KR102351345B1 - 오버레이 계측 데이터에 대한 확률적 행위의 영향 결정 - Google Patents

오버레이 계측 데이터에 대한 확률적 행위의 영향 결정 Download PDF

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KR102351345B1
KR102351345B1 KR1020197028612A KR20197028612A KR102351345B1 KR 102351345 B1 KR102351345 B1 KR 102351345B1 KR 1020197028612 A KR1020197028612 A KR 1020197028612A KR 20197028612 A KR20197028612 A KR 20197028612A KR 102351345 B1 KR102351345 B1 KR 102351345B1
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metrology
uncertainty
estimating
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KR20190115105A (ko
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에브게니 구레비치
마이클 이 아델
로엘 그론헤이드
요엘 펠러
블라디미르 레빈스키
다나 클레인
샤론 아하론
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케이엘에이 코포레이션
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/22—Connection or disconnection of sub-entities or redundant parts of a device in response to a measurement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H01L22/32—Additional lead-in metallisation on a device or substrate, e.g. additional pads or pad portions, lines in the scribe line, sacrificed conductors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020197028612A 2017-02-28 2018-02-27 오버레이 계측 데이터에 대한 확률적 행위의 영향 결정 Active KR102351345B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762464382P 2017-02-28 2017-02-28
US62/464,382 2017-02-28
US201762591104P 2017-11-27 2017-11-27
US62/591,104 2017-11-27
PCT/US2018/019793 WO2018160502A1 (en) 2017-02-28 2018-02-27 Determining the impacts of stochastic behavior on overlay metrology data

Publications (2)

Publication Number Publication Date
KR20190115105A KR20190115105A (ko) 2019-10-10
KR102351345B1 true KR102351345B1 (ko) 2022-01-13

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KR1020197028612A Active KR102351345B1 (ko) 2017-02-28 2018-02-27 오버레이 계측 데이터에 대한 확률적 행위의 영향 결정

Country Status (7)

Country Link
US (1) US10901325B2 (enExample)
JP (1) JP6960462B2 (enExample)
KR (1) KR102351345B1 (enExample)
CN (1) CN110383442B (enExample)
SG (1) SG11201907074RA (enExample)
TW (1) TWI735747B (enExample)
WO (1) WO2018160502A1 (enExample)

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US11521825B2 (en) 2017-04-13 2022-12-06 Fractilia, Llc System and method for predicting stochastic-aware process window and yield and their use for process monitoring and control
US11508546B2 (en) 2017-04-13 2022-11-22 Fractilia, Llc System and method for low-noise edge detection and its use for process monitoring and control
US11380516B2 (en) 2017-04-13 2022-07-05 Fractilia, Llc System and method for generating and analyzing roughness measurements and their use for process monitoring and control
US12142454B2 (en) 2017-04-13 2024-11-12 Fractilla, LLC Detection of probabilistic process windows
US10664955B2 (en) 2017-04-13 2020-05-26 Fractilia, Llc Edge detection system and its use for machine learning
US11361937B2 (en) 2017-04-13 2022-06-14 Fractilia, Llc System and method for generating and analyzing roughness measurements and their use for process monitoring and control
US10522322B2 (en) 2017-04-13 2019-12-31 Fractilia, Llc System and method for generating and analyzing roughness measurements
US10648801B2 (en) 2017-04-13 2020-05-12 Fractilia, Llc System and method for generating and analyzing roughness measurements and their use for process monitoring and control
US11355306B2 (en) 2017-04-13 2022-06-07 Fractilia, Llc System and method for generating and analyzing roughness measurements and their use for process monitoring and control
US10176966B1 (en) 2017-04-13 2019-01-08 Fractilia, Llc Edge detection system
US10656532B2 (en) 2017-04-13 2020-05-19 Fractilia, Llc Edge detection system and its use for optical proximity correction
US10488188B2 (en) 2017-04-13 2019-11-26 Fractilia, Llc System and method for removing noise from roughness measurements
US10445889B2 (en) * 2017-06-08 2019-10-15 Inspectrology LLC Method for measuring overlay offset in an integrated circuit and related technology
JP6942555B2 (ja) * 2017-08-03 2021-09-29 東京エレクトロン株式会社 基板処理方法、コンピュータ記憶媒体及び基板処理システム
US11333982B2 (en) * 2019-01-28 2022-05-17 Kla Corporation Scaling metric for quantifying metrology sensitivity to process variation
WO2020173654A1 (en) * 2019-02-25 2020-09-03 Asml Netherlands B.V. Method for determining stochastic variation of printed patterns
US10990019B2 (en) * 2019-04-09 2021-04-27 Kla Corporation Stochastic reticle defect dispositioning
US11353799B1 (en) * 2019-07-23 2022-06-07 Kla Corporation System and method for error reduction for metrology measurements
US11568101B2 (en) * 2019-08-13 2023-01-31 International Business Machines Corporation Predictive multi-stage modelling for complex process control
US11725934B2 (en) * 2019-11-28 2023-08-15 Kla Corporation Systems and methods for metrology optimization based on metrology landscapes
KR102590974B1 (ko) * 2021-09-10 2023-10-17 프랙틸리아 엘엘씨 확률적 프로세스 윈도우들의 검출
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CN117311103B (zh) * 2023-10-31 2024-08-06 魅杰光电科技(上海)有限公司 套刻误差测量方法、装置、系统及存储介质

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US20170010538A1 (en) 2014-02-11 2017-01-12 Asml Netherlands B.V. Model for calculating a stochastic variation in an arbitrary pattern
WO2018160502A1 (en) 2017-02-28 2018-09-07 Kla-Tencor Corporation Determining the impacts of stochastic behavior on overlay metrology data

Also Published As

Publication number Publication date
TW201840954A (zh) 2018-11-16
CN110383442A (zh) 2019-10-25
TWI735747B (zh) 2021-08-11
WO2018160502A1 (en) 2018-09-07
JP6960462B2 (ja) 2021-11-05
US20190049858A1 (en) 2019-02-14
SG11201907074RA (en) 2019-09-27
CN110383442B (zh) 2023-10-10
US10901325B2 (en) 2021-01-26
KR20190115105A (ko) 2019-10-10
JP2020511003A (ja) 2020-04-09

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