JPWO2015019242A1 - 照明装置 - Google Patents
照明装置 Download PDFInfo
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- JPWO2015019242A1 JPWO2015019242A1 JP2015530545A JP2015530545A JPWO2015019242A1 JP WO2015019242 A1 JPWO2015019242 A1 JP WO2015019242A1 JP 2015530545 A JP2015530545 A JP 2015530545A JP 2015530545 A JP2015530545 A JP 2015530545A JP WO2015019242 A1 JPWO2015019242 A1 JP WO2015019242A1
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- 238000005286 illumination Methods 0.000 claims abstract description 125
- 238000005259 measurement Methods 0.000 claims abstract description 34
- 238000001514 detection method Methods 0.000 claims abstract description 24
- 230000003287 optical effect Effects 0.000 claims abstract description 12
- 230000001360 synchronised effect Effects 0.000 claims description 8
- 230000000737 periodic effect Effects 0.000 claims description 6
- 239000000758 substrate Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0411—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using focussing or collimating elements, i.e. lenses or mirrors; Aberration correction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/08—Arrangements of light sources specially adapted for photometry standard sources, also using luminescent or radioactive material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
- G01J1/16—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B47/00—Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
- H05B47/10—Controlling the light source
- H05B47/175—Controlling the light source by remote control
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Circuit Arrangement For Electric Light Sources In General (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Abstract
Description
6×F≦fm≦10/PW0
但し、fmは特定周波数(kHz)、Fは基本周波数(kHz)、PW0は基本周波数Fをもつ矩形波の交流電力(kW)を表す。
fmmax=10/PW0 ・・(1)
6×F≦fm≦10/PW0 ・・(2)
Em=k×(Wm/Vm)+Y ・・(3)
20 照明デバイス
28A〜28D 放電ランプ
40 照度センサ
45 照度測定部
50 制御部
Claims (11)
- 照明光をそれぞれ発光する複数の光源と、
照明光学系と被照射領域との間に配置され、前記複数の光源による全体照明光の照度/強度を検出する光検出部と、
前記複数の光源それぞれに対し、発光制御を行う照明制御部とを備え、
前記照明制御部が、前記複数の光源から、前記複数の光源に対応したそれぞれ異なる周波数に従って照度/強度が変動する計測照明光を、それぞれ発光させ、
前記光検出部が、それぞれ異なる周波数に基づき、各光源の計測照明光を重ねた全体計測照明光から、各光源の変動分を含まない照明光の照度/強度を得ることを特徴とする照明装置。 - 前記照明制御部が、各光源に供給される電力の周期変動に応じて照度/強度の周期変動を生じさせる周波数に基づいて、計測照明光を発光させることを特徴とする請求項1に記載の照明装置。
- 前記複数の光源が、それぞれ、交流電力によって照明光を発光し、
前記照明制御部が、各光源に対し、基本周波数とその光源に応じた特定周波数とを重ねた合成周波数をもつ交流電力を供給し、計測照明光を発光させることを特徴とする請求項1に記載の照明装置。 - 前記照明制御部が、基本周波数の少なくとも2倍を超える特定周波数を、基本周波数に重ねることを特徴とする請求項3に記載の照明装置。
- 前記照明制御部が、以下の式の範囲にある特定周波数を基本周波数に重ねることを特徴とする請求項3乃至4のいずれかに記載の照明装置。
6×F≦fm≦10/PW0
但し、fmは特定周波数(kHz)、Fは基本周波数(kHz)、PW0は 基本周波数Fをもつ矩形波の交流電力(kW)を表す。 - 前記複数の光源に応じた複数の特定周波数が、許容最少間隔以上の周波数間隔を互いにもつことを特徴とする請求項3乃至5のいずれかに記載の照明装置。
- 前記光検出部が、同期検波部を有することを特徴とする請求項1乃至2のいずれかに記載の照明装置。
- 前記光検出部が、全体照明光を各光源の計測照明光にそれぞれ分離するフィルタを有し、
前記光検出部が、各光源の計測照明光の振幅幅から、揺らぎ照明光の照度/強度を検出することを特徴とする請求項1乃至2のいずれかに記載の照明装置。 - 前記照明制御部が、各光源に対する供給電力を、一律に制御することを特徴とする請求項1に記載の照明装置。
- 照明光を発光する単一の光源と、
照明光学系と被照射領域との間に配置され、前記光源による全体照明光の照度/強度を検出する光検出部と、
前記光源に対し、発光制御を行う照明制御部とを備え、
前記照明制御部が、前記光源の電力波形と、前記光源に応じた特定周波数とを重ねた合成周波数をもつ交流電力を前記光源に供給することによって、前記光源から、前記合成周波数に従って変動する計測照明光を発光させ、
前記光検出部が、前記合成周波数に基づき、前記光源の計測照明光を重ねた全体計測照明光から、前記光源の変動分を含まない照明光の照度/強度を得ることを特徴とする照明装置。 - 請求項1および10のいずれか一方に記載された照明装置を備えた露光装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013166551 | 2013-08-09 | ||
JP2013166551 | 2013-08-09 | ||
PCT/IB2014/063537 WO2015019242A2 (ja) | 2013-08-09 | 2014-07-30 | 照明装置 |
Publications (2)
Publication Number | Publication Date |
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JPWO2015019242A1 true JPWO2015019242A1 (ja) | 2017-03-02 |
JP6366585B2 JP6366585B2 (ja) | 2018-08-01 |
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JP (1) | JP6366585B2 (ja) |
KR (1) | KR102217004B1 (ja) |
CN (1) | CN105453218B (ja) |
TW (1) | TWI629568B (ja) |
WO (1) | WO2015019242A2 (ja) |
Families Citing this family (1)
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CN116610007B (zh) * | 2023-07-18 | 2023-10-27 | 上海图双精密装备有限公司 | 掩模对准光刻设备及其照明系统和照明方法 |
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JPS5542185A (en) * | 1978-09-22 | 1980-03-25 | Kawasaki Heavy Ind Ltd | Detecting device for arc welding or the like |
JP2001083472A (ja) * | 1999-09-10 | 2001-03-30 | Nikon Corp | 光変調装置、光源装置、及び露光装置 |
JP2010287820A (ja) * | 2009-06-15 | 2010-12-24 | B-Core Inc | 発光体及び受光体及び関連する方法 |
JP2011512001A (ja) * | 2008-01-17 | 2011-04-14 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 光強度制御のための方法及び装置 |
JP2012513106A (ja) * | 2008-12-19 | 2012-06-07 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | オプトエレクトロニクスデバイス |
JP2012208351A (ja) * | 2011-03-30 | 2012-10-25 | Orc Manufacturing Co Ltd | 測光装置および露光装置 |
JP2012221726A (ja) * | 2011-04-08 | 2012-11-12 | Ushio Inc | ランプユニットおよびこのランプを備えた光照射装置 |
JP2013069860A (ja) * | 2011-09-22 | 2013-04-18 | Orc Manufacturing Co Ltd | Led光源装置および露光装置 |
JP2013110342A (ja) * | 2011-11-24 | 2013-06-06 | Orc Manufacturing Co Ltd | 照明光学系 |
Family Cites Families (5)
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KR101446820B1 (ko) * | 2007-02-06 | 2014-10-01 | 칼 짜이스 에스엠테 게엠베하 | 마이크로리소그래피 투영 노광 장치의 조명 시스템 내의 다수의 미러 어레이들을 감시하는 방법 및 장치 |
DE102007005875A1 (de) * | 2007-02-06 | 2008-08-14 | Carl Zeiss Smt Ag | Vorrichtung und Verfahren zur Bestimmung der Ausrichtung von Oberflächen von optischen Elementen |
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JP2012145498A (ja) * | 2011-01-13 | 2012-08-02 | Konica Minolta Advanced Layers Inc | 分光測定装置 |
-
2014
- 2014-07-25 TW TW103125455A patent/TWI629568B/zh active
- 2014-07-30 WO PCT/IB2014/063537 patent/WO2015019242A2/ja active Application Filing
- 2014-07-30 CN CN201480044516.4A patent/CN105453218B/zh active Active
- 2014-07-30 KR KR1020167000517A patent/KR102217004B1/ko active IP Right Grant
- 2014-07-30 JP JP2015530545A patent/JP6366585B2/ja active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS5542185A (en) * | 1978-09-22 | 1980-03-25 | Kawasaki Heavy Ind Ltd | Detecting device for arc welding or the like |
JP2001083472A (ja) * | 1999-09-10 | 2001-03-30 | Nikon Corp | 光変調装置、光源装置、及び露光装置 |
JP2011512001A (ja) * | 2008-01-17 | 2011-04-14 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 光強度制御のための方法及び装置 |
JP2012513106A (ja) * | 2008-12-19 | 2012-06-07 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | オプトエレクトロニクスデバイス |
JP2010287820A (ja) * | 2009-06-15 | 2010-12-24 | B-Core Inc | 発光体及び受光体及び関連する方法 |
JP2012208351A (ja) * | 2011-03-30 | 2012-10-25 | Orc Manufacturing Co Ltd | 測光装置および露光装置 |
JP2012221726A (ja) * | 2011-04-08 | 2012-11-12 | Ushio Inc | ランプユニットおよびこのランプを備えた光照射装置 |
JP2013069860A (ja) * | 2011-09-22 | 2013-04-18 | Orc Manufacturing Co Ltd | Led光源装置および露光装置 |
JP2013110342A (ja) * | 2011-11-24 | 2013-06-06 | Orc Manufacturing Co Ltd | 照明光学系 |
Also Published As
Publication number | Publication date |
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KR20160042866A (ko) | 2016-04-20 |
CN105453218B (zh) | 2018-07-31 |
TW201514632A (zh) | 2015-04-16 |
JP6366585B2 (ja) | 2018-08-01 |
WO2015019242A2 (ja) | 2015-02-12 |
TWI629568B (zh) | 2018-07-11 |
CN105453218A (zh) | 2016-03-30 |
WO2015019242A3 (ja) | 2015-04-23 |
KR102217004B1 (ko) | 2021-02-17 |
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|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |