KR102314093B1 - Wide area exposure apparatus - Google Patents

Abstract

The present invention relates to a large-area exposure apparatus and, more specifically, to a large-area exposure apparatus which enables a mask panel to be easily mounted on and adhered to the lower surface of a mask holder by pulling out and rotating the mask holder, and thereby allowing the lower surface of the mask holder to be exposed forward or upward. In addition, according to the present invention, even if a chuck tray and the mask holder are not parallel when the chuck tray is raised, it can be easily adjusted and the adjusted parallelism can be maintained. Furthermore, the position and angle of the chuck tray on a plane can be easily varied, so that the position of a target substrate with respect to the mask panel can be easily aligned.

Description

Wide area exposure apparatus

The present invention relates to a large-area exposure apparatus, and more particularly, by drawing out and rotating the mask holder so that the lower surface of the mask holder is exposed forward or upward, the mask panel can be easily seated and adsorbed on the lower surface of the mask holder When the chuck tray is raised, even if the chuck tray and the mask holder are not in parallel, it can be easily adjusted and the adjusted parallelism can be maintained. The present invention relates to a large-area exposure apparatus capable of easily aligning a position of a target substrate with respect to the substrate.

In general, in the manufacturing process of a plasma display panel (PDP), a liquid crystal display (LCD), a printed circuit board (PCB), a color filter, a shadow mask, a semiconductor device, etc., a predetermined pattern is formed on a substrate. In order to form, photo and etching processes are performed. Exposure equipment and developing equipment are used in a photographic process consisting of exposure and development. At this time, OLED, which has recently been spotlighted as a next-generation display, also forms a pattern for each pixel through exposure and development. have.

In order to perform exposure on such a large-area substrate, it is impossible to perform an exposure operation at a time with light irradiated from a light source at a fixed position. There is a way to do it.

In this case, in order to perform exposure, the mask panel should be positioned on the chuck tray on which the target substrate is mounted, and the portion on which the mask pattern is formed should be exposed so that exposure can be performed.

Therefore, after adsorbing the mask panel to the lower surface of the mask holder, the mask panel and the target substrate must be approached. However, since the mask panel for exposing a large-area substrate is also manufactured in a large-area, the mask panel formed of a glass plate has a very heavy weight, so the process of adsorbing the mask panel to the lower surface of the mask holder is very difficult or the position There was a problem in that it was difficult to accurately position the

Therefore, there is a need to develop a device capable of easily mounting and adsorbing a mask panel of a large-area exposure apparatus to a mask holder.

KR10-1792051 (registration number) 2017.10.25.

An object of the present invention is to provide a large-area exposure apparatus capable of easily mounting and adsorbing a mask panel to the lower surface of the mask holder by drawing out and rotating the mask holder so that the lower surface of the mask holder is exposed forward or upward.

In addition, the present invention provides a large-area exposure apparatus capable of sliding the mask holder forward or backward, the mask holder being firmly fixed when the mask holder is rotated, and the position of the mask holder being firmly fixed when the mask holder is stored. Its purpose is to provide

Another object of the present invention is to provide a large-area exposure apparatus capable of easily adjusting and maintaining the adjusted parallelism even if the chuck tray and the mask holder are not parallel when the chuck tray is raised.

Another object of the present invention is to provide a large-area exposure apparatus in which the position and angle of the chuck tray on a plane can be easily varied, and thereby the position of a target substrate with respect to a mask panel can be easily aligned.

The present invention, a base frame comprising a pair of horizontal frames are provided in parallel with each other spaced apart from each other and having horizontal rails formed in the longitudinal direction; a holder rotation frame including a support block provided in front of the front end of the horizontal frame, and a rotation block rotatably coupled to each of the support blocks and having a rotation rail formed in a continuous shape with the horizontal rail; a mask holder on which a mask panel is adsorbed and fixed on a lower surface, both ends of which are slidably guided in the front-rear direction on the horizontal rail or the rotating rail; a chuck module provided below the mask holder between the horizontal frames and on which a target substrate to be exposed is seated; an exposure module comprising: an exposure rail provided parallel to one corner of the upper surface of the mask holder; and an exposure machine that is slidably coupled to the exposure rail and performs exposure from above a mask panel adsorbed to the mask holder; Including; a control unit for controlling driving of the chuck module, the mask holder, or the exposure module; including, when the rear end of the mask holder is separated from the horizontal frame by sliding the mask holder forward, the mask holder is moved to the rotation block can be rotated with respect to the support block along the , and when the mask holder is rotated along the rotation block, the lower surface of the mask holder to which the mask panel is adsorbed is exposed forward or upward.

In addition, the mask holder of the present invention has a holder stopping block protruding from the rear end of the lower surface, and the rotating block restricts the forward movement of the mask holder when the rear end of the mask holder is separated from the horizontal frame. A holder front stopper in contact with the front end of the topping block is provided, a holder stopping groove is recessed in the lower surface of the mask holder, and the rotation block is provided with a first stopping actuator through which the first stopping pin is put in and out. When the first stopping pin is drawn out, the first stopping pin is accommodated in the holder stopping groove, so that the front-back direction movement of the mask holder is limited.

In addition, the horizontal frame of the present invention is provided with a holder rear stopper in contact with the rear end of the holder stopping block or the rear end of the mask holder to limit the rear movement of the mask holder, and the horizontal frame has a second stopping pin A second stopping actuator that withdraws and withdraws is provided, so that when the second stopping pin is withdrawn, the second stopping pin is accommodated in the holder stopping groove, so that the front-back direction movement of the mask holder is limited.

In addition, the support block of the present invention is provided with a rotation angle limiting stopper whose upper surface is in contact with the lower surface front end of the rotation block, and the rotation angle limiting stopper is in contact with the front surface of the lower rear end of the rotation block when the rotation block is rotated. The rotation angle of the rotation block is limited.

In addition, the chuck module of the present invention includes a chuck tray on which the target substrate is seated, and a lifting module for elevating the chuck tray below the chuck tray, wherein the elevating module includes an elevating motor and the elevating motor and a plurality of elevating units for elevating the chuck tray by receiving a driving force from the .

In addition, the chuck module of the present invention includes a height adjustment module provided between the chuck tray and the lifting unit so that the chuck tray can contact the mask holder in parallel to the mask holder; A plate-shaped adjustment plate is installed on the upper surface of the adjustment plate to support the lower end of the chuck tray, but when the chuck tray comes into contact with the mask holder while rising, it is provided below the chuck tray in the direction in contact with the mask holder. a plurality of cushion cylinders which are compressed sequentially and provided so that the mask holder and the chuck tray come into parallel contact with each other; and an adjustable holding cylinder to maintain the forming angle.

In addition, the present invention, a camera provided above the mask holder to photograph the mask holder; is further provided,

The chuck module includes an alignment module having an upper surface in contact with the chuck tray and a lower surface in contact with the elevating module to change a planar position of the chuck tray with respect to the mask holder;

The control unit determines the degree of change in the position of the alignment module based on the photographed image of the camera after driving the elevating module to descend to a set height.

The present invention has the effect that the mask panel can be easily seated and adsorbed on the lower surface of the mask holder by drawing out and rotating the mask holder so that the lower surface of the mask holder is exposed forward or upward.

In addition, the present invention has an effect that, while the mask holder can be slid forward or backward, the mask holder is firmly fixed when the mask holder is rotated, and the position of the mask holder can be firmly fixed when the mask holder is stored.

In addition, the present invention has the effect of being able to easily adjust and maintain the adjusted parallelism even if the chuck tray and the mask holder are not parallel when the chuck tray is raised.

In addition, according to the present invention, the position and angle of the chuck tray on a plane can be easily varied, and through this, the position of the target substrate with respect to the mask panel can be easily aligned.

1 is a perspective view of a large-area exposure apparatus according to an embodiment of the present invention;
FIG. 2 is a perspective view of a main part configuration related to drawing out and receiving a mask holder of the large-area exposure apparatus according to an embodiment of the present invention; FIG.
3 is a use state diagram showing a rotational configuration of a mask holder of a large-area exposure apparatus according to an embodiment of the present invention;
4 is a perspective view of main parts of a base frame and a holder rotating frame of a large-area exposure apparatus according to an embodiment of the present invention;
5 is a perspective view of a chuck tray of a large-area exposure apparatus according to an embodiment of the present invention;
6 is a bottom perspective view of a large-area exposure apparatus according to an embodiment of the present invention;
7 is a perspective view of an alignment module and a lifting module of a large-area exposure apparatus according to an embodiment of the present invention;
8 is a perspective view of an adjustment module and an alignment module of a large-area exposure apparatus according to an embodiment of the present invention;
9 is a side cross-sectional view of an adjustment module and a chuck tray of a large-area exposure apparatus according to an embodiment of the present invention;

Hereinafter, an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

The present invention, as shown in Figures 1 to 9, are provided in parallel spaced apart from each other and a base frame 100 including a pair of horizontal frames 110 in which the horizontal rails 111 are formed in the longitudinal direction, The support block 220 provided in front of the front end of the horizontal frame 110 and the rotation block 210 in which the rotation rail 211 is formed in a shape continuous with the horizontal rail 111 is rotatably coupled to each support block. A holder rotation frame 200 comprising a mask holder 300, the mask panel is adsorbed and fixed on the lower surface, both ends of which are slidably guided in the front and rear directions on the horizontal rail 111 or the rotation rail 211, and the horizontal frame A chuck module 400 provided below the mask holder 300 and on which a target substrate to be exposed is seated between 110 and an exposure rail 510 provided parallel to one corner of the upper surface of the mask holder 300 . ) and an exposure module 500 including an exposure machine 520 that is slidably coupled to the exposure rail 510 and performs exposure from above the mask panel adsorbed to the mask holder 300, and a chuck module 400; It is configured to include a control unit for controlling the driving of the mask holder 300 or the exposure module 500 , so that the rear end of the mask holder 300 is separated from the horizontal frame 110 by sliding the mask holder 300 forward. The mask holder 300 becomes rotatable with respect to the support block 220 along the rotation block 210, and when the mask holder 300 is rotated along the rotation block 210, the mask holder 300 to which the mask panel is adsorbed. The lower surface is configured to be exposed forward or upward.

The base frame 100 serves to guide and fix the position of the mask holder 300 when the mask holder 300 that is drawn out or accommodated in the front and rear is accommodated. It is configured to include a pair of horizontal frames 110 in which the horizontal rails 111 are formed.

In the horizontal frame 110 , a horizontal rail 111 for guiding the mask holder 300 is formed in the longitudinal direction. At this time, the horizontal rail 111 is preferably configured to prevent movement in other directions other than the movement in the longitudinal direction when the mask holder 300 is guided. To this end, the horizontal frame 110 of the present invention has an inner surface, that is, a part of the surface facing another horizontal frame 110 configured to be spaced apart in the longitudinal direction, so that a 'C'-shaped horizontal rail 111 is formed. is formed The side end of the mask holder 300 is inserted and guided inside the horizontal rail 111 , so that only movement in the longitudinal direction, that is, in the front-rear direction, is possible, and movement in the upward, downward, and lateral directions is restricted.

At one side of the base frame 100, a second stopping actuator to which the second stopping pin is drawn in and out is provided. When the mask holder 300 is completely accommodated in the horizontal frame 110 , the second stopping actuator 112 performs a second stopping at a position corresponding to the holder stopping groove 320 recessed in the mask holder 300 . It is provided at the position where the pin is located. With this configuration, when the mask holder 300 is completely accommodated in the horizontal frame 110, the second stopping actuator 112 is driven and the second stopping pin is drawn out, the second stopping pin is inserted into the holder stopping groove. It is inserted into the 320 , and accordingly, the forward and backward movement of the mask holder 300 is restricted. A plurality of such second stopping actuators 112 may be provided, and accordingly, a plurality of holder stopping grooves 320 may also be formed at positions corresponding to the second stopping actuators 112 .

On the other hand, when the mask holder 300 slides backward and is accommodated in the horizontal frame 110 , it is difficult if the mask holder 300 enters the rear more than necessary. Since the mask holder 300 must always be fixed at the same position above the chuck module 400 , the base frame 100 is provided with a holder rear stopper 113 to limit the rear movement of the mask holder 300 . do. The holder rear stopper 113 is configured to be in contact with the rear end of the mask holder 300 or in contact with the rear end of the holder stopping block 330 provided at the rear end of the lower surface of the mask holder 300 .

In addition, the second stopping actuator 112 or the holder rear stopper 113 may be fixedly mounted to the horizontal frame 110 , but separately for fixing the second stopping actuator 112 or the holder rear stopper 113 . may be included in the base frame 100 .

The base frame 100 may be configured to further include a base plate for this purpose. The base plate is provided between the horizontal frames 110 , and has a structure in which both ends are coupled to each horizontal frame 110 . And the second stopping actuator 112 or the holder rear stopper 113 is fixedly coupled to the base plate.

Since the base plate is provided between the horizontal frames 110 , that is, above the chuck module 400 , the width of the upper surface of the chuck tray 410 is larger than that of the chuck tray 410 so as not to interfere with the contact between the chuck tray 410 and the mask holder 300 . A large area should be constructed in the form of perforations. If the base plate is positioned above the mask holder 300 between the horizontal frames 110 , the mask panel is provided so that light emitted from the exposure module 500 can be irradiated to the mask adsorbed to the mask holder 300 . A larger area may be configured in a perforated form.

Therefore, the base plate is formed in a plate shape and not only in a form in which one side is perforated, but also in a bar-shaped frame form crossing between the horizontal frames 110 , and between the two horizontal frames 110 . Any type of light from the exposure module 500 can be irradiated onto the mask panel without interfering with the contact between the chuck tray 410 and the mask holder 300 while firmly fixing the position.

The exposure operation can be performed only when the mask panel is adsorbed to the mask holder 300 accommodated in the horizontal frame 110 of the base frame 100 . However, since the mask panel is adsorbed to the lower surface of the mask holder 300 and is adjacent to the chuck tray 410 , it is difficult to adsorb the mask panel while the mask holder 300 is fixed.

Therefore, it is necessary to take out the mask holder 300 from the horizontal frame 110 to change the direction of the surface in a good state for adsorbing the mask panel. To this end, the front end of the base frame 100, preferably the front end of the horizontal frame 110, the holder rotation frame 200 is provided.

The holder rotation frame 200 serves to accommodate and fix the mask holder 300 when the mask holder 300 is withdrawn from the base frame 100 so that the mask holder 300 can be rotated and reversed, To this end, the support blocks 220 provided in the front end direction of the horizontal rail 111 and the rotation rail 211 are rotatably coupled to each support block 220 in a continuous shape with the horizontal rail 111 . It is configured to include the formed rotation block 210 .

The support block 220 serves as a reference point at which the rotation block 210 is rotated, and for this purpose, it is provided in front of the front end of each horizontal frame 110 . The support block 220 may be fixedly coupled to the horizontal frame 110 or may be fixed to a separate frame. The support block 220 may be fixed to any structure as long as its relative position with the horizontal frame 110 does not change.

The support block 220 is inserted and installed in a direction toward the support block 220 forming a pair of rotating bearings. The rotational shaft of the rotational block 210 to be described below is inserted into the rotational bearing so that the rotational block 210 can be rotated.

A horizontal block 230 coupled to the two support blocks 220 to further strengthen the structure of the support block 220 may be further provided between the support blocks 220 . The horizontal block 230 is also located below the mask holder 300 fixed to the rotation block 210 when the rotation block 210 is rotated, so that the mask holder 300 is separated from the rotation block 210 . Even if it falls downward, there is an additional effect of preventing the mask holder 300 from being damaged by supporting it immediately after falling.

On the other hand, the horizontal block 230 may be a redundant configuration that does not perform a special function in a state in which the mask holder 300 is accommodated between the horizontal frames 110 . In this case, the horizontal block 230 is the chuck module 400 . , since the mask holder 300 and the exposure module 500 are configured to protrude forward, the buttons 231 for controlling each configuration are arranged on the horizontal block 230 to utilize the space more efficiently, and the exposure operation It is possible to have the effect of directly seeing and controlling the devices in the front where this is made. In addition, the horizontal block 230 is provided with a pressure sensor 232 for detecting the reception of the mask holder 300, so that the first stopping actuator 212 can be configured to generate a measurement value that determines the driving time. have. When the mask holder 300 is drawn out and accommodated in the rotation block 210, the buttons 231 are covered by the mask holder 300 to generate a driving control signal of the first stopping actuator 212 by the button 231. Because it is difficult.

A rotation block 210 is coupled to each support block 220 in a rotatable form. The rotation block 210 serves to accommodate and fix the mask holder 300 when the mask holder 300 is withdrawn from the base frame 100 so that the mask holder 300 can be rotated and reversed. A rotation rail 211 is formed on one surface in a shape continuous with the horizontal rail 111 of the horizontal frame 110 and is rotatably coupled to the support block 220 .

At this time, since the horizontal rail 111 is formed in a 'C' shape by recessing a part of the surface facing another horizontal frame 110 configured to be spaced apart in the longitudinal direction, the rotation rail 211 is also another rotation configured to be spaced apart. A portion of the surface facing the block 210 is depressed in the longitudinal direction to form a 'C' shape. Accordingly, the rotation rail 211 is configured to prevent movement in other directions other than the movement in the longitudinal direction when the mask holder 300 is guided. That is, only movement in the front-rear direction of the mask holder 300 is possible, and movement in the upward, downward, and lateral directions is restricted. And, the rotation shaft is fixed to the outer surface of the rotation block 210 , that is, on the surface opposite to the surface on which the rotation rail 211 is formed, and is inserted and mounted in the rotation bearing of the support block 220 .

The mask holder 300 drawn out from the base frame 100 is accommodated in the rotation rail 211. At this time, if the mask holder 300 slides forward too much, an accident of leaving the rotation block 210 may occur. have. Accordingly, the holder front stopper 213 is provided in the rotation block 210 to prevent the mask holder 300 from moving forward more than necessary. The holder front stopper 213 serves to limit the forward movement of the mask holder 300 when the rear end of the mask holder 300 is separated from the horizontal frame 110 and is in a rotatable state. At this time, when the mask holder 300 also comes into contact with the holder front stopper 213 to limit the forward movement of the mask holder 300 , the holder stopping block 330 is formed to protrude at the rear end. That is, when the mask holder 300 slides forward and is separated from the horizontal frame 110 , the front surface of the holder stopping block 330 and the rear surface of the holder front stopper 213 come into contact with each other, and the front of the mask holder 300 . movement is restricted. At this time, the meaning of when the mask holder 300 is separated from the horizontal frame 110 does not have to be immediately as soon as the mask holder 300 is separated from the horizontal frame 110, and the mask holder 300 is separated from the horizontal frame ( 110) is not restricted by the rotation and does not matter anywhere as long as it is a position that does not deviate from the rotation block 210.

Thereafter, the front end of the mask holder 300 is lifted to rotate the mask holder 300 together with the rotation block 210. At this time, if the relative position of the mask holder 300 with respect to the rotation block 210 is not fixed, the mask holder As 300 is rotated, it may be separated from the rotation block 210 by weight. In order to solve this problem, a first stopping actuator from which the first stopping pin is drawn in and out is provided on one side of the rotation block 210 . When the mask holder 300 is completely accommodated in the rotation block 210 , the first stopping actuator 212 first stops at a position corresponding to the holder stopping groove 320 recessed in the mask holder 300 . It is provided at the position where the pin is located. Due to this configuration, when the mask holder 300 is completely accommodated in the rotation block 210, the first stopping actuator 212 is driven and the first stopping pin is drawn out, the first stopping pin is inserted into the holder stopping groove. It is inserted into the 320 , and accordingly, the forward and backward movement of the mask holder 300 is restricted.

On the other hand, the rotation block 210 is not rotated, the rotation rail 211 must be positioned on the same line as the horizontal rail 111, and in the rotated state, the mask holder 300 is rotated at an angle of more than 90 degrees and less than 180 degrees. After being rotated, the rotation angle should be maintained in a fixed state. This is because the mask panel can be easily adsorbed to the lower surface of the mask holder 300 only when the lower surface of the mask holder 300 is fixed in a state in which it is exposed forward or upward.

To this end, the support block 220 is provided with a rotation angle limiting stopper 221 . The rotation angle limiting stopper 221 has an upper surface in contact with the lower front end of the rotation block 210 in a state in which the rotation block 210 is not rotated, and when the rotation block 210 is rotated, the rear end of the lower surface of the rotation block 210 is rotated. facing the front At this time, the rotation angle of the rotation block 210 is determined according to the position of the rotation center point of the rotation bearing coupled to the support block 220 and the front surface of the rotation angle limiting stopper 221 .

With this configuration, the mask holder 300 is removed from the horizontal frame 110, fixed its position, and then rotated to expose the lower surface of the mask holder 300 forward or upward, so that the mask is placed on the lower surface of the mask holder 300. The panel can be easily adsorbed.

The mask holder 300 serves to adsorb the mask panel to the lower surface so that the target substrate seated on the chuck tray 410 and the mask panel are adjacent to each other when the chuck tray 410 is raised. It is configured to be slidably guided in the front-rear direction on the rail 111 or the rotating rail 211 .

The mask holder 300 adsorbs and fixes the mask panel, but since light emitted from the exposure module 500 must pass through a part of the mask panel to reach the target substrate seated on the chuck tray 410 , the central portion is perforated. composed in the form And, in order to guide the position of the mask panel, the mask holder 300 is formed with a mask seating groove 310 drawn in from the lower surface around the hole in the center. By seating the mask panel in such a mask seating groove, the mask panel can be accurately seated without being distorted.

In addition, a mask negative pressure line 311 for adsorption of the mask panel is recessed in the mask seating groove. The mask negative pressure line 311 communicates with the vacuum pump, and when the mask panel is seated in the mask seating groove and the vacuum pump is driven, a negative pressure is formed between the mask negative pressure line 311 and the mask panel, and the mask panel is placed in the mask holder 300 . will be adsorbed to The mask negative pressure line 311 may be formed in the form of a groove along the mask seating groove, or may be formed in the form of a hole in the mask seating groove so that each hole communicates within the mask holder 300 and then back to the vacuum pump. It may be configured in a communication form. On the other hand, in order to prevent the negative pressure formed from the mask negative pressure line 311 from leaking into the central drilling hole, a mask packing 312 may be provided at the edge of the drilling hole.

A holder stopping block 330 is formed to protrude from the rear end of the lower surface of the mask holder 300 . The holder stopping block 330 prevents the mask holder 300 from deviate from the rotation rail 211 when the mask holder 300 is pulled out to the outside, and for this purpose, the mask holder 300 is mounted on a horizontal rail ( 111) after leaving the holder front stopper 213 of the rotation block 210 is configured to be in contact with the front. In addition, the holder stopping block 330 prevents the mask holder 300 from entering the rear of the horizontal rail 111 more than necessary when the mask holder 300 is stored in the rear, and for this purpose, the mask holder 300 is The chuck module 400 is configured so that the rear side can contact the holder rear stopper 113 of the base frame 100 when the upper part of the set point is reached.

In addition, a holder stopping groove 320 is recessed in the lower surface of the mask holder 300 , so that when the mask holder 300 is accommodated in the horizontal rail 111 , the second is drawn out from the second stopping actuator 112 . The stopping pin is inserted to fix the position of the mask holder 300, or when the mask holder 300 is separated from the horizontal rail 111 and accommodated in the rotation rail 211, the first stopping actuator 212 The first stopping pin drawn out from the is inserted so that the position of the mask holder 300 can be fixed. At this time, the holder stopping groove 320 is formed in a shape in which the inner diameter decreases as the depth thereof increases, and the ends of the first stopping pin and the second stopping pin correspond to the shape of the holder stopping groove 320 . By having a shape that is narrowed toward the end as much as possible, even if the mask holder 300 is stopped at a slightly misaligned position, there is no difficulty in inserting the first stopping pin or the second stopping pin into the holder stopping groove 320. , In addition, during the insertion process, the first stopping pin or the second stopping pin is in the form of applying an external force to the inclined surface of the holder stopping groove 320 , so that the fine position of the mask holder 300 is adjusted incidentally. do. A plurality of such holder stopping grooves 320 may be formed. Referring to the drawings of the present invention, four holder stopping grooves 320 are formed, and the second stopping actuator 112 is four, the first The stopping actuator 212 is shown to be provided with two, but is not limited thereto.

On the other hand, both side ends of the mask holder 300 , that is, an end accommodated in the horizontal rail 111 or the rotating rail 211 may be provided with a plurality of holder wheels 340 . The holder wheel 340 serves to facilitate the movement of the mask holder 300 when the mask holder 300 is moved in the front-rear direction along the horizontal rail 111 or the rotating rail 211, and the holder wheel ( 340 is accommodated in the horizontal rail 111 or the rotating rail 211 to perform a rolling operation.

At this time, the horizontal rail 111 and the rotating rail 211 are recessed in a 'C' shape, and both side ends of the mask holder 300 are inserted into the recessed portion and slide structure, so the holder wheel 340 It is preferable that the rotation axis is extended laterally from both side ends of the silver mask holder 300 .

In addition, a handle 301 that an operator can hold by hand may be coupled to the front end of the mask holder 300 to facilitate withdrawing or receiving the mask holder 300 .

After sliding the mask holder 300 forward by the above configuration to be accommodated only in the rotation rail 211, the sliding of the mask holder 300 is restricted through the first stopping actuator 212, and then the mask holder ( When the front end of the 300) is lifted and the mask holder 300 is rotated, the mask panel is easily adsorbed. After the mask panel is adsorbed to the lower surface of the mask holder 300, the mask holder 300 is rotated in the reverse direction again, and the mask holder 300, which has been rotated in the reverse direction, is slid backwards so that the mask holder 300 becomes the base frame 100. ) to end the adsorption process of the mask panel.

After this process, the mask panel is positioned above the target substrate to be exposed. After that, when the target substrate is brought close to the mask panel by driving the chuck module 400, the preparation work for performing the exposure is completed.

The chuck module 400 serves to bring the target substrate close to the mask panel by seating the target substrate on which exposure is performed, and for this purpose, it is provided below the mask holder 300 between the horizontal frames 110 , It is configured so that the target substrate to be implemented can be seated.

The chuck module 400 includes a chuck tray 410 on which a target substrate is mounted, and a lifting module 420 for raising and lowering the chuck tray 410 below the chuck tray 410 .

The chuck tray 410 serves to seat and adsorb a target substrate to be exposed. To this end, the chuck tray 410 has an upper surface formed in a planar shape, and a central portion thereof is recessed into a quadrangle to form a substrate seating portion 411 . A target substrate is seated on the substrate mounting part 411 . Meanwhile, a substrate negative pressure line 412 for adsorption of a target substrate is recessed in the substrate seating part 411 . The substrate negative pressure line 412 communicates with the vacuum pump, and when the target substrate is seated on the substrate mounting part 411 and the vacuum pump is driven, a negative pressure is formed between the negative pressure line 412 and the target substrate, and the target substrate is placed on the chuck tray. (410) is adsorbed. Such a substrate negative pressure line 412 may be formed in the form of a grid-shaped groove in a set region based on the central portion of the substrate receiving unit 411 , or a plurality of arranged based on the central portion of the substrate receiving unit 411 . It may be formed in the form of a hole so that each hole communicates with the inside of the mask holder 300 and then communicates with the vacuum pump again.

The chuck tray 410 is closely fixed to the mask holder 300 before the exposure operation is performed. At this time, the close fixation of the chuck tray 410 and the mask holder 300 is achieved by negative pressure, so the holder negative pressure line 413 for forming negative pressure between the chuck tray 410 and the mask holder 300 is further is composed The holder negative pressure line 413 is configured in the form of a plurality of holes along the edge of the chuck tray 410 , and is preferably formed by being perforated on the upper surface of the chuck tray 410 where the substrate seating part 411 is not formed. The reason is to be able to provide negative pressure between the chuck tray 410 and the mask holder 300 even when a target substrate using the entire area of the substrate seating part 411 is seated on the substrate seating part 411 . Because. In addition, when forming a negative pressure between the chuck tray 410 and the mask holder 300, along the edge of the chuck tray 410 to seal the inner space between the chuck tray 410 and the mask holder 300 from the outside. A closure 414 is provided. The sealing part 414 is formed of a material such as silicon and is provided in a loop shape along the edge of the chuck tray 410 to close the inner space between the chuck tray 410 and the mask holder 300 when the chuck tray 410 is raised. sealed from the outside.

At this time, in the mask holder 300 , the mask panel and the mask negative pressure line 311 are located inside the sealing part 414 . That is, it means that the negative pressure at which the mask negative pressure line 311 adsorbs the mask panel is placed under the negative pressure region formed between the mask holder 300 and the chuck tray 410 by the sealing part 414 . In this case, if the negative pressure formed between the mask holder 300 and the chuck tray 410 is stronger than the negative pressure at which the mask holder 300 adsorbs the mask panel, the mask panel may be separated from the mask holder 300 . there is Accordingly, it is preferable that the negative pressure at which the mask holder 300 adsorbs the mask panel is greater than the negative pressure formed between the mask holder 300 and the chuck tray 410 .

In addition, a cooling water line (not shown) may be formed inside the chuck tray 410 to prevent an error from occurring due to the expansion of the target substrate by heat generated during the exposure operation.

The lifting module 420 is provided below the chuck tray 410 to raise the chuck tray 410 in the direction of the mask holder 300 or to separate the chuck tray 410 from the mask holder 300 .

The elevating module 420 serves to elevate or lower the chuck tray 410, and for this purpose, a plurality of elevating motors 421 and a plurality of elevating chuck trays 410 are provided by receiving driving force from the elevating motor 421. It is configured to include a lifting unit (422). At this time, the upper end of the lifting unit 422 is not directly coupled to the lower end of the chuck tray 410 , but is coupled to the lower end of the alignment module 430 and the alignment module 430 is coupled to the lower end of the chuck tray 410 . is composed of

The elevating motor 421 serves to provide a driving force to the elevating unit 422 , and for this purpose, it is provided below the elevating unit 422 or on the lower side of the elevating unit 422 . In the present invention, it is shown that one lifting motor 421 and two lifting units 422 are provided, but according to the driving method of the lifting motor 421 or the lifting unit 422, each lifting motor (422) Of course, a configuration in which 421) is provided is also possible.

First, the lifting unit 422 provides a lifting force to the upper configuration in a ball screw method. That is, the lifting unit 422 includes a screw that is rotated by receiving a driving force from the lifting motor 421 and a ball nut coupled to the screw. In addition, a separate guide rail may be provided that is slidably coupled to one side of the lifting rod so that the lifting rod coupled to the ball nut does not rotate while the screw is rotated to prevent lateral rotation while not interfering with the lifting operation. have.

These lifting units 422 are provided to be spaced apart from each other with respect to the center of the chuck tray 410 to face each other. In the present invention, it is illustrated that two lifting units 422 are provided, but the present invention is not limited thereto.

On the other hand, the elevating motor 421 is provided for each elevating unit 422 and may be configured to separately elevate each elevating unit 422 , but the chuck tray 410 simultaneously ascends and descends at the same time. Elevating the two lifting units 422 at the same time with a motor of a control and power efficiency is good.

Accordingly, the elevating motor 421 of the present invention is configured alone, and power is simultaneously provided to the two elevating units 422 from the elevating motor 421 . To this end, a power transmission unit 423 is provided between the elevating motor 421 and the elevating unit 422 .

Looking at the driving of the elevating module 420 , the elevating motor 421 is driven to simultaneously lift the two elevating units 422 . Thereafter, the chuck tray 410 lifted by the lifting unit 422 comes into contact with the mask holder 300 . At this time, when a part of the chuck tray 410 comes into contact with the mask holder 300 , the chuck tray 410 . ) The cushion cylinder 442 of the height adjustment module 440 in the direction in which the mask holder 300 is in contact is compressed. Then, the cushion cylinders 442 in the opposite direction are sequentially compressed from the cushion cylinder 442 in the direction in which the chuck tray 410 is in contact with the mask holder 300, and the chuck tray 410 and the mask holder 300 are completely is contacted Then, when the chuck tray 410 and the mask holder 300 come into complete contact, a reaction force is formed in the elevating motor 421 , and the reaction force is formed in parallel with the chuck tray 410 and the mask holder 300 . Since it is the contact moment, the driving of the lifting motor 421 is stopped at this time. There is also a method of measuring the reaction force of the lifting motor 421 in order to determine the timing for stopping the driving of the lifting motor 421. Of course, a method of determining the driving stop time of the lifting motor 421 is also possible. Thereafter, when the elevating motor 421 is rotated by a set amount in the reverse direction for alignment driving, the chuck tray 410 is lowered to a set height while maintaining parallel to the mask holder 300 . At this time, the chuck tray 410 is inclined with respect to the elevating module 420 by the height adjustment module 440. In order to maintain the inclination degree of the chuck tray 410, the height adjustment module 440 is used. The adjustment holding cylinder 443 is further provided, which will be dealt with in detail in the description of the height adjustment module 440 below.

When the chuck tray 410 is elevated by the elevating module 420 , the reason for the difference in the rise height of the chuck tray 410 is due to assembly, processing, and driving errors. If an error occurs in , an error may also occur in the horizontal direction of the chuck tray 410 by the same logic. In addition, the position of the mask panel adsorbed to the mask holder 300 and the position of the target substrate adsorbed to the chuck tray 410 are also factors involved in the horizontal direction error.

Therefore, in order to correct the horizontal direction error between the mask panel and the target substrate, the chuck module 400 includes an alignment module 430 between the chuck tray 410 and the elevating module 420 .

The alignment module 430 has an upper surface in contact with the chuck tray 410 and a lower surface in contact with the elevating module 420 , and serves to change the position of the chuck tray 410 with respect to the mask holder 300 on a plane. In this case, the alignment of the plane is largely divided into two types. One is horizontal and vertical alignment, that is, X-Y alignment, and the other is rotation angle in a plane, ie, θ alignment. In order to simultaneously perform the X-Y alignment and the θ alignment, an XY-θ stage may be utilized.

The alignment module 430 serves to move or rotate the chuck tray 410 in horizontal and vertical directions on a plane. A plurality of alignment blocks 432 coupled to the upper surface of the alignment plate 431 and coupled to the upper surface of the alignment plate 431 to be slidable in the X-axis and Y-axis, and a plate-shaped alignment plate 431 that is coupled and lifted according to the lift driving of the lifting unit 422 . ) and an alignment motor 434 coupled to one side of the alignment block 432 to slide the alignment block 432 in the X-axis or Y-axis, and a lower rotating body whose lower end is coupled to the upper end of the alignment block 432 and The upper end is coupled to the lower end of the chuck tray 410 and is configured to include a rotation support 433 consisting of an upper rotation body rotatably supported by the lower rotation body.

When describing the alignment block 432 in more detail, the alignment block 432 includes a base block coupled to the alignment plate 431, and a first coupled to the top of the base block slidably in the first direction with respect to the base block. It is configured to include a first block and a second block coupled to the upper end of the first block to be slidable in a second direction perpendicular to the first direction on the first block. At this time, the upper and lower positions of the first block and the second block may be interchanged, and regardless of the shape of the block, a block sliding in the first direction is referred to as a first block, and a block sliding in the second direction is referred to as a second block. do it with For example, the first block is slid in a first direction in the left and right direction with respect to the base block, and the second block coupled to the upper part of the first block slides in the second direction, which is the front-back direction with respect to the first block. Assuming (432), if this alignment block 432 is installed by rotating 90 degrees, then the block sliding with respect to the base block is slid in the front-rear direction, and accordingly the block coupled to the upper part of the base block is It is called the second block, not the first block. That is, in the description of the alignment block 432 of the present invention, regardless of the shape or position of the block, the block sliding in the first direction in the left-right direction is the first block, and the block sliding in the front-back direction in the second direction is the second block. It is written in 2 blocks. Therefore, even if the same alignment block 432 is installed by rotating 90 degrees, the names of the first block and the second block are reversed.

The alignment motor 434 is installed on the upper surface of the alignment plate 431 and connected to the alignment block 432 , and serves to slide the alignment block 432 in the front-rear direction or left-right direction. To this end, a screw extending from the rotation shaft of the alignment motor 434 is provided, and a ball nut coupled to the screw and moving horizontally according to the rotation of the screw is extended and coupled to one side of the alignment block 432 . In this case, the alignment block 432 and the rotation support 433 are configured as a pair, and the alignment block 432 and the rotation support 433 pair are provided with four spaced apart to form the vertices of a mutual rectangle. And the alignment motor 434 is coupled to the three alignment blocks 432 in a direction perpendicular to the rotation axis of one alignment motor 434 in the three alignment blocks 432 and the rotation axis of the other two alignment motors 434. . As such, the pair of the alignment block 432 and the rotation support 433 coupled to the alignment motor 434 is a rotary axis, the alignment motor 434 is not coupled to the other alignment block 432 and the rotation support 433 of the The pair is called the slave axis. Accordingly, in connection with the above description, at least one alignment motor 434 must be orthogonal to the rotation axis of the other two alignment motors 434 , so that the two alignment blocks 432 are on the same axis when the alignment motor 434 is driven. direction, and the other alignment block 432 is moved along an orthogonal axial direction when the alignment motor 434 is driven.

Using this, the chuck tray 410 coupled to the alignment module 430 can be freely moved on a plane. First, for convenience of description, it is assumed that the rotation shafts of the two alignment motors 434 are installed in the first direction and the rotation shafts of the other alignment motor 434 are installed in the second direction. If the rotation shafts of the two alignment motors 434 are installed in the second direction, since the above assumption is the same as when viewed from the 90 degree side, there is no change in the motion characteristics.

First, when the two alignment motors 434 in the first direction are driven to move the ball nut in the same direction, the first block of the alignment block 432 coupled to the two alignment motors 434 as well as all alignment blocks 432 The first block of is slid in the first direction. Through this, the chuck tray 410 can be moved in the first direction.

Next, when the alignment motor 434 in the second direction is driven, the second block of all alignment blocks 432 as well as the second block coupled to the alignment motor 434 slides in the second direction. Through this, the chuck tray 410 can be moved in the second direction.

Next, by driving the two alignment motors 434 in the first direction so that the ball nut moves in the same direction, and at the same time driving the alignment motor 434 in the second direction, all alignment blocks 432 move in the first direction and It slides in the second direction, and through this, the chuck tray 410 can be moved in a diagonal direction.

Next, by driving the two alignment motors 434 in the first direction so that the ball nut moves in opposite directions, and by driving the alignment motor 434 in the second direction, the ball nut is aligned with the alignment motor 434 in the first direction. When moving to have a rotation direction connected to the ball nuts of the (clockwise, counterclockwise), the chuck tray 410 is rotated on a plane. At this time, while stopping the driving of one of the two alignment motors 434 in the first direction, the remaining one alignment motor 434 in the first direction and the alignment motor 434 in the second direction are simultaneously operated. When driven in rotational directions that are continuous, various plane movements such as changing the rotational center of the chuck tray 410 in the direction of the alignment motor 434 in the first direction where the driving is stopped are possible.

The alignment of the chuck tray 410 on a plane may be achieved by driving the alignment module 430 .

Then, when the elevating module 420 is driven to raise the chuck tray 410 , the chuck tray 410 comes into contact with the mask holder 300 . At this time, any part of the chuck tray 410 is moved to the mask holder 300 . ), there is a risk that the mask panel or the target substrate may be damaged by the contact impact. Further, in order for the chuck tray 410 to contact the mask holder 300 in parallel, the raising of the portion in contact with the mask holder 300 should be stopped and only the portion not in contact with the mask holder 300 should be raised.

In the present invention, the height adjustment module 440 is configured on the upper part of the alignment module 430 for this purpose. The height adjustment module 440 is a plate-shaped adjustment plate 441 coupled to the upper end of the rotation support 433 of the alignment module 430 , and a cushion cylinder 442 and a cushion cylinder installed on the upper surface of the adjustment plate 441 . and an adjustment retaining cylinder 443 installed adjacent the cushion cylinder 442 to mate with the 442 . And the chuck tray 410 is supported on the upper end of the cushion cylinder 442 and the adjustment holding cylinder 443 .

Looking at the operation of the height adjustment module 440 , when the chuck tray 410 comes into contact with the mask holder 300 while rising by the driving of the elevation module 420 , all parts are in contact with the mask holder 300 at the same time. Either direction may be in contact with the mask holder 300 first. Then, the cushion cylinder 442 of the height adjustment module 440 located below the chuck tray 410 in the direction in contact with the mask holder 300 is compressed. And when the elevating module 420 is further driven, the cushion cylinders 442 in the opposite direction are sequentially compressed starting from the cushion cylinder 442 in the direction in which the chuck tray 410 is in contact with the mask holder 300 , and the chuck tray 410 is compressed. ) and the mask holder 300 are in complete contact. At this time, when the chuck tray 410 is in contact with the mask holder 300 in all directions, that is, when the chuck tray 410 and the mask holder 300 are in a parallel state, the driving of the elevating module 420 is stopped. The upward driving of the chuck tray 410 is stopped. At this time, the cushion cylinders 442 are compressed in different degrees from each other, and the adjustment holding cylinder 443 paired with each cushion cylinder 442 is also in a compressed state. When the driving of the lifting module 420 is stopped, the actuator of the adjusting holding cylinder 443 operates to press the pin of the adjusting holding cylinder 443 from the side, so that the adjusting holding cylinder 443 maintains the current compressed state. In addition, the cushion cylinder 442 is driven in the reverse direction to prevent the height of the chuck tray 410 from being changed by the cushion cylinder 442 when the elevating module 420 descends in the future. That is, the angle formed at the lower end of the chuck tray 410 with respect to the upper surface of the adjustment plate 441 is maintained. Thereafter, when the lifting module 420 is lowered to a set height for driving the alignment module 430 , the chuck tray 410 supported by the adjustment holding cylinder 443 is lowered while maintaining parallel to the mask holder 300 . be able to do

The exposure module 500 serves to irradiate light from above the mask panel so that the target substrate can be exposed. ) and an exposure machine 520 that is slidably coupled to the exposure rail 510 and irradiates ultraviolet rays from above the mask panel adsorbed to the mask holder 300 to perform exposure.

The exposure rail 510 is provided parallel to the longitudinal direction of the chuck tray 410 and provides a movement path to the exposure machine 520 . The exposure may be performed while the exposure machine 520 moves upwards of the chuck tray 410 and the mask holder 300 along the exposure rail 510 .

The exposure machine 520 irradiates ultraviolet rays to the mask panel adsorbed to the mask holder 300 so that the ultraviolet rays passing through the mask panel act on the target substrate seated on the chuck tray 410 . To this end, the exposure machine 520 is reciprocally installed along the exposure rail 510 and includes a plurality of LED chips and a lens module for controlling the irradiation area of light emitted from the LED chips.

Ultraviolet rays are irradiated from the exposure machine 520, and exposure is performed in a scan manner from one end of the mask panel to the opposite end.

The control unit serves to control the operation of the chuck module 400 , the mask holder 300 , or the exposure module 500 . In this case, the driving control includes not only direct driving of each component as an electrical control signal, but also indirect driving through control of hydraulic pressure or pneumatic pressure supplied to any component.

Looking at the control operation of the control unit, first, the mask holder 300 is drawn out and accommodated in the rotation block 210, and then when the input of the button 231 or the detection of the pressure sensor 232 is made, the first stopping actuator 212 is operated. It is driven to fix the mask holder 300 to the rotation block 210 .

Then, when the button 231 is input after the mask panel is seated in the mask holder 300 , the control unit drives the vacuum pump to form a negative pressure in the mask negative pressure line 311 , so that the mask panel is adsorbed to the mask holder 300 . make it possible

Then, when the button 231 is input after the target substrate is seated on the chuck tray 410 , the control unit drives the vacuum pump so that a negative pressure is formed in the substrate negative pressure line 412 so that the target substrate is placed on the chuck tray 410 . to be adsorbed.

Then, when the button 231 is input after the mask holder 300 is accommodated in the horizontal frame 110 and positioned above the chuck tray 410, the control unit drives the second stopping actuator 112 to drive the mask holder. (300) is fixed to the horizontal frame (110).

Then, when the button 231 is input, the control unit lifts the lifting module 420 to bring the chuck tray 410 close to the mask holder 300 . At this time, when the chuck tray 410 is in contact with the mask holder 300 and a reaction force is formed in the lifting motor 421 or the amount of rotation compared to the input power of the lifting motor 421 is rapidly changed, the driving of the lifting motor 421 is performed. stop

Then, the control unit operates the actuator of the adjustment holding cylinder 443 of the adjustment holding module to fix the height of the adjustment holding cylinder 443 , and driving the cushion cylinder 442 in the reverse direction to provide the cushion cylinder 442 and the chuck tray. Release the contact of 410 . Alternatively, the actuator of the adjustment holding cylinder 443 is operated to fix the height of the adjustment holding cylinder 443 , and the driving of the cushion cylinder 442 is stopped. The gist is to control the chuck tray 410 to be supported by the adjustment holding cylinder 443 without changing the height of the chuck tray 410 by the cushion cylinder 442 when the lifting module 420 is lowered. will be.

Thereafter, the controller drives the elevating module 420 to descend by a set amount to separate the chuck tray 410 from the mask holder 300 by a set distance. Then, the alignment module 430 is driven to change the planar position of the chuck tray 410 with respect to the mask holder 300 . Preferably, the position of the target substrate seated on the chuck tray 410 with respect to the mask panel adsorbed on the mask holder 300 is changed. To this end, a mask pattern is formed on the mask panel and a sample pattern is formed on the target substrate. Based on the positions of the mask pattern and the sample pattern, XY and θ adjustment values are calculated. In addition, a camera 550 is further provided above the mask holder 300 to specify the positions of the mask pattern and the sample pattern.

The camera 550 is provided above the mask holder 300 and serves to photograph the lower mask holder 300 , and preferably photograph the mask panel adsorbed to the mask holder 300 . The position of the mask pattern of the mask panel and the sample pattern of the target substrate can be known by such imaging. Two cameras 550 are usually provided so that XY and θ adjustment values can be calculated by specifying the positions of the mask pattern and the sample pattern at two points, respectively, but the positions of the mask pattern and the sample pattern are changed due to the expansion of the target substrate. A total of four cameras 550 may be provided, two in one direction, so as to be able to control in consideration of the variable.

The controller calculates XY and θ adjustment values by image processing the image captured by the camera 550 , and drives each alignment motor 434 of the alignment module 430 based on this. The driving amount of each alignment motor 434 for the XY and θ adjustment values may be calculated by the control unit at that time, or the driving amount may be extracted from a pre-stored table.

When the driving of the alignment module 430 is completed, the control unit lifts the lifting module 420 to bring the chuck tray 410 into contact with the mask holder 300 again. Then, by driving the vacuum motor to form a negative pressure in the negative pressure line 413 of the holder, the relative positions of the mask panel and the target substrate are firmly fixed.

When the position alignment of the mask panel and the target substrate is completed, the controller drives the exposure module 500 so that the exposure machine 520 can perform exposure on the upper part of the mask panel in a scan manner.

In the present invention having the above-described configuration, the mask holder 300 is drawn out and rotated so that the lower surface of the mask holder 300 is exposed forward or upward, so that the mask panel can be easily seated and adsorbed on the lower surface of the mask holder 300 . possible effect.

In addition, in the present invention, while the mask holder 300 can be slid forward or backward, the mask holder 300 is firmly fixed when the mask holder 300 is rotated, and when the mask holder 300 is stored, the mask holder ( 300) has the effect of firmly fixing the position.

In addition, according to the present invention, even if the chuck tray 410 and the mask holder 300 are not parallel when the chuck tray 410 is raised, it can be easily adjusted and the adjusted parallelism can be maintained.

In addition, according to the present invention, the position and angle of the chuck tray 410 on a plane can be easily changed, and thereby, the position of the target substrate with respect to the mask panel can be easily aligned.

100: base frame 110: horizontal frame
111: horizontal rail 112: second stopping actuator
113: holder rear stopper
200: rotation frame 210: rotation block
211: rotation rail 212: first stopping actuator
213: holder front stopper
220: support block 221: rotation angle limit stopper
230: horizontal block 231: button
232: pressure sensor
300: mask holder 301: handle
310: mask seating groove 311: mask negative pressure line
312: mask packing 320: holder stopping groove
330: holder stopping block 340: holder wheel
400: chuck module 410: chuck tray
411: board seating part 412: board negative pressure line
413: holder negative pressure line 414: sealing part
420: elevating module 421: elevating motor
422: lifting unit 423: power transmission unit
430: alignment module 431: alignment plate
432: alignment block 433: rotation support
434: alignment motor
440: height adjustment module 441: adjustment plate
442: cushion cylinder 443: adjustment holding cylinder
500: exposure module 510: exposure rail
520: exposure machine
550 : camera

Claims (7)

a base frame including a pair of horizontal frames spaced apart from each other and provided in parallel with horizontal rails formed in the longitudinal direction;
a holder rotation frame including a support block provided in front of the front end of the horizontal frame, and a rotation block rotatably coupled to each of the support blocks and having a rotation rail formed in a continuous shape with the horizontal rail;
a mask holder on which a mask panel is adsorbed and fixed on a lower surface, both ends of which are slidably guided in the front and rear directions on the horizontal rail or the rotating rail;
a chuck module provided below the mask holder between the horizontal frames and on which a target substrate subjected to exposure is seated;
an exposure module comprising: an exposure rail provided parallel to one corner of the upper surface of the mask holder; and an exposure machine slidably coupled to the exposure rail and performing exposure from an upper side of a mask panel adsorbed to the mask holder;
a controller for controlling driving of the chuck module, the mask holder, or the exposure module;
including,
When the rear end of the mask holder is separated from the horizontal frame by sliding the mask holder forward, the mask holder can be rotated with respect to the support block along the rotation block, and when the mask holder is rotated along the rotation block The lower surface of the mask holder to which the mask panel is adsorbed is exposed forward or upward,
The chuck module includes a chuck tray on which the target substrate is seated, and a lifting module for raising and lowering the chuck tray below the chuck tray,
The elevating module may include an elevating motor and a plurality of elevating units receiving a driving force from the elevating motor to elevate the chuck tray.
The method of claim 1,
A holder stopping block is protruded from the rear end of the lower surface of the mask holder, and the rotating block is at the front end of the holder stopping block to limit the forward movement of the mask holder when the rear end of the mask holder is separated from the horizontal frame. A stopper in front of the holder is provided,
The mask holder has a holder stopping groove recessed in its lower surface, and the rotation block is provided with a first stopping actuator through which the first stopping pin is drawn out, so that when the first stopping pin is withdrawn, the first stopper A large-area exposure apparatus in which a topping pin is accommodated in the holder stopping groove so that the front-rear movement of the mask holder is restricted.
3. The method of claim 2,
The horizontal frame is provided with a holder rear stopper in contact with the rear end of the holder stopping block or the rear end of the mask holder to limit the rear movement of the mask holder,
The horizontal frame is provided with a second stopping actuator through which a second stopping pin is drawn out, so that when the second stopping pin is drawn out, the second stopping pin is accommodated in the holder stopping groove, so that the mask holder A large-area exposure device with limited forward and backward movement.
4. The method of claim 3,
The support block is provided with a rotation angle limiting stopper whose upper surface is in contact with the front end of the lower surface of the rotation block, and the rotation angle limiting stopper is in contact with the front end of the lower surface of the rotation block when the rotation block is rotated to rotate the rotation block A large-area exposure device that limits the angle.
delete The method of claim 1,
The chuck module includes a height adjustment module provided between the chuck tray and the elevating part to allow the chuck tray to contact the mask holder in parallel with the mask holder;
The height adjustment module includes a plate-shaped adjustment plate and a chuck tray installed on an upper surface of the adjustment plate to support a lower end of the chuck tray, and in a direction in contact with the mask holder when the chuck tray comes into contact with the mask holder while the chuck tray is rising A plurality of cushion cylinders are sequentially compressed according to the order provided below and are provided in parallel so that the mask holder and the chuck tray are in parallel contact, and the cushion cylinder is arranged in close proximity to the cushion cylinder to form a pair on the upper surface of the adjustment plate. A large-area exposure apparatus including an adjustment holding cylinder for maintaining a formation angle of a lower end of the chuck tray.
7. The method of claim 6,
A camera provided above the mask holder to photograph the mask holder is further provided,
The chuck module includes an alignment module configured to change a position of the chuck tray in a plane with respect to the mask holder by having an upper surface in contact with the chuck tray and a lower surface in contact with the elevating module;
The control unit, after driving the elevating module to descend to a set height, a large-area exposure apparatus for determining the degree of position variation of the alignment module based on the photographed image of the camera.

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