KR102314052B1 - 필터 세정 방법, 액처리 장치 및 기억 매체 - Google Patents

필터 세정 방법, 액처리 장치 및 기억 매체 Download PDF

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KR102314052B1
KR102314052B1 KR1020140162505A KR20140162505A KR102314052B1 KR 102314052 B1 KR102314052 B1 KR 102314052B1 KR 1020140162505 A KR1020140162505 A KR 1020140162505A KR 20140162505 A KR20140162505 A KR 20140162505A KR 102314052 B1 KR102314052 B1 KR 102314052B1
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tank
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KR20150060547A (ko
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쇼고 미조타
다카시 야부타
준 노나카
히로미 기요세
히데키 니시무라
다카시 우노
다카시 나카자와
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도쿄엘렉트론가부시키가이샤
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

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KR1020140162505A 2013-11-25 2014-11-20 필터 세정 방법, 액처리 장치 및 기억 매체 Active KR102314052B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2013-243124 2013-11-25
JP2013243124A JP6159651B2 (ja) 2013-11-25 2013-11-25 フィルタ洗浄方法、液処理装置及び記憶媒体

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KR20150060547A KR20150060547A (ko) 2015-06-03
KR102314052B1 true KR102314052B1 (ko) 2021-10-15

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JP (1) JP6159651B2 (https=)
KR (1) KR102314052B1 (https=)
TW (1) TWI568485B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20260006700A (ko) 2020-02-05 2026-01-13 도쿄엘렉트론가부시키가이샤 필터 세정 시스템 및 필터 세정 방법
KR102583556B1 (ko) * 2021-01-07 2023-10-10 세메스 주식회사 처리액 공급 장치 및 처리액 공급 장치의 고형 제거 방법
JP7628450B2 (ja) * 2021-03-24 2025-02-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および配管着脱パーツ洗浄方法
KR102504552B1 (ko) 2021-09-10 2023-03-02 (주)디바이스이엔지 반도체 제조 부품의 플러싱 조건 결정 장치 및 플러싱 조건 결정 방법
JP7526237B2 (ja) 2022-09-15 2024-07-31 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置、および、フィルタの気泡除去方法
JP2025064258A (ja) * 2023-10-05 2025-04-17 株式会社Sumco フィルタ洗浄方法
JP7797741B1 (ja) * 2025-11-07 2026-01-13 台灣▲し▼科宏晟科技股分有限公司 化学液体供給システム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003251290A (ja) * 2002-03-05 2003-09-09 Dainippon Screen Mfg Co Ltd 洗浄装置及びこれを備えた基板処理装置
JP2013030709A (ja) * 2011-07-29 2013-02-07 Tokyo Electron Ltd 処理液供給装置、処理液供給方法、プログラム及びコンピュータ記憶媒体

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04162627A (ja) * 1990-10-26 1992-06-08 Matsushita Electric Ind Co Ltd 薬液処理装置
JPH0516114U (ja) * 1991-08-14 1993-03-02 三菱重工業株式会社 潤滑油タンク及びラインフイルターのフラツシング回路
KR960025332U (ko) * 1994-12-26 1996-07-22 약액처리조용 여과필터
US5753135A (en) * 1995-10-23 1998-05-19 Jablonsky; Julius James Apparatus and method for recovering photoresist developers and strippers
JP4692997B2 (ja) * 1998-07-07 2011-06-01 東京エレクトロン株式会社 処理装置及び処理方法
TW514561B (en) * 2000-08-28 2002-12-21 Henkel Corp Antiplugging method and apparatus for separating multivalent metal ions from autodeposition compositions, and for regenerating ion exchange resins useful therewith

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003251290A (ja) * 2002-03-05 2003-09-09 Dainippon Screen Mfg Co Ltd 洗浄装置及びこれを備えた基板処理装置
JP2013030709A (ja) * 2011-07-29 2013-02-07 Tokyo Electron Ltd 処理液供給装置、処理液供給方法、プログラム及びコンピュータ記憶媒体

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TW201534381A (zh) 2015-09-16
JP6159651B2 (ja) 2017-07-05
KR20150060547A (ko) 2015-06-03
TWI568485B (zh) 2017-02-01
JP2015103662A (ja) 2015-06-04

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