KR102139033B1 - 액침 부재 및 노광 장치 - Google Patents

액침 부재 및 노광 장치 Download PDF

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KR102139033B1
KR102139033B1 KR1020157003887A KR20157003887A KR102139033B1 KR 102139033 B1 KR102139033 B1 KR 102139033B1 KR 1020157003887 A KR1020157003887 A KR 1020157003887A KR 20157003887 A KR20157003887 A KR 20157003887A KR 102139033 B1 KR102139033 B1 KR 102139033B1
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liquid
substrate
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liquid immersion
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Korean (ko)
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KR20150038075A (ko
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신지 사토
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가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020157003887A 2012-07-20 2013-07-16 액침 부재 및 노광 장치 Active KR102139033B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261674078P 2012-07-20 2012-07-20
US61/674,078 2012-07-20
US201361790328P 2013-03-15 2013-03-15
US61/790,328 2013-03-15
PCT/JP2013/069959 WO2014014123A1 (en) 2012-07-20 2013-07-16 Liquid immersion member and exposure apparatus

Publications (2)

Publication Number Publication Date
KR20150038075A KR20150038075A (ko) 2015-04-08
KR102139033B1 true KR102139033B1 (ko) 2020-08-11

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KR1020157003887A Active KR102139033B1 (ko) 2012-07-20 2013-07-16 액침 부재 및 노광 장치

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US (3) US9823580B2 (OSRAM)
EP (1) EP2875405B1 (OSRAM)
JP (1) JP6406250B2 (OSRAM)
KR (1) KR102139033B1 (OSRAM)
CN (2) CN104487897B (OSRAM)
HK (1) HK1208914A1 (OSRAM)
TW (3) TWI661277B (OSRAM)
WO (1) WO2014014123A1 (OSRAM)

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US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
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US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
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EP3057122B1 (en) 2013-10-08 2018-11-21 Nikon Corporation Immersion member, exposure apparatus, exposure method, and device manufacturing method
KR102649164B1 (ko) 2017-12-15 2024-03-20 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법
CN112286012A (zh) * 2020-10-29 2021-01-29 浙江启尔机电技术有限公司 一种浸液回收系统及采用该系统的浸液回收方法

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US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
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US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
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Publication number Priority date Publication date Assignee Title
US20090231560A1 (en) * 2008-03-17 2009-09-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
WO2011083724A1 (ja) * 2010-01-08 2011-07-14 株式会社ニコン 液浸部材、露光装置、露光方法、及びデバイス製造方法

Also Published As

Publication number Publication date
US20180314166A1 (en) 2018-11-01
JP6406250B2 (ja) 2018-10-17
US9823580B2 (en) 2017-11-21
TW201405256A (zh) 2014-02-01
EP2875405A1 (en) 2015-05-27
JP2015528132A (ja) 2015-09-24
TWI661277B (zh) 2019-06-01
US20140022522A1 (en) 2014-01-23
HK1208914A1 (en) 2016-03-18
CN104487897B (zh) 2017-08-29
CN107422612A (zh) 2017-12-01
US10007189B2 (en) 2018-06-26
CN107422612B (zh) 2020-05-26
HK1206435A1 (en) 2016-01-08
TWI700557B (zh) 2020-08-01
TW201925928A (zh) 2019-07-01
WO2014014123A1 (en) 2014-01-23
TWI617894B (zh) 2018-03-11
US20150124230A1 (en) 2015-05-07
US10739683B2 (en) 2020-08-11
EP2875405B1 (en) 2020-02-26
CN104487897A (zh) 2015-04-01
TW201809910A (zh) 2018-03-16
KR20150038075A (ko) 2015-04-08

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