KR102193322B1 - 블록 코폴리머 조성물 및 그의 관련 방법 - Google Patents

블록 코폴리머 조성물 및 그의 관련 방법 Download PDF

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KR102193322B1
KR102193322B1 KR1020140013766A KR20140013766A KR102193322B1 KR 102193322 B1 KR102193322 B1 KR 102193322B1 KR 1020140013766 A KR1020140013766 A KR 1020140013766A KR 20140013766 A KR20140013766 A KR 20140013766A KR 102193322 B1 KR102193322 B1 KR 102193322B1
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acrylate
deuterated
group
alkyl
meth
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KR20140101309A (ko
Inventor
피터 트레포나스
필립 허스태드
신위 구
에린 보겔
발레리 긴즈버그
시-웨이 챙
다니엘 머레이
Original Assignee
롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨
다우 글로벌 테크놀로지스 엘엘씨
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/005—Stabilisers against oxidation, heat, light, ozone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020140013766A 2013-02-08 2014-02-06 블록 코폴리머 조성물 및 그의 관련 방법 Active KR102193322B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/762,749 2013-02-08
US13/762,749 US8822615B1 (en) 2013-02-08 2013-02-08 Block copolymer composition and methods relating thereto

Publications (2)

Publication Number Publication Date
KR20140101309A KR20140101309A (ko) 2014-08-19
KR102193322B1 true KR102193322B1 (ko) 2020-12-22

Family

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Country Link
US (1) US8822615B1 (enExample)
JP (1) JP6400912B2 (enExample)
KR (1) KR102193322B1 (enExample)
CN (1) CN103980649B (enExample)
TW (1) TWI519590B (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9957383B2 (en) * 2014-09-10 2018-05-01 California Institute Of Technology Brush block copolymer infrared 1-D photonic crystals using linear polymer additives
US10294359B2 (en) * 2014-12-30 2019-05-21 Rohm And Haas Electronic Materials Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US10011713B2 (en) * 2014-12-30 2018-07-03 Dow Global Technologies Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US11021630B2 (en) 2014-12-30 2021-06-01 Rohm And Haas Electronic Materials Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
TWI627219B (zh) 2015-02-26 2018-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI612379B (zh) 2015-02-26 2018-01-21 Rohm And Haas Electronic Materials Llc 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI669337B (zh) 2015-02-26 2019-08-21 美商羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI588200B (zh) 2015-02-26 2017-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
CN106478975B (zh) * 2016-10-21 2019-10-25 苏州科技大学 双功能嵌段聚合物的制备方法及其改性聚偏氟乙烯微滤膜的方法
CN107326464B (zh) * 2016-12-19 2020-12-15 上海大学 聚脯氨酸螺旋纳米纤维的制备方法
US20240026251A1 (en) * 2021-02-10 2024-01-25 Dow Global Technologies Llc Solvent compositions with antioxidants

Citations (2)

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JP2004258380A (ja) * 2003-02-26 2004-09-16 Toshiba Corp 表示装置および表示装置用透明基板の製造方法
JP2007266392A (ja) 2006-03-29 2007-10-11 Toshiba Corp ３次元形状を有する半導体部材を加工する方法およびこの方法を用いて形成されたトランジスタ

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US5015708A (en) * 1989-06-26 1991-05-14 Gaf Chemicals Corporation Precipitation polymerization of terpolymers of a vinyl lactam, a polymerizable carboxylic acid and a hydrophobic monomer in an aliphatic hydrocarbon solvent
US6605236B1 (en) * 1994-01-03 2003-08-12 Xerox Corporation Conductive polymeric composites, articles and processes for the preparation thereof
PL200670B1 (pl) 1998-12-28 2009-01-30 Chugoku Marine Paints Kopolimer sililo(met)akrylanowy, sposób jego wytwarzania, przeciwporostowa kompozycja do malowania zawierająca kopolimer sililo(met)akrylanowy oraz jej zastosowanie
JP3940546B2 (ja) 1999-06-07 2007-07-04 株式会社東芝 パターン形成方法およびパターン形成材料
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JP2007266392A (ja) 2006-03-29 2007-10-11 Toshiba Corp ３次元形状を有する半導体部材を加工する方法およびこの方法を用いて形成されたトランジスタ

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Also Published As

Publication number Publication date
CN103980649B (zh) 2016-08-17
JP6400912B2 (ja) 2018-10-03
US8822615B1 (en) 2014-09-02
JP2014169436A (ja) 2014-09-18
US20140227448A1 (en) 2014-08-14
TW201434937A (zh) 2014-09-16
TWI519590B (zh) 2016-02-01
KR20140101309A (ko) 2014-08-19
CN103980649A (zh) 2014-08-13

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