KR102302617B1 - 3d micro structures fabricating system - Google Patents

Abstract

The present invention relates to a 3D microstructure manufacturing system that forms a microstructure by irradiating an exposure target with a mask laminated on a substrate, and more particularly, a pair of exposure modules provided with LED lenses irradiating UV for exposure The substrate stage on which the exposure object is mounted is coupled so as to be able to rotate or revolve in the horizontal direction in the left and right directions, and the substrate stage on which the exposure object is mounted is coupled so as to be able to move back and forth, change the front and back angle, and rotate left and right horizontally. ) Forms pillars and 3D structures in the form of an aspect ratio It relates to a 3D microstructure fabrication system capable of micro-molding in the interior.

Description

3D MICRO STRUCTURES FABRICATING SYSTEM

The present invention relates to a 3D microstructure manufacturing system that forms a microstructure by irradiating an exposure target with a mask laminated on a substrate, and more particularly, a pair of exposure modules provided with LED lenses irradiating UV for exposure The substrate stage on which the exposure object is mounted is coupled so as to be able to rotate or revolve in the horizontal direction in the left and right directions, and the substrate stage on which the exposure object is mounted is coupled so as to be able to move back and forth, change the front and back angle, and rotate left and right horizontally. ) Forms pillars and 3D structures in the form of aspect ratios, and can also form various types of 3D structures in which multiple layers are combined through multi-layer exposure of an object to be exposed, as small as about 1 μm It relates to a 3D microstructure fabrication system capable of micro-molding in the interior.

In general, the exposure apparatus is used in the technical field of flat panel displays and printed circuit boards.

Specifically, the exposure apparatus is used to form several identical or different microstructures (patterns, etc.) such as electrodes or dots on a glass substrate or a printed circuit board, or to form patterns constituting a circuit on a printed circuit board.

The exposure method using such an exposure apparatus generally comprises the steps of applying or coating an ink such as a photoresist (PR) liquid or a metal paste such as copper (Cu), silver (Ag), aluminum (Al), etc.; It is formed by an exposure method using a step of transmitting a light beam irradiated from a light source of an exposure apparatus through a pattern mask on the coated ink, and etching and cleaning steps.

The exposure apparatus for pattern molding of a printed circuit board is disclosed in Korean Patent Publication No. 10-2011-0058501, Patent Publication No. 10-2013-0092224, Patent Publication No. 10-2014-0058135, Patent Publication No. 10-2011-0074623, etc. As can be seen,

A substrate stage on which a substrate and a mask are aligned and seated and an exposure module irradiating light for exposure are arranged vertically and fixedly to form a microstructure by irradiating light for exposure to an object to be exposed,

In the conventional exposure apparatus, the irradiation angle or direction of the light beam and the direction of the substrate to which the light beam is irradiated are fixed vertically, so it is impossible to multi-layer mold the pattern, particularly the fine pattern, into various shapes, which can be produced using the exposure apparatus. There is a disadvantage in that the type and number of printed circuit boards are limited.

That is, the exposure method of the printed circuit board depends on the type of PR liquid,

In the developing stage after exposure, the area irradiated with light is removed during exposure, and the pattern is formed as the remaining areas except for the area irradiated with light are cured,

Alternatively, in the developing step after exposure, the area irradiated with light is cured during exposure, and the remaining areas except for the area irradiated with light are removed to form a pattern.

At this time, since the direction to which the light is irradiated and the direction of the substrate to which the light is irradiated are formed only in a direction perpendicular to the plane of the substrate, it is not suitable for forming fine patterns and multi-layer patterns, as well as the shape of the filler forming the multi-layer pattern and Since the 3D pattern cannot be three-dimensionally implemented in various forms, there is a problem in that the use of the exposure apparatus is limited.

Accordingly, the present invention has been devised to solve the above problems,

A pair of exposure modules equipped with LED lenses irradiating ultraviolet rays for exposure are coupled to be able to rotate or revolve in the left and right horizontal directions, and the substrate stage equipped with the exposure object is coupled to enable forward and backward movement, change of front and rear angle, and horizontal rotation By three-dimensionally changing the direction in which the ultraviolet rays are irradiated, it is possible to form a filler structure with a high aspect ratio or to form a 3D structure, and also apply a mask alignment function (mask aligner) for multi-layer exposure An object of the present invention is to provide a 3D microstructure fabrication system capable of carrying out

In order to achieve the above object, the 3D microstructure manufacturing system according to the present invention,

In the 3D microstructure manufacturing system for forming a microstructure by irradiating an exposure target with a mask stacked on a substrate with ultraviolet rays for exposure,

A moving base installed so as to be movable from side to side on the bed, a pair of first moving frames coupled to be movable back and forth from the moving base, and the upper end of the pair of first moving frames are connected and rotated back and forth to change the angle a tilting stage comprising a combined tilting frame, a rotary plate coupled to be horizontally rotatable from side to side on the upper surface of the tilting frame, and a seating block provided on the upper surface of the rotary plate and to which an exposure object is fixed;

A first guide frame installed on one side of the upper part of the bed, a first lifting frame coupled to be able to move up and down along the first guide frame, rotate horizontally based on a central axis in the front of the first lifting frame, or or a pair of exposure units comprising an exposure module coupled to revolve horizontally based on an imaginary axis and provided with a plurality of UV LED lamps for exposure on a lower surface for pattern formation; and

and an alignment unit installed on the upper side of the other side of the bed and having an imaging means for visually confirming whether the mask stacked on the substrate is aligned.

And the 3D microstructure manufacturing system according to the present invention,

A fixed plate provided on the rear side of the alignment unit, a first moving block coupled to be able to adjust the position left and right with respect to the fixed plate, a second moving block coupled to be able to adjust the position back and forth with respect to the first moving block, the A mask loading unit composed of a lifting block coupled to enable vertical height adjustment with respect to the second moving block, a loading frame coupled to and from the lifting block to move forward and backward toward the seating block, and a loading frame having a detachable part on which a mask is placed; more characterized by including.

Furthermore, in the 3D microstructure manufacturing system according to the present invention,

The seating block is characterized in that it comprises a suction hole for fixing the substrate by vacuum adsorption, and a jig for fixing the mask of the substrate.

In addition, the 3D microstructure manufacturing system according to the present invention,

Control means for individually controlling each of the UV LED lamps of the exposure unit, combining one or more of the presence or absence of lighting for each lamp, color for each lamp, and brightness for each lamp, further comprising a control means for enabling individual control for each lamp.

3D microstructure manufacturing system according to the present invention,

It is possible to three-dimensionally diversify the irradiating direction of light and the direction in which light is irradiated, and at the same time, it is possible to irradiate ultraviolet rays for exposure having wavelengths of different bands to form a 3D structure, or to form a multilayered mask through a mask alignment function (mask aligner). The filler forming the circuit pattern can be 3D molded into various shapes through multi-layer exposure while having a high aspect ratio,

Through 3D molding of the filler, it is possible to form a fine filler within the range of 30-50 μm, which cannot be realized with a conventional exposure apparatus,

While improving the alignment accuracy between the substrate and the mask, it is possible to reduce the defect rate by precisely aligning the substrate and the mask by finely adjusting the front, rear, left, right, and left positions and heights of the mask. make molding possible,

There is an effect that the quality and productivity of the printed circuit board can be improved by uniformly molding the fine-patterned filler into various shapes.

1A and 1B are perspective views of the present invention.
Figure 2 is a perspective view of the tilting stage according to the present invention.
3 is a perspective view of an exposure unit according to the present invention;
4 is a perspective view of an alignment unit according to the present invention.
5 is a perspective view of a mask loading unit according to the present invention.
6A to 6D are front views by operation of the present invention.
7 is an exemplary view of the lamp arrangement of the exposure unit according to the present invention.
8 is an enlarged photograph of a microstructure molded by the present invention.

The present invention is intended to be described in detail in the text of the embodiment (態樣, aspect) (or embodiments) can be applied to various changes and can have various forms. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents and substitutes included in the spirit and scope of the present invention.

In each drawing, the same reference numerals, particularly the tens and one digit, or the same tens, one, and alphabetic reference numerals indicate members having the same or similar functions, and unless otherwise specified, each The member indicated by the reference sign may be understood as a member conforming to these standards.

In addition, in each drawing, components are expressed in exaggeratedly large (or thick) or small (or thin) in size or thickness in consideration of convenience of understanding, or simplified, but the protection scope of the present invention is limited by this. it shouldn't be

The terminology used herein is only used to describe a specific embodiment (aspect, aspect, aspect) (or embodiment), and is not intended to limit the present invention. The singular expression includes the plural expression unless the context clearly dictates otherwise.

In the present application, terms such as comprises or consists of are intended to designate that a feature, number, step, operation, component, part, or combination thereof described in the specification is present, but one or more other features It is to be understood that it does not preclude the possibility of the presence or addition of numbers, steps, operations, components, parts, or combinations thereof.

Unless defined otherwise, all terms used herein, including technical and scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with the meaning in the context of the related art, and should not be interpreted in an ideal or excessively formal meaning unless explicitly defined in the present application. does not

~1~, ~2~, etc. described in the present specification will be referred to only to distinguish that they are different components, and are not limited to the order of manufacture, and their names in the detailed description and claims of the invention are may not match.

In describing the 3D microstructure manufacturing system according to the present invention, when specifying an approximate direction reference that is not strict for convenience with reference to 2, the direction in which the Ulim stage 20 is disposed is the front, and the direction facing the front is As a reference, the direction in which gravity acts is defined as the direction as it is shown, up, down, left and right, and in the detailed description and claims related to other drawings, the direction is specified and described according to this standard, unless otherwise specified.

Further, in the present specification, the left and right horizontal direction, which is the longitudinal direction of the guide rail 12, is specified as the X axis, the front and rear horizontal direction that is horizontally orthogonal to the rail part is the Y axis, and the vertical direction is specified as the Z axis.

Hereinafter, a 3D microstructure manufacturing system according to the present invention will be described with reference to the accompanying drawings.

The present invention relates to a 3D microstructure manufacturing system for forming a microstructure by irradiating an exposure target with a mask laminated on a substrate to form a microstructure. 20), an exposure unit 30, an alignment unit 40, a mask loading unit 50, and a control means.

The microstructure molded by the present invention is formed to have a certain pattern in which a filler or a 2D or 3D structure of a specific shape is formed, and there is no limitation in the shape thereof.

The main body 10 includes a bed 11 and a guide rail 12 formed in the left and right horizontal directions on the upper surface of the bed 11, and a housing in which the exposure operation is performed is provided on one side of the bed 11, A frame structure in which an alignment unit 40 and a mask loading unit 50 are installed is provided on the other side of the bed 11 .

And the inclination stage 20 is slidingly coupled to the guide rail 12 of the bed 11, and the exposure unit 30 having a pair of exposure modules 33A and 33B inside the housing is built-in. The other side of the housing is opened, and the tilting stage 20 moves left and right between the alignment unit 40 and the exposure unit 30 along the guide rail 12 in the X-axis direction.

The tilting stage 20 includes a moving base 21 coupled to be movable from side to side in the bed 11, a pair of first moving frames 22 coupled to be movable back and forth in the moving base 21, The pair of first moving frames 22 are connected to each other and rotated forward and backward so that the angle can be changed. The tilting frame 23 is coupled to the upper surface of the tilting frame 23 so as to be able to rotate horizontally from side to side. (25), is provided on the upper surface of the rotating plate 25 and is composed of a seating block 27 to which the exposure object is fixed.

The moving base 21 is slidably coupled to the guide rail 12 to move the tilting stage 20 in the left and right X-axis directions.

The first moving frame 22 is vertically installed on both sides of the moving base 21 , and a connecting frame connecting the lower ends of each first moving frame 22 is formed within the moving base 21 . It is slidably coupled to move in the Y-axis direction, and this first moving frame 22 is movable back and forth by receiving power from a first motor (not shown) built into the moving base 21 .

Both ends of the tilting frame 23 are hinge-coupled to the upper ends of the first moving frames 22 on both sides, respectively, and power from a second motor 24 installed in the first moving frame 22 on one side (right side in the drawing) It is possible to change the angle while rotating (tilting) back and forth by reciprocating the X axis to the axis.

The rotating plate 25 is axially installed on the upper surface of the tilting frame 23 and horizontally coupled to the left and right about the Z axis, and the rotating plate 25 is installed on the lower surface of the tilting frame 23 from the third motor 26 It can rotate left and right in one direction (or in both directions) by receiving power.

The seating block 27 is coupled to the center of the upper surface of the rotating plate 25, and includes a suction groove 27a for fixing by vacuum suction, and a jig portion 27A for fixing the mask on the substrate.

In this seating block 27, the mask is placed on the substrate by the mask alignment unit 40 and the mask loading unit 50 in a state in which a substrate made of a material such as silicon or glass is vacuum-adsorbed and fixed with the suction groove 27a. When aligned, the mask is fixed and seated on the substrate through the jig portion 27A.

The exposure unit 30 includes a first guide frame 31 installed on one side of the upper portion of the bed 11 , and a first lifting frame 32 coupled to the upper and lower sides along the first guide frame 31 . ), coupled to rotate horizontally with respect to the central axis on the front of the first lifting frame 32 or to revolve horizontally on the basis of an imaginary axis, and a plurality of UV LED lamps for exposure for pattern formation on the lower surface. It is composed of a pair of exposure modules 33A and 33B.

The first lifting frame 32 can be moved up and down in the Z-axis direction, which is the longitudinal direction of the first guide frame 31 by receiving power from a fourth motor (not shown) installed on the rear surface of the first guide frame 31 . do.

The exposure modules 33A and 33B are provided below the fixing plate 35 fixed and coupled to the front surface of the first lifting frame 32, and are tilted through a plurality of UV LED lamps for exposure provided on the lower surface of the tilting stage 20. ) is irradiated with UV light for exposure to the fixed exposure object.

In this case, the exposure modules 33A and 33B emit short-wavelength exposure ultraviolet rays, and the wavelengths of the exposure ultraviolet rays irradiated from the respective exposure modules 33A and 33B are set to be different from each other.

For example, the first exposure module 33A may irradiate an exposure ultraviolet ray in a 405 nm band, and the second exposure module 33B may irradiate an exposure ultraviolet ray in a 365 nm band.

In addition, the arrangement of the lamps may be changed while the LED lamps provided in each of the exposure modules 33A and 33B are irradiated with UV for exposure of different wavelengths.

7 shows an embodiment in which the LED lamps of the exposure modules 33A and 33B are arranged in a width * length of 20 * 20, in which a total of 400 lamps are arranged.

For example, as shown in [A] of FIG. 7 , only the lamps of the 405 nm band (hereinafter, referred to as first lamps) are provided in the first exposure module 33A, and the lamps of the 365 nm band (hereinafter referred to as the first lamp) are provided in the second exposure module 33B. 2 lamps) may be provided,

Alternatively, as shown in [B] of FIG. 7 , the first lamp and the second lamp are cross-arranged in a zigzag form in the first exposure module 33A, and the first lamp (or the first lamp (or the second lamp) in n columns in the second exposure module 33B. 2 lamps) are arranged in a row with the second lamps (or the first lamps) in n+1 columns, respectively, so that different lamps are alternately arranged for each column, etc.

By differentiating the wavelength of the ultraviolet light for exposure irradiated by the pair of exposure modules 33A and 33B and the arrangement of the lamp for each wavelength, it is possible to form various patterns.

Also, as shown in [C] of FIG. 7 , since the number of lamps in each column (or row) is formed differently, the lamps may not be arranged in a square shape.

However, the type, number, or arrangement of the lamps is not limited to the present specification and may be changed according to the specifications of the object to be exposed.

Meanwhile, each of the exposure modules 33A and 33B rotates or revolves in one direction by receiving power from the fifth motor 34 installed on the front of each of the first lifting frames 32 .

First, although not shown in the drawings, the exposure modules 33A and 33B are installed as a rotating shaft in the center of the fixed plate 35 so that the fifth motor 34 and the rotating shaft are connected to each other by a gear assembly or a belt structure. ) (33B) can be rotated in one direction by rotating the axis of rotation, which is the central axis of 33B.

Next, the idle operation of the exposure modules 33A and 33B will be described with reference to the perspective view inside the hospital in FIG. 4 ,

Specifically, the exposure unit 30 includes a first operating plate 36 movably coupled to the left and right horizontal directions on the upper surface of the fixed plate 35 , and horizontally forward and backward on the upper surface of the first operation plate 36 . Including a second operating plate 37 coupled to be movable reciprocally in the direction,

The exposure modules (33A, 33B) are connected to the first operating plate (36) by a fixed shaft at the lower part of the fixing plate (35) and are movably coupled together with the first operating plate (36),

The second operating plate 37 includes an eccentric cam 38 coupled to the rear end of the driving shaft 34a of the fifth motor 34 at an off-center position.

Therefore, the eccentric cam 38 revolves around the drive shaft 34a by rotation of the fixed drive shaft 34a while the fifth motor 34 operates and rotates,

The rotation of the eccentric cam 38 reciprocates the second operating plate 37 in the Y-axis direction and simultaneously moves the first operating plate 36 in the X-axis direction,

The exposure modules 33A and 33B connected to the first operation plate 36 by a combination of repeated reciprocating movements of the first and second operation plates 36 and 37 use an imaginary axis that is the center of circular motion of the fixed axis. It can rotate in one direction to make an orbital motion.

Next, the alignment unit 40 is installed on the other side of the upper portion of the bed 11, and includes an imaging means 42 for visually checking whether the mask stacked on the substrate is aligned.

The imaging means 42 can enlarge and show a photographed image (including a photograph) by a certain magnification or more, and a microscope or a camera may be used, and in the drawings of the present specification, a microscope is shown as a representative.

Specifically, the alignment unit 40 is coupled to a second guide frame 47 coupled to the front surface of the frame structure, and vertically along the second guide frame 47, and is coupled to the front surface of the imaging means 42 ) includes a second elevating frame 41 to which it is coupled.

The second guide frame 47 is coupled to the front end of the second moving plate 46 of the frame structure, so that each plate 44, 45, and 46 of the frame structure moves in the X-axis, Y-axis, and Z-axis directions. As a result, the position of the second moving frame 41, that is, the front, rear, left, right, and vertical positions of the imaging means 42 and the vertical height are changed.

To this end, the fixing plate 14 is installed horizontally on the other upper side of the bed 11,

The alignment unit 40 receives power from the sixth motor or the air cylinder 43 to move up and down the elevating plate 44 in the Z-axis direction, and moving forward and backward in the Y-axis direction in the elevating plate 44 The coupled first moving plate 45, the first moving plate 45 is coupled to be movable left and right in the X-axis direction, and the second lifting frame 41 (ie, the imaging means 42) is provided at the front end. and a coupled second moving plate (46).

In addition, an auxiliary plate 44A for elevating and lowering by receiving power from a sixth motor or air cylinder 43 is provided on the lower portion of the fixed plate 14, and the elevating plate 44 is provided on the upper portion of the fixed plate 14. provided, the auxiliary plate 44A and the elevating plate 44 are interconnected by elevating rods 44a penetrating the fixed plate 14 so that the imaging means 42 is moved by the sixth motor or the air cylinder 43. height is automatically controlled,

The first and second moving plates 45 and 46 are moved left and right and forward and backward by the first and second levers 45a and 46a, respectively, so that the front, rear, left, and right positions of the imaging means 42 can be manually adjusted. .

The imaging means 42 has an upper eyepiece (not shown) and a lower lens portion, and enlarges the upper surfaces of the substrate and the mask placed on the mounting block 27 so that the operator can visually identify them.

The mask loading unit 50 is a fixed plate 51 provided on the rear side (more strictly, the lifting plate 44) of the alignment unit 40, the position can be adjusted left and right with respect to the fixed plate 51 The first moving block 52 coupled to the first moving block 52, the second moving block 54 coupled so that the position can be adjusted back and forth with respect to the first moving block 52, the vertical height adjustment is possible with respect to the second moving block 54 Consisting of a lifting block 56 coupled operably, a loading frame 58 having a detachable portion 58a that is coupled from the lifting block 56 to the seating block 27 in a forward and backward manner and a mask is placed therein. do.

The fixing plate 51 is coupled to the elevating plate 44 and moves together with the imaging means to change the position and height of the mask loading unit 50 .

The first moving block 52 is slidably coupled to the left and right on the lower surface of the fixed plate 51 , and is connected to the first fine adjustment rod 53 provided on the front surface of the fixed plate 51 , When the adjustment rod 53 is rotated in both directions, the first moving block 52 is moved in the X-axis direction by the rod unit drawn in and out from the first fine adjustment rod 53 to adjust the left and right positions.

The second moving block 54 is slidably coupled to move forward and backward on the lower surface of the first moving block 52 , and is attached to a second fine adjustment rod 55 provided on one side of the first moving block 52 . Connected, when the second fine adjustment rod 55 is rotated in both directions, the second moving block 54 is moved in the Y-axis direction by the rod part drawn out from the second fine adjustment rod 55 to adjust the front and rear positions.

The lifting block 56 is slidably coupled to the lower surface of the second moving block 54 to move up and down, and the third fine adjustment rod 57 provided through the side plate of the lifting block 56 and the gear unit structure When the third fine adjustment rod 57 is rotated in both directions connected to the back (eg, a rack gear, etc.), the lifting block 56 ascends and descends in the Z-axis direction to adjust the height.

The loading frame 58 is slidably coupled to the guide bar connected to the front of the elevating block 56 to move forward and backward. ) is located on the upper portion of the rotating plate 26, and this detachable portion (58a) can be placed by inserting the mask in a sliding coupling manner.

The control means individually controls the UV LED lamps of the exposure unit 30 to enable individual control for each lamp by combining one or more of the presence/absence of lighting for each lamp, color for each lamp, and brightness for each lamp.

In the drawings of the present specification, a desktop PC 13 provided on one side of the front end of the bed 11 is typically shown as a control means, but various electronic input devices such as a notebook computer, a tablet PC, a central control room, and a separate operation controller may be used. Of course you can.

Furthermore, the control means may be electrically connected to the alignment unit 40 and/or the mask loading unit 50 to control the operation of the alignment unit 40 and/or the mask loading unit 40 through the control means. have.

That is, the enlarged image input to the imaging unit 42 may be output to the display unit of the control unit (eg, the monitor of the PC 13 ).

In addition, the fixed plate 51, the first moving block 52, the second moving block 54, the lifting block 56, the loading frame through the input unit of the control means (for example, the mouse or keyboard of the PC 13). Individual operation of each part of (58) can be controlled remotely.

At this time, for remote control of the mask loading unit 50 through the control means, a driving means such as a motor that enables individual operation for each configuration of the mask loading unit 40 will be installed, which is necessary for the manual operation described above. By simply replacing the configuration with a motor, etc.,

A driving means such as a motor for remote control of the fixed plate 51 , the first moving block 52 , the second moving block 54 , the lifting block 56 , and the loading frame 58 should be added, and using the motor Individual operation of each configuration is omitted as a person skilled in the art can sufficiently reproduce the above-described manual control based on the manual control.

Hereinafter, a detailed operation of the 3D microstructure manufacturing system of the above configuration will be described.

First, as shown in Figure 6a, the operator is fixed by seating the substrate on the upper surface of the seating block 27 of the rotating plate 25. At this time, the substrate is fixed by vacuum suction, and PR liquid is applied to the substrate in advance.

When the fixing of the substrate is completed, the mask is mounted on the detachable part 58a of the mask loading unit 50, and then the loading frame 58 is advanced to the front end of the guide bar so that the mask of the detachable part 58a is mounted on the mounting block ( 27) to be placed on top of the substrate.

And in this state, the operator uses the imaging means 42 to check the vertical alignment position of the substrate and the mask (for example, visually check whether the markings printed on the substrate and the mask are aligned), while the mask loading unit 50 After adjusting the front, rear, left, right, and left positions of the mask using the first and second fine adjustment rods 53 and 55 of In the seated state, the substrate and the mask are fixed with the jig portion 27A.

At this time, if necessary, the height adjustment of the imaging means 42 and the mask loading unit 50 may also be made.

When the fixing of the substrate and the mask is completed, the loading frame 58 is moved backward to the rear end of the guide bar so that the loading frame 58 is separated from the tilting stage 20 .

In this case, as described above, the alignment of the mask and the operation of the mask loading unit 50 may be performed remotely through the control means.

At this time, in the present invention, when the exposure operation for one mask is completed, only the completed mask is removed, and then another mask is accurately aligned on the substrate being worked by using the alignment unit 40 and the mask loading unit 50, so that continuous operation is possible. , through which it becomes possible to form high-aspect-ratio fillers or 3D patterns through multi-layer exposure.

When the alignment of the substrate and the mask is completed, the operator sets the operation for each lamp through the control means and starts the exposure operation.

When the exposure operation is started, as shown in FIGS. 6B and 6C , the tilting stage 20 moves to the lower space of the housing in which the exposure unit 30 is built, and then the first to first steps of the tilting stage 20 are performed. The third motors 24 and 26 and the fifth motor 34 of the exposure unit 30 operate,

The exposure object fixed to the seating block 27 is simultaneously rotated forward and backward of the first moving frame 22, changing the angle (tilting) through the forward and backward reciprocating rotation of the tilting frame 23, and the rotating plate 25 is continuously rotated at the same time. , the direction the light is irradiated continues to change according to the set pattern,

At the same time, as the direction in which the light is irradiated from the lamp continues to change through the rotation or revolution of the exposure modules 33A and 33B, each lamp operates individually (lighting up, changing color, adjusting brightness) according to a set pattern,

By three-dimensionally diversifying the direction of a light beam incident on an exposure target, high aspect ratio fillers or multilayer fine patterns can be 3D molded into various shapes.

In addition, as shown in FIGS. 6B and 6C , by using a pair of exposure modules 33A and 33B having different wavelengths or different lamp arrangements for each wavelength, the size and shape of the pattern can be further diversified.

In this case, the operation sequence, time, number, etc. of each exposure module 33A, 33B may vary according to the specifications of the exposure object. For example, each of the exposure modules 33A and 33B operates sequentially for the same time period, the operation time is different for each exposure module 33A and 33B, or the operation sequence of each exposure module 33A and 33B or the number of repetitions can be variously set.

In addition, as shown in FIG. 6D , the height of each of the exposure modules 33A and 33B may be changed as needed during the exposure operation.

8 is an enlarged photograph taken of the filler and pattern realized through the present invention. In [A] of FIG. 8, a pillar having a high aspect ratio of 6:1 or more can be confirmed, and [B of FIG. 8] ], a high-yield micro-pillar can be confirmed, in [C] of FIG. 8, a 3D fine pattern of an inverted triangle (fan-shaped) shape can be confirmed, and in [D] of FIG. In [E] of FIG. 8, a 3D fine pattern of an 'S'-shaped sector can be confirmed, and in [F] of FIG. 8, a 3D fine pattern of a quad 'S'-shaped sector can be confirmed, and FIG. In [G] of [G], the 3D fine pattern of the cone shape can be confirmed, and in [H] of FIG. 8, the pillar of the UFO 3D shape can be confirmed,

These pillars or fine patterns can be implemented in a slanted form with a standard of about 30-50 μm, so that a fine pattern of a printed circuit board that could not be implemented with a conventional exposure apparatus can be precisely molded, and as small as a fine pattern within a range of about 1 μm. Molding is also possible.

In particular, there is an advantage in that the above-described operations of the tilting stage 20 and the operation of the exposure unit 30 are set in various combinations, and at the same time, the shape of the pattern can be variously molded into a 3D form through repeated lamination of masks. .

In the above description of the present invention, with reference to the accompanying drawings, the 3D microstructure manufacturing system has been mainly described, but the present invention is capable of various modifications, changes and substitutions by those skilled in the art, and these modifications, changes and substitutions protect the protection of the present invention. should be construed as within the scope.

10: body 20: tilting stage
30: exposure unit 40: alignment unit
50: mask loading unit

Claims (4)

In the 3D microstructure manufacturing system for forming a microstructure by irradiating an exposure target with a mask laminated on a substrate with ultraviolet rays for exposure,
A moving base 21 installed movably from side to side on the bed 11, a pair of first moving frames 22 coupled to be movable back and forth from the moving base 21, the pair of first moving frames (22) The tilting frame 23, which connects the upper end and rotates back and forth so as to be able to change the angle, the rotary plate 25 coupled so as to be able to rotate horizontally from side to side on the upper surface of the tilting frame 23, the rotary plate 25 ) provided on the upper surface of the tilting stage 20 consisting of a seating block 27 to which the exposure object is fixed;
A first guide frame 31 installed on one side of the upper portion of the bed 11, a first elevating frame 32 coupled to be elevating vertically along the first guide frame 31, the first elevating frame (32) is provided under the fixed plate 35 fixed and coupled to the front surface of the first elevating frame 32, coupled to rotate horizontally based on the central axis or to revolve horizontally based on the imaginary axis. and an exposure unit 30 including a pair of exposure modules 33A and 33B provided with a plurality of exposure UV LED lamps for pattern formation on the lower surface; and
An alignment unit 40 installed on the other side of the bed 11 and provided with an imaging means 42 for visually confirming whether the mask stacked on the substrate is aligned or not;
The exposure modules 33A and 33B are axially installed in the center of the fixed plate 35 as a rotation shaft, and the fifth motor 34 and the rotation shaft are connected to each other, so that the exposure modules 33A and 33B have a rotation axis that is the central axis of the exposure modules 33A and 33B in one direction. rotate and rotate,
The exposure unit 30 includes a first operating plate 36 movably coupled to the upper surface of the fixing plate 35 in a horizontal direction in the left and right directions, and reciprocating in the front and rear horizontal directions on the upper surface of the first operation plate 36 . to include a second operating plate 37 coupled to be movable,
The exposure modules (33A, 33B) are connected to the first operating plate (36) by a fixed shaft at the lower part of the fixing plate (35) and are movably coupled together with the first operating plate (36),
The second operating plate 37 includes an eccentric cam 38 coupled to the rear end of the drive shaft 34a of the fifth motor 34 at a position off-center,
The eccentric cam 38 revolves around the drive shaft 34a by rotation of the fixed drive shaft 34a while the fifth motor 34 operates and rotates,
The rotation of the eccentric cam 38 reciprocates the second operating plate 37 in the Y-axis direction and simultaneously moves the first operating plate 36 in the X-axis direction,
By a combination of the repeated reciprocating movements of the first and second operating plates 36 and 37, the exposure modules 33A and 33B connected to the first operating plate 36 form an imaginary axis that is the center of circular motion of the fixed axis. A 3D microstructure manufacturing system, characterized in that it rotates in one direction on an axis to perform an orbital motion.
The method of claim 1,
A fixed plate 50 provided on the rear side of the alignment unit 40, a first moving block 52 coupled to the left and right with respect to the fixed plate 50 so that the position can be adjusted, and the first moving block 52 A second moving block 54 coupled so as to be able to adjust the position back and forth with respect to the second moving block 54, an elevating block 56 coupled to enable vertical height adjustment with respect to the second moving block 54, and the seating in the elevating block 56 3D microstructure fabrication, characterized in that it further comprises; a mask loading unit 50 comprising a loading frame 58 that is coupled back and forth toward the block 27 and has a detachable part 58a on which the mask is placed. system.
The method of claim 1,
The seating block 27 is a 3D microstructure manufacturing system, characterized in that it comprises a suction groove (27a) for fixing the substrate by vacuum suction, and a jig portion (27A) for fixing the mask on the substrate.
4. The method according to any one of claims 1 to 3,
Control means for individually controlling each of the UV LED lamps of the exposure unit 30 to enable individual control for each lamp by combining one or more of the presence or absence of lighting for each lamp, color for each lamp, and brightness for each lamp 3D microstructure fabrication system.

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