JP6400912B2 - ブロック共重合体組成物及びそれに関連する方法 - Google Patents

ブロック共重合体組成物及びそれに関連する方法 Download PDF

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Publication number
JP6400912B2
JP6400912B2 JP2014015404A JP2014015404A JP6400912B2 JP 6400912 B2 JP6400912 B2 JP 6400912B2 JP 2014015404 A JP2014015404 A JP 2014015404A JP 2014015404 A JP2014015404 A JP 2014015404A JP 6400912 B2 JP6400912 B2 JP 6400912B2
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Prior art keywords
acrylate
deuterated
group
alkyl
meth
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Japanese (ja)
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JP2014169436A (ja
JP2014169436A5 (enExample
Inventor
ピーター・トレフォナス
フィリップ・フスタッド
シンウ・グ
エリン・フォーゲル
ベイリー・ギンズバーグ
シー−ウェイ・チャン
ダニエル・マリー
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DuPont Electronic Materials International LLC
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Rohm and Haas Electronic Materials LLC
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/005—Stabilisers against oxidation, heat, light, ozone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2014015404A 2013-02-08 2014-01-30 ブロック共重合体組成物及びそれに関連する方法 Active JP6400912B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/762,749 US8822615B1 (en) 2013-02-08 2013-02-08 Block copolymer composition and methods relating thereto
US13/762,749 2013-02-08

Publications (3)

Publication Number Publication Date
JP2014169436A JP2014169436A (ja) 2014-09-18
JP2014169436A5 JP2014169436A5 (enExample) 2018-08-23
JP6400912B2 true JP6400912B2 (ja) 2018-10-03

Family

ID=51272830

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JP2014015404A Active JP6400912B2 (ja) 2013-02-08 2014-01-30 ブロック共重合体組成物及びそれに関連する方法

Country Status (5)

Country Link
US (1) US8822615B1 (enExample)
JP (1) JP6400912B2 (enExample)
KR (1) KR102193322B1 (enExample)
CN (1) CN103980649B (enExample)
TW (1) TWI519590B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9957383B2 (en) * 2014-09-10 2018-05-01 California Institute Of Technology Brush block copolymer infrared 1-D photonic crystals using linear polymer additives
US11021630B2 (en) 2014-12-30 2021-06-01 Rohm And Haas Electronic Materials Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US10294359B2 (en) * 2014-12-30 2019-05-21 Rohm And Haas Electronic Materials Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US10011713B2 (en) * 2014-12-30 2018-07-03 Dow Global Technologies Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
TWI627219B (zh) 2015-02-26 2018-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI588200B (zh) 2015-02-26 2017-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI669337B (zh) 2015-02-26 2019-08-21 美商羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI612379B (zh) 2015-02-26 2018-01-21 Rohm And Haas Electronic Materials Llc 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
CN106478975B (zh) * 2016-10-21 2019-10-25 苏州科技大学 双功能嵌段聚合物的制备方法及其改性聚偏氟乙烯微滤膜的方法
CN107326464B (zh) * 2016-12-19 2020-12-15 上海大学 聚脯氨酸螺旋纳米纤维的制备方法
CA3206451A1 (en) * 2021-02-10 2022-08-18 Felipe A. Donate Solvent compositions with antioxidants

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US5015708A (en) * 1989-06-26 1991-05-14 Gaf Chemicals Corporation Precipitation polymerization of terpolymers of a vinyl lactam, a polymerizable carboxylic acid and a hydrophobic monomer in an aliphatic hydrocarbon solvent
US6605236B1 (en) * 1994-01-03 2003-08-12 Xerox Corporation Conductive polymeric composites, articles and processes for the preparation thereof
PL200670B1 (pl) 1998-12-28 2009-01-30 Chugoku Marine Paints Kopolimer sililo(met)akrylanowy, sposób jego wytwarzania, przeciwporostowa kompozycja do malowania zawierająca kopolimer sililo(met)akrylanowy oraz jej zastosowanie
JP3940546B2 (ja) 1999-06-07 2007-07-04 株式会社東芝 パターン形成方法およびパターン形成材料
US20050113475A1 (en) 2002-02-19 2005-05-26 Haruo Nishida Preparation of copolymers by gas phase polymerization
US6846776B2 (en) * 2002-08-21 2005-01-25 Eastman Kodak Company Transfer laminate donor for lenticular images with anti-stick backing material
JP3910926B2 (ja) * 2003-02-26 2007-04-25 株式会社東芝 表示装置用透明基板の製造方法
US8287957B2 (en) * 2004-11-22 2012-10-16 Wisconsin Alumni Research Foundation Methods and compositions for forming aperiodic patterned copolymer films
EP1960839A4 (en) * 2005-12-16 2012-01-11 Arkema Inc METHOD AND APPLICATIONS FOR PRODUCING BLOCK COPOLYMERS WITH LOW SURFACE ENERGY
JP5270817B2 (ja) * 2006-03-29 2013-08-21 株式会社東芝 ３次元形状を有する半導体部材を加工する方法
US20070254169A1 (en) 2006-04-28 2007-11-01 Kamins Theodore I Structures including organic self-assembled monolayers and methods of making the structures
JP4673266B2 (ja) * 2006-08-03 2011-04-20 日本電信電話株式会社 パターン形成方法及びモールド
US8247033B2 (en) 2008-09-19 2012-08-21 The University Of Massachusetts Self-assembly of block copolymers on topographically patterned polymeric substrates
CA2776672A1 (en) * 2008-10-03 2010-04-08 Chamelic Ltd Ab diblock copolymers and applications for their use
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JP5281386B2 (ja) * 2008-12-22 2013-09-04 株式会社日立製作所 高分子薄膜及びパターン媒体並びにこれらの製造方法
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Also Published As

Publication number Publication date
TW201434937A (zh) 2014-09-16
JP2014169436A (ja) 2014-09-18
US8822615B1 (en) 2014-09-02
CN103980649B (zh) 2016-08-17
KR102193322B1 (ko) 2020-12-22
US20140227448A1 (en) 2014-08-14
CN103980649A (zh) 2014-08-13
KR20140101309A (ko) 2014-08-19
TWI519590B (zh) 2016-02-01

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