B2 (en) | 2006-09-08 | 2015-03-31 | Silicon Genesis Corporation | Substrate cleaving under controlled stress conditions |
| US11389171B2 (en) * | 2006-11-21 | 2022-07-19 | David S. Goldsmith | Integrated system for the infixion and retrieval of implants |
| JP6145415B2 (ja) | 2014-02-27 | 2017-06-14 | 東京エレクトロン株式会社 | 剥離方法、プログラム、コンピュータ記憶媒体、剥離装置及び剥離システム |
| WO2017065155A1 (ja) | 2015-10-16 | 2017-04-20 | 旭硝子株式会社 | 積層体の剥離装置及び剥離方法並びに電子デバイスの製造方法 |
| JP2017168563A (ja) | 2016-03-15 | 2017-09-21 | 日本電気硝子株式会社 | 基板の剥離装置 |
| WO2018188731A1 (de) | 2017-04-11 | 2018-10-18 | Muehlbauer GmbH & Co. KG | Bauteil-empfangseinrichtung mit optischem sensor |
| KR102565070B1 (ko) | 2017-09-04 | 2023-08-08 | 린텍 가부시키가이샤 | 박형화 판상 부재의 제조 방법, 및 제조 장치 |
| CN208898748U (zh) * | 2019-03-11 | 2019-05-24 | 成都力维展示工程有限公司 | 一种具有自动掰片功能的玻璃切割机 |
-
2020
- 2020-09-10 US US17/017,319 patent/US11538698B2/en active Active
- 2020-09-17 KR KR1020237031711A patent/KR102937744B1/ko active Active
- 2020-09-17 WO PCT/US2020/051180 patent/WO2021061480A1/en not_active Ceased
- 2020-09-17 EP EP20785642.8A patent/EP4035202B1/en active Active
- 2020-09-17 KR KR1020227013720A patent/KR102710431B1/ko active Active
- 2020-09-17 JP JP2022519372A patent/JP7418559B2/ja active Active
- 2020-09-17 CN CN202080072907.2A patent/CN114556540A/zh active Pending
- 2020-09-22 TW TW109132794A patent/TWI833039B/zh active
- 2020-09-22 TW TW112134734A patent/TWI902008B/zh active
-
2022
- 2022-09-29 US US17/956,402 patent/US12148635B2/en active Active
-
2023
- 2023-09-21 JP JP2023156214A patent/JP7699633B2/ja active Active
-
2024
- 2024-06-11 US US18/739,890 patent/US12334369B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004335930A (ja) | 2003-05-12 | 2004-11-25 | Juki Corp | ウェハの劈開方法及び劈開装置 |
| US20130062020A1 (en) | 2011-03-15 | 2013-03-14 | Memc Electronic Materials, Inc. | Systems and Methods for Cleaving A Bonded Wafer Pair |
| US20150101758A1 (en) | 2013-10-11 | 2015-04-16 | Tokyo Electron Limited | Peel-off apparatus, peel-off system, peel-off method and computer storage medium |
| US20180071771A1 (en) | 2016-09-13 | 2018-03-15 | SCREEN Holdings Co., Ltd. | Detaching apparatus and detaching method |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI902008B (zh) | 2025-10-21 |
| KR102710431B1 (ko) | 2024-09-25 |
| EP4035202A1 (en) | 2022-08-03 |
| EP4035202B1 (en) | 2023-08-16 |
| KR20220071229A (ko) | 2022-05-31 |
| US12148635B2 (en) | 2024-11-19 |
| JP7699633B2 (ja) | 2025-06-27 |
| JP2023171825A (ja) | 2023-12-05 |
| WO2021061480A1 (en) | 2021-04-01 |
| US20230031395A1 (en) | 2023-02-02 |
| US20210098272A1 (en) | 2021-04-01 |
| JP7418559B2 (ja) | 2024-01-19 |
| CN114556540A (zh) | 2022-05-27 |
| US11538698B2 (en) | 2022-12-27 |
| US20240332042A1 (en) | 2024-10-03 |
| KR20230137484A (ko) | 2023-10-04 |
| TW202127566A (zh) | 2021-07-16 |
| TWI833039B (zh) | 2024-02-21 |
| US12334369B2 (en) | 2025-06-17 |
| TW202403938A (zh) | 2024-01-16 |
| JP2022550363A (ja) | 2022-12-01 |
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