KR102193322B1 - 블록 코폴리머 조성물 및 그의 관련 방법 - Google Patents

블록 코폴리머 조성물 및 그의 관련 방법 Download PDF

Info

Publication number
KR102193322B1
KR102193322B1 KR1020140013766A KR20140013766A KR102193322B1 KR 102193322 B1 KR102193322 B1 KR 102193322B1 KR 1020140013766 A KR1020140013766 A KR 1020140013766A KR 20140013766 A KR20140013766 A KR 20140013766A KR 102193322 B1 KR102193322 B1 KR 102193322B1
Authority
KR
South Korea
Prior art keywords
acrylate
deuterated
group
alkyl
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020140013766A
Other languages
English (en)
Korean (ko)
Other versions
KR20140101309A (ko
Inventor
피터 트레포나스
필립 허스태드
신위 구
에린 보겔
발레리 긴즈버그
시-웨이 챙
다니엘 머레이
Original Assignee
롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨
다우 글로벌 테크놀로지스 엘엘씨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨, 다우 글로벌 테크놀로지스 엘엘씨 filed Critical 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨
Publication of KR20140101309A publication Critical patent/KR20140101309A/ko
Application granted granted Critical
Publication of KR102193322B1 publication Critical patent/KR102193322B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/005—Stabilisers against oxidation, heat, light, ozone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020140013766A 2013-02-08 2014-02-06 블록 코폴리머 조성물 및 그의 관련 방법 Active KR102193322B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/762,749 US8822615B1 (en) 2013-02-08 2013-02-08 Block copolymer composition and methods relating thereto
US13/762,749 2013-02-08

Publications (2)

Publication Number Publication Date
KR20140101309A KR20140101309A (ko) 2014-08-19
KR102193322B1 true KR102193322B1 (ko) 2020-12-22

Family

ID=51272830

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140013766A Active KR102193322B1 (ko) 2013-02-08 2014-02-06 블록 코폴리머 조성물 및 그의 관련 방법

Country Status (5)

Country Link
US (1) US8822615B1 (enExample)
JP (1) JP6400912B2 (enExample)
KR (1) KR102193322B1 (enExample)
CN (1) CN103980649B (enExample)
TW (1) TWI519590B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9957383B2 (en) * 2014-09-10 2018-05-01 California Institute Of Technology Brush block copolymer infrared 1-D photonic crystals using linear polymer additives
US10294359B2 (en) * 2014-12-30 2019-05-21 Rohm And Haas Electronic Materials Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US11021630B2 (en) 2014-12-30 2021-06-01 Rohm And Haas Electronic Materials Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US10011713B2 (en) * 2014-12-30 2018-07-03 Dow Global Technologies Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
TWI588200B (zh) 2015-02-26 2017-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI612379B (zh) 2015-02-26 2018-01-21 Rohm And Haas Electronic Materials Llc 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI627219B (zh) 2015-02-26 2018-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI669337B (zh) 2015-02-26 2019-08-21 美商羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
CN106478975B (zh) * 2016-10-21 2019-10-25 苏州科技大学 双功能嵌段聚合物的制备方法及其改性聚偏氟乙烯微滤膜的方法
CN107326464B (zh) * 2016-12-19 2020-12-15 上海大学 聚脯氨酸螺旋纳米纤维的制备方法
CA3206451A1 (en) * 2021-02-10 2022-08-18 Felipe A. Donate Solvent compositions with antioxidants

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004258380A (ja) * 2003-02-26 2004-09-16 Toshiba Corp 表示装置および表示装置用透明基板の製造方法
JP2007266392A (ja) 2006-03-29 2007-10-11 Toshiba Corp ３次元形状を有する半導体部材を加工する方法およびこの方法を用いて形成されたトランジスタ

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5015708A (en) * 1989-06-26 1991-05-14 Gaf Chemicals Corporation Precipitation polymerization of terpolymers of a vinyl lactam, a polymerizable carboxylic acid and a hydrophobic monomer in an aliphatic hydrocarbon solvent
US6605236B1 (en) * 1994-01-03 2003-08-12 Xerox Corporation Conductive polymeric composites, articles and processes for the preparation thereof
PL200670B1 (pl) 1998-12-28 2009-01-30 Chugoku Marine Paints Kopolimer sililo(met)akrylanowy, sposób jego wytwarzania, przeciwporostowa kompozycja do malowania zawierająca kopolimer sililo(met)akrylanowy oraz jej zastosowanie
JP3940546B2 (ja) 1999-06-07 2007-07-04 株式会社東芝 パターン形成方法およびパターン形成材料
US20050113475A1 (en) 2002-02-19 2005-05-26 Haruo Nishida Preparation of copolymers by gas phase polymerization
US6846776B2 (en) * 2002-08-21 2005-01-25 Eastman Kodak Company Transfer laminate donor for lenticular images with anti-stick backing material
EP1827717A4 (en) * 2004-11-22 2011-11-23 Wisconsin Alumni Res Found METHOD AND COMPOSITIONS FOR FORMING APERIODICALLY PATTERNED COPOLYMER FILMS
CA2633263A1 (en) * 2005-12-16 2007-07-12 Arkema Inc. Low surface energy block co-polymer preparation methods and applications
US20070254169A1 (en) 2006-04-28 2007-11-01 Kamins Theodore I Structures including organic self-assembled monolayers and methods of making the structures
JP4673266B2 (ja) * 2006-08-03 2011-04-20 日本電信電話株式会社 パターン形成方法及びモールド
US8247033B2 (en) 2008-09-19 2012-08-21 The University Of Massachusetts Self-assembly of block copolymers on topographically patterned polymeric substrates
CA2776672A1 (en) * 2008-10-03 2010-04-08 Chamelic Ltd Ab diblock copolymers and applications for their use
US7560141B1 (en) 2008-11-11 2009-07-14 International Business Machines Corporation Method of positioning patterns from block copolymer self-assembly
JP5281386B2 (ja) * 2008-12-22 2013-09-04 株式会社日立製作所 高分子薄膜及びパターン媒体並びにこれらの製造方法
US8349203B2 (en) 2009-09-04 2013-01-08 International Business Machines Corporation Method of forming self-assembled patterns using block copolymers, and articles thereof
US8304493B2 (en) 2010-08-20 2012-11-06 Micron Technology, Inc. Methods of forming block copolymers

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004258380A (ja) * 2003-02-26 2004-09-16 Toshiba Corp 表示装置および表示装置用透明基板の製造方法
JP2007266392A (ja) 2006-03-29 2007-10-11 Toshiba Corp ３次元形状を有する半導体部材を加工する方法およびこの方法を用いて形成されたトランジスタ

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
"Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma", R. L. Bruce 외 7명, J. Vac. Sci. Technol. B, 28(4), Jul/Aug 2010 1부.*
"Poly(trialkylsilyl methacrylate)s: A family of hydrolysable polymers with tuneable erosion profiles", Christine Bressy 외 4명, Polymer Degradation and Stability, 95(2010), pp.1260-1268 1부.*

Also Published As

Publication number Publication date
CN103980649B (zh) 2016-08-17
US20140227448A1 (en) 2014-08-14
JP6400912B2 (ja) 2018-10-03
JP2014169436A (ja) 2014-09-18
US8822615B1 (en) 2014-09-02
TW201434937A (zh) 2014-09-16
TWI519590B (zh) 2016-02-01
KR20140101309A (ko) 2014-08-19
CN103980649A (zh) 2014-08-13

Similar Documents

Publication Publication Date Title
KR101940011B1 (ko) 블록 코폴리머 및 이와 관련한 방법
JP6400912B2 (ja) ブロック共重合体組成物及びそれに関連する方法
KR102129321B1 (ko) 열적 어닐링 가공
KR102143360B1 (ko) 기판위에 패턴을 제조하기 위한 조성물 및 방법
KR20130092490A (ko) 블렌드된 블록 코폴리머 조성물
KR102153960B1 (ko) 열 어닐링 가공법
KR102188296B1 (ko) 자기조립 제어 코폴리머 조성물 및 관련 방법
KR102193316B1 (ko) 블록 코폴리머 제제와 이와 관련한 방법
CN103571253B (zh) 高温热退火方法

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

U11 Full renewal or maintenance fee paid

Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 6