KR102540966B1 - 경화성 조성물, 경화막, 적외광 투과 필터 및 고체 촬상 장치 - Google Patents
경화성 조성물, 경화막, 적외광 투과 필터 및 고체 촬상 장치 Download PDFInfo
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- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
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- UJMBCXLDXJUMFB-UHFFFAOYSA-K trisodium;5-oxo-1-(4-sulfonatophenyl)-4-[(4-sulfonatophenyl)diazenyl]-4h-pyrazole-3-carboxylate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)C1=NN(C=2C=CC(=CC=2)S([O-])(=O)=O)C(=O)C1N=NC1=CC=C(S([O-])(=O)=O)C=C1 UJMBCXLDXJUMFB-UHFFFAOYSA-K 0.000 description 1
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- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0041—Optical brightening agents, organic pigments
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
- C09B57/004—Diketopyrrolopyrrole dyes
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0013—Means for improving the coupling-in of light from the light source into the light guide
- G02B6/0023—Means for improving the coupling-in of light from the light source into the light guide provided by one optical element, or plurality thereof, placed between the light guide and the light source, or around the light source
- G02B6/0026—Wavelength selective element, sheet or layer, e.g. filter or grating
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
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- Optics & Photonics (AREA)
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- Medicinal Chemistry (AREA)
- Computer Hardware Design (AREA)
- Spectroscopy & Molecular Physics (AREA)
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- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Compositions Of Macromolecular Compounds (AREA)
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JP6714858B2 (ja) | 2016-09-12 | 2020-07-01 | 株式会社デンソー | アクチュエータ装置 |
JP6733525B2 (ja) * | 2016-11-30 | 2020-08-05 | 東洋インキScホールディングス株式会社 | カラーフィルタ用感光性着色組成物およびカラーフィルタ |
CN108333872B (zh) * | 2017-01-19 | 2021-06-29 | 东友精细化工有限公司 | 绿色像素用着色感光性树脂组合物、滤色器及其应用 |
JP6837863B2 (ja) * | 2017-02-17 | 2021-03-03 | 住友化学株式会社 | 赤色着色組成物 |
JP7137295B2 (ja) * | 2017-03-30 | 2022-09-14 | 株式会社Dnpファインケミカル | 赤外光透過型組成物 |
JP6956193B2 (ja) * | 2017-09-25 | 2021-11-02 | 富士フイルム株式会社 | 硬化性組成物、膜、赤外線透過フィルタ、固体撮像素子および光センサ |
CN111316137B (zh) * | 2017-11-07 | 2023-02-17 | 3M创新有限公司 | 光学制品和包括光学制品的系统 |
CN107820056A (zh) * | 2017-11-16 | 2018-03-20 | 上海易密值半导体技术有限公司 | 一种基于液体镜头的双波段光纤传输智能工业相机 |
KR102356582B1 (ko) * | 2018-01-10 | 2022-01-27 | 동우 화인켐 주식회사 | 녹색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치 |
KR102383520B1 (ko) * | 2018-02-01 | 2022-04-06 | 동우 화인켐 주식회사 | 적색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치 |
JPWO2019150833A1 (ja) * | 2018-02-02 | 2021-02-12 | 富士フイルム株式会社 | 組成物、膜、赤外線透過フィルタおよび固体撮像素子 |
KR102337782B1 (ko) * | 2018-02-09 | 2021-12-09 | 동우 화인켐 주식회사 | 녹색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치 |
CN111684320B (zh) * | 2018-02-27 | 2023-03-31 | Jsr株式会社 | 光学滤波器、固体摄像装置及照相机模块 |
CN111937152A (zh) | 2018-04-11 | 2020-11-13 | 索尼半导体解决方案公司 | 摄像器件和摄像器件的制造方法 |
CN108948384B (zh) * | 2018-07-31 | 2021-02-09 | 惠州莹光塑胶颜料有限公司 | 一种应用于遥控接收面板的黑色色料及其制备方法 |
CN111100428B (zh) * | 2018-10-29 | 2022-02-11 | 丰阳产业科技股份有限公司 | 农用披覆材组成物、农用披覆材及农用披覆材的制造方法 |
WO2020158663A1 (ja) | 2019-01-31 | 2020-08-06 | 凸版印刷株式会社 | 固体撮像素子用フィルター、および、固体撮像素子 |
WO2021070693A1 (ja) * | 2019-10-07 | 2021-04-15 | 住友化学株式会社 | 着色硬化性樹脂組成物 |
JP7451951B2 (ja) | 2019-11-14 | 2024-03-19 | Toppanホールディングス株式会社 | 着色性組成物、赤外線パスフィルター、固体撮像素子用フィルターおよび固体撮像素子 |
JPWO2021187600A1 (zh) * | 2020-03-19 | 2021-09-23 | ||
CN113050212A (zh) * | 2021-01-12 | 2021-06-29 | 苏州群烨新材料科技有限公司 | 红外带通滤光片、其制备方法及具有其的成像设备 |
KR20240044605A (ko) * | 2022-09-28 | 2024-04-05 | 동우 화인켐 주식회사 | 적외선 투과 감광성 수지 조성물 |
JP7466040B1 (ja) | 2023-03-31 | 2024-04-11 | artience株式会社 | 光学積層体及びその製造方法 |
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CN102081305A (zh) | 2009-12-01 | 2011-06-01 | 东洋油墨制造株式会社 | 滤色器用蓝色着色组合物、滤色器及彩色显示器 |
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