JP6842461B2 - 光学補正構成、そのような光学補正構成を有する投影対物部、およびそのような投影対物部を有するマイクロリソグラフィ装置 - Google Patents

光学補正構成、そのような光学補正構成を有する投影対物部、およびそのような投影対物部を有するマイクロリソグラフィ装置 Download PDF

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JP6842461B2
JP6842461B2 JP2018515780A JP2018515780A JP6842461B2 JP 6842461 B2 JP6842461 B2 JP 6842461B2 JP 2018515780 A JP2018515780 A JP 2018515780A JP 2018515780 A JP2018515780 A JP 2018515780A JP 6842461 B2 JP6842461 B2 JP 6842461B2
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correction
optical
configuration
optical correction
component
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JP2018534612A (ja
JP2018534612A5 (enExample
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ホルガー ヴァルター
ホルガー ヴァルター
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0081—Simple or compound lenses having one or more elements with analytic function to create variable power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/04—Simple or compound lenses with non-spherical faces with continuous faces that are rotationally symmetrical but deviate from a true sphere, e.g. so called "aspheric" lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2018515780A 2015-09-24 2016-09-06 光学補正構成、そのような光学補正構成を有する投影対物部、およびそのような投影対物部を有するマイクロリソグラフィ装置 Active JP6842461B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015218329.7 2015-09-24
DE102015218329.7A DE102015218329A1 (de) 2015-09-24 2015-09-24 Optische Korrekturanordnung, Projektionsobjektiv mit einer solchen optischen Korrekturanordnung sowie mikrolithografische Apparatur mit einem solchen Projektionsobjektiv
PCT/EP2016/070981 WO2017050565A1 (de) 2015-09-24 2016-09-06 Optische korrekturanordnung, projektionsobjektiv mit einer solchen optischen korrekturanordnung sowie mikrolithografische apparatur mit einem solchen projektionsobjektiv

Publications (3)

Publication Number Publication Date
JP2018534612A JP2018534612A (ja) 2018-11-22
JP2018534612A5 JP2018534612A5 (enExample) 2019-10-17
JP6842461B2 true JP6842461B2 (ja) 2021-03-17

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JP2018515780A Active JP6842461B2 (ja) 2015-09-24 2016-09-06 光学補正構成、そのような光学補正構成を有する投影対物部、およびそのような投影対物部を有するマイクロリソグラフィ装置

Country Status (6)

Country Link
US (1) US10859815B2 (enExample)
JP (1) JP6842461B2 (enExample)
KR (1) KR102683680B1 (enExample)
CN (1) CN108027502B (enExample)
DE (1) DE102015218329A1 (enExample)
WO (1) WO2017050565A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107544130B (zh) * 2016-06-29 2020-05-22 佳能株式会社 附接光学系统、图像捕获光学系统和图像捕获装置
DE102018201495A1 (de) * 2018-01-31 2019-01-10 Carl Zeiss Smt Gmbh Abbildendes optisches System für die Mikrolithographie
NL2024520A (en) * 2019-01-17 2020-08-14 Asml Netherlands Bv Target delivery system
JP7178932B2 (ja) * 2019-03-12 2022-11-28 キヤノン株式会社 露光装置、および物品製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142555A (ja) * 1996-11-06 1998-05-29 Nikon Corp 投影露光装置
JP3303758B2 (ja) * 1996-12-28 2002-07-22 キヤノン株式会社 投影露光装置及びデバイスの製造方法
EP0851304B1 (en) 1996-12-28 2004-03-17 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method
JP3459773B2 (ja) * 1998-06-24 2003-10-27 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP2003107311A (ja) * 2001-09-27 2003-04-09 Nikon Corp 光学素子保持装置、鏡筒及び露光装置並びにデバイスの製造方法
JP2003178954A (ja) * 2001-12-12 2003-06-27 Canon Inc 露光装置及びデバイスの製造方法
JP4307140B2 (ja) * 2003-04-25 2009-08-05 キヤノン株式会社 光学素子位置決め装置、それを用いた露光装置、デバイスの製造方法
WO2008040494A1 (en) * 2006-10-02 2008-04-10 Carl Zeiss Smt Ag Method for improving the imaging properties of an optical system, and such an optical system
DE102008043321A1 (de) * 2008-01-17 2009-07-23 Carl Zeiss Smt Ag Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102008043243A1 (de) 2008-10-28 2009-10-29 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie sowie Verfahren zum Verbessern der Abbildungseigenschaften eines Projektionsobjektivs
JP5312058B2 (ja) 2009-01-19 2013-10-09 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
US8159753B2 (en) * 2010-05-28 2012-04-17 Universidad De Guanajuato Optical system with variable field depth
NL2009844A (en) * 2011-12-22 2013-06-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
DE102012212758A1 (de) * 2012-07-20 2014-01-23 Carl Zeiss Smt Gmbh Systemkorrektur aus langen Zeitskalen
DE102013204572A1 (de) * 2013-03-15 2014-09-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit hochflexiblem Manipulator
DE102013213545A1 (de) * 2013-07-10 2015-01-15 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
CN103885176B (zh) * 2014-03-20 2016-07-20 中国科学院西安光学精密机械研究所 相位掩膜板及能够调节中间编码图像品质的波前编码成像系统

Also Published As

Publication number Publication date
KR20180058764A (ko) 2018-06-01
DE102015218329A1 (de) 2017-03-30
JP2018534612A (ja) 2018-11-22
US10859815B2 (en) 2020-12-08
WO2017050565A1 (de) 2017-03-30
CN108027502B (zh) 2021-07-06
CN108027502A (zh) 2018-05-11
US20180196256A1 (en) 2018-07-12
KR102683680B1 (ko) 2024-07-11

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