KR102683680B1 - 광학 교정 어셈블리, 이러한 광학 교정 어셈블리를 포함하는 투영 오브젝티브 및 이러한 투영 오브젝티브를 포함하는 마이크로리소그래픽 장치 - Google Patents

광학 교정 어셈블리, 이러한 광학 교정 어셈블리를 포함하는 투영 오브젝티브 및 이러한 투영 오브젝티브를 포함하는 마이크로리소그래픽 장치 Download PDF

Info

Publication number
KR102683680B1
KR102683680B1 KR1020187011256A KR20187011256A KR102683680B1 KR 102683680 B1 KR102683680 B1 KR 102683680B1 KR 1020187011256 A KR1020187011256 A KR 1020187011256A KR 20187011256 A KR20187011256 A KR 20187011256A KR 102683680 B1 KR102683680 B1 KR 102683680B1
Authority
KR
South Korea
Prior art keywords
correction
optical
optical correction
correction device
manipulator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020187011256A
Other languages
English (en)
Korean (ko)
Other versions
KR20180058764A (ko
Inventor
홀거 봘터
홀거 ”U터
Original Assignee
칼 짜이스 에스엠티 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 에스엠티 게엠베하 filed Critical 칼 짜이스 에스엠티 게엠베하
Publication of KR20180058764A publication Critical patent/KR20180058764A/ko
Application granted granted Critical
Publication of KR102683680B1 publication Critical patent/KR102683680B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/04—Simple or compound lenses with non-spherical faces with continuous faces that are rotationally symmetrical but deviate from a true sphere, e.g. so called "aspheric" lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0081—Simple or compound lenses having one or more elements with analytic function to create variable power

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020187011256A 2015-09-24 2016-09-06 광학 교정 어셈블리, 이러한 광학 교정 어셈블리를 포함하는 투영 오브젝티브 및 이러한 투영 오브젝티브를 포함하는 마이크로리소그래픽 장치 Active KR102683680B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015218329.7A DE102015218329A1 (de) 2015-09-24 2015-09-24 Optische Korrekturanordnung, Projektionsobjektiv mit einer solchen optischen Korrekturanordnung sowie mikrolithografische Apparatur mit einem solchen Projektionsobjektiv
DE102015218329.7 2015-09-24
PCT/EP2016/070981 WO2017050565A1 (de) 2015-09-24 2016-09-06 Optische korrekturanordnung, projektionsobjektiv mit einer solchen optischen korrekturanordnung sowie mikrolithografische apparatur mit einem solchen projektionsobjektiv

Publications (2)

Publication Number Publication Date
KR20180058764A KR20180058764A (ko) 2018-06-01
KR102683680B1 true KR102683680B1 (ko) 2024-07-11

Family

ID=56883789

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187011256A Active KR102683680B1 (ko) 2015-09-24 2016-09-06 광학 교정 어셈블리, 이러한 광학 교정 어셈블리를 포함하는 투영 오브젝티브 및 이러한 투영 오브젝티브를 포함하는 마이크로리소그래픽 장치

Country Status (6)

Country Link
US (1) US10859815B2 (enExample)
JP (1) JP6842461B2 (enExample)
KR (1) KR102683680B1 (enExample)
CN (1) CN108027502B (enExample)
DE (1) DE102015218329A1 (enExample)
WO (1) WO2017050565A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107544130B (zh) * 2016-06-29 2020-05-22 佳能株式会社 附接光学系统、图像捕获光学系统和图像捕获装置
DE102018201495A1 (de) * 2018-01-31 2019-01-10 Carl Zeiss Smt Gmbh Abbildendes optisches System für die Mikrolithographie
NL2024520A (en) 2019-01-17 2020-08-14 Asml Netherlands Bv Target delivery system
JP7178932B2 (ja) * 2019-03-12 2022-11-28 キヤノン株式会社 露光装置、および物品製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004327807A (ja) * 2003-04-25 2004-11-18 Canon Inc 光学素子位置決め装置、それを用いた露光装置、デバイスの製造方法
JP2010506388A (ja) * 2006-10-02 2010-02-25 カール・ツァイス・エスエムティー・アーゲー 光学システムの結像特性を改善する方法及びその光学システム
JP2010166007A (ja) * 2009-01-19 2010-07-29 Canon Inc 投影光学系、露光装置及びデバイス製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142555A (ja) * 1996-11-06 1998-05-29 Nikon Corp 投影露光装置
JP3303758B2 (ja) * 1996-12-28 2002-07-22 キヤノン株式会社 投影露光装置及びデバイスの製造方法
DE69728126T2 (de) * 1996-12-28 2005-01-20 Canon K.K. Projektionsbelichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
JP3459773B2 (ja) * 1998-06-24 2003-10-27 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP2003107311A (ja) * 2001-09-27 2003-04-09 Nikon Corp 光学素子保持装置、鏡筒及び露光装置並びにデバイスの製造方法
JP2003178954A (ja) * 2001-12-12 2003-06-27 Canon Inc 露光装置及びデバイスの製造方法
DE102008043321A1 (de) * 2008-01-17 2009-07-23 Carl Zeiss Smt Ag Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102008043243A1 (de) 2008-10-28 2009-10-29 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie sowie Verfahren zum Verbessern der Abbildungseigenschaften eines Projektionsobjektivs
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
US8159753B2 (en) * 2010-05-28 2012-04-17 Universidad De Guanajuato Optical system with variable field depth
NL2009844A (en) * 2011-12-22 2013-06-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
DE102012212758A1 (de) * 2012-07-20 2014-01-23 Carl Zeiss Smt Gmbh Systemkorrektur aus langen Zeitskalen
DE102013204572A1 (de) * 2013-03-15 2014-09-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit hochflexiblem Manipulator
DE102013213545A1 (de) * 2013-07-10 2015-01-15 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
CN103885176B (zh) * 2014-03-20 2016-07-20 中国科学院西安光学精密机械研究所 相位掩膜板及能够调节中间编码图像品质的波前编码成像系统

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004327807A (ja) * 2003-04-25 2004-11-18 Canon Inc 光学素子位置決め装置、それを用いた露光装置、デバイスの製造方法
JP2010506388A (ja) * 2006-10-02 2010-02-25 カール・ツァイス・エスエムティー・アーゲー 光学システムの結像特性を改善する方法及びその光学システム
JP2010166007A (ja) * 2009-01-19 2010-07-29 Canon Inc 投影光学系、露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
JP2018534612A (ja) 2018-11-22
DE102015218329A1 (de) 2017-03-30
KR20180058764A (ko) 2018-06-01
US20180196256A1 (en) 2018-07-12
JP6842461B2 (ja) 2021-03-17
CN108027502B (zh) 2021-07-06
CN108027502A (zh) 2018-05-11
WO2017050565A1 (de) 2017-03-30
US10859815B2 (en) 2020-12-08

Similar Documents

Publication Publication Date Title
KR102683680B1 (ko) 광학 교정 어셈블리, 이러한 광학 교정 어셈블리를 포함하는 투영 오브젝티브 및 이러한 투영 오브젝티브를 포함하는 마이크로리소그래픽 장치
KR101313118B1 (ko) 변위 장치, 리소그래피 장치 및 위치설정 방법
US6836093B1 (en) Exposure method and apparatus
JP2010530636A (ja) クランプデバイスおよびオブジェクトロード方法
JP6681982B2 (ja) 位置決めデバイス、リソグラフィ装置、及びデバイス製造方法
JP6748737B2 (ja) 基板支持部、リソグラフィ装置、およびローディング方法
US9360762B2 (en) Illumination system, lithographic apparatus and method
JP5820905B2 (ja) スキャナ
JP6563600B2 (ja) 振動絶縁デバイス、リソグラフィ装置、および振動絶縁システムを調節する方法
US6937319B2 (en) Exposure method and apparatus with vibration-preventative control
JP2013518408A (ja) レンズが回動するリソグラフイシステム
US8853988B2 (en) Control systems and methods for compensating for effects of a stage motor
US10095120B2 (en) Vibration-compensated optical system, lithography apparatus and method
JP4446951B2 (ja) 位置決めデバイス、リソグラフィ装置及び駆動ユニット
JP5726794B2 (ja) 平面モータおよび平面モータを備えるリソグラフィ装置
JP2016516213A (ja) 高度に柔軟なマニピュレータを有する投影露光装置
US7034474B2 (en) Auto-calibration of attraction-only type actuator commutations
CN105339845B (zh) 光刻设备、用于光刻设备和方法中的定位系统
KR20190010660A (ko) 스테이지 시스템, 리소그래피 장치 및 디바이스 제조 방법
JP5434498B2 (ja) 光学素子の保持装置、光学系、及び露光装置
JP2010197517A (ja) 照明光学装置、露光装置およびデバイス製造方法
TW202514279A (zh) 微影設備中之電動勢制動

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601