KR102825486B1 - 기판 세정 장치 - Google Patents

기판 세정 장치 Download PDF

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Publication number
KR102825486B1
KR102825486B1 KR1020247003898A KR20247003898A KR102825486B1 KR 102825486 B1 KR102825486 B1 KR 102825486B1 KR 1020247003898 A KR1020247003898 A KR 1020247003898A KR 20247003898 A KR20247003898 A KR 20247003898A KR 102825486 B1 KR102825486 B1 KR 102825486B1
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KR
South Korea
Prior art keywords
substrate
brush
cleaning
liquid
lower brush
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
KR1020247003898A
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English (en)
Korean (ko)
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KR20240029067A (ko
Inventor
다쿠마 다카하시
도모유키 시노하라
준이치 이시이
가즈키 나카무라
다카시 시노하라
노부아키 오키타
요시후미 오카다
Original Assignee
가부시키가이샤 스크린 홀딩스
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Application filed by 가부시키가이샤 스크린 홀딩스 filed Critical 가부시키가이샤 스크린 홀딩스
Publication of KR20240029067A publication Critical patent/KR20240029067A/ko
Application granted granted Critical
Publication of KR102825486B1 publication Critical patent/KR102825486B1/ko
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    • H01L21/67046—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/12—Brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/36—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis orthogonal to the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
    • B08B1/52—Cleaning by methods involving the use of tools involving cleaning of the cleaning members using fluids
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

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  • Cleaning Or Drying Semiconductors (AREA)
KR1020247003898A 2021-07-15 2022-06-30 기판 세정 장치 Active KR102825486B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2021-117423 2021-07-15
JP2021117423A JP7810528B2 (ja) 2021-07-15 2021-07-15 基板洗浄装置
PCT/JP2022/026392 WO2023286635A1 (ja) 2021-07-15 2022-06-30 基板洗浄装置

Publications (2)

Publication Number Publication Date
KR20240029067A KR20240029067A (ko) 2024-03-05
KR102825486B1 true KR102825486B1 (ko) 2025-06-30

Family

ID=84920207

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247003898A Active KR102825486B1 (ko) 2021-07-15 2022-06-30 기판 세정 장치

Country Status (6)

Country Link
US (1) US12463063B2 (https=)
JP (1) JP7810528B2 (https=)
KR (1) KR102825486B1 (https=)
CN (1) CN117642846A (https=)
TW (2) TWI850692B (https=)
WO (1) WO2023286635A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7810528B2 (ja) 2021-07-15 2026-02-03 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置
CN118268297B (zh) * 2024-06-03 2024-08-30 沈阳和研科技股份有限公司 一种陶瓷吸盘清洁装置及划片机
CN118635188B (zh) * 2024-08-13 2024-11-05 河南新黄水电工程有限公司辉县百泉分公司 一种水利工程施工设备的刷洗机构
CN118831879B (zh) * 2024-09-24 2025-01-24 洛阳合兴工贸有限公司 一种汽车连杆加工用清洁装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003332287A (ja) * 2002-05-17 2003-11-21 Dainippon Screen Mfg Co Ltd 基板洗浄方法及びその装置
JP2020017689A (ja) * 2018-07-27 2020-01-30 芝浦メカトロニクス株式会社 基板洗浄装置及び基板洗浄方法
JP2021093427A (ja) * 2019-12-09 2021-06-17 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置および基板洗浄方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2877216B2 (ja) * 1992-10-02 1999-03-31 東京エレクトロン株式会社 洗浄装置
JP5904169B2 (ja) 2013-07-23 2016-04-13 東京エレクトロン株式会社 基板洗浄装置、基板洗浄方法及び記憶媒体
JP6740028B2 (ja) 2015-07-29 2020-08-12 東京エレクトロン株式会社 基板処理装置、基板処理方法および記憶媒体
JP6969434B2 (ja) 2018-02-21 2021-11-24 東京エレクトロン株式会社 洗浄具、基板洗浄装置及び基板洗浄方法
KR102935928B1 (ko) 2019-09-17 2026-03-06 가부시키가이샤 스크린 홀딩스 기판 세정 장치
JP7810528B2 (ja) 2021-07-15 2026-02-03 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003332287A (ja) * 2002-05-17 2003-11-21 Dainippon Screen Mfg Co Ltd 基板洗浄方法及びその装置
JP2020017689A (ja) * 2018-07-27 2020-01-30 芝浦メカトロニクス株式会社 基板洗浄装置及び基板洗浄方法
JP2021093427A (ja) * 2019-12-09 2021-06-17 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置および基板洗浄方法

Also Published As

Publication number Publication date
US12463063B2 (en) 2025-11-04
US20240321598A1 (en) 2024-09-26
KR20240029067A (ko) 2024-03-05
TWI850692B (zh) 2024-08-01
JP2023013332A (ja) 2023-01-26
JP7810528B2 (ja) 2026-02-03
WO2023286635A1 (ja) 2023-01-19
CN117642846A (zh) 2024-03-01
TW202318479A (zh) 2023-05-01
TW202447827A (zh) 2024-12-01

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