CN104487897B - 液浸构件及曝光装置 - Google Patents

液浸构件及曝光装置 Download PDF

Info

Publication number
CN104487897B
CN104487897B CN201380038451.8A CN201380038451A CN104487897B CN 104487897 B CN104487897 B CN 104487897B CN 201380038451 A CN201380038451 A CN 201380038451A CN 104487897 B CN104487897 B CN 104487897B
Authority
CN
China
Prior art keywords
liquid
component
substrate
liquid immersion
immersion member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201380038451.8A
Other languages
English (en)
Chinese (zh)
Other versions
CN104487897A (zh
Inventor
佐藤真路
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to CN201710675381.7A priority Critical patent/CN107422612B/zh
Publication of CN104487897A publication Critical patent/CN104487897A/zh
Application granted granted Critical
Publication of CN104487897B publication Critical patent/CN104487897B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201380038451.8A 2012-07-20 2013-07-16 液浸构件及曝光装置 Active CN104487897B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710675381.7A CN107422612B (zh) 2012-07-20 2013-07-16 液浸构件、曝光装置、液浸曝光装置、液浸曝光方法及元件制造方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261674078P 2012-07-20 2012-07-20
US61/674,078 2012-07-20
US201361790328P 2013-03-15 2013-03-15
US61/790,328 2013-03-15
PCT/JP2013/069959 WO2014014123A1 (en) 2012-07-20 2013-07-16 Liquid immersion member and exposure apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201710675381.7A Division CN107422612B (zh) 2012-07-20 2013-07-16 液浸构件、曝光装置、液浸曝光装置、液浸曝光方法及元件制造方法

Publications (2)

Publication Number Publication Date
CN104487897A CN104487897A (zh) 2015-04-01
CN104487897B true CN104487897B (zh) 2017-08-29

Family

ID=48951526

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201380038451.8A Active CN104487897B (zh) 2012-07-20 2013-07-16 液浸构件及曝光装置
CN201710675381.7A Active CN107422612B (zh) 2012-07-20 2013-07-16 液浸构件、曝光装置、液浸曝光装置、液浸曝光方法及元件制造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201710675381.7A Active CN107422612B (zh) 2012-07-20 2013-07-16 液浸构件、曝光装置、液浸曝光装置、液浸曝光方法及元件制造方法

Country Status (8)

Country Link
US (3) US9823580B2 (OSRAM)
EP (1) EP2875405B1 (OSRAM)
JP (1) JP6406250B2 (OSRAM)
KR (1) KR102139033B1 (OSRAM)
CN (2) CN104487897B (OSRAM)
HK (1) HK1208914A1 (OSRAM)
TW (3) TWI661277B (OSRAM)
WO (1) WO2014014123A1 (OSRAM)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2003226A (en) 2008-08-19 2010-03-09 Asml Netherlands Bv Lithographic apparatus, drying device, metrology apparatus and device manufacturing method.
US9256137B2 (en) * 2011-08-25 2016-02-09 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
JP6119242B2 (ja) * 2012-12-27 2017-04-26 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
EP3057122B1 (en) 2013-10-08 2018-11-21 Nikon Corporation Immersion member, exposure apparatus, exposure method, and device manufacturing method
KR102649164B1 (ko) 2017-12-15 2024-03-20 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법
CN112286012A (zh) * 2020-10-29 2021-01-29 浙江启尔机电技术有限公司 一种浸液回收系统及采用该系统的浸液回收方法

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU5067898A (en) 1996-11-28 1998-06-22 Nikon Corporation Aligner and method for exposure
EP0900412B1 (en) 1997-03-10 2005-04-06 ASML Netherlands B.V. Lithographic apparatus comprising a positioning device having two object holders
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
US6452292B1 (en) 2000-06-26 2002-09-17 Nikon Corporation Planar motor with linear coil arrays
WO2002069049A2 (en) 2001-02-27 2002-09-06 Asml Us, Inc. Simultaneous imaging of two reticles
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
TWI242691B (en) 2002-08-23 2005-11-01 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
KR101308826B1 (ko) 2003-09-03 2013-09-13 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
SG153813A1 (en) 2004-06-09 2009-07-29 Nikon Corp Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate
EP1796146B1 (en) 2004-09-17 2013-01-16 Nikon Corporation Exposure apparatus, exposure method, and method for manufacturing device
KR20070083492A (ko) * 2004-12-02 2007-08-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JP4844186B2 (ja) 2005-03-18 2011-12-28 株式会社ニコン プレート部材、基板保持装置、露光装置及び露光方法、並びにデバイス製造方法
TW200644079A (en) * 2005-03-31 2006-12-16 Nikon Corp Exposure apparatus, exposure method, and device production method
JP2008544565A (ja) * 2005-06-29 2008-12-04 エヌエックスピー ビー ヴィ プロセスチャンバの内部を近大気圧に保つ装置及び方法
US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7656501B2 (en) 2005-11-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus
US7804577B2 (en) * 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
TWI393171B (zh) 2006-01-19 2013-04-11 尼康股份有限公司 A moving body driving method and a moving body driving system, a pattern forming method and a pattern forming apparatus, an exposure method and an exposure apparatus, and an element manufacturing method
KR101486086B1 (ko) 2006-05-10 2015-01-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP2007335662A (ja) * 2006-06-15 2007-12-27 Canon Inc 露光装置
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8068209B2 (en) * 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
JP2009099939A (ja) * 2007-09-25 2009-05-07 Dainippon Screen Mfg Co Ltd アライメントマーク形成装置
US8610873B2 (en) * 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) * 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US8233139B2 (en) 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
JP2010135794A (ja) 2008-12-04 2010-06-17 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
US20100328637A1 (en) 2008-12-04 2010-12-30 Nikon Corporation Exposure apparatus, exposing method and device fabricating method
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP2523210A1 (en) * 2010-01-08 2012-11-14 Nikon Corporation Liquid-immersion member, exposing device, exposing method, and device manufacturing method
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
US20180314166A1 (en) 2018-11-01
JP6406250B2 (ja) 2018-10-17
US9823580B2 (en) 2017-11-21
TW201405256A (zh) 2014-02-01
EP2875405A1 (en) 2015-05-27
JP2015528132A (ja) 2015-09-24
TWI661277B (zh) 2019-06-01
US20140022522A1 (en) 2014-01-23
HK1208914A1 (en) 2016-03-18
KR102139033B1 (ko) 2020-08-11
CN107422612A (zh) 2017-12-01
US10007189B2 (en) 2018-06-26
CN107422612B (zh) 2020-05-26
HK1206435A1 (en) 2016-01-08
TWI700557B (zh) 2020-08-01
TW201925928A (zh) 2019-07-01
WO2014014123A1 (en) 2014-01-23
TWI617894B (zh) 2018-03-11
US20150124230A1 (en) 2015-05-07
US10739683B2 (en) 2020-08-11
EP2875405B1 (en) 2020-02-26
CN104487897A (zh) 2015-04-01
TW201809910A (zh) 2018-03-16
KR20150038075A (ko) 2015-04-08

Similar Documents

Publication Publication Date Title
CN104487897B (zh) 液浸构件及曝光装置
US10520828B2 (en) Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
TWI686679B (zh) 曝光裝置及元件製造方法
CN104838470A (zh) 具备防振装置的曝光装置
TW201740219A (zh) 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體
JP6212884B2 (ja) 露光装置、露光方法、及びデバイス製造方法
JP2014154700A (ja) 露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体
JP2014086678A (ja) 液浸部材、露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体
JP2014086456A (ja) 液浸部材、露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体
HK1242789A1 (en) Liquid immersion member and exposure apparatus
HK1206435B (en) Liquid immersion member and exposure apparatus

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
REG Reference to a national code

Ref country code: HK

Ref legal event code: DE

Ref document number: 1206435

Country of ref document: HK

GR01 Patent grant
GR01 Patent grant
REG Reference to a national code

Ref country code: HK

Ref legal event code: GR

Ref document number: 1206435

Country of ref document: HK