KR102217004B1 - 조명 장치 - Google Patents

조명 장치 Download PDF

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Publication number
KR102217004B1
KR102217004B1 KR1020167000517A KR20167000517A KR102217004B1 KR 102217004 B1 KR102217004 B1 KR 102217004B1 KR 1020167000517 A KR1020167000517 A KR 1020167000517A KR 20167000517 A KR20167000517 A KR 20167000517A KR 102217004 B1 KR102217004 B1 KR 102217004B1
Authority
KR
South Korea
Prior art keywords
light
illumination
illuminance
illumination light
discharge lamp
Prior art date
Application number
KR1020167000517A
Other languages
English (en)
Korean (ko)
Other versions
KR20160042866A (ko
Inventor
아키요시 후지모리
토모히코 혼다
Original Assignee
가부시키가이샤 오크세이사쿠쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 오크세이사쿠쇼 filed Critical 가부시키가이샤 오크세이사쿠쇼
Publication of KR20160042866A publication Critical patent/KR20160042866A/ko
Application granted granted Critical
Publication of KR102217004B1 publication Critical patent/KR102217004B1/ko

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0411—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using focussing or collimating elements, i.e. lenses or mirrors; Aberration correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/08—Arrangements of light sources specially adapted for photometry standard sources, also using luminescent or radioactive material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
    • G01J1/16—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B47/00—Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
    • H05B47/10—Controlling the light source
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B47/00—Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
    • H05B47/10—Controlling the light source
    • H05B47/175—Controlling the light source by remote control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
KR1020167000517A 2013-08-09 2014-07-30 조명 장치 KR102217004B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013166551 2013-08-09
JPJP-P-2013-166551 2013-08-09
PCT/IB2014/063537 WO2015019242A2 (ja) 2013-08-09 2014-07-30 照明装置

Publications (2)

Publication Number Publication Date
KR20160042866A KR20160042866A (ko) 2016-04-20
KR102217004B1 true KR102217004B1 (ko) 2021-02-17

Family

ID=52461991

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167000517A KR102217004B1 (ko) 2013-08-09 2014-07-30 조명 장치

Country Status (5)

Country Link
JP (1) JP6366585B2 (zh)
KR (1) KR102217004B1 (zh)
CN (1) CN105453218B (zh)
TW (1) TWI629568B (zh)
WO (1) WO2015019242A2 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116610007B (zh) * 2023-07-18 2023-10-27 上海图双精密装备有限公司 掩模对准光刻设备及其照明系统和照明方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007073496A (ja) * 2005-09-02 2007-03-22 Au Optronics Corp 光源駆動装置、発光システムおよび光源の輝度均一性を改善する方法
JP2012208351A (ja) * 2011-03-30 2012-10-25 Orc Manufacturing Co Ltd 測光装置および露光装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5542185A (en) * 1978-09-22 1980-03-25 Kawasaki Heavy Ind Ltd Detecting device for arc welding or the like
JP2001083472A (ja) * 1999-09-10 2001-03-30 Nikon Corp 光変調装置、光源装置、及び露光装置
EP2511765B1 (de) * 2007-02-06 2019-04-03 Carl Zeiss SMT GmbH Regelvorrichtung zur Regelung einer flächigen Anordnung individuell ansteuerbarer Strahlablenkungselemente in einer mikrolithographischen Projektionsbelichtungsanlage
DE102007005875A1 (de) * 2007-02-06 2008-08-14 Carl Zeiss Smt Ag Vorrichtung und Verfahren zur Bestimmung der Ausrichtung von Oberflächen von optischen Elementen
JP2011512001A (ja) * 2008-01-17 2011-04-14 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 光強度制御のための方法及び装置
JP2010034293A (ja) * 2008-07-29 2010-02-12 Ushio Inc 露光用光照射装置
DE102008064149A1 (de) * 2008-12-19 2010-07-01 Osram Opto Semiconductors Gmbh Optoelektronische Vorrichtung
JP5537841B2 (ja) * 2009-06-15 2014-07-02 ビーコア株式会社 発光体及び受光体及び関連する方法
JP2012145498A (ja) * 2011-01-13 2012-08-02 Konica Minolta Advanced Layers Inc 分光測定装置
JP2012221726A (ja) 2011-04-08 2012-11-12 Ushio Inc ランプユニットおよびこのランプを備えた光照射装置
JP2013069860A (ja) * 2011-09-22 2013-04-18 Orc Manufacturing Co Ltd Ｌｅｄ光源装置および露光装置
JP2013110342A (ja) * 2011-11-24 2013-06-06 Orc Manufacturing Co Ltd 照明光学系

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007073496A (ja) * 2005-09-02 2007-03-22 Au Optronics Corp 光源駆動装置、発光システムおよび光源の輝度均一性を改善する方法
JP2012208351A (ja) * 2011-03-30 2012-10-25 Orc Manufacturing Co Ltd 測光装置および露光装置

Also Published As

Publication number Publication date
CN105453218B (zh) 2018-07-31
JP6366585B2 (ja) 2018-08-01
TW201514632A (zh) 2015-04-16
WO2015019242A3 (ja) 2015-04-23
JPWO2015019242A1 (ja) 2017-03-02
CN105453218A (zh) 2016-03-30
KR20160042866A (ko) 2016-04-20
WO2015019242A2 (ja) 2015-02-12
TWI629568B (zh) 2018-07-11

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