KR102160018B1 - 조성물, 경화막, 컬러 필터, 차광막, 고체 촬상 소자 및 화상 표시 장치 - Google Patents

조성물, 경화막, 컬러 필터, 차광막, 고체 촬상 소자 및 화상 표시 장치 Download PDF

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KR102160018B1
KR102160018B1 KR1020187027311A KR20187027311A KR102160018B1 KR 102160018 B1 KR102160018 B1 KR 102160018B1 KR 1020187027311 A KR1020187027311 A KR 1020187027311A KR 20187027311 A KR20187027311 A KR 20187027311A KR 102160018 B1 KR102160018 B1 KR 102160018B1
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South Korea
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group
composition
titanium nitride
containing particles
preferable
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KR1020187027311A
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Korean (ko)
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KR20180116354A (ko
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마코토 쿠보타
다이스케 하마다
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후지필름 가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/076—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with titanium or zirconium or hafnium
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/28—Nitrogen-containing compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/002—Physical properties
    • C08K2201/006—Additives being defined by their surface area
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/011—Nanostructured additives

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
KR1020187027311A 2016-03-31 2017-03-08 조성물, 경화막, 컬러 필터, 차광막, 고체 촬상 소자 및 화상 표시 장치 KR102160018B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016072402 2016-03-31
JPJP-P-2016-072402 2016-03-31
PCT/JP2017/009177 WO2017169584A1 (ja) 2016-03-31 2017-03-08 組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置

Publications (2)

Publication Number Publication Date
KR20180116354A KR20180116354A (ko) 2018-10-24
KR102160018B1 true KR102160018B1 (ko) 2020-09-25

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Country Status (5)

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JP (1) JP6698820B2 (zh)
KR (1) KR102160018B1 (zh)
CN (2) CN109073799B (zh)
TW (1) TWI790993B (zh)
WO (1) WO2017169584A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6698820B2 (ja) * 2016-03-31 2020-05-27 富士フイルム株式会社 組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置
CN112189168A (zh) * 2018-07-20 2021-01-05 富士胶片株式会社 遮光性树脂组合物、固化膜、滤色器、遮光膜、固体摄像元件、图像显示装置
JP7330719B2 (ja) * 2019-03-01 2023-08-22 太陽ホールディングス株式会社 アルカリ現像型光硬化性熱硬化性樹脂組成物
WO2020203080A1 (ja) * 2019-03-29 2020-10-08 富士フイルム株式会社 組成物、遮光膜、カラーフィルタ、光学素子、センサ、固体撮像素子、ヘッドライトユニット
JP7301986B2 (ja) * 2019-09-06 2023-07-03 富士フイルム株式会社 組成物、膜、構造体、カラーフィルタ、固体撮像素子および画像表示装置

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JP2010217839A (ja) * 2009-03-19 2010-09-30 Fujifilm Corp 分散組成物及びその製造方法、遮光性カラーフィルタ用感光性樹脂組成物及びその製造方法、遮光性カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5136139B2 (ja) 2007-03-20 2013-02-06 東レ株式会社 樹脂ブラックマトリクス用黒色樹脂組成物、樹脂ブラックマトリクス、カラーフィルターおよび液晶表示装置

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US3717851A (en) 1971-03-03 1973-02-20 Ibm Processing of compacted data
JPS53137099A (en) * 1977-05-06 1978-11-30 Toyo Soda Mfg Co Ltd Production of titanium nitride
JPS54145400A (en) * 1978-05-08 1979-11-13 Ube Ind Ltd Production of metal nitride powder
US4812301A (en) * 1986-04-24 1989-03-14 The United States Of America As Represented By The Secretary Of The Interior Production of titanium nitride, carbide, and carbonitride powders
JPH02284643A (ja) * 1989-01-10 1990-11-22 Kawasaki Steel Corp 高純度の金属またはセラミックス微粉、超微粉の回収方法
DE3924300A1 (de) * 1989-01-21 1991-01-31 Basf Ag Verfahren zur herstellung von pulverfoermigen metallnitriden
WO2006070794A1 (ja) * 2004-12-28 2006-07-06 Dai Nippon Printing Co., Ltd. 表示素子用黒色樹脂組成物、及び表示素子用部材
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JP2010097214A (ja) * 2008-09-19 2010-04-30 Toray Ind Inc 液晶表示装置用カラーフィルター基板、および液晶表示装置
TWI483999B (zh) * 2009-06-15 2015-05-11 Toray Industries 黑色複合微粒子、黑色樹脂組成物、彩色濾光片基板及液晶顯示裝置
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Publication number Priority date Publication date Assignee Title
JP5136139B2 (ja) 2007-03-20 2013-02-06 東レ株式会社 樹脂ブラックマトリクス用黒色樹脂組成物、樹脂ブラックマトリクス、カラーフィルターおよび液晶表示装置
JP2010217839A (ja) * 2009-03-19 2010-09-30 Fujifilm Corp 分散組成物及びその製造方法、遮光性カラーフィルタ用感光性樹脂組成物及びその製造方法、遮光性カラーフィルタ及びその製造方法、並びに固体撮像素子

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TWI790993B (zh) 2023-02-01
CN113031398A (zh) 2021-06-25
JP6698820B2 (ja) 2020-05-27
WO2017169584A1 (ja) 2017-10-05
CN109073799B (zh) 2021-03-09
TW201806853A (zh) 2018-03-01
KR20180116354A (ko) 2018-10-24
CN109073799A (zh) 2018-12-21
JPWO2017169584A1 (ja) 2019-01-17

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