KR102160258B1 - Exposure Apparatus and Fine Metal Mask Manufacturing Method using the same - Google Patents

Abstract

The present invention relates to an exposure apparatus in which the width and angle of a light source can be easily adjusted, and a method for manufacturing a fine metal mask capable of manufacturing a fine metal mask without chemical treatment.
An exposure apparatus according to the present invention for solving the above problems includes: a work stage installed to be slidably moved in a horizontal direction; A light source module in which a plurality of LEDs are installed at a predetermined distance along a bottom surface while being installed at a predetermined distance above the work stage; First and second supports connected to both ends of the light source module to rotatably support the light source module; A driving device installed on any one of the first and second supports to rotate the light source module at a predetermined angle; A plurality of light blocking films having an upper end detachably installed on a lower surface of the light source module and a lower end having a vertical downward length; And a controller for controlling the operation of the work stage and the driving device, wherein the controller controls the operation of the driving device so that the lower end of the light blocking film is aligned with the moving direction of the work stage, It characterized in that the interlocking control.

Description

Exposure apparatus and fine metal mask manufacturing method using the same {Exposure Apparatus and Fine Metal Mask Manufacturing Method using the same}

The present invention relates to an exposure apparatus and a method of manufacturing a fine metal mask using the same, and more particularly, to an exposure apparatus configured to be able to adjust an angle, and a fine metal mask using a pattern mold (photoresist film) formed using such an exposure apparatus. The present invention relates to a method of manufacturing a fine metal mask in which (Fine Metal Mask, FMM) is formed on a conductive substrate and then separated from each other by applying a physical force.

In general, the exposure apparatus is a device that irradiates parallel light to a mask mounted on a stage using a halogen lamp or an LED as a light source, and transfers the mask pattern to an object through this.

As described above, as a prior art of the exposure apparatus, a scan type exposure apparatus (hereinafter referred to as “Patent Document 1”) using an LED light source of Korean Patent Publication No. 1728532 is disclosed.

The exposure apparatus disclosed in Patent Document 1 includes a plurality of LED light sources; Each of the plurality of LED light sources includes an optical partition wall spaced apart from each other in correspondence with the center, and the optical partition wall has a regular hexagonal shape when viewed in plan, and the optical partition wall structure comprises a plurality of optical partition walls combined with each other. The optical system's barrel is composed of the LED light source as a unit, and the portions where the sides of the optical partitions are in contact do not deviate from each other, and the linear axis direction of the optical partition is deviated so as not to coincide with the scanning direction by the LED light source. The optical partition wall is connected so that the LED light source in the optical partition wall is arranged in a zigzag manner so that only two sides of the optical partition wall coincide with the adjacent optical partition wall, and the direction in which the optical partition wall extends does not coincide with the scanning direction. Is configured not to.

However, the exposure apparatus disclosed in Patent Document 1 has a regular hexagonal optical partition to prevent waste and interference of the LED light source, but the width and angle of the light source according to the size and shape of the mask mounted on the stage cannot be adjusted. Accordingly, when the conditions of the object to be manufactured are changed accordingly, there is a problem that the exposure apparatus must be separately manufactured according to the conditions.

On the other hand, the fine metal mask (FMM) used to manufacture the organic light emitting display (OLED) is generally manufactured by an etching method using a rolled sheet, but the thickness is further increased as the resolution of the display applied to smartphones is increased recently. It is required to manufacture a fine metal mask that is thin and has a small pattern size and spacing, and accordingly, a technical limit has been reached in manufacturing a fine metal mask through an etching method, and research on a new manufacturing method is being actively conducted.

As a part of this, research on the electroplating method is being conducted.In the electrochemical plating method, a metal is electrochemically electrodeposited on a substrate and then various chemical treatments such as oxides, hydroxides, and metal salts are performed to improve the surface adhesion between the metal electrodeposition and the substrate. It is to separate the metal electrodeposited material from the substrate by lowering it.The conventional electroplating method as described above uses harmful chemicals such as selenium dioxide, zinc acid salt, iodocalcium, and sodium dichromate to separate the metal electrodeposition. Since it must be done, there is a problem that a large amount of chemical wastewater is generated.

Accordingly, there is a need to develop an exposure apparatus that can easily adjust the installation angle, height, and width of a light source appropriately according to the manufacturing target, and a method of manufacturing a fine metal mask capable of manufacturing a fine metal mask without chemical treatment.

KR 10-1728532 B1 (2017. 04. 13.) KR 10-1732078 B1 (2017. 04. 25.) KR 10-1907490 B1 (2018. 10. 05.) KR 10-2014-0005464 A (2014. 05. 15.)

The present invention was conceived to solve the problems of the conventional exposure apparatus and the method of manufacturing a fine metal mask as described above, and the problem to be solved by the present invention is to provide an exposure apparatus in which the width and angle of a light source can be easily adjusted. , To provide a fine metal mask manufacturing method capable of manufacturing a fine metal mask without chemical treatment.

An exposure apparatus according to the present invention for solving the above problems includes: a work stage installed to be slidably moved in a horizontal direction; A light source module in which a plurality of LEDs are installed at a predetermined distance along a bottom surface while being installed at a predetermined distance above the work stage; First and second supports connected to both ends of the light source module to rotatably support the light source module; A driving device installed on any one of the first and second supports to rotate the light source module at a predetermined angle; A plurality of light blocking films having an upper end detachably installed on a lower surface of the light source module and a lower end having a vertical downward length; And a controller for controlling the operation of the work stage and the driving device, wherein the controller controls the operation of the driving device so that the lower end of the light blocking film is aligned with the moving direction of the work stage, and the installation angle of the light source module It characterized in that the interlocking control.

In addition, the controller of the present invention is further characterized in that the installation angle of the light source module is controlled so that the lower end of the light blocking film is positioned toward the moving side of the work stage.

In addition, the present invention is a pair of installation blocks provided with a rotation shaft of a predetermined length on one side of the light source module; And a plurality of module blocks assembled between the pair of installation blocks, wherein the plurality of module blocks are formed in a square or hexagonal block shape and have fitting grooves and fitting protrusions at predetermined intervals on an outer surface thereof, Another characteristic feature is that the module blocks positioned adjacent to each other by the fitting groove and the fitting protrusion are fitted together and the LED is installed to adjust the width of the light source to which light is irradiated.

On the other hand, the method for manufacturing a fine metal mask using the exposure apparatus of the present invention includes: forming a graphene film of a predetermined thickness on a conductive substrate; Forming a photosensitive film of a predetermined thickness on the graphene film; A substrate installation step of installing the conductive substrate on a work stage; A photomask installation step of installing a photomask having a predetermined pattern on the photoresist film; The work stage is moved in the horizontal direction and the operation of the driving device is controlled so that the light of the LED is irradiated to the optical mask at a predetermined angle through the light source module, so that the photosensitive film is exposed to light, and the optical mask is removed, A pattern mold manufacturing step of applying a developer to the photosensitive film to form a pattern hole in the exposed portion; A fine metal mask forming step of forming a fine metal mask by electroplating the photosensitive layer on which the pattern is formed in the pattern mold manufacturing step; A photosensitive film removing step of removing the photosensitive film after forming the fine metal mask; And separating the fine metal mask from the conductive substrate by applying a physical force to the prepared fine metal mask.

In addition, the present invention is further characterized in that the pattern hole is formed to be inclined so that the upper width of the pattern hole is relatively smaller than the lower width in the pattern mold manufacturing step.

According to the present invention, an exposure apparatus capable of adjusting a width and an angle is provided, and through such an exposure apparatus, a pattern hole having an inclination (taper) of a predetermined angle can be easily formed in a pattern mold.

In addition, the fine metal mask manufactured by the electroplating method using the pattern mold is attached with the force of Van der Waals through the graphene film attached between the conductive substrates, thereby applying a physical force to the fine metal mask from the conductive substrate. Can be easily separated, and as a result, chemical surface treatment is not required to separate the fine metal mask, and thus, there is an advantage that no chemical wastewater is generated.

1 is a configuration diagram showing an example of an exposure apparatus according to the present invention.
2 and 3 are views showing an embodiment of a light source module according to the present invention.
4 is a view showing an example in which the installation angle of the light source module according to the present invention is adjusted.
Figure 5 (a, b) is a view showing an example of a light source module according to the present invention is configured as a module block separately assembled.
6 is a view showing another example of the light source module according to the present invention is configured as a module block separately assembled.
7 is a view showing an example of a light blocking film according to the present invention.
8 is a block diagram showing an example of a method of manufacturing a fine metal mask using an exposure apparatus according to the present invention.
9 is a diagram showing an example of a graphene film forming step, a photosensitive film forming step, and a photomask installation step according to the present invention.
10 and 11 are views showing an example of a pattern mold manufacturing step according to the present invention.
12 is a view showing an example of a fine metal mask forming step, a photosensitive film removal step, and a fine metal mask separation step according to the present invention.

Hereinafter, a preferred embodiment of the present invention will be described in detail according to the accompanying drawings.

The present invention is to provide an exposure apparatus in which the width and angle of a light source can be easily adjusted, and a fine metal mask manufacturing method capable of manufacturing a fine metal mask without chemical treatment. The exposure apparatus of the present invention is shown in FIG. As described above, the work stage 10, the light source module 20, the first and second supports 30A and 30B, the driving device 40, the light blocking film 50, and the controller 60 are included.

The work stage 10 is a configuration in which a conductive substrate 100 having a predetermined size is seated on an upper surface and is installed to be moved a predetermined distance in the horizontal direction, and the work stage 10 has a predetermined width as shown in FIG. 1. The branch includes a sliding plate (not shown), a plurality of guide rails (not shown) installed on the bottom surface of the sliding plate, and a driving device (not shown) for transferring the moving block of the guide rail, thereby The conductive substrate 100 seated on the sliding plate is reciprocated (sliding) in the horizontal direction along the guide rail by the driving device.

The light source module 20 is installed on the upper part of the work stage 10 by a predetermined distance and irradiates light to the photosensitive film 300 mounted on the upper part (sliding plate) of the work stage 10 to be specified according to the pattern of the photomask. This is a configuration for exposing a portion.

This light source module 20 includes a pair of installation blocks 21 rotatably assembled to the first and second supports 30A and 30B to be described later, as shown in FIG. 2, and the pair of installation blocks 21 ) It includes a module block 22 installed between the plurality of LEDs (22A) are installed at a predetermined interval on the bottom surface.

At this time, a rotation shaft 21A having a predetermined length is provided on one side of the installation block 21, and a predetermined interval so that the light blocking film 50 to be described later is detachable as shown in FIG. 3 on the bottom of the module block 22 A plurality of assembly holes 22B are formed.

And the rotation shaft 21A of the one side installation block 210 is connected to be rotated by a driving device 40 to be described later, whereby the controller 60 to be described later as shown in FIG. 4 controls the driving device 40 By doing so, the installation angle of the module block 22 is adjusted.

On the other hand, in addition to adjusting the installation angle of the light source module 20, the length of the light source module 20 is appropriately adjusted according to the width of the object requiring exposure treatment to adjust the width to which light is irradiated. It can be configured to save electrical energy by preventing it from being used.

In this example, the light source module 20 has a rectangular block shape as shown in FIG. 5 (a, b) and a plurality of fitting grooves (H) and fitting protrusions (B) are formed at predetermined intervals along the outer surface. It may be composed of two module blocks 22 ′ and a connection block 23 having the same square block shape as the module block 22 ′.

At this time, the LED (22A) is not installed on the bottom of the connection block (23), and the fitting groove (H) and the fitting protrusion (B) of the plurality of module blocks (22') and the connection block (23) are assembled by mutual fitting. A contact plate (not shown) that naturally comes into contact with each other is provided, whereby electricity supplied from one end is supplied to the other end through the mutually assembled module block 22 ′ and the connection block 23, and a plurality of module blocks 22 ') provided in the LED (22A) is turned on.

According to the configuration as described above, an appropriate number of module blocks 22 ′ and connection blocks 23 are fitted to each other according to the width required for exposure treatment, and then mounting blocks 21 are assembled at both ends of the LED (22A). The number of installations of the module blocks 22 ′ equipped with is appropriately adjusted.

Another example is a module block 22" in which the light source module 20 is formed in a hexagonal block shape instead of the shape of a hexagonal block as shown in FIG. 6 and the fitting grooves (H) and the fitting protrusions (B) are alternately formed along the outer surface. It can be composed of.

The hexagonal block-shaped module block 22" as described above can easily arrange the LEDs 22A in a plurality of rows as necessary, and as a result, the module block 22" has an appropriate width and width required for exposure processing. It will be assembled and used in multiple rows.

With the above configuration, the user can easily adjust and use the width and width of the light source by appropriately replacing and assembling the module blocks 20, 20', 20" of the light source module 20 according to various manufacturing environments. do.

The first and second supports 30A and 30B are configured to rotatably support the light source module 20 on the upper side of the work stage 10 by a predetermined distance.

These first and second supports 30A, 30B are formed to have a predetermined length vertically as shown in FIG. 1, and an installation hole through which the rotation shaft 21A of the light source module 20 is assembled through the upper side (refer to None) is formed, and the lower part is fixed to the lower part of the exposure apparatus (fixed part of the work stage).

Further, on the first and second supports 30A and 30B, a height adjusting member 31 for adjusting the upper end height by a screw shaft, an actuator, a cylinder, etc. is installed, thereby adjusting the installation height of the light source module 20.

The driving device 40 is configured to adjust the installation angle of the light source module 20, and the driving device 40 has a predetermined gear ratio as shown in FIG. 1 and a driving gear that is assembled so as to mesh with each other (not shown. ) And a driven gear (not shown), and a motor 42 connected to the drive gear side of the reduction unit 41, and a light source module on the driven gear side of the reduction unit 41 The rotation shaft 21A of the 20 is connected and the rotation shaft 21A is rotated by the rotation operation of the motor 42 so that the installation angle of the light source module 20 is adjusted.

The light blocking film 50 is a configuration in which light irradiated from the LED 22A installed on the bottom of the light source module 20 is dispersed to prevent wasted or interference of light.

As shown in FIG. 7, the light blocking film 50 includes a hexagonal column-shaped blocking film body 51 in which the interior is connected up and down, and an assembly protrusion of a predetermined size protruding from the upper end of the blocking film body 51 ( 52), and this light blocking film 50 is fitted and fixed in the assembly hole 22B formed on the bottom of the module block 22, and as a result, the appropriate length is adjusted as the installation height of the light source module 20 is adjusted. It can be replaced and assembled with the light blocking film 50 having a.

Above, the blocking film main body 51 is illustrated and described only as being formed in a hexagonal column shape, but unlike this, it may be changed into various column shapes such as a circle, a triangle, a square, a pentagon, and an octagon.

The controller 60 is a configuration that controls the horizontal sliding operation of the work stage 10 and the operation of the driving device 40, whereby the light source module 20 is at a preset angle according to the moving direction of the work stage 10. It will be automatically adjusted continuously.

Meanwhile, as shown in FIG. 8, the method of manufacturing a fine metal mask using an exposure apparatus includes a graphene film formation step (S10), a photosensitive film formation step (S20), a substrate installation step (S30), a photomask installation step (S40), A pattern mold manufacturing step (S50), a fine metal mask forming step (S60), a photosensitive film removing step (S70), and a fine metal mask separating step (S80) are included, and these steps will be described below.

(1) Graphene film formation step (S10)

In this step, a graphene film 200 having a predetermined thickness is formed on the conductive substrate 100 as shown in FIG. 9, and the conductive substrate 100 may be composed of various metal plates such as stainless steel, copper, and nickel. have.

In addition, the graphene film 200 may be formed directly on the conductive substrate 100 by using a chemical vapor deposition method, or may be formed by transferring a previously prepared graphene sheet onto the conductive substrate 100.

(2) Photoresist film formation step (S20)

In this step, as shown in FIG. 9, a photosensitive film 300 having a predetermined thickness is formed on the graphene film 200, wherein the photosensitive film 300 is formed by using a dry film resist (DFR) having a predetermined thickness. 200) and then by pressing using a hot pressing roller, the photoresist film 300 is bonded (laminated) to the graphene film 200, or a liquid photoresist (LPR) is predetermined on the graphene film 200. It can be formed by applying to a thickness.

(3) Board installation step (S30)

In this step, the conductive substrate 100 is installed on the work stage 10 of the exposure apparatus, and at this time, a fixing clamp (not shown) is installed on the work stage 10 to fix the conductive substrate 100 so that it does not flow. It can be rigidly fixed by means of a clamp.

(4) Photomask installation step (S40)

In this step, as shown in FIG. 9, a photo mask 400 having a predetermined pattern is installed on the photosensitive film 300, and a portion to be exposed through an exposure apparatus (light A mask hole 410 is formed in a portion to be exposed).

That is, in the photomask 400 according to the present invention, a positive photomask 400 in which a portion to be exposed is dissolved by a developer is used, and thereby a pattern having the same shape (pattern) as the mask hole 410 The hole 310 is formed in the photosensitive film 300.

(5) Pattern mold manufacturing step (S50)

In this step, after the photomask 400 is attached on the photosensitive film 300, exposure is performed using an exposure apparatus to form a pattern having the same pattern as the mask hole 410 of the photomask 400 in the photosensitive film 300. Then, after removing the photomask 400, a developer is applied to the photosensitive film 300 to dissolve the exposed portion, thereby forming the pattern hole 310. In this case, the installation angle of the light source module 20 is By automatically controlling in accordance with the sliding direction of the work stage 10, a taper of a predetermined angle is formed so that the upper width of the pattern hole 310 formed in the photosensitive film 300 is relatively smaller than the lower width.

In more detail, as shown in FIG. 10, when the work stage 10 is horizontally moved to one side, the lower end of the light blocking film 50 installed on the bottom of the light source module 20 is the work stage 10. The installation angle is adjusted at a predetermined angle (for example, 30 to 60°) to follow the direction in which the is moved, and in this state, the work stage 10 is horizontally moved to be exposed to the light source module 20 as a whole. Is scanned.

After the work stage 10 is moved to one side in this way, as shown in FIG. 11, the work stage 10 is moved horizontally to the opposite side, and at the same time, the light blocking film 50 installed on the bottom surface of the light source module 20 ), the installation angle is adjusted again at a predetermined angle so that the lower end of the work stage 10 follows the direction in which the work stage 10 is moved, and in this state, the work stage 10 is horizontally moved so that the entire exposure is processed by the light source module 20. The car is scanned.

As the work stage 10 is reciprocated in the horizontal direction as described above, parallel light is naturally irradiated toward the mask hole 410 of the photomask 400 in a diagonal direction, and as a result, the pattern hole 310 of the photosensitive film 300 The inclined pattern mold is formed so that the upper width of the silver is relatively smaller than the lower width.

(6) Fine metal mask formation step (S60)

This step is to form a fine metal mask 500 by electroplating a metal on the photosensitive film 300 in which the tapered pattern hole 310 is formed in the pattern mold manufacturing step (S50). In this case, the metal used for electroplating is Ni-based alloys (eg, Fe-Ni, Fe-Ni-Co, etc.) may be used.

(7) Photoresist film removal step (S70)

In this step, after the fine metal mask 500 is formed in accordance with the pattern of the photosensitive film 300, the photomask 400 and the remaining photosensitive film 300 are removed (separated). At this time, the photosensitive film 300 is attached to the exposure apparatus. After being exposed to light as a whole, the remaining photosensitive film 300 may be removed by applying a developer, or may be separated from the graphene film 200 by applying a physical force.

(8) Fine metal mask separation step (S80)

This step is to separate the fine metal mask 500 exposed to the outside while the photoresist layer 300 is removed from the conductive substrate 100 using the graphene layer 200, wherein the fine metal mask 500 Since it is attached to the graphene film 200 by the force of Van der Waals, it can be easily separated from the conductive substrate 100 on the basis of the graphene film 200 when a physical force is applied thereto, even without chemical treatment. The manufactured fine metal mask 500 is easily separated.

Thereafter, the graphene film 200 is formed on the conductive substrate 100 again, and the fine metal mask 500 is continuously manufactured by repeating the above process.

As described above, according to the present invention, a pattern mold having a pattern hole having a predetermined angle of inclination (taper) is manufactured through an exposure apparatus capable of adjusting the width and angle, and thereby a fine metal mask having a predetermined angle of inclination is manufactured. The fine metal mask thus prepared is attached to the graphene film and the force of Van der Waals, so that it can be physically separated from the conductive substrate easily.

In the above, for the convenience of explanation, the drawings showing the preferred embodiments and the configurations shown in the drawings have been described with reference numerals and names, but this is an embodiment according to the present invention and is It is limited and the scope of the rights should not be interpreted, and the simple substitution with a configuration that has the same effect as a change to a variety of predictable shapes from the description of the invention is within the range that can be changed for easy implementation by a skilled person. You will see it extremely self-evident.

10: work stage 20: light source module
21: mounting block 21A: rotating shaft
22, 22', 22": module block 22A: LED
22B: Assemblyman 23: Connection block
30A: first support 30B: second support
31: height adjustment member 40: drive device
41: reduction unit 42: motor
50: light blocking film 51: blocking film body
52: assembly protrusion 60: controller
100: conductive substrate 200: graphene film
300: photoresist 310: pattern hole
400: photomask 410: mask hole
500: fine metal mask B: fitting projection
H: fitting groove

Claims (5)

A work stage 10 installed to be slidable in a horizontal direction;
A light source module 20 in which a plurality of LEDs 22A are installed at a predetermined distance along a bottom surface while being installed at a predetermined distance above the work stage 10;
First and second supports (30A, 30B) connected to both ends of the light source module (20) to rotatably support the light source module (20);
A driving device 40 installed on one of the first and second supports 30A, 30B to rotate the light source module 20 at a predetermined angle;
A plurality of light blocking films 50 having an upper end detachably installed on a lower surface of the light source module 20 and a lower end having a vertical downward length; And
A controller 60 for controlling the operation of the work stage 10 and the driving device 40;
Including,
The controller 60,
By controlling the operation of the driving device 40, the lower end of the light blocking film 50 interlocks and controls the installation angle of the light source module 20 in accordance with the moving direction of the work stage 10,
The light source module 20,
A pair of installation blocks 21 provided with a rotation shaft 21A of a predetermined length on one side; And
A plurality of module blocks (22', 22") assembled between the pair of installation blocks (21);
Including,
The plurality of module blocks 22 ′, 22 ″,
While being formed in a square or hexagonal block shape, a fitting groove (H) and a fitting protrusion (B) are formed at a predetermined distance on the outer surface, and are positioned adjacent to each other by the fitting groove (H) and the fitting protrusion (B) The exposure apparatus, characterized in that the width of the light source to which the light of the LED (22A) is irradiated is adjusted by inserting and assembling the module blocks (22', 22").
The method according to claim 1,
The controller 60,
An exposure apparatus, characterized in that controlling an installation angle of the light source module (20) so that the lower end of the light blocking film (50) is positioned in the direction in which the work stage (10) is moved.
delete In the method of manufacturing a fine metal mask using the exposure apparatus according to claim 1,
A graphene film forming step of forming a graphene film 200 having a predetermined thickness on the conductive substrate 100 (S10);
A photosensitive film forming step (S20) of forming a photosensitive film 300 having a predetermined thickness on the graphene film 200;
A substrate installation step (S30) of installing the conductive substrate 100 on the work stage 10;
A photomask installation step (S40) of installing a photomask 400 having a predetermined pattern on the photosensitive layer 300;
The work stage 10 is moved in the horizontal direction and the operation of the driving device 40 is controlled so that the light of the LED 21 is irradiated to the optical mask 400 at a predetermined angle through the light source module 20. A pattern mold manufacturing step of exposing the photosensitive film 300, removing the photomask 400, and applying a developer to the photosensitive film 300 to form a pattern hole 310 in the exposed portion ( S50);
A fine metal mask forming step (S60) of forming a fine metal mask 500 by electroplating the photosensitive film 300 on which the pattern is formed in the pattern mold manufacturing step (S50);
A photosensitive film removing step (S70) of removing the photosensitive film 300 after the fine metal mask forming step (S60); And
A fine metal mask separation step (S80) of separating from the conductive substrate 100 by applying a physical force to the manufactured fine metal mask 500;
Fine metal mask manufacturing method using an exposure apparatus, characterized in that consisting of.
The method of claim 4,
In the pattern mold manufacturing step (S50),
A method of manufacturing a fine metal mask using an exposure apparatus, wherein the pattern hole 310 is formed to be inclined so that the upper width of the pattern hole 310 is relatively smaller than the lower width.

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