CN117642846A - 基板清洗装置 - Google Patents

基板清洗装置 Download PDF

Info

Publication number
CN117642846A
CN117642846A CN202280049929.6A CN202280049929A CN117642846A CN 117642846 A CN117642846 A CN 117642846A CN 202280049929 A CN202280049929 A CN 202280049929A CN 117642846 A CN117642846 A CN 117642846A
Authority
CN
China
Prior art keywords
substrate
cleaning
brush
surface brush
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280049929.6A
Other languages
English (en)
Chinese (zh)
Inventor
高桥拓马
筱原智之
石井淳一
中村一树
筱原敬
冲田展彬
冈田吉文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Publication of CN117642846A publication Critical patent/CN117642846A/zh
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/12—Brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/36—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis orthogonal to the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
    • B08B1/52—Cleaning by methods involving the use of tools involving cleaning of the cleaning members using fluids
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
CN202280049929.6A 2021-07-15 2022-06-30 基板清洗装置 Pending CN117642846A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021117423A JP7810528B2 (ja) 2021-07-15 2021-07-15 基板洗浄装置
JP2021-117423 2021-07-15
PCT/JP2022/026392 WO2023286635A1 (ja) 2021-07-15 2022-06-30 基板洗浄装置

Publications (1)

Publication Number Publication Date
CN117642846A true CN117642846A (zh) 2024-03-01

Family

ID=84920207

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280049929.6A Pending CN117642846A (zh) 2021-07-15 2022-06-30 基板清洗装置

Country Status (6)

Country Link
US (1) US12463063B2 (https=)
JP (1) JP7810528B2 (https=)
KR (1) KR102825486B1 (https=)
CN (1) CN117642846A (https=)
TW (2) TWI850692B (https=)
WO (1) WO2023286635A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7810528B2 (ja) 2021-07-15 2026-02-03 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置
CN118268297B (zh) * 2024-06-03 2024-08-30 沈阳和研科技股份有限公司 一种陶瓷吸盘清洁装置及划片机
CN118635188B (zh) * 2024-08-13 2024-11-05 河南新黄水电工程有限公司辉县百泉分公司 一种水利工程施工设备的刷洗机构
CN118831879B (zh) * 2024-09-24 2025-01-24 洛阳合兴工贸有限公司 一种汽车连杆加工用清洁装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2877216B2 (ja) * 1992-10-02 1999-03-31 東京エレクトロン株式会社 洗浄装置
JP4033709B2 (ja) 2002-05-17 2008-01-16 大日本スクリーン製造株式会社 基板洗浄方法及びその装置
JP5904169B2 (ja) 2013-07-23 2016-04-13 東京エレクトロン株式会社 基板洗浄装置、基板洗浄方法及び記憶媒体
JP6740028B2 (ja) 2015-07-29 2020-08-12 東京エレクトロン株式会社 基板処理装置、基板処理方法および記憶媒体
JP6969434B2 (ja) 2018-02-21 2021-11-24 東京エレクトロン株式会社 洗浄具、基板洗浄装置及び基板洗浄方法
JP7104580B2 (ja) 2018-07-27 2022-07-21 芝浦メカトロニクス株式会社 基板洗浄装置及び基板洗浄方法
KR102935928B1 (ko) 2019-09-17 2026-03-06 가부시키가이샤 스크린 홀딩스 기판 세정 장치
JP7291068B2 (ja) 2019-12-09 2023-06-14 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置および基板洗浄方法
JP7810528B2 (ja) 2021-07-15 2026-02-03 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置

Also Published As

Publication number Publication date
US12463063B2 (en) 2025-11-04
US20240321598A1 (en) 2024-09-26
KR102825486B1 (ko) 2025-06-30
KR20240029067A (ko) 2024-03-05
TWI850692B (zh) 2024-08-01
JP2023013332A (ja) 2023-01-26
JP7810528B2 (ja) 2026-02-03
WO2023286635A1 (ja) 2023-01-19
TW202318479A (zh) 2023-05-01
TW202447827A (zh) 2024-12-01

Similar Documents

Publication Publication Date Title
CN115472527B (zh) 衬底洗净装置及衬底洗净方法
CN114203583B (zh) 衬底洗净装置、衬底处理装置及衬底洗净方法
CN117642846A (zh) 基板清洗装置
CN114551291B (zh) 下表面刷、刷基座及衬底清洗装置
JP2022051026A (ja) 基板洗浄装置およびそれを備える基板処理装置
JP2022051029A (ja) 基板洗浄装置および基板洗浄方法
CN115588628B (zh) 衬底洗净装置及衬底洗净方法
TW202226409A (zh) 基板洗淨裝置及基板洗淨方法
CN115513093B (zh) 衬底洗净装置及衬底洗净方法
CN117732765A (zh) 下表面刷、刷单元及基板清洗装置
CN118248589B (zh) 衬底处理装置及衬底处理方法
JP7491805B2 (ja) 基板洗浄装置および基板洗浄方法
JP7589266B2 (ja) 基板処理装置および基板処理方法
JP7591024B2 (ja) 基板処理装置および基板処理方法
JP7672908B2 (ja) 基板洗浄装置および基板洗浄方法
CN118248588A (zh) 衬底处理装置及衬底处理方法
CN117772650A (zh) 基板清洗刷及基板清洗装置

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination