KR102243425B1 - 원통형 고분자 마스크 및 제작 방법 - Google Patents

원통형 고분자 마스크 및 제작 방법 Download PDF

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Publication number
KR102243425B1
KR102243425B1 KR1020147030846A KR20147030846A KR102243425B1 KR 102243425 B1 KR102243425 B1 KR 102243425B1 KR 1020147030846 A KR1020147030846 A KR 1020147030846A KR 20147030846 A KR20147030846 A KR 20147030846A KR 102243425 B1 KR102243425 B1 KR 102243425B1
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KR
South Korea
Prior art keywords
delete delete
mask
cylinder
polymer
casting
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KR1020147030846A
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English (en)
Korean (ko)
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KR20150013486A (ko
Inventor
보리스 코브린
올리버 자이츠
브루스 리처드슨
이안 맥매킨
묵티 알얄
브라이언트 그릭스비
Original Assignee
메타머트리얼 테크놀러지스 유에스에이, 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority claimed from US13/756,370 external-priority patent/US9481112B2/en
Priority claimed from US13/756,348 external-priority patent/US9782917B2/en
Application filed by 메타머트리얼 테크놀러지스 유에스에이, 인크. filed Critical 메타머트리얼 테크놀러지스 유에스에이, 인크.
Publication of KR20150013486A publication Critical patent/KR20150013486A/ko
Application granted granted Critical
Publication of KR102243425B1 publication Critical patent/KR102243425B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
KR1020147030846A 2012-05-02 2013-04-29 원통형 고분자 마스크 및 제작 방법 KR102243425B1 (ko)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
US201261641650P 2012-05-02 2012-05-02
US201261641711P 2012-05-02 2012-05-02
US61/641,711 2012-05-02
US61/641,650 2012-05-02
US13/756,348 2013-01-31
US13/756,370 US9481112B2 (en) 2013-01-31 2013-01-31 Cylindrical master mold assembly for casting cylindrical masks
US13/756,370 2013-01-31
US13/756,348 US9782917B2 (en) 2013-01-31 2013-01-31 Cylindrical master mold and method of fabrication
US201361798629P 2013-03-15 2013-03-15
US61/798,629 2013-03-15
PCT/US2013/038675 WO2013165915A1 (en) 2012-05-02 2013-04-29 Cylindrical polymer mask and method of fabrication

Publications (2)

Publication Number Publication Date
KR20150013486A KR20150013486A (ko) 2015-02-05
KR102243425B1 true KR102243425B1 (ko) 2021-04-22

Family

ID=49514780

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147030846A KR102243425B1 (ko) 2012-05-02 2013-04-29 원통형 고분자 마스크 및 제작 방법

Country Status (5)

Country Link
JP (1) JP6278954B2 (zh)
KR (1) KR102243425B1 (zh)
CN (1) CN104412165B (zh)
TW (1) TWI621910B (zh)
WO (1) WO2013165915A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10036951B2 (en) 2015-05-29 2018-07-31 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle assembly and fabrication methods thereof
DE102016123538A1 (de) * 2016-12-06 2018-06-07 Ev Group E. Thallner Gmbh Verfahren zum Prägen von Mikro- und/oder Nanostrukturen
CN107416763B (zh) * 2017-08-18 2019-04-16 西安交通大学 复杂腔体内表面微纳结构的自适应随形制造方法
KR102096606B1 (ko) * 2018-08-29 2020-04-02 부산대학교 산학협력단 실린더 표면의 나노구조 임프린트를 위한 소프트 몰드 제조 및 이를 이용한 나노임프린트 공정 방법
KR102180106B1 (ko) * 2019-04-26 2020-11-18 부산대학교 산학협력단 슬리브형 나노 및 마이크로 패턴을 가지는 롤 금형 제조 방법
CN113427685B (zh) * 2021-05-31 2022-12-09 天津大学 一种周期性多孔膜基结构橡胶制品制作模型及使用方法
KR102574828B1 (ko) * 2021-07-06 2023-09-06 성균관대학교산학협력단 핵산 검출 키트 및 이의 제조 방법
CN115424017B (zh) * 2022-08-23 2023-10-17 河海大学 一种建筑物内外轮廓分割方法、装置及存储介质
CN116619694B (zh) * 2023-07-24 2023-09-26 四川聚诚达环保科技有限公司 化粪池模具、成型方法及制得的化粪池

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JP2005035119A (ja) * 2003-07-18 2005-02-10 Fuji Photo Film Co Ltd エンボスロールの製法及び該エンボスロールを使用した転写シートの製法
JP2011526069A (ja) * 2008-01-22 2011-09-29 ローイス インコーポレイテッド 大面積ナノパターン形成方法および装置
WO2012027050A2 (en) * 2010-08-23 2012-03-01 Rolith, Inc. Mask for near-field lithography and fabrication the same

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US5406871A (en) * 1991-08-05 1995-04-18 Minnesota Mining And Manufacturing Company Cover assembly of expanded elastomeric tubing having frangible support core structures
CH690030A5 (de) * 1995-01-26 2000-03-31 Fingraf Ag Verfahren und Vorrichtung zur Herstellung einer Druckschablone.
EP0750381B1 (en) * 1995-06-21 2002-09-18 Minnesota Mining And Manufacturing Company Crushable core and cover assembly having an expanded elastomeric tubing and a chrushable core
US5833898A (en) * 1996-10-10 1998-11-10 Albany International Corp. Method for manufacturing resin-impregnated endless belt structures
US6675863B1 (en) * 2000-09-07 2004-01-13 Physical Optics Corporation Seamless master and method of making same
JP2003276035A (ja) * 2002-03-22 2003-09-30 Shin Etsu Polymer Co Ltd ゴム製品の成形金型
WO2008051031A1 (en) * 2006-10-27 2008-05-02 Lg Chem, Ltd. Method of manufacturing seamless silicon roll having pattern and seamless silicon roll produced by the same
KR100902772B1 (ko) * 2006-11-10 2009-06-15 주식회사 엘지화학 이음매가 없으며 양호한 표면을 가지는 패턴화된 실리콘롤의 제조방법
WO2009004903A1 (ja) * 2007-06-29 2009-01-08 Bridgestone Corporation トナー搬送ローラ並びにローラ製造用金型及びその製造方法
US8518633B2 (en) * 2008-01-22 2013-08-27 Rolith Inc. Large area nanopatterning method and apparatus
US8192920B2 (en) * 2008-04-26 2012-06-05 Rolith Inc. Lithography method
JP2011206938A (ja) * 2010-03-29 2011-10-20 Kanagawa Acad Of Sci & Technol 熱インプリント用モールドおよびその製造方法並びにそのモールドを用いた樹脂材の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005035119A (ja) * 2003-07-18 2005-02-10 Fuji Photo Film Co Ltd エンボスロールの製法及び該エンボスロールを使用した転写シートの製法
JP2011526069A (ja) * 2008-01-22 2011-09-29 ローイス インコーポレイテッド 大面積ナノパターン形成方法および装置
WO2012027050A2 (en) * 2010-08-23 2012-03-01 Rolith, Inc. Mask for near-field lithography and fabrication the same

Also Published As

Publication number Publication date
TW201409164A (zh) 2014-03-01
TWI621910B (zh) 2018-04-21
WO2013165915A1 (en) 2013-11-07
CN104412165B (zh) 2018-06-19
JP6278954B2 (ja) 2018-02-14
KR20150013486A (ko) 2015-02-05
JP2015521376A (ja) 2015-07-27
CN104412165A (zh) 2015-03-11

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