KR102621966B1 - 변압기 커플링된 용량성 튜닝 스위칭 (switching) 으로 변압기 커플링된 플라즈마 펄싱하는 (pulsing) 시스템들 및 방법들 - Google Patents

변압기 커플링된 용량성 튜닝 스위칭 (switching) 으로 변압기 커플링된 플라즈마 펄싱하는 (pulsing) 시스템들 및 방법들 Download PDF

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KR102621966B1
KR102621966B1 KR1020207000501A KR20207000501A KR102621966B1 KR 102621966 B1 KR102621966 B1 KR 102621966B1 KR 1020207000501 A KR1020207000501 A KR 1020207000501A KR 20207000501 A KR20207000501 A KR 20207000501A KR 102621966 B1 KR102621966 B1 KR 102621966B1
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frequency
duty cycle
pulsing
variable capacitor
power
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KR20200006180A (ko
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마오린 롱
알렉스 패터슨
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램 리써치 코포레이션
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Polarising Elements (AREA)
  • Threshing Machine Elements (AREA)
  • Types And Forms Of Lifts (AREA)
KR1020207000501A 2017-06-08 2018-05-30 변압기 커플링된 용량성 튜닝 스위칭 (switching) 으로 변압기 커플링된 플라즈마 펄싱하는 (pulsing) 시스템들 및 방법들 Active KR102621966B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/617,366 2017-06-08
US15/617,366 US10734195B2 (en) 2017-06-08 2017-06-08 Systems and methods for transformer coupled plasma pulsing with transformer coupled capacitive tuning switching
PCT/US2018/035026 WO2018226468A1 (en) 2017-06-08 2018-05-30 Systems and methods for transformer coupled plasma pulsing with transformer coupled capacitive tuning switching

Publications (2)

Publication Number Publication Date
KR20200006180A KR20200006180A (ko) 2020-01-17
KR102621966B1 true KR102621966B1 (ko) 2024-01-05

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KR1020207000501A Active KR102621966B1 (ko) 2017-06-08 2018-05-30 변압기 커플링된 용량성 튜닝 스위칭 (switching) 으로 변압기 커플링된 플라즈마 펄싱하는 (pulsing) 시스템들 및 방법들

Country Status (6)

Country Link
US (1) US10734195B2 (https=)
JP (1) JP7536451B2 (https=)
KR (1) KR102621966B1 (https=)
CN (1) CN110709961B (https=)
TW (1) TWI787276B (https=)
WO (1) WO2018226468A1 (https=)

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JP6976279B2 (ja) * 2019-03-25 2021-12-08 株式会社Kokusai Electric 基板処理装置、半導体装置の製造方法及びプログラム
US11114279B2 (en) 2019-06-28 2021-09-07 COMET Technologies USA, Inc. Arc suppression device for plasma processing equipment
CN112509899B (zh) * 2019-09-16 2024-02-09 中微半导体设备(上海)股份有限公司 电感耦合等离子体处理装置及其点火控制方法
TW202601749A (zh) * 2020-03-19 2026-01-01 美商蘭姆研究公司 基板處理系統
TW202215485A (zh) * 2020-06-12 2022-04-16 美商蘭姆研究公司 用於離子損傷減輕及蝕刻均勻度改善之脈動遠程電漿
US12609283B2 (en) * 2020-06-15 2026-04-21 Lam Research Corporation Control of pulsing frequencies and duty cycles of parameters of RF signals
CN112016676B (zh) * 2020-08-18 2021-07-02 武汉大学 一种神经网络模型预测的半导体薄膜工艺参数优化系统
KR102852822B1 (ko) * 2021-05-20 2025-09-02 인투코어테크놀로지 주식회사 반도체 공정에서 바이어스 전원을 제공하는 주파수 발생 장치
US11923175B2 (en) * 2021-07-28 2024-03-05 COMET Technologies USA, Inc. Systems and methods for variable gain tuning of matching networks
US11715624B2 (en) * 2021-08-09 2023-08-01 Mks Instruments, Inc. Adaptive pulse shaping with post match sensor
US11621587B1 (en) 2022-07-18 2023-04-04 Caps Medical Ltd. Configurable plasma generating system
US12389521B2 (en) 2022-07-18 2025-08-12 Caps Medical Ltd. Plasma generating system
CN119896039A (zh) * 2022-07-18 2025-04-25 卡普斯医疗有限公司 等离子体生成系统
US20250006478A1 (en) * 2023-06-28 2025-01-02 Mks Instruments, Inc. Pulse-Shaping Using A Sub-Region Tuning Apparatus And Method
US20250285840A1 (en) * 2024-03-05 2025-09-11 Applied Materials, Inc. Rf power splitting and control

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Also Published As

Publication number Publication date
CN110709961A (zh) 2020-01-17
US20180358205A1 (en) 2018-12-13
US10734195B2 (en) 2020-08-04
WO2018226468A1 (en) 2018-12-13
CN110709961B (zh) 2023-02-03
TWI787276B (zh) 2022-12-21
KR20200006180A (ko) 2020-01-17
JP7536451B2 (ja) 2024-08-20
JP2020523739A (ja) 2020-08-06
TW201909233A (zh) 2019-03-01

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