KR101922204B1 - Scanning type exposure device - Google Patents

Abstract

A scanning type exposure apparatus includes an XY stage, a light source unit, and a microscope unit. The light source unit is mounted on the XY stage via a rotary tilt unit, includes a plurality of light emitting diodes, and has a smaller size than a substrate supporting an exposure target. The microscope unit is coupled to the light source unit. The light source unit and the microscope unit perform X-axis tilt, Y-axis tilt, and Z-axis rotation at a specific position of the XY stage.

Description

[0001] SCANNING TYPE EXPOSURE DEVICE [0002]

The present invention relates to an exposure apparatus, and more particularly, to a scanning exposure apparatus.

BACKGROUND ART [0002] Exposure devices that irradiate light onto a target object for curing, melting, sintering, and the like are used in various fields such as lithography equipment or 3D (3-Dimensional) printers.

BACKGROUND ART [0002] In a lithography system for forming semiconductors, displays, MEMS (Micro Electro Mechanical System) structures, etc., an exposure apparatus generally uses a fixed parallel light source larger than a substrate. When a tilted structure is manufactured, Tilt or rotate.

The exposure apparatus is fabricated in a large size so that the light source can expose the entire substrate. The larger the substrate, the larger the exposure apparatus is. Therefore, when the entire light source is tilted, the entire equipment becomes very large. In the case of tilting the substrate, the vacuum chuck for fixing the substrate and the entire exposure mask move, and alignment may be changed. In both cases, there is a problem that the amount of exposure is uneven depending on the position of the substrate.

The present invention can miniaturize the entire apparatus and can carry out the planar exposure, the oblique exposure and the rotational exposure while maintaining the exposure accuracy with respect to the large area substrate, and can confirm the alignment state of the substrate with the exposure mask and monitor the exposure state at various positions Which can be freely performed in a scanning exposure apparatus.

An exposure apparatus of a scanning type according to an embodiment of the present invention includes a light source unit, a rotary tilt unit, an XY stage, a microscope unit, and an exposure mask. The light source unit includes a light emitting element. The rotary tilt unit is coupled to the light source unit, rotates the light source unit around the Z axis, and tilts the light source unit with respect to each of the X axis and the Y axis. The XY stage is coupled to the rotary tilt unit, and moves the light source unit and the rotary tilt unit in the X-axis direction and the Y-axis direction. The microscope unit is coupled to at least one of the light source unit and the rotary tilt unit, and photographs the exposure target. The exposure mask is located on the exposure target and has a light shielding portion and a light transmitting portion.

The light source unit may include a plurality of light emitting elements that emit light at the same brightness, and may have a smaller size than the substrate that supports the exposure target. The light source unit and the rotary tilt unit can constitute an exposure head, and at least two exposure heads can be installed on the XY stage with a distance therebetween. The light source units included in each of the at least two exposure heads can emit light of different wavelengths.

A scanning exposure apparatus according to another embodiment of the present invention includes a light source unit, a rotary tilt unit, an XY stage, and a microscope unit. The light source unit includes a plurality of light emitting elements capable of individual light amount control. The rotary tilt unit is coupled to the light source unit, rotates the light source unit around the Z axis, and tilts the light source unit with respect to each of the X axis and the Y axis. The XY stage is coupled to the rotary tilt unit, and moves the light source unit and the rotary tilt unit in the X-axis direction and the Y-axis direction. The microscope unit is coupled to at least one of the light source unit and the rotary tilt unit, and photographs the exposure target.

The plurality of light emitting elements may be composed of a plurality of light emitting diodes whose supply current is controlled by the control circuit unit. The light source unit may have a smaller size than the substrate for supporting the exposure target, and the exposure mask may be replaced by controlling the light amount of each of the plurality of light emitting elements individually.

The light source unit and the rotary tilt unit can constitute the exposure head, and at least two exposure heads can be provided at the XY stage with a distance therebetween. The light source units included in each of the at least two exposure heads can emit light of different wavelengths.

According to another embodiment of the present invention, an exposure apparatus of a scanning method includes an XY stage, a light source unit, and a microscope unit. The light source unit is provided on the XY stage through a rotary tilt unit, and includes a plurality of light emitting diodes, and has a smaller size than the substrate supporting the exposure target. The microscope unit is coupled to the light source unit. The light source unit and the microscope unit perform X-axis tilt and Y-axis tilt and Z-axis rotation at specific positions of the XY stage.

The rotary tilt unit may include a first tilt unit coupled to the light source unit, a second tilt unit coupled to the first tilt unit, a second tilt unit, and a Z axis rotation unit coupled to the XY stage. Either the first tilt portion or the second tilt portion may function as an X-axis tilt portion, and the other may function as a Y-axis tilt portion.

The first tilt unit may include a first body, and a first rotation shaft connected to the first body and the light source unit and tilting the light source unit by rotation. The second tilt part may include a second body, and a second rotation shaft connected to the first body and the second body and tilting the first body and the light source unit by rotation. The axial direction of the first rotary shaft and the second rotary shaft may be parallel to the ground, and the axial direction of the first rotary shaft and the axial direction of the second rotary shaft may be orthogonal to each other.

The Z-axis rotation unit may include a third body coupled to the XY stage, and a third rotation shaft connected to the second body and the third body for rotating the second body, the first body, and the light source unit by rotation. The axial direction of the third rotary shaft can coincide with the gravitational direction.

The microscope unit may include at least one of a first microscope unit coupled to the light source unit and a second microscope unit coupled to the second body. The range of the first microscope unit can coincide with the exposure range of the light source unit.

The exposure apparatus of the scanning method may further include a first Z-axis transfer unit. The first Z-axis transfer unit may be installed between the rotary tilt unit and the XY stage to move the rotary tilt unit and the light source unit in the Z-axis direction with respect to the XY stage.

The exposure apparatus of the scanning method may further include a second Z-axis transfer unit. The second Z-axis transfer unit is coupled to the XY stage to move the XY stage, the rotary tilt unit, and the light source unit in the Z-axis direction.

The exposure apparatus of the present invention can reduce the size of the entire apparatus by using a scanning method that linearly moves the light source units smaller than the substrate. Since various oblique exposure and rotational exposure can be performed, various types of inclined structures and three-dimensional lattice structures or horn structures can be easily manufactured.

Further, since the microscope unit can accurately photograph the exposure target while rotating, tilting, and moving together with the light source unit, the alignment state of the exposure target and the exposure mask can be easily confirmed, and the exposure state of the exposure target can be precisely monitored .

FIG. 1 is a configuration diagram showing a scanning exposure apparatus according to a first embodiment of the present invention.
2 is a schematic perspective view of the exposure head shown in Fig.
3 is a perspective view showing an example of the light source unit shown in Fig.
4 is a block diagram showing an example of the rotation tilt unit shown in Fig.
5 is a plan view of the substrate shown in Fig.
Fig. 6 is a configuration diagram showing the oblique exposure of the exposure apparatus shown in Fig. 1. Fig.
FIGS. 7 and 8 are block diagrams showing the oblique exposure of the exposure apparatus according to the prior art.
9 is an enlarged cross-sectional view of a substrate showing an embodiment of oblique exposure using the exposure apparatus of FIG.
10 and 11 are sectional views showing an inclined structure that can be produced by the oblique exposure shown in FIG.
12A to 12C are enlarged sectional views of a substrate showing another embodiment of oblique exposure.
13 is a configuration diagram showing an exposure apparatus according to the second embodiment of the present invention.
14 is a configuration diagram showing an exposure apparatus according to the third embodiment of the present invention.
15 is a schematic plan view of the light source unit in the exposure apparatus shown in Fig.
16 is a plan view of the substrate of the exposure apparatus shown in Fig.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings, which will be readily apparent to those skilled in the art to which the present invention pertains. The present invention may be embodied in many different forms and is not limited to the embodiments described herein.

FIG. 1 is a configuration diagram showing a scanning exposure apparatus according to a first embodiment of the present invention, and FIG. 2 is a schematic perspective view of the exposure head shown in FIG.

1 and 2, the exposure apparatus 100 of the first embodiment includes a light source unit 10 including a light emitting element, a rotary tilt unit 20 for rotating and tilting the light source unit 10, An XY stage 30 coupled to the microscope 20, and at least one microscope unit 40. The light source unit 10 and the rotary tilt unit 20 constitute an exposure head.

The light source unit (10) includes at least one light emitting element (11). Fig. 3 is a perspective view showing an example of the light source unit shown in Fig. 1, and shows a state in which the light source unit is turned upside down.

3, the light source unit 10 includes a circuit board 12, a plurality of light emitting devices 11 arranged on the circuit board 12 and arranged along the X-axis direction and the Y- , And a support body 13 for supporting the circuit board 12.

The light emitting device 11 may be a light emitting diode (LED) having low power consumption. The plurality of light emitting devices 11 can receive the same amount of current from the circuit board 12 and emit light at the same brightness. The light source unit 10 controls the brightness of the plurality of light emitting devices 11 according to the amount of current .

Referring again to FIGS. 1 and 2, the light source unit 10 is made smaller in size than the substrate (or the wafer or the like) 50, It is possible to emit light of a wavelength band.

The rotary tilt unit 20 rotates the light source unit 10 about the Z axis and tilts the light source unit 10 with respect to each of the X axis and the Y axis. Here, the X axis and the Y axis mean two directions that are parallel to the ground and are perpendicular to each other, and the Z axis corresponds to the direction of gravity and the direction orthogonal to the X axis and the Y axis.

The rotary tilt unit 20 can be made of a combination of various mechanical parts. 4 is a block diagram showing an example of the rotation tilt unit shown in Fig.

4, the rotary tilting unit 20 includes a first tilting portion 21 coupled to the light source unit 10, a second tilting portion 22 coupled to the first tilting portion 21, And a Z-axis rotation part 23 coupled to the 2-tilt part 22. [ Either one of the first tilt section 21 and the second tilt section 22 functions as an X-axis tilt section, and the other functions as a Y-axis tilt section.

That is, the functions of the first tilt part 21 and the second tilt part 22 may be changed according to the rotation state of the light source unit 10. [ In FIG. 4, the first tilt section 21 functions as a Y-axis tilt section and the second tilt section 22 functions as an X-axis tilt section.

The first tilt part 21 may include a first body 24 and a first rotation shaft 25 connected to the first body 24 and the light source unit 10. The first rotary shaft 25 can be coupled to the support 13 of the light source unit 10 and the axial direction of the first rotary shaft 25 is parallel to the ground.

The light source unit 10 is tilted in the Y-axis direction by the rotation of the first rotation shaft 25 and is moved in the positive Y-axis direction from the reference position (position where the light source unit 10 irradiates light in the downward direction) And negative (-) directions, respectively. That is, the Y-axis tilt angle of the light source unit 10 can be determined by the first tilt unit 21 within a range of 180 degrees.

The second tilt part 22 may include a second body 26 and a second rotation shaft 27 connected to the first body 24 and the second body 26. The axial direction of the second rotary shaft 27 is parallel to the paper surface and orthogonal to the axial direction of the first rotary shaft 25.

The light source unit 10 and the first tilt part 21 are inclined in the X axis direction by the rotation of the second rotation shaft 27 and the light source unit 10 and the first body 24 are inclined in the X- Position can be inclined up to 90 degrees in each of the positive (+) X-axis direction and the negative (-) X-axis direction. That is, the tilt angle of the X-axis can be determined within the range of 180 ° by the second tilting portion 22 of the light source unit 10 and the first tilting portion 21.

The Z-axis rotary part 23 may include a third body 28 and a third rotary shaft 29 connected to the second body 26 and the third body 28. The axial direction of the third rotary shaft 29 coincides with the gravity direction (Z-axis direction). The light source unit 10 and the first tilt part 21 and the second tilt part 22 as a whole are rotated by the rotation of the third rotation shaft 29 and can be rotated 360 degrees in the clockwise direction and the counterclockwise direction respectively .

Each of the first rotary shaft 25, the second rotary shaft 27 and the third rotary shaft 29 can be manually operated or can be operated by a driving device (not shown) such as an electric motor, a pneumatic actuator, a hydraulic actuator, . The driving device of the first rotating shaft 25 may be located inside the first body 24 and the driving device of the second rotating shaft 27 may be located inside the second body 26. The driving device of the third rotary shaft 29 may be located inside the third body 28.

When the rotary tilt unit 20 includes a driving device, the driving line, the signal processing line, and the like may be connected to the outside through the third rotary shaft 29. [ To this end, the third rotary shaft 29 may be a hollow hollow shaft and may include a plurality of through holes.

The rotary tilt unit 20 is not limited to the example shown in Fig. 4, and can be applied to any configuration as long as the light source unit 10 can be rotated in the Z-axis direction and tilted in the X- and Y-axis directions .

1 and 4, the XY stage 30 is coupled to the rotary tilt unit 20 and moves the rotary tilt unit 20 and the light source unit 10 in the X-axis direction and the Y-axis direction. The third body 28 of the Z-axis rotary part 23 of the rotary tilt unit 20 can be coupled to the XY stage 30. [

The XY stage 30 may include a first linear moving part for moving the X axis and a second linear moving part for moving the Y axis. Each of the first and second linear movement units may be constituted by a motor and an LM (Linear Motion) guide, or may be a combination of known mechanical components. The light source unit 10 having a smaller size than the substrate 50 can perform exposure in a scanning manner while moving in the X-axis or Y-axis direction by the XY stage 30.

The exposure apparatus 100 of the first embodiment may include a Z-axis transfer unit. The Z axis conveying portion includes at least one of a first Z axis conveying portion 35A provided between the rotary tilt unit 20 and the XY stage 30 and a second Z axis conveying portion 35B coupled to the XY stage 30 can do.

The first Z axis transfer unit 35A moves the exposure head in the Z axis direction with respect to the XY stage 30 and changes the distance between the exposure target 51 and the light source unit 10 to irradiate the exposure target 51 It is possible to control the amount of light to be emitted.

The second Z-axis transfer section 35B moves the XY stage 30 and the entire exposure head coupled thereto in the Z-axis direction. The second Z-axis transporting unit 35B functions not only to adjust the amount of light irradiated to the exposure target 51 but also to raise the XY stage 30 and the exposure head when the substrate 50 is replaced, Can be prevented.

The microscope unit 40 is coupled to at least one of the light source unit 10 and the rotary tilt unit 20 and constitutes a vision system for photographing the exposure target 51 with precision. 4 shows a first microscope unit 41 coupled to the light source unit 10 and a second microscope unit 42 coupled to the rotation tilt unit 20. The first and second microscope units 41, 42 may be omitted.

The first microscope unit 41 can be coupled to the support 13 of the light source unit 10 and can be moved along with the light source unit 10 in a linear motion, a two-axis (X and Y axis) tilt, can do. The photographing range of the first microscope unit 41 can substantially coincide with the exposure range of the light source unit 10. [ The first microscope unit 41 can photograph the exposure target 51 irradiated with the light from the light source unit 10 precisely.

The second microscope unit 42 can be coupled to the second body 26 of the second tilt section 22 of the rotary tilt unit 20 and can be moved linearly along the second body 26, Axis or Y-axis) tilt, and Z-axis rotation. The shooting range of the second microscope unit 42 may be different from the shooting range of the first microscope unit 41 when the light source unit 10 is tilted by the first rotation shaft 25. [

The exposure apparatus 100 may further include an additional microscope unit that maintains a fixed position in addition to the first and second microscope units 41 and 42 integrated in the exposure head. That is, the exposure apparatus 100 may include at least one movable microscope unit 41, 42 moving together with an exposure head, and a stationary microscope unit irrespective of the movement of the exposure head.

The exposure apparatus 100 can easily identify the alignment state of the substrate 50 and the exposure mask 52 at the actual exposure position by providing the first and second microscope units 41 and 42 that move together with the exposure head, The state of the exposed exposure target 51 can be precisely monitored.

The substrate 50 is supported by a known substrate support such as an electrostatic chuck or a vacuum chuck, and the exposure mask 52 can be supported by a known mask holder. The exposure apparatus 100 may further include a lens unit 60. The lens unit 60 may include a focusing lens 61 for focusing the light emitted from the light source unit 10 and a collimator lens 62 for converting the focused light into parallel light, It does not.

5 is a plan view of the substrate shown in Fig. 1 and 5, the exposure area 71 of the light source unit 10 may be, for example, a quadrangle.

The light source unit 10 is turned on at a specific position to expose a part of the substrate 50 and then turned off and is linearly moved and then turned on to expose another part of the substrate 50, (See section (A)). At this time, the first exposure region and the second exposure region may have overlapping portions, and the degree of exposure may be controlled by adjusting the exposure time per exposure area.

On the other hand, the light source unit 10 can be linearly moved continuously in the turn-on state (see (B)), and the degree of exposure can be controlled by adjusting the moving speed and the number of scanning repetitions.

Referring again to FIG. 1, the exposure apparatus 100 of the present embodiment can reduce the size of the entire apparatus by using a scanning method in which the light source unit 10, which is smaller than the substrate 50, is linearly moved. Further, the exposure apparatus 100 can easily tilt the light source unit 10 using the rotation tilt unit 20. [ Such a configuration does not cause enlargement of the equipment to which the exposure apparatus 100 is applied compared to the configuration for tilting the entire exposure apparatus 100 or the substrate 50. [

Fig. 6 is a configuration diagram showing the oblique exposure of the exposure apparatus shown in Fig. 1. Fig. Referring to FIGS. 1 and 6, in the oblique exposure process, the light source unit 10 emits light in a tilted state in the X-axis or Y-axis direction by the rotary tilt unit 20, And moves linearly.

Irregular exposure in various directions is possible within the movement range of the XY stage 30 regardless of whether the substrate 50 is large or not, and it is very easy to adjust the inclination direction and the inclination angle. In addition, in the present embodiment, the deviation of the quantity of light is obtained by performing the linear movement (scanning) of the light source unit 10 several times by the tilt of the light source unit 10 Can be minimized or substantially eliminated.

FIGS. 7 and 8 are block diagrams showing the oblique exposure of the exposure apparatus according to the prior art. The conventional exposure apparatus has a light source module 200 that is larger than the substrate 50 so as to expose the entire substrate 50 and tilts the light source module 200 as shown in FIG. The substrate 50 is tilted.

7 and 8, the larger the substrate 50 is, the larger the overall size of the apparatus is, and it is difficult to set the inclination direction and the inclination angle in various ways.

The exposure apparatus 100 of the present embodiment can easily produce various shapes of three-dimensional tilted structures by freely tilting and rotating the light source unit 10. [ FIG. 9 is an enlarged cross-sectional view of a substrate showing an example of oblique exposure using the exposure apparatus of FIG. 1, and FIGS. 10 and 11 are cross-sectional views showing inclined structures that can be produced by oblique exposure shown in FIG.

1 and 9, a photosensitive layer 51, which is an exposure target, is placed on a substrate 50, and an exposure mask 52 is placed on the photosensitive layer 51. The exposure mask 52 includes a light-shielding portion 53 and a light-projecting portion 54. The light source unit 10 is tilted in the X-axis or Y-axis direction by the rotary tilt unit 20, and irradiates light having an inclination angle of +? With respect to the Z-axis direction.

Light emitted to the substrate 50 may be collimated by the collimator lens 62. The portion of the photosensitive layer 51 facing the transparent portion 54 of the exposure mask 52 is selectively obliquely exposed. The positive photosensitive layer has a characteristic that a portion exposed to light is soluble in a developing solution, and a negative photosensitive layer has a characteristic that a portion exposed to light is insoluble in a chemical.

In the case where the photosensitive layer 51 shown in FIG. 9 is a positive photosensitive layer, a post-exposure development operation can provide a tilted structure 81 from which a portion exposed to light is removed as shown in FIG. In the case where the photosensitive layer 51 shown in FIG. 9 is a negative photosensitive layer, when the post-exposure development operation is performed, a tilted structure 82 in which portions exposed to light are hardened as shown in FIG. 11 can be obtained.

12A to 12C are enlarged sectional views of a substrate showing another embodiment of oblique exposure.

Referring to FIG. 12A, the photosensitive layer 51 may be a negative photosensitive layer, and an exposure mask 52 is placed on the photosensitive layer 51. The light source unit 10 (see FIG. 1) is tilted in the X-axis or Y-axis direction and irradiates light having an inclination angle of +? With respect to the Z-axis direction. The portion of the photosensitive layer 51 facing the light-transmitting portion of the exposure mask 52 is primarily obliquely exposed.

12B, the light source unit 10 (see FIG. 1) is tilted from the reference position in the direction opposite to the case of FIG. 12A, and irradiates light having an inclination angle of -θ with respect to the Z-axis direction. The portion of the photosensitive layer 51 facing the light-transmitting portion of the exposure mask 52 is subjected to secondary oblique exposure.

When the primary oblique exposure and the post-secondary oblique exposure post-exposure development work are performed, a mesh-shaped inclined structure 83 in which inclined portions in two directions are intertwined can be obtained as shown in FIG. 12C.

The inclined structures 81, 82 and 83 shown in Figs. 10, 11 and 12C can be used as optical components such as diffraction gratings. On the other hand, the light source unit 10 can be rotated at the time of oblique exposure, and in this case, a lattice structure or a cone structure having various three-dimensional shapes can be easily manufactured.

13 is a configuration diagram showing an exposure apparatus according to the second embodiment of the present invention.

Referring to FIG. 13, the exposure apparatus 110 of the second embodiment is configured as a multi-head type having a plurality of exposure heads 90A and 90B. 13 shows an example in which the first exposure head 90A and the second exposure head 90B are installed on the XY stage 30 with a distance therebetween.

The first exposure head 90A includes the first light source unit 10A and the first rotary tilt unit 20A and the second exposure head 90B includes the second light source unit 10B and the second rotary tilt unit 20B. 20B. The first light source unit 10A and the second light source unit 10B may have the same light emission wavelength and can perform exposure while moving together. In this case, the number of scanning times can be reduced to shorten the entire process time.

On the other hand, the first light source unit 10A and the second light source unit 10B may have different emission wavelengths. The photosensitive layer 51, which is an exposure target, may have a different light sensitivity with respect to the first wavelength and the second wavelength. The first light source unit 10A may emit light of a first wavelength, (10B) can emit light of the second wavelength.

The first exposure head 90A and the second exposure head 90B can move simultaneously or selectively. The exposure apparatus 110 of the second embodiment can improve the exposure speed by providing a plurality of exposure heads 90A and 90B and can use the difference in photosensitivity of the photosensitive layer 51 to produce various types of inclined structures have.

The exposure apparatus 110 of the second embodiment has the same configuration as that of the first embodiment except that there are a plurality of exposure heads 90A and 90B, and a duplicate description will be omitted.

FIG. 14 is a configuration diagram showing an exposure apparatus according to a third embodiment of the present invention, and FIG. 15 is a schematic plan view of a light source unit in the exposure apparatus shown in FIG. 14, showing a state in which the light source unit is turned upside down.

Referring to Figs. 14 and 15, in the exposure apparatus 120 of the third embodiment, the light source unit 10C includes a plurality of light emitting elements 11A capable of individual brightness control. To this end, the light source unit 10C further includes a control circuit unit for controlling ON / OFF and gray scale (light amount) of each of the plurality of light emitting devices 11A.

Since the light amount of the light emitting diode is controlled according to the current, the control circuit unit can control the on / off and grayscale of the light emitting diode precisely by controlling the current supplied to each of the light emitting diodes. In Fig. 15, the light emitting element 11B in an off state is indicated by black and the light emitting element 11W in an on state is indicated by white for convenience.

Since the plurality of light emitting devices 11A can individually control the brightness, the light source unit 10C can replace the exposure mask of the first embodiment. That is, since the specific portion of the photosensitive layer 51 can be selectively exposed without disposing the exposure mask on the substrate 50, the exposure apparatus 120 of the third embodiment can omit the exposure mask of the first embodiment .

16 is a plan view of the substrate of the exposure apparatus shown in Fig. Referring to FIGS. 14 and 16, the light source unit 10 can perform exposure while changing the gray scale. 16 shows a first exposure area 72 irradiated with a first light quantity and a second exposure area 73 irradiated with a second light quantity lower than the first light quantity.

In addition, the light source unit 10 can be moved on / off and grayscale of the light emitting elements 11A to form an exposure area of a specific shape. 16 shows a third exposed area 74 in the form of a cloud consisting of a set of eight differently shaped exposure areas 741. In FIG.

In the case of the third exposure area 74, the light source unit 10 is turned off by turning on the light emitting elements 11A at a specific position at a specific position in a specific gray scale by the control circuit, It is possible to complete the third exposure region 74 while repeating the process of turning on the light emitting devices 11A at a specific position in a specific gray scale and then turning off the light emitting devices 11A.

The exposure apparatus 120 of the third embodiment has the same configuration as that of the first embodiment or the second embodiment described above except for the configuration of the light source unit 10C and the omission of the exposure mask. That is, in the case of the second embodiment, the first light source unit 10A and the second light source unit 10B can have the same configuration as the light source unit 10C of the third embodiment, and the exposure mask can be omitted.

The exposure apparatuses 100, 110, and 120 having the above-described structure may be used in a lithography process for manufacturing semiconductors, displays, MEMS structures, etc., or a 3D printing process for forming a three- And the like.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, Of course.

100, 110, 120: Exposure device 10: Light source unit
11: light emitting element 20: rotary tilt unit
21: first tilt section 22: second tilt section
23: Z axis rotation part 30: XY stage
35A: first Z-axis feed portion 35B: second Z-axis feed portion
40: microscope unit 50: substrate
51: exposure target, photosensitive layer 52: exposure mask
60: lens unit 61: focusing lens
62: Collimator lens

Claims (16)

A light source unit including a light emitting element;
A first body coupled to the first body and coupled to the light source unit, the first body coupled to the first body, the second body coupled to the first body, the second body being rotatable about the first body, A tilting unit including a second body coupled to the second body, a third body coupled to the third body, a third body coupled to the third body, and a third body coupled to the third body;
An XY stage coupled to the rotary tilt unit, the XY stage moving the light source unit and the rotary tilt unit in the X axis direction and the Y axis direction;
A movable microscope unit coupled to at least one of the light source unit and the rotation tilt unit and configured to photograph an exposure target while moving with at least one of the light source unit and the rotation tilt unit; And
And an exposure mask located on the exposure target and having a light shielding portion and a light transmitting portion,
The light source unit and the movable microscope may control the tilt angle of the X axis by the first rotation axis at a specific position of the XY stage, the tilt angle of the Y axis by the rotation of the second rotation axis, A scanning-type exposure apparatus capable of controlling the rotation angle of the Z-axis. The method according to claim 1,
Wherein the light source unit includes a plurality of light emitting elements emitting light at the same brightness and has a smaller size than a substrate supporting the exposure target. 3. The method of claim 2,
Wherein the light source unit and the rotary tilt unit constitute an exposure head,
Wherein at least two exposure heads are provided in the XY stage with a distance therebetween. The method of claim 3,
Wherein the light source unit included in each of the at least two exposure heads emits light of different wavelengths. A light source unit including a plurality of light emitting elements capable of individual light amount control;
A first body coupled to the first body and coupled to the light source unit, the first body coupled to the first body, the second body coupled to the first body, the second body being rotatable about the first body, A tilting unit including a second body coupled to the second body, a third body coupled to the third body, a third body coupled to the third body, and a third body coupled to the third body;
An XY stage coupled to the rotary tilt unit, the XY stage moving the light source unit and the rotary tilt unit in the X axis direction and the Y axis direction; And
And a mobile microscope unit coupled to at least one of the light source unit and the rotation tilt unit and configured to photograph an exposure target while moving with at least one of the light source unit and the rotation tilt unit,
Wherein the light source unit and the movable microscope unit are configured to adjust an X-axis tilt angle by rotation of the first rotation axis at a specific position of the XY stage, a Y-axis tilt angle control by rotation of the second rotation axis, A scanning-type exposure apparatus capable of adjusting the rotation angle of the Z-axis by rotation of the Z- 6. The method of claim 5,
Wherein the plurality of light emitting elements are composed of a plurality of light emitting diodes whose supply current is controlled by a control circuit portion,
Wherein the light source unit has a smaller size than the substrate for supporting the exposure target, and replaces the exposure mask by an individual light amount control of the plurality of light emitting elements. The method according to claim 6,
Wherein the light source unit and the rotary tilt unit constitute an exposure head,
Wherein at least two exposure heads are provided in the XY stage with a distance therebetween. 8. The method of claim 7,
Wherein the light source unit included in each of the at least two exposure heads emits light of different wavelengths. delete delete delete delete delete 9. The method according to any one of claims 1 to 8,
Wherein the microscope unit comprises at least one of a first microscope unit coupled to the light source unit and a second microscope unit coupled to the second body,
Wherein the range of the first microscope unit coincides with the exposure range of the light source unit. 9. The method according to any one of claims 1 to 8,
And a first Z-axis transferring unit installed between the rotary tilting unit and the XY stage for moving the rotary tilting unit and the light source unit in the Z-axis direction with respect to the XY stage. 16. The method of claim 15,
And a second Z axis transfer unit coupled to the XY stage for moving the XY stage, the rotary tilt unit, and the light source unit in the Z axis direction.

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