KR102700446B1 - 광원 장치, 조명 장치 및 노광 장치 - Google Patents

광원 장치, 조명 장치 및 노광 장치 Download PDF

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Publication number
KR102700446B1
KR102700446B1 KR1020210036402A KR20210036402A KR102700446B1 KR 102700446 B1 KR102700446 B1 KR 102700446B1 KR 1020210036402 A KR1020210036402 A KR 1020210036402A KR 20210036402 A KR20210036402 A KR 20210036402A KR 102700446 B1 KR102700446 B1 KR 102700446B1
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South Korea
Prior art keywords
led
chip
light source
substrate
led chips
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KR1020210036402A
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English (en)
Korean (ko)
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KR20210122109A (ko
Inventor
다이스케 야스나가
겐타로 히루마
Original Assignee
캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50—Cooling arrangements
    • F21V29/56—Cooling arrangements using liquid coolants
    • F21V29/58—Cooling arrangements using liquid coolants characterised by the coolants
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
    • F21K9/00—Light sources using semiconductor devices as light-generating elements, e.g. using light-emitting diodes [LED] or lasers
    • F21K9/20—Light sources comprising attachment means
    • F21K9/23—Retrofit light sources for lighting devices with a single fitting for each light source, e.g. for substitution of incandescent lamps with bayonet or threaded fittings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50—Cooling arrangements
    • F21V29/502—Cooling arrangements characterised by the adaptation for cooling of specific components
    • F21V29/503—Cooling arrangements characterised by the adaptation for cooling of specific components of light sources
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V5/00—Refractors for light sources
    • F21V5/04—Refractors for light sources of lens shape
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • H01L21/027—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B45/00—Circuit arrangements for operating light-emitting diodes [LED]
    • H05B45/10—Controlling the intensity of the light
    • H05B45/14—Controlling the intensity of the light using electrical feedback from LEDs or from LED modules
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2105/00—Planar light sources
    • F21Y2105/10—Planar light sources comprising a two-dimensional [2D] array of point-like light-generating elements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2115/00—Light-generating elements of semiconductor light sources
    • F21Y2115/10—Light-emitting diodes [LED]

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Led Device Packages (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020210036402A 2020-03-30 2021-03-22 광원 장치, 조명 장치 및 노광 장치 Active KR102700446B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2020-060987 2020-03-30
JP2020060987A JP7458853B2 (ja) 2020-03-30 2020-03-30 光源装置、照明装置、及び露光装置。

Publications (2)

Publication Number Publication Date
KR20210122109A KR20210122109A (ko) 2021-10-08
KR102700446B1 true KR102700446B1 (ko) 2024-08-30

Family

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KR1020210036402A Active KR102700446B1 (ko) 2020-03-30 2021-03-22 광원 장치, 조명 장치 및 노광 장치

Country Status (3)

Country Link
JP (1) JP7458853B2 (https=)
KR (1) KR102700446B1 (https=)
CN (1) CN113467191A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2026046013A (ja) * 2024-08-30 2026-03-13 キヤノン株式会社 光源装置、露光装置、および、物品製造方法

Citations (2)

* Cited by examiner, † Cited by third party
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JP2006019412A (ja) * 2004-06-30 2006-01-19 Canon Inc 露光装置及びデバイスの製造方法
JP2018031848A (ja) * 2016-08-23 2018-03-01 株式会社リコー 光源装置、画像投写装置、及び光源装置の配置方法

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* Cited by examiner, † Cited by third party
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JP2007073984A (ja) * 2003-01-16 2007-03-22 Nikon Corp 照明光源装置、露光装置及び露光方法
JP2004274011A (ja) * 2003-01-16 2004-09-30 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2005316441A (ja) * 2004-03-30 2005-11-10 Sanyo Electric Co Ltd 照明装置及び投写型映像表示装置
JP2005339881A (ja) * 2004-05-25 2005-12-08 Hitachi Displays Ltd 照明装置、照明モジュール及び液晶表示装置
JP4148230B2 (ja) * 2005-03-01 2008-09-10 セイコーエプソン株式会社 冷却ユニットの製造方法、冷却ユニット、光学装置、並びにプロジェクタ
TWI345661B (en) * 2006-10-30 2011-07-21 Coretronic Corp Backlight module
JP5344809B2 (ja) 2007-11-21 2013-11-20 アルパイン株式会社 バックライト装置
JP2010098204A (ja) * 2008-10-20 2010-04-30 Stanley Electric Co Ltd 光源の冷却構造
US8592830B2 (en) * 2009-04-13 2013-11-26 Panasonic Corporation LED unit
JP2010278130A (ja) * 2009-05-27 2010-12-09 Toyota Motor Corp パワーデバイスの冷却装置及び燃料電池システム
KR101034935B1 (ko) * 2009-07-30 2011-05-17 박상희 방송 및 사진 촬영용 엘이디 조명장치
WO2015064470A1 (ja) * 2013-10-30 2015-05-07 オリンパスメディカルシステムズ株式会社 光源装置及び内視鏡装置
JP2016111268A (ja) * 2014-12-09 2016-06-20 キヤノン株式会社 冷却装置、照明光学系、露光装置、並びに物品の製造方法
CN104896330A (zh) * 2015-06-03 2015-09-09 中国科学院半导体研究所 Led光源模组
JP2017045002A (ja) * 2015-08-28 2017-03-02 キヤノン株式会社 光源装置及び投射型表示装置
CN109844970B (zh) * 2016-07-28 2023-04-04 亮锐有限责任公司 具有反射侧覆层的发光器件封装
EP3301999B1 (en) * 2016-09-30 2020-06-17 HP Scitex Ltd Light emitting diode heatsink
JP6636996B2 (ja) * 2017-07-11 2020-01-29 ファナック株式会社 Ｌｄモジュール冷却装置及びレーザ装置
EP3495050A1 (en) * 2017-12-07 2019-06-12 Syddansk Universitet Fluid based cooling system
CN110095929A (zh) * 2018-01-29 2019-08-06 精工爱普生株式会社 投影仪

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006019412A (ja) * 2004-06-30 2006-01-19 Canon Inc 露光装置及びデバイスの製造方法
JP2018031848A (ja) * 2016-08-23 2018-03-01 株式会社リコー 光源装置、画像投写装置、及び光源装置の配置方法

Also Published As

Publication number Publication date
JP2021162613A (ja) 2021-10-11
CN113467191A (zh) 2021-10-01
KR20210122109A (ko) 2021-10-08
JP7458853B2 (ja) 2024-04-01

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