KR102574629B1 - 연마 방법 및 조성 조정제 - Google Patents

연마 방법 및 조성 조정제 Download PDF

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Publication number
KR102574629B1
KR102574629B1 KR1020177023361A KR20177023361A KR102574629B1 KR 102574629 B1 KR102574629 B1 KR 102574629B1 KR 1020177023361 A KR1020177023361 A KR 1020177023361A KR 20177023361 A KR20177023361 A KR 20177023361A KR 102574629 B1 KR102574629 B1 KR 102574629B1
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South Korea
Prior art keywords
polishing
composition
water
polished
polishing composition
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Korean (ko)
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KR20180011046A (ko
Inventor
히로유키 오다
신이치로 다카미
슈헤이 다카하시
마코토 다바타
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가부시키가이샤 후지미인코퍼레이티드
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/12—Devices for exhausting mist of oil or coolant; Devices for collecting or recovering materials resulting from grinding or polishing, e.g. of precious metals, precious stones, diamonds or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
KR1020177023361A 2015-05-22 2016-05-13 연마 방법 및 조성 조정제 Active KR102574629B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2015-104552 2015-05-22
JP2015104552A JP6174625B2 (ja) 2015-05-22 2015-05-22 研磨方法及び組成調整剤
PCT/JP2016/064226 WO2016190128A1 (ja) 2015-05-22 2016-05-13 研磨方法及び組成調整剤

Publications (2)

Publication Number Publication Date
KR20180011046A KR20180011046A (ko) 2018-01-31
KR102574629B1 true KR102574629B1 (ko) 2023-09-06

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KR1020177023361A Active KR102574629B1 (ko) 2015-05-22 2016-05-13 연마 방법 및 조성 조정제

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JP (1) JP6174625B2 (enExample)
KR (1) KR102574629B1 (enExample)
TW (2) TWI758249B (enExample)
WO (1) WO2016190128A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018193916A1 (ja) * 2017-04-17 2018-10-25 日産化学株式会社 両性界面活性剤を含む研磨用組成物
US20210062041A1 (en) * 2018-01-18 2021-03-04 Hitachi Chemical Company, Ltd. Polishing liquid, polishing liquid set, and polishing method
US10683439B2 (en) * 2018-03-15 2020-06-16 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing composition and method of polishing a substrate having enhanced defect inhibition
WO2019189124A1 (ja) * 2018-03-28 2019-10-03 株式会社フジミインコーポレーテッド 研磨用組成物
JP7253335B2 (ja) * 2018-07-31 2023-04-06 株式会社フジミインコーポレーテッド 研磨用組成物、その製造方法および研磨用組成物を用いた研磨方法
TWI794474B (zh) * 2019-04-15 2023-03-01 日商昭和電工材料股份有限公司 研磨液、研磨液套組及研磨方法
KR102804301B1 (ko) * 2023-10-04 2025-05-12 주식회사 플롯퍼실리티스 반도체 공정 챔버 내 오염물 세정용 패드

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009054629A (ja) 2007-08-23 2009-03-12 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 研磨用スラリーのリサイクル方法
JP2012114225A (ja) * 2010-11-24 2012-06-14 Sumco Corp 薬液リサイクル方法および該方法に用いる装置
WO2012102144A1 (ja) 2011-01-26 2012-08-02 株式会社 フジミインコーポレーテッド 研磨用組成物、それを用いた研磨方法及び基板の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5598607U (enExample) 1978-12-28 1980-07-09
JP5297695B2 (ja) * 2008-05-30 2013-09-25 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 スラリー供給装置及び同装置を用いる半導体ウェーハの研磨方法
JP5656960B2 (ja) * 2012-11-14 2015-01-21 株式会社フジミインコーポレーテッド Ｌｐｄ低減剤及びそれを用いたシリコンウエハの欠陥低減方法
JP5843036B1 (ja) * 2015-06-23 2016-01-13 コニカミノルタ株式会社 再生研磨材スラリーの調製方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009054629A (ja) 2007-08-23 2009-03-12 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 研磨用スラリーのリサイクル方法
JP2012114225A (ja) * 2010-11-24 2012-06-14 Sumco Corp 薬液リサイクル方法および該方法に用いる装置
WO2012102144A1 (ja) 2011-01-26 2012-08-02 株式会社 フジミインコーポレーテッド 研磨用組成物、それを用いた研磨方法及び基板の製造方法

Also Published As

Publication number Publication date
TWI758249B (zh) 2022-03-21
KR20180011046A (ko) 2018-01-31
JP2016215336A (ja) 2016-12-22
WO2016190128A1 (ja) 2016-12-01
TW201710458A (zh) 2017-03-16
JP6174625B2 (ja) 2017-08-02
TW202041646A (zh) 2020-11-16

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