KR102435492B1 - 화상 처리 시스템, 및 화상 처리를 행하기 위한 컴퓨터 프로그램 - Google Patents

화상 처리 시스템, 및 화상 처리를 행하기 위한 컴퓨터 프로그램 Download PDF

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KR102435492B1
KR102435492B1 KR1020217027367A KR20217027367A KR102435492B1 KR 102435492 B1 KR102435492 B1 KR 102435492B1 KR 1020217027367 A KR1020217027367 A KR 1020217027367A KR 20217027367 A KR20217027367 A KR 20217027367A KR 102435492 B1 KR102435492 B1 KR 102435492B1
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신이찌 시노다
야스다까 도요다
시게또시 사끼무라
마사요시 이시까와
히로유끼 신도
히또시 스가하라
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주식회사 히타치하이테크
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    • G06T7/0002Inspection of images, e.g. flaw detection
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    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • GPHYSICS
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KR1020217027367A 2017-03-27 2018-03-15 화상 처리 시스템, 및 화상 처리를 행하기 위한 컴퓨터 프로그램 Active KR102435492B1 (ko)

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JPJP-P-2017-060351 2017-03-27
JP2017060351A JP6731370B2 (ja) 2017-03-27 2017-03-27 画像処理システム及び画像処理を行うためのコンピュータープログラム
PCT/JP2018/010307 WO2018180562A1 (ja) 2017-03-27 2018-03-15 画像処理システム及び画像処理を行うためのコンピュータープログラム
KR1020197022591A KR102336431B1 (ko) 2017-03-27 2018-03-15 화상 처리 시스템, 및 화상 처리를 행하기 위한 컴퓨터 프로그램

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WO (1) WO2018180562A1 (enExample)

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US12131103B2 (en) * 2020-03-30 2024-10-29 Kla Corporation Semiconductor fabrication process parameter determination using a generative adversarial network
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US11836906B2 (en) 2023-12-05
TW201945982A (zh) 2019-12-01
CN116152507A (zh) 2023-05-23
CN110352431B (zh) 2023-07-18
KR20190103283A (ko) 2019-09-04
CN110352431A (zh) 2019-10-18
TWI697849B (zh) 2020-07-01
WO2018180562A1 (ja) 2018-10-04
JP2018163524A (ja) 2018-10-18
TW201835815A (zh) 2018-10-01
KR102336431B1 (ko) 2021-12-08
US20220036116A1 (en) 2022-02-03
KR20210111335A (ko) 2021-09-10
JP6731370B2 (ja) 2020-07-29
US20200134355A1 (en) 2020-04-30
US11176405B2 (en) 2021-11-16

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